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1.发明授权O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists 失效用作阳性抗蚀剂的敏化剂的O-醌二叠氮基磺酸单酯
公开(公告)号：US4853315A
公开(公告)日：1989-08-01
申请号：US144825
申请日：1988-01-15
IPC分类号： C07C309/76 , C07C67/00 , C07C301/00 , G03C1/72 , G03C1/73 , G03F7/022
CPC分类号： G03F7/022
摘要： Esters of 1-oxo-2-diazo-naphthalene sulfonic acid wherein the sulfonic acid group is at either the 4 or the 5 position of a hydroxymethyl-tricyclo [5.2.1.0.sup.2,6 ] decane wherein the hydroxy group is either at the 3 or 4 position and useful as sensitizers for positive resists, particularly relatively thick resists at 365 nm.
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2.发明授权
公开(公告)号：US4522911A
公开(公告)日：1985-06-11
申请号：US508642
申请日：1983-06-28
申请人： Nicholas J. Clecak , Dennis R. McKean , Robert D. Miller , Terry C. Tompkins , Carlton G. Willson
发明人： Nicholas J. Clecak , Dennis R. McKean , Robert D. Miller , Terry C. Tompkins , Carlton G. Willson
IPC分类号： G03F7/20 , C07D213/77 , G03C1/72 , G03C5/08 , G03F7/008 , G03F7/016 , G03F7/022 , G03F7/039 , H01L21/027 , G03C1/54 , C07C113/00 , G03C1/60
CPC分类号： C07D213/77 , G03F7/0163
摘要： A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.
摘要翻译： 一种与深紫外线辐射一起使用的平版印刷抗蚀剂，包括酸性树脂和重氮磺酰三乙酸敏化剂。
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公开(公告)号：US4397937A
公开(公告)日：1983-08-09
申请号：US347658
申请日：1982-02-10
申请人： Nicholas J. Clecak , Dennis R. McKean , Robert D. Miller , Terry C. Tompkins , Robert J. Twieg , Carlton G. Willson
发明人： Nicholas J. Clecak , Dennis R. McKean , Robert D. Miller , Terry C. Tompkins , Robert J. Twieg , Carlton G. Willson
CPC分类号： G03F7/022
摘要： Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.
摘要翻译： 正型抗蚀剂由可溶性酚醛树脂和作为1-氧代-2-二氮萘磺酸的二酯和作为几何和非对映异构体的混合物的不对称伯或仲脂族二醇的敏化剂形成。
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4.发明授权
公开(公告)号：US5807947A
公开(公告)日：1998-09-15
申请号：US277687
申请日：1994-07-20
申请人： Richard Vicari , Douglas J. Gordon , William D. Hinsberg , Dennis R. McKean , Carlton G. Willson , Ralph Dammel
发明人： Richard Vicari , Douglas J. Gordon , William D. Hinsberg , Dennis R. McKean , Carlton G. Willson , Ralph Dammel
IPC分类号： C08F212/14 , G03F7/004 , G03F7/023 , C08F12/24
CPC分类号： C08F212/14 , G03F7/0045 , G03F7/0233
摘要： A polymer of (a) an unsubstituted 4-hydroxystyrene monomer and (b) a substituted 4-hydroxystyrene monomer of the formula ##STR1## wherein A, B, C, and D are independently H or C.sub.1 to C.sub.4 alkyl wherein at least one of B and D is C.sub.1 to C.sub.4 alkyl; and wherein said copolymer has a molecular weight of from about 800 to about 100,000; and wherein the mol ratio of monomer (a) to monomer (b) ranges from about 3:1 to about 1:3.
摘要翻译： （a）未取代的4-羟基苯乙烯单体和（b）下式的取代的4-羟基苯乙烯单体的聚合物，其中A，B，C和D独立地为H或C 1至C 4烷基，其中至少一个 B和D是C1至C4烷基; 并且其中所述共聚物的分子量为约800至约100,000; 并且其中单体（a）与单体（b）的摩尔比为约3:1至约1:3。
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5.发明授权Process for imaging of photoresist including treatment of the photoresist with an organometallic compound 失效用于光刻胶成像的方法，包括用有机金属化合物处理光致抗蚀剂
公开(公告)号：US5250395A
公开(公告)日：1993-10-05
申请号：US735420
申请日：1991-07-25
申请人： Robert D. Allen , Scott A. MacDonald , Dennis R. McKean , Hubert Schlosser , Robert J. Twieg , Gregory M. Wallraff , Carlton G. Willson
发明人： Robert D. Allen , Scott A. MacDonald , Dennis R. McKean , Hubert Schlosser , Robert J. Twieg , Gregory M. Wallraff , Carlton G. Willson
摘要： The present invention relates to a process for negative tone imaging of photoresist to improve resolution of lithographic patterns.
摘要翻译： 本发明涉及光刻胶的负色调成像方法，以提高光刻图案的分辨率。
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6.发明授权Copolymers of 4-hydroxystyrene and alkyl substituted-4-hydroxystyrene in admixture with a photosensitizer to form a photosensitive composition 失效4-羟基苯乙烯和烷基取代的-4-羟基苯乙烯的共聚物与光敏剂混合以形成光敏组合物
公开(公告)号：US5342727A
公开(公告)日：1994-08-30
申请号：US812878
申请日：1991-12-20
申请人： Richard Vicari , Douglas J. Gordon , William D. Hinsberg , Dennis R. McKean , Carlton G. Willson , Ralph Dammel
发明人： Richard Vicari , Douglas J. Gordon , William D. Hinsberg , Dennis R. McKean , Carlton G. Willson , Ralph Dammel
CPC分类号： G03F7/0233 , C08F212/14 , C08F8/12 , G03F7/0045
摘要： A copolymer of (a) an unsubstituted 4-hydroxystyrene monomer and (b) a substituted 4-hydroxystyrene monomer of the formula ##STR1## wherein A, B, C, and D are independently H or C.sub.1 to C.sub.4 alkyl and wherein at least one of B and D is C.sub.1 to C.sub.4 alkyl; and wherein said copolymer has a molecular weight of from about 800 to about 100,000; and wherein the mol ratio of monomer (a) to monomer (b) ranges from about 3:1 to about 1:3.
摘要翻译： （a）未取代的4-羟基苯乙烯单体和（b）式（IMAGE）的取代的4-羟基苯乙烯单体的共聚物，其中A，B，C和D独立地为H或C 1至C 4烷基，并且其中至少一个 的B和D是C 1〜C 4烷基; 并且其中所述共聚物的分子量为约800至约100,000; 并且其中单体（a）与单体（b）的摩尔比为约3:1至约1:3。
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7.发明授权High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution 失效高对比度，高分辨率深紫外光刻抗蚀剂组合物，具有α磷酸取代的重氮羰基化合物
公开(公告)号：US4601969A
公开(公告)日：1986-07-22
申请号：US717254
申请日：1985-03-28
申请人： Nicholas J. Clecak , Barbara D. Grant , Robert D. Miller , Terry C. Tompkins , Carlton G. Willson
发明人： Nicholas J. Clecak , Barbara D. Grant , Robert D. Miller , Terry C. Tompkins , Carlton G. Willson
IPC分类号： C08L101/00 , C08K5/00 , C08K5/53 , C08L33/00 , C08L33/02 , C08L61/10 , G03C1/72 , G03C5/16 , G03F7/016 , G03F7/038 , G03F7/039 , G03F7/20 , H01L21/027 , G03C1/54
CPC分类号： G03F7/0163
摘要： A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
摘要翻译： 用于深紫外线辐射的平版印刷树脂包括弱酸性树脂和α磷酰基取代的重氮羰基化合物作为敏化剂。
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公开(公告)号：US4552833A
公开(公告)日：1985-11-12
申请号：US609690
申请日：1984-05-14
IPC分类号： G03F7/30 , G03F7/038 , G03F7/039 , G03F7/26 , G03F7/36 , G03F7/38 , H01L21/027 , G03C5/16 , G03C1/72
摘要： A negative tone resist image is achieved by (1) coating a substrate with a film of a polymer containing a masked, reactive functionality; (2) imagewise exposing the film to radiation in a fashion such that the masked functionality is liberated; (3) contacting the film with an organometallic reagent; (4) developing the relief image by the oxygen plasma etching.
摘要翻译： 负色调抗蚀剂图像通过（1）用含有掩蔽的反应性官能团的聚合物膜涂覆基材来实现; （2）以使掩蔽的功能被释放的方式将膜成像曝光于辐射; （3）使膜与有机金属试剂接触; （4）通过氧等离子体蚀刻显影浮雕图像。
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公开(公告)号：US4464460A
公开(公告)日：1984-08-07
申请号：US508644
申请日：1983-06-28
申请人： Hiroyuki Hiraoka , Donald C. Hofer , Robert D. Miller , Lester A. Pederson , Carlton G. Willson
发明人： Hiroyuki Hiraoka , Donald C. Hofer , Robert D. Miller , Lester A. Pederson , Carlton G. Willson
IPC分类号： G03C5/00 , G03F7/075 , G03F7/09 , G03F7/26 , H01L21/027
CPC分类号： G03F7/094 , G03F7/0754
摘要： A process for making an image oxygen-reactive ion etch barrier using a polysilane that is resistant to resistive ion etching and is also a positive acting resist.
摘要翻译： 使用耐电阻离子蚀刻的聚硅烷制造图像氧反应离子蚀刻阻挡层的方法，也是正性抗蚀剂。
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10.发明申请APPARATUS FOR FABRICATING NANOSCALE PATTERNS IN LIGHT CURABLE COMPOSITIONS USING AN ELECTRIC FIELD 审中-公开使用电场制作光固化组合物中的纳米尺度图案的装置公开(公告)号：US20080305440A1
公开(公告)日：2008-12-11
申请号：US12052099
申请日：2008-03-20
IPC分类号： G03F7/20
CPC分类号： B81C1/0046 , B05D1/40 , B05D3/067 , B05D3/145 , B29C43/003 , B29C2043/025 , B29C2043/3211 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to an apparatus for patterning a liquid on a substrate, with the apparatus including, a template having a pair of spaced-apart recessions with a protrusion disposed therebetween, with the protrusion being spaced-apart from the substrate a first distance and each of the pair of spaced-apart recessions being spaced-apart from the substrate a second distance, with the second distance being greater than the first distance; and a source of voltage in electrical communication with the template to produce an electric field between the template and the substrate, with a strength of the electrical field being inversely proportional to the first and second distances.
摘要翻译： 本发明涉及一种用于在衬底上图案化液体的装置，其中该装置包括：具有一对间隔开的凹陷的模板，其中突出物设置在其间，突起与衬底间隔开第一距离 并且所述一对间隔开的凹部中的每一个与所述衬底间隔开第二距离，所述第二距离大于所述第一距离; 以及与模板电连通的电压源，以在模板和衬底之间产生电场，其中电场的强度与第一和第二距离成反比。
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