Etching process for micromachining materials and devices fabricated thereby
    6.
    发明申请
    Etching process for micromachining materials and devices fabricated thereby 有权
    用于由其制造的微加工材料和器件的蚀刻工艺

    公开(公告)号:US20050285216A1

    公开(公告)日:2005-12-29

    申请号:US11152671

    申请日:2005-06-14

    摘要: The present invention provides an optical microbench having intersecting structures etched into a substrate. In particular, microbenches in accordance with the present invention include structures having a planar surfaces formed along selected crystallographic planes of a single crystal substrate. Two of the structures provided are an etch-stop pit and an anisotropically etched feature disposed adjacent the etch-stop pit. At the point of intersection between the etch-stop pit and the anisotropically etched feature the orientation of the crystallographic planes is maintained. The present invention also provides a method for micromachining a substrate to form an optical microbench. The method comprises the steps of forming an etch-stop pit and forming an anisotropically etched feature adjacent the etch-stop pit. The method may also comprise coating the surfaces of the etch-stop pit with an etch-stop layer.

    摘要翻译: 本发明提供一种具有蚀刻到衬底中的相交结构的光学微型台。 特别地,根据本发明的微型薄片包括具有沿着单晶衬底的选定结晶面形成的平面的结构。 提供的两个结构是蚀刻停止凹坑和邻近蚀刻停止凹坑设置的各向异性蚀刻特征。 在蚀刻停止凹坑和各向异性蚀刻特征之间的交点处,维持结晶平面的取向。 本发明还提供了一种用于微加工基板以形成光学微型台的方法。 该方法包括以下步骤:形成蚀刻停止凹坑并在蚀刻停止凹坑附近形成各向异性蚀刻的特征。 该方法还可以包括用蚀刻停止层涂覆蚀刻停止凹坑的表面。