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17 条记录 (耗时 0.031 秒)

    METHOD AND DEVICE FOR PRODUCING AND PROCESSING LAYERS OF SUBSTRATES UNDER A DEFINED PROCESSING ATMOSPHERE
    4.
    发明申请
    METHOD AND DEVICE FOR PRODUCING AND PROCESSING LAYERS OF SUBSTRATES UNDER A DEFINED PROCESSING ATMOSPHERE 审中-公开
    用于生产和加工定义加工大气层底物层的方法和装置

    公开(公告)号：US20090061088A1

    公开(公告)日：2009-03-05

    申请号：US12176454

    申请日：2008-07-21

    申请人： Hubertus Von Der Waydbrink ,  Michael Hentschel ,  Marco Kenne ,  Andrej Wolf

    发明人： Hubertus Von Der Waydbrink ,  Michael Hentschel ,  Marco Kenne ,  Andrej Wolf

    IPC分类号： C23C16/00 ,  C23C16/458 ,  H05B6/00

    CPC分类号： C23C16/46 ,  C23C14/24 ,  C23C14/562 ,  C23C16/545

    摘要： A method is provided for producing a processing atmosphere for coating substrates, with this method primarily being used in CVD-processes for precipitating an individual layer or a system of individual layers under defined processing atmospheres, in which processing gas is supplied to a coating chamber in a defined manner and exhausted. Via the method and related devices, a variable processing atmosphere is adjustable inside the coating chamber in a flexible, reliable and homogenous manner, and requiring a reduced maintenance and energy expense, even when the substrate is heated. The processing gas is created by at least one gas channel extending perpendicular in reference to the substrate by way of supplying gas flow or exhausting, with a lateral extension being equivalent to the width of the substrate.

    摘要翻译： 提供了一种用于生产用于涂覆基材的处理气氛的方法，该方法主要用于在规定的加工环境下沉淀单个层或各层的体系的CVD工艺，其中将处理气体供应到涂覆室 一个定义的方式和用尽。 通过该方法和相关设备，可以以柔性，可靠和均匀的方式在涂层室内调节可变处理气氛，并且即使在加热基板时也需要减少维护和能量消耗。 处理气体由至少一个气体通道产生，所述至少一个气体通道通过提供气流或排气而相对于基板垂直延伸，横向延伸部等于基板的宽度。

    DEVICE FOR CONTROLLING THE TEMPERATURE OF SUBSTRATES
    6.
    发明申请
    DEVICE FOR CONTROLLING THE TEMPERATURE OF SUBSTRATES 有权
    用于控制基板温度的装置

    公开(公告)号：US20120118541A1

    公开(公告)日：2012-05-17

    申请号：US13376465

    申请日：2010-06-18

    申请人： Hubertus Von Der Waydbrink ,  Thomas Meyer ,  Michael Hentschel ,  Reinhardt Bauer ,  Andrej Wolf ,  Hans-Christian Hecht

    发明人： Hubertus Von Der Waydbrink ,  Thomas Meyer ,  Michael Hentschel ,  Reinhardt Bauer ,  Andrej Wolf ,  Hans-Christian Hecht

    IPC分类号： F28F13/00

    CPC分类号： C23C14/541 ,  C23C14/56

    摘要： A device for controlling the temperature of substrates in a substrate-treatment system, in which a substrate can be guided in the longitudinal extension of the substrate-treatment system in a substrate transport plane within a vacuum chamber past a treatment device, solves the problem of dynamically shaping a dynamic change of the thermal insulation to control the heat transfer in the substrate and thereby, reduce, in particular, thermal inertias by providing a heat-absorbing cooler side of the substrate transport plane. The heat-absorbing cooler can be shielded, at least partially from the substrate transport plane, using an insulation member.

    摘要翻译： 用于控制基板处理系统中的基板的温度的装置，其中基板可以在基板处理系统的纵向延伸中在通过处理装置的真空室内的基板输送平面中被引导，解决了 动态地塑造热绝缘的动态变化以控制衬底中的热传递，从而通过提供衬底传输平面的吸热冷却器侧，特别地减少热惯性。 使用绝缘构件，可以至少部分地从基板输送平面屏蔽吸热式冷却器。

    Apparatus for continuous coating
    7.
    发明授权
    Apparatus for continuous coating 有权
    用于连续涂布的装置

    公开(公告)号：US08470094B2

    公开(公告)日：2013-06-25

    申请号：US13293266

    申请日：2011-11-10

    申请人： Hubertus Von Der Waydbrink ,  Siegfried Scheibe ,  Jens Meyer ,  Andrej Wolf ,  Uwe Traeber ,  Michael Hentschel

    发明人： Hubertus Von Der Waydbrink ,  Siegfried Scheibe ,  Jens Meyer ,  Andrej Wolf ,  Uwe Traeber ,  Michael Hentschel

    IPC分类号： C23C16/54

    CPC分类号： C23C16/54 ,  C23C16/4401

    摘要： Apparatus for continuous coating has a chamber wall which forms a processing chamber, thermal insulation which forms a processing area within the chamber, a transportation device for substrates located in the processing area with a substrate transportation direction of the substrates lying in the lengthwise extension of the apparatus for continuous coating, and heating equipment which heats the substrates, is designed to minimize unwanted coating, in particular of parts of the apparatus, in order to minimize the expense of maintaining and servicing the apparatus A condensation element is positioned in the processing chamber, which extends into the processing area and binds the arising vapor through condensation.

    摘要翻译： 用于连续涂布的装置具有形成处理室的室壁，在室内形成处理区域的热绝缘体，位于处理区域中的基板的输送装置，其中基板的基板输送方向位于 用于连续涂覆的装置和加热基板的加热设备被设计成使不需要的涂层，特别是装置的部件最小化，以便最小化维护和维修设备的费用。冷凝件位于处理室中， 其延伸到处理区域中并通过冷凝来结合产生的蒸气。