-
公开(公告)号：US20080074665A1
公开(公告)日：2008-03-27
申请号：US11945058
申请日：2007-11-26
Applicant: Boaz BRILL , Moshe Finarov , David Scheiner
Inventor： Boaz BRILL , Moshe Finarov , David Scheiner
CPC classification number: G03F7/70633 , G01B11/14 , G01B11/27 , G01N21/4788 , G01N21/9501 , G01N21/956 , H01L22/12
Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.
Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造过程中层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。
-
公开(公告)号：US20060001883A1
公开(公告)日：2006-01-05
申请号：US10525568
申请日：2003-05-08
Applicant: Boaz Brill , Moshe Finarov , David Scheiner
Inventor： Boaz Brill , Moshe Finarov , David Scheiner
IPC: G01N21/55
CPC classification number: G01N21/55
Abstract: An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for collecting light coming from the sample through a detection channel (DC), and generating data indicative of the collected light, a light directing assembly (106) operable to direct the incident beam onto a certain location on the sample's plane with a plurality of incident angles, and to direct light returned from the illuminated location to the detector unit (104), the light directing assembly (106) comprising a plurality of beam deflector elements (108 A-D), at least one of the deflector elements being movable and position of said at least one movable deflector element defining one of the selected incident angles.
Abstract translation: 一种用于样品测量的光学系统，包括可操作以产生通过照明通道（IC）向特定方向向样品（S）传播的入射光束的光源（102），用于 收集来自样品的光通过检测通道（DC）并产生指示所收集的光的数据;导光组件（106），其可操作以将入射光束以多个入射角度引导到样品平面上的特定位置 ，并且将从所述照明位置返回的光引导到所述检测器单元（104），所述光引导组件（106）包括多个光束偏转元件（108AD），所述偏转元件中的至少一个可移动并且所述 限定所选入射角中的一个的至少一个可移动偏转元件。
-
公开(公告)号：US20110089348A1
公开(公告)日：2011-04-21
申请号：US12966595
申请日：2010-12-13
Applicant: Moshe Finarov , David Scheiner , Yoav Lishzinker , On Haran
Inventor： Moshe Finarov , David Scheiner , Yoav Lishzinker , On Haran
IPC: G01N21/86
CPC classification number: G01N21/31 , G01N21/6489 , G01N21/65 , G01N21/8422 , G01N21/8901 , G01N21/9501 , G01N2021/3568 , G01N2021/8908 , G01N2201/0826 , G01N2201/0833 , G01N2201/1085
Abstract: Photovoltaic thin film quality control is obtained where the thin film is supported by a support and a section of the film is illuminated by a polychromatic or monochromatic illumination source. The illumination is positioned in certain locations including locations where the layer stack includes a reduced number of thin film layers. Such locations may be discrete sampled points located within scribe lines, contact frames or dedicated measurement targets. The light collected from such discrete sampled points is transferred to a photo-sensitive sensor through an optical switch. The spectral signal of the light reflected, transmitted or scattered by the sampled points is collected by the sensor and processed by a controller in such a way that parameters of simplified stacks are used for accurate determination of desired parameters of the full cell stack. In this way the photovoltaic thin film parameters applicable to the quality control are derived e.g. thin film thickness, index of refraction, extinction coefficient, absorption coefficient, energy gap, conductivity, crystallinity, surface roughness, crystal phase, material composition and photoluminescence spectrum and intensity. Manufacturing equipment parameters influencing the material properties may be changed to provide a uniform thin film layer with pre-defined properties.
Abstract translation: 获得光电薄膜质量控制，其中薄膜由支撑体支撑并且膜的一部分被多色或单色照明源照射。 照明被定位在某些位置，包括层堆叠减少数量的薄膜层的位置。 这些位置可以是位于划线，接触框架或专用测量目标内的离散采样点。 从这些离散采样点收集的光通过光学开关传送到光敏传感器。 由采样点反射，传播或散射的光的光谱信号由传感器收集并由控制器进行处理，使得简化堆栈的参数用于精确确定全单元堆栈的期望参数。 以这种方式，可以使用适用于质量控制的光伏薄膜参数。 薄膜厚度，折射率，消光系数，吸收系数，能隙，导电率，结晶度，表面粗糙度，结晶相，材料组成和光致发光光谱和强度。 可以改变影响材料性能的制造设备参数，以提供具有预定特性的均匀薄膜层。
-
4.发明授权Method and apparatus for monitoring a chemical mechanical planarization process applied to metal-based patterned objects 有权用于监测应用于基于金属的图案化物体的化学机械平面化处理的方法和装置公开(公告)号：US06801326B2
公开(公告)日：2004-10-05
申请号：US09942849
申请日：2001-08-31
Applicant: Moshe Finarov , David Scheiner , Avi Ravid
Inventor： Moshe Finarov , David Scheiner , Avi Ravid
IPC: G01B1106
CPC classification number: H01L22/34 , B24B37/013 , B24B49/02 , B24B49/12 , H01L21/67253 , H01L22/12 , H01L22/26
Abstract: A method is presented for optical control of the quality of a process of chemical mechanical planarization (CMP) performed by a polishing tool applied to an article having a patterned area. The article contains a plurality of stacks each formed by a plurality of different layers, thereby defining a pattern in the form of spaced-apart metal regions. The method is capable of locating at least one of residues, erosion and dishing conditions on the article. At least one predetermined site on the article is selected for control. This at least one predetermined site is illuminated, and spectral characteristics of light components reflected from this location are detected. Data representative of the detected light components is analyzed for determining at least one parameter of the article within the at least one illuminated site.
Abstract translation: 提出了一种用于光学控制由应用于具有图案化区域的制品的抛光工具执行的化学机械平面化（CMP）工艺的质量的方法。 该物品包含多个由多个不同层形成的堆叠，从而限定了间隔金属区域形式的图案。 该方法能够定位物品上的残留物，侵蚀和凹陷条件中的至少一种。 选择物品上至少一个预定的位置进行控制。 该至少一个预定位置被照亮，并且检测从该位置反射的光分量的光谱特性。 分析表示检测到的光成分的数据，以确定至少一个照明部位内的物品的至少一个参数。
-
公开(公告)号：US20060102830A1
公开(公告)日：2006-05-18
申请号：US11271773
申请日：2005-11-14
Applicant: Boaz Brill , Moshe Finarov , David Scheiner
Inventor： Boaz Brill , Moshe Finarov , David Scheiner
CPC classification number: G03F7/70633 , G01B11/14 , G01B11/27 , G01N21/4788 , G01N21/9501 , G01N21/956 , H01L22/12
Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements comprise at least two measurements with different polarization states of incident light, each measurement including illuminating eh measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between eth diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.
-
Patent Agency Ranking
公开(公告)号：US20070034816A1
公开(公告)日：2007-02-15
申请号：US11580997
申请日：2006-10-16
Applicant: Boaz Brill , Moshe Finarov , David Scheiner
Inventor： Boaz Brill , Moshe Finarov , David Scheiner
CPC classification number: G03F7/70633 , G01B11/14 , G01B11/27 , G01N21/4788 , G01N21/9501 , G01N21/956 , H01L22/12
Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements comprise at least two measurements with different polarization states of incident light, each measurement including illuminating eh measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between eth diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.
Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造期间层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有入射光的不同偏振态的至少两个测量，每个测量包括照射eh测量位置，以便通过另一个照射衍射结构之一。 测量位置的衍射特性表示了eth衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。
-
公开(公告)号：US6100985A
公开(公告)日：2000-08-08
申请号：US267989
申请日：1999-03-12
Applicant: David Scheiner , Moshe Finarov
Inventor： David Scheiner , Moshe Finarov
CPC classification number: G01B11/0625 , G01B11/02 , G01J3/42 , H01L22/12
Abstract: A method for measuring at least one desired parameter of a patterned structure having a plurality of features defined by a certain process of its manufacturing. The structure represents a grid having at least one cycle formed of at least two locally adjacent elements having different optical properties in respect of an incident radiation. An optical model, based on at least some of the features of the structure is provided. The model is capable of determining theoretical data representative of photometric intensities of light components of different wavelengths specularly reflected from the structure and of calculating said at least one desired parameter of the structure. A measurement area, which is substantially larger than a surface area of the structure defined by the grid cycle, is illuminated by an incident radiation of a preset substantially wide wavelength range. Light component substantially specularly reflected from the measurement area is detected and measured data representative of photometric intensities of each wavelength within the wavelength range is obtained. The measured and theoretical data are analyzed and the optical model is optimized until the theoretical data satisfies a predetermined condition. Upon detecting that the predetermined condition is satisfied, said at least one parameter of the structure is calculated.
Abstract translation: 一种用于测量具有由其制造的特定过程限定的多个特征的图案化结构的至少一个期望参数的方法。 该结构表示具有至少一个周期的网格，该至少一个周期由相对于入射辐射具有不同光学特性的至少两个局部相邻元件形成。 提供了基于结构的至少一些特征的光学模型。 该模型能够确定表示从结构镜面反射的不同波长的光分量的光度强度并且计算所述结构的至少一个期望参数的理论数据。 基本上大于由栅格周期限定的结构的表面积的测量区域被预设的基本上宽的波长范围的入射辐射照射。 检测从测量区域基本上镜面反射的光分量，并且获得表示波长范围内的每个波长的光度强度的测量数据。 分析测量和理论数据，并优化光学模型，直到理论数据满足预定条件。 在检测到满足预定条件时，计算结构的所述至少一个参数。
-
公开(公告)号：US20100214566A1
公开(公告)日：2010-08-26
申请号：US12775883
申请日：2010-05-07
Applicant: Boaz Brill , Moshe Finarov , David Scheiner
Inventor： Boaz Brill , Moshe Finarov , David Scheiner
IPC: G01B11/00 , H01L23/544
CPC classification number: G03F7/70633 , G01B11/14 , G01B11/27 , G01N21/4788 , G01N21/9501 , G01N21/956 , H01L22/12
Abstract: Alignment of layers during manufacture of a multi-layer sample is controlled by applying optical measurements to a measurement site in the sample. The measurement site includes two diffractive structures located one above the other in two different layers, respectively. The optical measurements include at least two measurements with different polarization states of incident light, each measurement including illuminating the measurement site so as to illuminate one of the diffractive structures through the other. The diffraction properties of the measurement site are indicative of a lateral shift between the diffractive structures. The diffraction properties detected are analyzed for the different polarization states of the incident light to determine an existing lateral shift between the layers.
Abstract translation: 通过对样品中的测量部位进行光学测量来控制多层样品的制造期间层的对准。 测量部位包括两个分别位于两个不同层之间的衍射结构。 光学测量包括具有不同入射光偏振态的至少两次测量，每个测量包括照亮测量位置，以便通过另一个照射衍射结构之一。 测量部位的衍射特性表示衍射结构之间的横向偏移。 对入射光的不同极化状态分析检测的衍射特性，以确定层之间现有的横向偏移。
-
公开(公告)号：US07292341B2
公开(公告)日：2007-11-06
申请号：US10525568
申请日：2003-05-08
Applicant: Boaz Brill , Moshe Finarov , David Scheiner
Inventor： Boaz Brill , Moshe Finarov , David Scheiner
CPC classification number: G01N21/55
Abstract: An optical system for use in measurements in a sample comprising a light source (102) operable to produce an incident light beam propagating in a certain direction towards the sample (S) through an illumination channel (IC), a detector unit (104) for collecting light coming from the sample through a detection channel (DC), and generating data indicative of the collected light, a light directing assembly (106) operable to direct the incident beam onto a certain location on the sample's plane with a plurality of incident angles, and to direct light returned from the illuminated location to the detector unit (104), the light directing assembly (106) comprising a plurality of beam deflector elements (108 A-D), at least one of the deflector elements being movable and position of said at least one movable deflector element defining one of the selected incident angles.
Abstract translation: 一种用于样品测量的光学系统，包括可操作以产生通过照明通道（IC）向特定方向向样品（S）传播的入射光束的光源（102），用于 收集来自样品的光通过检测通道（DC）并产生指示所收集的光的数据;导光组件（106），其可操作以将入射光束以多个入射角度引导到样品平面上的特定位置 ，并且将从所述照明位置返回的光引导到所述检测器单元（104），所述光引导组件（106）包括多个光束偏转元件（108AD），所述偏转元件中的至少一个可移动并且所述 限定所选入射角中的一个的至少一个可移动偏转元件。
-
公开(公告)号：US06974962B2
公开(公告)日：2005-12-13
申请号：US10257544
申请日：2001-09-20
Applicant: Boaz Brill , Moshe Finarov , David Scheiner
Inventor： Boaz Brill , Moshe Finarov , David Scheiner
CPC classification number: G03F7/70633 , G01B11/14 , G01B11/27 , G01N21/4788 , G01N21/9501 , G01N21/956 , H01L22/12
Abstract: The method for controlling layers alignment in a multi-layer sample (10), such a semiconductors wafer based on detecting a diffraction efficiency of radiation diffracted from the patterned structures (12, 14) located one above the other in two different layers of the sample.
Abstract translation: 用于控制多层样品（10）中的层对准的方法，这种半导体晶片基于检测从图案化结构（12,14）衍射的辐射的衍射效率，所述图案化结构（12,14）在样品的两个不同层中彼此上下 。
-
-
-
-
-
-
-
-
-
Search Results
31
records
(took 0.013 seconds)
