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1.发明授权High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution 失效高对比度，高分辨率深紫外光刻抗蚀剂组合物，具有α磷酸取代的重氮羰基化合物
公开(公告)号：US4601969A
公开(公告)日：1986-07-22
申请号：US717254
申请日：1985-03-28
申请人： Nicholas J. Clecak , Barbara D. Grant , Robert D. Miller , Terry C. Tompkins , Carlton G. Willson
发明人： Nicholas J. Clecak , Barbara D. Grant , Robert D. Miller , Terry C. Tompkins , Carlton G. Willson
IPC分类号： C08L101/00 , C08K5/00 , C08K5/53 , C08L33/00 , C08L33/02 , C08L61/10 , G03C1/72 , G03C5/16 , G03F7/016 , G03F7/038 , G03F7/039 , G03F7/20 , H01L21/027 , G03C1/54
CPC分类号： G03F7/0163
摘要： A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
摘要翻译： 用于深紫外线辐射的平版印刷树脂包括弱酸性树脂和α磷酰基取代的重氮羰基化合物作为敏化剂。
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公开(公告)号：US4284706A
公开(公告)日：1981-08-18
申请号：US99806
申请日：1979-12-03
IPC分类号： G03C1/72 , C08K5/1575 , C08L61/00 , C08L61/04 , C08L61/06 , G03C1/00 , G03F7/004 , G03F7/016 , G03F7/022 , G03F7/038 , G03F7/26 , H01L21/26 , G03C1/54 , G03C1/60 , G03C5/00
CPC分类号： G03F7/0163 , G03F7/0226
摘要： Lithographic resist compositions are provided which permit an improved lift-off process in which the deposition mask with apertures has the desirable negative slope or overhang. The resist composition comprises a phenolic-aldehyde resin, a photosensitizer and Meldrum's diazo, or Meldrum's acid or suitable analogs thereof as a profile modifying agent. The profile modifying agents useful in the present invention have the formula: ##STR1## wherein R.sub.1 is C.sub.1 to C.sub.20 alkyl or aryl, R.sub.2 is H, C.sub.1 to C.sub.20 alkyl or aryl, or together R.sub.1 and R.sub.2 are cycloalkyl, A is N or H.
摘要翻译： 提供了光刻抗蚀剂组合物，其允许改进的剥离过程，其中具有孔的沉积掩模具有期望的负斜率或悬垂。 抗蚀剂组合物包含酚醛树脂，光敏剂和Meldrum的重氮，或Meldrum的酸或其合适的类似物作为轮廓修饰剂。 可用于本发明的轮廓调节剂具有下式：其中R 1为C 1至C 20烷基或芳基，R 2为H，C 1至C 20烷基或芳基，或R 1和R 2为环烷基，A为N或H 。
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3.发明授权
公开(公告)号：US4139276A
公开(公告)日：1979-02-13
申请号：US890170
申请日：1978-03-27
CPC分类号： G02F1/1521 , C09K9/02
摘要： Electrochromic display devices having very desirable stability and reversibility are obtained using as the oxidant certain fluorene compounds substituted with at least two alkoxy groups per molecule. The display device comprises a reactive medium between two electrically conductive electrodes at least one of which is transparent. The reactive medium comprises an anhydrous solvent and an oxidant/reductant pair.
摘要翻译： {PG，1具有非常理想的稳定性和可逆性的电致变色显示装置可以用氧化剂获得，每个分子被至少两个烷氧基取代的某些芴化合物。 显示装置包括两个导电电极之间的反应介质，其中至少一个是透明的。 反应介质包括无水溶剂和氧化剂/还原剂对。
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公开(公告)号：US4339522A
公开(公告)日：1982-07-13
申请号：US200296
申请日：1980-10-24
CPC分类号： G03F7/0163
摘要： Phenolic-aldehyde resins sensitized with Meldrum's diazo or a homologue thereof are useful as lithographic resists sensitive to deep ultra-violet light.
摘要翻译： 用Meldrum的重氮或其同系物敏化的酚醛树脂可用作对深紫外光敏感的光刻抗蚀剂。
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公开(公告)号：US4398001A
公开(公告)日：1983-08-09
申请号：US360710
申请日：1982-03-22
IPC分类号： G03F7/26 , C08L61/00 , C08L61/04 , C08L61/06 , C08L61/10 , G03F7/038 , G03F7/039 , G03F7/20 , C08G2/02
CPC分类号： G03F7/039
摘要： A resist sensitive to electron beam (and X-ray) radiation but resistant to reactive ion etching is formulated from a novolac resin and a sensitizer which is a terpolymer of sulfur dioxide, an olefin is hydrocarbon and an unsaturated ether.
摘要翻译： 对电子束（和X射线）辐射敏感并且抗反应离子蚀刻的抗蚀剂由酚醛清漆树脂和作为二氧化硫，烯烃是不饱和醚的三元共聚物的敏化剂配制。
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6.发明授权
公开(公告)号：US4427478A
公开(公告)日：1984-01-24
申请号：US392998
申请日：1982-06-28
申请人： Barbara D. Grant , Carol R. Jones
发明人： Barbara D. Grant , Carol R. Jones
CPC分类号： H05K7/06 , H05K3/386 , H05K2201/10287 , H05K3/103 , H05K3/4611
摘要： A process is described for fabricating an encapsulated circuit board. The process involves use of an adhesive which is photochemically curable to a limited preselected depth so as to rigidly fix the circuit wires in X and Y directions while permitting limited pliability of the adhesive and hence mobility of the wires in the Z direction. The adhesive preferably is one which is also thermally curable so that at a later stage of fabrication (e.g., either as a part of or after lamination of individual circuit boards into a multilayered circuit board), the complete unit may be thermally bulk cured to rigidly fix all wires in the Z direction.
摘要翻译： 描述了一种用于制造封装电路板的工艺。 该方法包括使用可光化学固化到有限的预选深度的粘合剂，以便将电路线刚性地固定在X和Y方向上，同时允许粘合剂的柔韧性受限并且因此导线在Z方向上的移动性。 粘合剂优选是也可热固化的粘合剂，使得在稍后的制造阶段（例如，作为将各个电路板层叠到多层电路板中的一部分或之后），完整单元可以热固化至刚性 将所有电线固定在Z方向。
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公开(公告)号：US4422713A
公开(公告)日：1983-12-27
申请号：US369284
申请日：1982-04-16
CPC分类号： G03H1/181 , G03C1/66 , G03H2001/185 , G03H2260/10 , Y10S359/90
摘要： A method for making high diffraction efficiency holograms from dichromated gelatin (DCG) including the steps of curing the DCG for a specified time under controlled temperature and humidity conditions, periodically removing the DCG material from the curing conditions, placing a dye spot on the cured DCG material, measuring the extent of diffusion of the dye spot after a predetermined time, replacing the DCG material into the curing conditions, repeating the method until dye spot diffusion of a predetermined size occurs, and using the DCG material at that cure state to make holograms.
摘要翻译： 一种用于从重铬酸盐明胶（DCG）制备高衍射效率全息图的方法，包括在控制温度和湿度条件下固化DCG一段特定时间的步骤，从固化条件周期性地除去DCG材料，将染料斑点置于固化的DCG上 材料，测量在预定时间之后染料斑点的扩散程度，将DCG材料替换成固化条件，重复该方法直到发生预定尺寸的染料斑点扩散，并且在该固化状态下使用DCG材料制成全息图 。
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公开(公告)号：US4309255A
公开(公告)日：1982-01-05
申请号：US185813
申请日：1980-09-10
CPC分类号： B41M5/20
摘要： A medium for electrochromic recording is provided by treating paper with a water soluble leuco methylene blue compound having the formula ##STR1## wherein R is a sulfonated aromatic or sulfonated aliphatic moiety.
摘要翻译： 通过用具有下式的水溶性无色亚甲基蓝化合物处理纸来提供电致变色记录介质，其中R是磺化芳族或磺化脂族部分。
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