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    Chemical-mechanical polishing composition and method for using the same
    1.
    发明申请
    Chemical-mechanical polishing composition and method for using the same 有权
    化学机械抛光组合物及其使用方法

    公开(公告)号：US20050056368A1

    公开(公告)日：2005-03-17

    申请号：US10660379

    申请日：2003-09-11

    申请人： David Schroeder ,  Kevin Moeggenborg

    发明人： David Schroeder ,  Kevin Moeggenborg

    IPC分类号： C09G1/02 ,  C09K3/14 ,  H01L21/321 ,  C23F1/00

    CPC分类号： C09G1/02 ,  C09K3/1409 ,  C09K3/1463 ,  H01L21/3212

    摘要： The invention provides a chemical-mechanical polishing composition comprising: (a) fumed silica particles, (b) about 5×10−3 to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, barium, and mixtures thereof, based on the total weight of the polishing composition, (c) about 0.1 to about 15 wt. % of an oxidizing agent, and (d) a liquid carrier comprising water. The invention also provides a polishing composition, which optionally comprises an oxidizing agent, comprising about 5×10−3 to about 10 millimoles per kilogram of at least one alkaline earth metal selected from the group consisting of calcium, strontium, and mixtures thereof. The invention further provides methods for polishing a substrate using the aforementioned polishing compositions.

    摘要翻译： 本发明提供一种化学机械抛光组合物，其包含：（a）煅制二氧化硅颗粒，（b）约5×10 -3至约10毫摩尔/千克至少一种选自钙，锶， 钡及其混合物，基于抛光组合物的总重量，（c）约0.1至约15重量％ ％的氧化剂，和（d）包含水的液体载体。 本发明还提供一种抛光组合物，其任选地包含氧化剂，其包含约5×10 -3至约10毫摩尔/千克至少一种选自钙，锶及其混合物的至少一种碱土金属。 本发明还提供了使用上述抛光组合物抛光衬底的方法。

    Chemical-mechanical polishing composition and method for using the same
    6.
    发明申请
    Chemical-mechanical polishing composition and method for using the same 审中-公开
    化学机械抛光组合物及其使用方法

    公开(公告)号：US20050211950A1

    公开(公告)日：2005-09-29

    申请号：US10807944

    申请日：2004-03-24

    申请人： Francesco de Rege Thesauro ,  Kevin Moeggenborg ,  Vlasta Brusic ,  Benjamin Bayer

    发明人： Francesco de Rege Thesauro ,  Kevin Moeggenborg ,  Vlasta Brusic ,  Benjamin Bayer

    IPC分类号： C09G1/02 ,  H01L21/321 ,  C09K13/00 ,  B44C1/22 ,  H01L21/302

    CPC分类号： C09G1/02

    摘要： The invention provides a chemical-mechanical polishing composition comprising: (a) an abrasive comprising α-alumina, (b) about 0.05 to about 50 mmol/kg of ions of at least one metal selected from the group consisting of calcium, strontium, barium, and mixtures thereof, based on the total weight of the polishing composition, and (c) a liquid carrier comprising water. The invention also provides a chemical-mechanical polishing composition comprising: (a) an abrasive selected from the group consisting of α-alumina, γ-alumina, δ-alumina, θ-alumina, diamond, boron carbide, silicon carbide, tungsten carbide, titanium nitride, and mixtures thereof, (b) about 0.05 to about 3.5 mmol/kg of ions of at least one metal selected from the group consisting of calcium, strontium, barium, magnesium, zinc, and mixtures thereof, based on the total weight of the polishing composition, and (c) a liquid carrier comprising water. The invention further provides methods of polishing a substrate using each of the above-described chemical-mechanical polishing compositions.

    摘要翻译： 本发明提供一种化学机械抛光组合物，其包括：（a）包含α-氧化铝的磨料，（b）约0.05至约50mmol / kg的选自钙，锶，钡中的至少一种金属的离子 ，及其混合物，基于抛光组合物的总重量，和（c）包含水的液体载体。 本发明还提供一种化学机械抛光组合物，其包含：（a）选自α-氧化铝，γ-氧化铝，δ-氧化铝，θ-氧化铝，金刚石，碳化硼，碳化硅，碳化钨， 氮化钛及其混合物，（b）基于总重量，约0.05至约3.5mmol / kg的选自钙，锶，钡，镁，锌及其混合物的至少一种金属的离子 的抛光组合物，和（c）包含水的液体载体。 本发明还提供了使用上述每种化学 - 机械抛光组合物抛光基材的方法。

    Polishing system comprising a highly branched polymer
    7.
    发明申请
    Polishing system comprising a highly branched polymer 有权
    抛光体系包含高支化聚合物

    公开(公告)号：US20050150598A1

    公开(公告)日：2005-07-14

    申请号：US10755154

    申请日：2004-01-09

    申请人： Kevin Moeggenborg ,  Fred Sun

    发明人： Kevin Moeggenborg ,  Fred Sun

    IPC分类号： C09G1/00 ,  C09G1/02 ,  B44C1/22

    CPC分类号： C09G1/02

    摘要： The invention provides a polishing system and method of its use comprising (a) a liquid carrier, (b) a polymer having a degree of branching of about 50% or greater, and (c) a polishing pad, an abrasive, or a combination thereof.

    摘要翻译： 本发明提供了一种抛光系统及其使用方法，包括（a）液体载体，（b）具有约50％或更大分支度的聚合物，和（c）抛光垫，研磨剂或组合 其中。

    Glass polishing compositions and methods
    9.
    发明申请
    Glass polishing compositions and methods 审中-公开
    玻璃抛光组合物和方法

    公开(公告)号：US20100022171A1

    公开(公告)日：2010-01-28

    申请号：US12311717

    申请日：2007-10-16

    申请人： Nevin Naguib ,  Kevin Moeggenborg

    发明人： Nevin Naguib ,  Kevin Moeggenborg

    IPC分类号： B24B7/24 ,  C09K3/14

    CPC分类号： C03C19/00

    摘要： The present invention provides glass polishing compositions and methods suitable for polishing a glass substrate at a down force of about 110 g/cm2 or less. One preferred polishing composition comprises a particulate cerium oxide abrasive (e.g., about 1 to about 15 percent by weight) suspended in an aqueous carrier containing a polymeric stabilizer, e.g., about 50 to about 1500 ppm of the stabilizer, and optionally, a water soluble inorganic salt. Preferably, the particulate cerium oxide abrasive has a mean particle size in the range of about 0.35 to about 0.9 μm. Another preferred composition comprises about 1 to about 15 percent by weight of a particulate cerium oxide abrasive characterized by a mean particle size of at least about 0.2 μm and a purity of at least about 99.9% CeO2, on a weight basis, suspended in an aqueous carrier at a pH at least about 1 unit higher or lower than the isoelectric point (IEP) of the cerium oxide abrasive.

    摘要翻译： 本发明提供了玻璃抛光组合物和适合于以约110g / cm 2或更低的压力抛光玻璃基材的方法。 一种优选的抛光组合物包含悬浮在含有聚合物稳定剂的水性载体中的颗粒状氧化铈磨料（例如约1至约15重量％），例如约50至约1500ppm的稳定剂，以及任选的水溶性 无机盐。 优选地，颗粒状氧化铈磨料的平均粒度在约0.35至约0.9μm的范围内。 另一种优选的组合物包含约1至约15重量％的颗粒状氧化铈磨料，其特征在于平均粒径为至少约0.2μm，纯度为至少约99.9％CeO 2，以重量为基础，悬浮于水性 载体在氧化铈研磨剂的等电点（IEP）的至少约1单位的pH以上。