Apparatus for manufacturing a process abatement reactor
    2.
    发明授权
    Apparatus for manufacturing a process abatement reactor 失效
    用于制造工艺消除反应器的装置

    公开(公告)号:US07736600B2

    公开(公告)日:2010-06-15

    申请号:US11555056

    申请日:2006-10-31

    IPC分类号: B01D50/00

    摘要: A thermal reactor for use during the abatement of a semiconductor manufacturing process is provided, including a thermal reaction unit having: an interior porous wall that defines a central chamber, the interior porous wall formed from a plurality of stacked porous sections; at least one gas inlet in fluid communication with the central chamber and adapted to introduce gaseous waste stream to the central chamber; a thermal mechanism positioned within the central chamber and adapted to decompose the gaseous waste stream within the central chamber, thereby forming reaction products; and a fluid delivery system adapted to provide a fluid to the central chamber through the interior porous wall at a sufficient force to reduce deposition of reaction products on an inner surface of the interior porous wall of the central chamber; wherein at least one of the porous sections has one or more of: a property that varies within the porous section; and a property that differs from a property of at least one other porous section of the interior porous wall.

    摘要翻译: 提供了一种在减少半导体制造过程中使用的热反应器,包括热反应单元,其具有限定中心室的内部多孔壁,所述内部多孔壁由多个堆叠的多孔部分形成; 至少一个气体入口与中心室流体连通并且适于将气体废物流引入中心室; 位于中心室内的热机构,其适于分解中心室内的气态废物流,从而形成反应产物; 以及流体输送系统,其适于通过内部多孔壁以足够的力向中心室提供流体,以减少反应产物在中心室的内部多孔壁的内表面上的沉积; 其中所述多孔部分中的至少一个具有以下一种或多种:在所述多孔部分内变化的性质; 以及与内部多孔壁的至少另一个多孔部分的性质不同的性质。