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1.发明授权O-quinone diazide sulfonic acid monoesters useful as sensitizers for positive resists 失效用作阳性抗蚀剂的敏化剂的O-醌二叠氮基磺酸单酯
公开(公告)号：US4853315A
公开(公告)日：1989-08-01
申请号：US144825
申请日：1988-01-15
IPC分类号： C07C309/76 , C07C67/00 , C07C301/00 , G03C1/72 , G03C1/73 , G03F7/022
CPC分类号： G03F7/022
摘要： Esters of 1-oxo-2-diazo-naphthalene sulfonic acid wherein the sulfonic acid group is at either the 4 or the 5 position of a hydroxymethyl-tricyclo [5.2.1.0.sup.2,6 ] decane wherein the hydroxy group is either at the 3 or 4 position and useful as sensitizers for positive resists, particularly relatively thick resists at 365 nm.
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2.发明授权
公开(公告)号：US4522911A
公开(公告)日：1985-06-11
申请号：US508642
申请日：1983-06-28
申请人： Nicholas J. Clecak , Dennis R. McKean , Robert D. Miller , Terry C. Tompkins , Carlton G. Willson
发明人： Nicholas J. Clecak , Dennis R. McKean , Robert D. Miller , Terry C. Tompkins , Carlton G. Willson
IPC分类号： G03F7/20 , C07D213/77 , G03C1/72 , G03C5/08 , G03F7/008 , G03F7/016 , G03F7/022 , G03F7/039 , H01L21/027 , G03C1/54 , C07C113/00 , G03C1/60
CPC分类号： C07D213/77 , G03F7/0163
摘要： A lithographic resist for use with deep ultra-violet radiation comprising an acidic resin and a diazohomotetramic acid sensitizer.
摘要翻译： 一种与深紫外线辐射一起使用的平版印刷抗蚀剂，包括酸性树脂和重氮磺酰三乙酸敏化剂。
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公开(公告)号：US4397937A
公开(公告)日：1983-08-09
申请号：US347658
申请日：1982-02-10
申请人： Nicholas J. Clecak , Dennis R. McKean , Robert D. Miller , Terry C. Tompkins , Robert J. Twieg , Carlton G. Willson
发明人： Nicholas J. Clecak , Dennis R. McKean , Robert D. Miller , Terry C. Tompkins , Robert J. Twieg , Carlton G. Willson
CPC分类号： G03F7/022
摘要： Positive resists are formed from a soluble phenolic resin and a sensitizer which is a diester of a 1-oxo-2-diazonaphthalene sulfonic acid and of an unsymmetrical primary or secondary aliphatic diol which is a mixture of geometric and diastereoisomers.
摘要翻译： 正型抗蚀剂由可溶性酚醛树脂和作为1-氧代-2-二氮萘磺酸的二酯和作为几何和非对映异构体的混合物的不对称伯或仲脂族二醇的敏化剂形成。
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4.发明授权High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution 失效高对比度，高分辨率深紫外光刻抗蚀剂组合物，具有α磷酸取代的重氮羰基化合物
公开(公告)号：US4601969A
公开(公告)日：1986-07-22
申请号：US717254
申请日：1985-03-28
申请人： Nicholas J. Clecak , Barbara D. Grant , Robert D. Miller , Terry C. Tompkins , Carlton G. Willson
发明人： Nicholas J. Clecak , Barbara D. Grant , Robert D. Miller , Terry C. Tompkins , Carlton G. Willson
IPC分类号： C08L101/00 , C08K5/00 , C08K5/53 , C08L33/00 , C08L33/02 , C08L61/10 , G03C1/72 , G03C5/16 , G03F7/016 , G03F7/038 , G03F7/039 , G03F7/20 , H01L21/027 , G03C1/54
CPC分类号： G03F7/0163
摘要： A lithographic resin for use with deep ultraviolet radiation comprises a weakly acidic resin and an alpha phosphoryl substituted diazo carbonyl compound as a sensitizer.
摘要翻译： 用于深紫外线辐射的平版印刷树脂包括弱酸性树脂和α磷酰基取代的重氮羰基化合物作为敏化剂。
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公开(公告)号：US4552833A
公开(公告)日：1985-11-12
申请号：US609690
申请日：1984-05-14
IPC分类号： G03F7/30 , G03F7/038 , G03F7/039 , G03F7/26 , G03F7/36 , G03F7/38 , H01L21/027 , G03C5/16 , G03C1/72
摘要： A negative tone resist image is achieved by (1) coating a substrate with a film of a polymer containing a masked, reactive functionality; (2) imagewise exposing the film to radiation in a fashion such that the masked functionality is liberated; (3) contacting the film with an organometallic reagent; (4) developing the relief image by the oxygen plasma etching.
摘要翻译： 负色调抗蚀剂图像通过（1）用含有掩蔽的反应性官能团的聚合物膜涂覆基材来实现; （2）以使掩蔽的功能被释放的方式将膜成像曝光于辐射; （3）使膜与有机金属试剂接触; （4）通过氧等离子体蚀刻显影浮雕图像。
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公开(公告)号：US4464460A
公开(公告)日：1984-08-07
申请号：US508644
申请日：1983-06-28
申请人： Hiroyuki Hiraoka , Donald C. Hofer , Robert D. Miller , Lester A. Pederson , Carlton G. Willson
发明人： Hiroyuki Hiraoka , Donald C. Hofer , Robert D. Miller , Lester A. Pederson , Carlton G. Willson
IPC分类号： G03C5/00 , G03F7/075 , G03F7/09 , G03F7/26 , H01L21/027
CPC分类号： G03F7/094 , G03F7/0754
摘要： A process for making an image oxygen-reactive ion etch barrier using a polysilane that is resistant to resistive ion etching and is also a positive acting resist.
摘要翻译： 使用耐电阻离子蚀刻的聚硅烷制造图像氧反应离子蚀刻阻挡层的方法，也是正性抗蚀剂。
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公开(公告)号：US07125467B2
公开(公告)日：2006-10-24
申请号：US10611528
申请日：2003-06-30
申请人： Phillip Joe Brock , Michael William Chaw , Dan J. Dawson , Craig J. Hawker , James L. Hedrick , Wesley L. Hillman , Teddie P. Magbitang , Dennis R. McKean , Robert D. Miller , Richard I. Palmisano , Jila Tabib , Mark C. Thurber , Willi Volksen
发明人： Phillip Joe Brock , Michael William Chaw , Dan J. Dawson , Craig J. Hawker , James L. Hedrick , Wesley L. Hillman , Teddie P. Magbitang , Dennis R. McKean , Robert D. Miller , Richard I. Palmisano , Jila Tabib , Mark C. Thurber , Willi Volksen
CPC分类号： C09D5/20 , Y10T29/49032 , Y10T29/49041
摘要： A process for fabricating sliders where the sliders are held in place during processing by a solid matrix material is described. A thin coating of a release-layer material is applied on the sliders before encapsulation in the matrix material. The release-layer material is polyvinyl alcohol and more preferably high molecular weight polyvinyl alcohol which is highly hydrolyzed. Use of the release-layer of the invention maintains the process resistance while providing the advantage of allowing easier removal of the matrix material after it is no longer needed. The release-layer can be applied to encapsulant materials including epoxies, acrylates, polyimides, silsesquioxanes and others. After the selected fabrication process such as the formation of air-bearing features an appropriate solvent is applied to soften the polyvinyl alcohol film and allow clean debonding of the sliders.
摘要翻译： 描述了一种用于制造滑块的方法，其中滑块在由固体基质材料处理期间保持就位。 剥离层材料的薄涂层在封装在基质材料中之前施加在滑块上。 剥离层材料是聚乙烯醇，更优选高度水解的高分子量聚乙烯醇。 本发明的释放层的使用保持了工艺阻力，同时提供了在不再需要基质材料之后容易去除基质材料的优点。 释放层可以应用于包括环氧树脂，丙烯酸酯，聚酰亚胺，倍半硅氧烷等的包封材料。 在选择的制造方法如形成空气轴承特征之后，施加适当的溶剂以软化聚乙烯醇膜并允许滑块的清洁脱粘。
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8.发明授权Sliders bonded by a debondable encapsulant comprising different polymers formed via in situ polymerization 有权通过包含通过原位聚合形成的不同聚合物的可剥离密封剂结合的滑块公开(公告)号：US07196872B2
公开(公告)日：2007-03-27
申请号：US10835845
申请日：2004-04-29
申请人： Michael W. Chaw , Dan J. Dawson , Craig J. Hawker , James L. Hedrick , Wesley L. Hillman , Teddie P. Magbitang , Dennis R. McKean , Robert D. Miller , Willi Volksen
发明人： Michael W. Chaw , Dan J. Dawson , Craig J. Hawker , James L. Hedrick , Wesley L. Hillman , Teddie P. Magbitang , Dennis R. McKean , Robert D. Miller , Willi Volksen
CPC分类号： G11B5/6082 , Y10T29/49032 , Y10T29/4905 , Y10T156/11
摘要： A slider assembly is provided comprising a plurality of sliders bonded by a debondable solid encapsulant comprised of different first and second polymers The solid encapsulant is comprised of a polymer prepared by polymerizing an encapsulant fluid comprising a homogeneous mixture of first and second constituents. The first constituent is comprised of a first monomer suitable for in situ polymerization to form the first polymer. The second constituent is comprised of the second polymer or a second monomer suitable for in situ polymerization to form the second polymer. The first constituent does not substantially react with the second constituent. Each slider has a surface that is free from the encapsulant. The encapsulant-free surfaces are coplanar to each other. Also provided are methods for forming the assembly and methods for patterning a slider surface using the encapsulant.
摘要翻译： 提供了一种滑块组件，其包括由不同的第一和第二聚合物组成的可脱粘固体密封剂结合的多个滑块。固体密封剂由通过聚合包含第一和第二组分的均匀混合物的密封剂流体制备的聚合物组成。 第一组分由适于原位聚合以形成第一聚合物的第一单体组成。 第二组分由第二聚合物或适于原位聚合形成第二聚合物的第二单体组成。 第一组分基本上不与第二组分反应。 每个滑块具有没有密封剂的表面。 无密封剂的表面彼此共面。 还提供了用于形成组件的方法和使用密封剂来图案化滑块表面的方法。
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9.发明授权Sliders bonded by a debondable encapsulant containing styrene and butadiene polymers 失效滑块由含有苯乙烯和丁二烯聚合物的可剥离密封剂粘合公开(公告)号：US07209324B2
公开(公告)日：2007-04-24
申请号：US10611673
申请日：2003-06-30
申请人： Phillip J. Brock , Michael W. Chaw , Dan J. Dawson , Craig J. Hawker , James L. Hedrick , Teddie P. Magbitang , Dennis R. McKean , Robert D. Miller , Richard I. Palmisano , Willi Volksen
发明人： Phillip J. Brock , Michael W. Chaw , Dan J. Dawson , Craig J. Hawker , James L. Hedrick , Teddie P. Magbitang , Dennis R. McKean , Robert D. Miller , Richard I. Palmisano , Willi Volksen
IPC分类号： G11B5/60
CPC分类号： G11B5/6005
摘要： The invention relates generally to the bonding of one or more sliders in styrene and butadiene polymers. More particularly, the invention relates to planarized slider assemblies formed by using debondable solid encapsulants comprised of styrene and butadiene polymers. The invention also relates to methods that use such encapsulants in conjunction with resists to produce magnetic head sliders having patterned air-bearing surfaces.
摘要翻译： 本发明一般涉及一种或多种滑块在苯乙烯和丁二烯聚合物中的结合。 更具体地，本发明涉及通过使用由苯乙烯和丁二烯聚合物组成的可分离固体密封剂形成的平面化滑块组件。 本发明还涉及将这种密封剂与抗蚀剂结合使用以产生具有图案化空气轴承表面的磁头滑块的方法。
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10.发明授权Sliders bonded by a debondable encapsulant containing styrene and acrylate polymers 失效滑块由含有苯乙烯和丙烯酸酯聚合物的可分散的密封剂粘合公开(公告)号：US07064929B2
公开(公告)日：2006-06-20
申请号：US10611317
申请日：2003-06-30
申请人： Dennis R. McKean , Robert D. Miller , Teddie P. Magbitang , James L. Hedrick , Craig J. Hawker , Willi Volksen , Phillip J. Brock , Dan J. Dawson , Michael W. Chaw , Richard I. Palmisano
发明人： Dennis R. McKean , Robert D. Miller , Teddie P. Magbitang , James L. Hedrick , Craig J. Hawker , Willi Volksen , Phillip J. Brock , Dan J. Dawson , Michael W. Chaw , Richard I. Palmisano
IPC分类号： G11B21/16
CPC分类号： B29C33/14 , B29C39/10 , B29C39/36 , B29K2025/00 , B29K2033/12 , B29K2105/0073 , G11B5/127 , G11B5/4853 , Y10T156/1092 , Y10T428/24752
摘要： The invention relates generally to the bonding of one or more sliders in styrene and acrylate polymers. More particularly, the invention relates to planarized slider assemblies formed by using debondable solid encapsulants comprised of styrene and acrylate polymers. The invention also relates to methods that use such encapsulants in conjunction with resists to produce magnetic head sliders having patterned air-bearing surfaces.
摘要翻译： 本发明一般涉及在苯乙烯和丙烯酸酯聚合物中粘合一个或多个滑块。 更具体地说，本发明涉及通过使用由苯乙烯和丙烯酸酯聚合物组成的可剥离固体密封剂形成的平面化滑块组件。 本发明还涉及将这种密封剂与抗蚀剂结合使用以产生具有图案化空气轴承表面的磁头滑块的方法。
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