公开(公告)号：US5905520A

公开(公告)日：1999-05-18

申请号：US574902

申请日：1995-12-19

申请人： Daisuke Fujii ,  Eiichi Sugisaki ,  Amiko Chihara ,  Akihiro Yoshimura ,  Shigeru Yamakawa ,  Yasunori Toda ,  Kumiko Nagai ,  Mitsuhiro Ino

发明人： Daisuke Fujii ,  Eiichi Sugisaki ,  Amiko Chihara ,  Akihiro Yoshimura ,  Shigeru Yamakawa ,  Yasunori Toda ,  Kumiko Nagai ,  Mitsuhiro Ino

IPC分类号： B41J11/66 ,  B41J11/70 ,  B41J15/04 ,  B65H31/30 ,  B65H33/08 ,  B65H43/06 ,  B65H45/101 ,  B41J2/385 ,  G03G9/08

CPC分类号： B65H31/3054 ,  B65H33/08 ,  B65H43/06 ,  B65H45/1015

摘要： A paper handling apparatus has a simplified structure and allows printed paper to be stacked efficiently. The paper handling apparatus receives printed paper which has undergone printing for each print job and handles the printed paper in an orderly manner. The paper handling apparatus has a stacking section in which printed paper is stacked sequentially for a plurality of jobs and an unloading mechanism for unloading stacked printed paper from the stacking section to the outside. The paper handling apparatus can be used with a printing apparatus which is connected to a large-scale information processing system or similar for printing a large volume of data.

摘要翻译： 纸张处理装置具有简化的结构，并且能够有效地堆叠印刷纸。 纸张处理装置接收对于每个打印作业经历了打印的打印纸，并且有序地处理打印纸。 纸张处理设备具有堆叠部分，其中打印纸被顺次堆叠用于多个作业，以及用于将堆叠的打印纸从堆叠部分卸载到外部的卸载机构。 纸张处理装置可以与连接到大规模信息处理系统或类似的用于打印大量数据的打印装置一起使用。

公开(公告)号：US08702903B2

公开(公告)日：2014-04-22

申请号：US12055633

申请日：2008-03-26

申请人： Masaaki Miyagawa ,  Akihiro Yoshimura

发明人： Masaaki Miyagawa ,  Akihiro Yoshimura

IPC分类号： C23C16/50 ,  C23C16/00 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01L21/67103 ,  H01J37/32091 ,  H01J37/32642 ,  H01J2237/2001 ,  H01L21/67005 ,  H01L21/67069 ,  H01L21/68735

摘要： A thermally conductive sheet is used between a mounting table for mounting thereon a target substrate and an annular focus ring mounted on the mounting table to surround a circumferential peripheral portion of the target substrate. Further, the mounting table includes therein a cooling unit and is disposed in a depressurized accommodating chamber for accommodating therein the target substrate. The thermally conductive sheet has a non-adhesive layer on each of one or more surfaces thereof.

摘要翻译： 在用于安装目标基板的安装台和安装在安装台上的环形聚焦环之间使用导热片以包围目标基板的圆周周边部分。 此外，安装台包括冷却单元，并且设置在减压容纳室中，用于容纳目标基板。 导热片在其一个或多个表面中的每一个上具有非粘性层。

公开(公告)号：US20090206055A1

公开(公告)日：2009-08-20

申请号：US12388843

申请日：2009-02-19

申请人： Tetsuji SATO ,  Akihiro Yoshimura

发明人： Tetsuji SATO ,  Akihiro Yoshimura

IPC分类号： H01L21/306

CPC分类号： H01J37/32633 ,  H01J37/32449 ,  H01J37/32623

摘要： In a plasma processing apparatus for performing a plasma process on a target substrate, a baffle plate has an opening through which the process passes and partitions the internal space of the processing container into a plasma process space and an exhaust space, the opening being a single continuous slit. The baffle plate is disposed in an annular gas exhaust path around the mounting table, and the slit includes a plurality of linear slit portions extending in a radial direction of the annular baffle plate and a plurality of curved slit portions, each of which interconnects ends of a pair of the adjacent linear slit portions, so that the slit is formed in a wave shape in its entirety.

摘要翻译： 在用于在目标基板上进行等离子体处理的等离子体处理装置中，挡板具有开口，工序通过该开口并将处理容器的内部空间分隔成等离子体处理空间和排气空间，该开口为单个 连续缝 挡板设置在安装台周围的环形排气通道中，狭缝包括沿环形挡板的径向延伸的多个线性狭缝部分和多个弯曲狭缝部分，每个弯曲狭缝部分将 一对相邻的线状狭缝部，使得狭缝整体形成波形。

公开(公告)号：US20110116207A1

公开(公告)日：2011-05-19

申请号：US12947214

申请日：2010-11-16

申请人： Tetsuji SATO ,  Takashi Kitazawa ,  Akihiro Yoshimura

发明人： Tetsuji SATO ,  Takashi Kitazawa ,  Akihiro Yoshimura

IPC分类号： H01L21/683

CPC分类号： H01L21/6831

摘要： A substrate mounting table of a substrate processing apparatus includes a base portion and a circular plate-shaped electrostatic chuck adhered to an upper surface of the base portion by an adhesive layer. The electrostatic chuck has a circular attracting surface to support a substrate. The substrate mounting table further includes an annular focus ring arranged around the electrostatic chuck to surround the substrate and to cover an outer peripheral portion of the upper surface of the base portion. The electrostatic chuck has a two-layer structure including an upper circular part and a lower circular part having a diameter larger than that of the upper circular part. An outer peripheral portion of the lower circular part and an outer peripheral portion of the adhesive layer adhering the lower circular part to the base portion are covered with the focus ring.

摘要翻译： 基板处理装置的基板安装台包括基部和通过粘合层粘附到基部的上表面的圆形板状静电卡盘。 静电吸盘具有支撑衬底的圆形吸引表面。 基板安装台还包括围绕静电卡盘布置以围绕基板并覆盖基部的上表面的外周部分的环形聚焦环。 静电卡盘具有包括上部圆形部分和直径大于上部圆形部分的直径的下部圆形部分的两层结构。 下部圆形部分的外围部分和将下部圆形部分粘附到基部的粘合剂层的外周部分被聚焦环覆盖。

公开(公告)号：US20080166894A1

公开(公告)日：2008-07-10

申请号：US11970612

申请日：2008-01-08

申请人： Masaaki MIYAGAWA ,  Akihiro Yoshimura

发明人： Masaaki MIYAGAWA ,  Akihiro Yoshimura

IPC分类号： H01L21/00

CPC分类号： H01L21/6831 ,  H01L21/67103

摘要： A focus ring heat transfer method improves heat transfer of a focus ring arranged in an outer peripheral portion of a mounting surface of a mounting table adapted to mount a target substrate in a chamber. The method includes steps of: disposing a heat transfer sheet between the focus ring and the mounting table; and vacuum-evacuating the chamber prior to processing the target substrate and then restoring the pressure the inside of the chamber to an atmospheric pressure or a light vacuum pressure. Therefore, air present in a fine gap between the heat transfer sheet and the mounting surface is removed to allow the heat transfer sheet to adhere to the mounting surface.

摘要翻译： 聚焦环传热方法改善了布置在适于将目标基板安装在室中的安装台的安装表面的外周部分中的聚焦环的热传递。 该方法包括以下步骤：在聚焦环和安装台之间设置传热片; 并且在处理目标基板之前对腔室进行真空抽真空，然后将腔室内部的压力恢复到大气压力或轻的真空压力。 因此，除去传热片与安装面之间的微细间隙的空气，使传热片粘附在安装面上。

公开(公告)号：US09032916B2

公开(公告)日：2015-05-19

申请号：US13806417

申请日：2011-06-07

申请人： Kazuaki Nishio ,  Akihiro Yoshimura

发明人： Kazuaki Nishio ,  Akihiro Yoshimura

IPC分类号： F02F1/14 ,  F02F1/10 ,  F01P3/02

CPC分类号： F02F1/16 ,  F01P3/02 ,  F01P2003/021 ,  F02F1/10 ,  F02F1/14

摘要： A cylinder bore wall insulating member has a contact surface that comes in contact with a wall surface of a cylinder bore wall that forms a cylinder block of an internal combustion engine and defines a groove-like coolant passage. An internal combustion engine in which the cylinder bore wall has a uniform temperature may be obtained using the insulating member.

摘要翻译： 气缸壁壁绝缘构件具有接触表面，该接触表面与形成内燃机的气缸体的气缸孔壁的壁面相接触并且限定了槽状冷却剂通道。 使用绝缘构件可以获得其中气缸孔壁具有均匀温度的内燃机。

公开(公告)号：US20130160725A1

公开(公告)日：2013-06-27

申请号：US13806417

申请日：2011-06-07

申请人： Kazuaki Nishio ,  Akihiro Yoshimura

发明人： Kazuaki Nishio ,  Akihiro Yoshimura

IPC分类号： F02F1/14

CPC分类号： F02F1/16 ,  F01P3/02 ,  F01P2003/021 ,  F02F1/10 ,  F02F1/14

摘要： A cylinder bore wall insulating member has a contact surface that comes in contact with a wall surface of a cylinder bore wall that forms a cylinder block of an internal combustion engine and defines a groove-like coolant passage. An internal combustion engine in which the cylinder bore wall has a uniform temperature may be obtained using the insulating member.

公开(公告)号：US09455125B2

公开(公告)日：2016-09-27

申请号：US13070115

申请日：2011-03-23

申请人： Akihiro Yoshimura ,  Tetsuji Sato ,  Masato Horiguchi ,  Nobuhiro Wada ,  Makoto Kobayashi ,  Hiroshi Tsujimoto ,  Jun Tamura ,  Mamoru Naoi

发明人： Akihiro Yoshimura ,  Tetsuji Sato ,  Masato Horiguchi ,  Nobuhiro Wada ,  Makoto Kobayashi ,  Hiroshi Tsujimoto ,  Jun Tamura ,  Mamoru Naoi

IPC分类号： C23C16/00 ,  C23F1/00 ,  H01L21/306 ,  H01J37/32

CPC分类号： H01J37/32091 ,  H01J37/32568

摘要： Disclosed is a substrate processing apparatus capable of suppressing generation of plasma in the space between a moving electrode and an end wall at one side of a cylindrical chamber. The substrate processing apparatus includes a cylindrical chamber to receive a wafer, a shower head movable along a central axis of the chamber inside the chamber, a susceptor opposing the shower head in the chamber, and a flexible bellows connecting the shower head to a cover of the chamber, wherein a high frequency power is applied to a processing space presented between the shower head and the susceptor, processing gas is introduced into the processing space, the shower head and the side wall of the chamber are non-contact to each other, and a bypass member is installed electrically connecting the shower head and the cover or the side wall of the chamber.

摘要翻译： 公开了一种能够抑制在圆筒形室的一侧的移动电极与端壁之间的空间中产生等离子体的基板处理装置。 基板处理装置包括用于容纳晶片的圆柱形室，可沿着室内的室的中心轴线移动的喷头，与腔室中的淋浴喷头相对的基座，以及柔性波纹管，其将淋浴头连接到 所述室，其中向所述淋浴喷头和所述基座之间呈现的处理空间施加高频功率，将处理气体引入所述处理空间中，所述淋浴喷头和所述室的侧壁彼此不接触， 并且旁路部件被安装成电连接淋浴头和盖子或室的侧壁。

公开(公告)号：USD709536S1

公开(公告)日：2014-07-22

申请号：US29417056

申请日：2012-03-29

申请人： Akihiro Yoshimura ,  Masaaki Miyagawa ,  Tetsuji Sato

设计人： Akihiro Yoshimura ,  Masaaki Miyagawa ,  Tetsuji Sato

公开(公告)号：US08687343B2

公开(公告)日：2014-04-01

申请号：US12947214

申请日：2010-11-16

申请人： Tetsuji Sato ,  Takashi Kitazawa ,  Akihiro Yoshimura

发明人： Tetsuji Sato ,  Takashi Kitazawa ,  Akihiro Yoshimura

IPC分类号： H01L21/683 ,  C23F1/00

CPC分类号： H01L21/6831

摘要： A substrate mounting table of a substrate processing apparatus includes a base portion and a circular plate-shaped electrostatic chuck adhered to an upper surface of the base portion by an adhesive layer. The electrostatic chuck has a circular attracting surface to support a substrate. The substrate mounting table further includes an annular focus ring arranged around the electrostatic chuck to surround the substrate and to cover an outer peripheral portion of the upper surface of the base portion. The electrostatic chuck has a two-layer structure including an upper circular part and a lower circular part having a diameter larger than that of the upper circular part. An outer peripheral portion of the lower circular part and an outer peripheral portion of the adhesive layer adhering the lower circular part to the base portion are covered with the focus ring.

摘要翻译： 基板处理装置的基板安装台包括基部和通过粘合层粘附到基部的上表面的圆形板状静电卡盘。 静电吸盘具有支撑衬底的圆形吸引表面。 基板安装台还包括围绕静电卡盘布置以围绕基板并覆盖基部的上表面的外周部分的环形聚焦环。 静电卡盘具有包括上部圆形部分和直径大于上部圆形部分的直径的下部圆形部分的两层结构。 下部圆形部分的外围部分和将下部圆形部分粘附到基部的粘合剂层的外周部分被聚焦环覆盖。