Light-emitting diode with an electrically conductive window
    3.
    发明授权
    Light-emitting diode with an electrically conductive window 失效
    具有导电窗的发光二极管

    公开(公告)号:US5008718A

    公开(公告)日:1991-04-16

    申请号:US452800

    申请日:1989-12-18

    IPC分类号: H01L33/00 H01L33/30

    CPC分类号: H01L33/30 H01L33/0062

    摘要: A light-emitting diode has a semiconductor substrate underlying active p-n junction layers of AlGaInP for emitting light. A transparent window layer of semiconductor different from AlGaInP overlies the active layers and has a lower electrical resistivity than the active layers and a bandgap greater than the bandgap of the active layers, for minimizing current crowding from a metal electrical contact over the transparent window layer. The active layers may be epitaxially grown on a temporary GaAs substrate. A layer of lattice mismatched GaP is then grown on the active layers with the GaP having a bandgap greater than the bandgap of the active layers so that it is transparent to light emitted by the LED. The GaAs temporary substrate is then selectively etched away so that the GaP acts as a transparent substrate. A transparent window layer may be epitaxially grown over the active layers on the face previously adjacent to the GaAs substrate.

    Method of making a high band-gap opto-electronic device
    4.
    发明授权
    Method of making a high band-gap opto-electronic device 失效
    制造高带隙光电器件的方法

    公开(公告)号:US5204284A

    公开(公告)日:1993-04-20

    申请号:US744569

    申请日:1991-08-13

    摘要: A high band-gap opto-electronic device is formed by epitaxially growing the device section in a lattice-matched (Al.sub.x Ga.sub.1-x).sub.y In.sub.1-y P-GaAs system. The band-gap of the epitaxial layer increases with x. Instead of growing the device section directly on the GaAs substrate, a layer of (Al.sub.x Ga.sub.1-x).sub.y In.sub.1-y P, graded in x and in temperature while maintaining substantially y=0.5, is grown as a transitional layer. The high band-gap device structures include homojunctions, heterojunctions and particularly a separate confinement quantum well heterostructures. Various embodiments of the invention include devices on absorbing substrates and on transparent substrates, and devices incorporating strained-layer superlattices.

    摘要翻译: 通过在晶格匹配(Al x Ga 1-x)y In 1-y -P-GaAs系统中外延生长器件部分来形成高带隙光电器件。 外延层的带隙随x增加。 不是直接在GaAs衬底上生长器件部分,而是在保持基本上为y = 0.5的同时以x和温度分级的(Al x Ga 1-x)y In 1-y P层被生长为过渡层。 高带隙器件结构包括同功能,异质结,特别是单独的约束量子阱异质结构。 本发明的各种实施例包括吸收衬底和透明衬底上的器件以及包含应变层超晶格的器件。