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    Waveguide type displacement interferometer having two reference paths
    1.
    发明授权
    Waveguide type displacement interferometer having two reference paths 失效
    具有两个参考路径的波导型位移干涉仪

    公开(公告)号：US5396328A

    公开(公告)日：1995-03-07

    申请号：US768217

    申请日：1992-09-21

    申请人： Dieter Jestel ,  Andreas Franz ,  Dieter Michel

    发明人： Dieter Jestel ,  Andreas Franz ,  Dieter Michel

    IPC分类号： G01B9/02 ,  G01D5/26 ,  G02B6/12 ,  G02F1/025 ,  G02F1/035 ,  G02F1/225

    CPC分类号： G01D5/266 ,  G01B9/02028 ,  G01B9/02051 ,  G01B9/02081

    摘要： The interferometer comprises a light source, at least one beam splitting means, a beam combiner means, measuring and reference arms as well as wave guides for guiding the light to the beam splitting means and for guiding the light back to photodetectors. Beam splitting means and beam combiner means are formed by integrated optics elements on a substrate. The wave guides on the substrate form a measuring arm (7.sub.1) and two reference arms (6.sub.1, 8.sub.1) which have different optical path lengths for setting a phase difference. An evaluation electronics for determining correct as to signs, the change in optical path length in the measuring arm (7.sub.1) is connected to the photodetectors.

    摘要翻译： PCT No.PCT / EP91 / 00246 Sec。 371日期：1992年9月21日 102（e）日期1992年9月21日PCT 1991年2月8日PCT PCT。 WO91 / 12487 PCT出版物 日期1991年8月22日。干涉仪包括光源，至少一个分束装置，光束组合器装置，测量和参考臂以及波导，用于将光引导到分束装置并将光引导回 到光电探测器。 光束分束装置和光束组合器装置由衬底上的集成光学元件形成。 基板上的波导形成测量臂（71）和具有不同光程长度的两个参考臂（61,81），用于设定相位差。 用于确定符号正确的评估电子装置，测量臂（71）中的光路长度的变化被连接到光电检测器。

    Absolute interferometer measuring process and apparatus having a measuring interferometer, control interferometer and tunable laser
    2.
    发明授权
    Absolute interferometer measuring process and apparatus having a measuring interferometer, control interferometer and tunable laser 失效
    具有测量干涉仪，控制干涉仪和可调激光器的绝对干涉仪测量过程和设备

    公开(公告)号：US5631736A

    公开(公告)日：1997-05-20

    申请号：US614334

    申请日：1996-03-12

    申请人： Jurgen Thiel ,  Dieter Michel ,  Andreas Franz

    发明人： Jurgen Thiel ,  Dieter Michel ,  Andreas Franz

    IPC分类号： G01B9/02 ,  G01B11/02

    CPC分类号： G01B9/02007 ,  G01B9/02004 ,  G01B9/0207 ,  G01B2290/60

    摘要： An absolute measuring interferometer having a measuring interferometer, a tunable laser emitting a laser beam and a control interferometer for adjusting the air wavelength of the laser beam. The control interferometer adjusts the air wavelength of the laser beam to a specific wavelength value at the ends of each measuring cycle. The wavelength of the tunable laser is continually tuned within the specific wavelength interval where the phase change of the interference signal is continually detected during the wavelength modulation process. An absolute measurement is determined by a simple mathematical relationship between the measured wavelength and phase changes.

    摘要翻译： 具有测量干涉仪，发射激光束的可调激光器和用于调节激光束的空气波长的控制干涉仪的绝对测量干涉仪。 控制干涉仪在每个测量周期的末端将激光束的空气波长调整到特定的波长值。 可调谐激光器的波长在波长调制过程中连续检测到干扰信号的相位变化的特定波长间隔内连续调谐。 绝对测量由测量的波长和相位变化之间的简单数学关系确定。

    Integrated optical sensor arrangement with detecting means, and means for controlling the optical emission wavelength of the light beam source
    5.
    发明授权
    Integrated optical sensor arrangement with detecting means, and means for controlling the optical emission wavelength of the light beam source 失效
    具有检测装置的集成光学传感器装置和用于控制光束源的光发射波长的装置

    公开(公告)号：US5113066A

    公开(公告)日：1992-05-12

    申请号：US681883

    申请日：1991-04-08

    申请人： Dieter Michel ,  Andreas Franz

    发明人： Dieter Michel ,  Andreas Franz

    IPC分类号： G01B11/00 ,  G01B11/26 ,  G01D5/38 ,  G02B6/124 ,  G02B6/34 ,  G02B6/43 ,  H04B10/50 ,  H04B10/572

    CPC分类号： G02B6/43 ,  G01D5/38 ,  G02B6/124 ,  G02B6/34 ,  H04B10/503 ,  H04B10/572

    摘要： In an integrated optical arrangement, such as a photoelectric position measuring arrangement, a diffraction grid is scanned by light beam diffraction by a scanning unit having a laser. A light beam bundle emanating from the laser is split by the diffraction grid into two diffraction beam bundles, which are inserted into the top input waveguides of a waveguide coupler by two coupling elements. The two diffraction beam bundles interfere in the waveguide coupler and impinge on three detectors located at three output waveguides of the waveguide coupler for obtaining measured values. For readjustment of the optimal emission wavelength of the laser, an additional diffraction beam bundle emanating from the diffraction grid is entered into said integrated optical sensor arrangement by an additional coupling element. The additional beam bundle triggers a detector for generating a control signal to control the optimal emission wavelength of the laser.

    摘要翻译： 在诸如光电位置测量装置的集成光学布置中，通过具有激光的扫描单元的光束衍射来扫描衍射栅格。 从激光器发出的光束束被衍射网格划分成两个衍射束束，它们通过两个耦合元件插入到波导耦合器的顶部输入波导中。 两个衍射束束干涉波导耦合器并撞击位于波导耦合器的三个输出波导处的三个检测器，以获得测量值。 为了重新调整激光器的最佳发射波长，从衍射栅格发出的另外的衍射束束通过附加的耦合元件进入所述集成的光学传感器装置。 附加光束束触发用于产生控制信号的检测器以控制激光器的最佳发射波长。

    Polarizing interferometric displacement measuring arrangement
    6.
    发明授权
    Polarizing interferometric displacement measuring arrangement 失效
    偏振干涉位移测量装置

    公开(公告)号：US5333048A

    公开(公告)日：1994-07-26

    申请号：US50733

    申请日：1993-04-20

    申请人： Dieter Michel ,  Erwin Spanner

    发明人： Dieter Michel ,  Erwin Spanner

    IPC分类号： G01B9/02 ,  G01B11/02 ,  G01B11/26 ,  G01D5/34 ,  G01D5/38 ,  G02B27/28

    CPC分类号： G01D5/344 ,  G01D5/38

    摘要： A polarizing optical arrangement wherein a linearly polarized signal beam cluster is generated. The signal beam cluster is created from interfering partial beam clusters and is linearly polarized. The azimuth of oscillation of the linearly polarized signal beam cluster is dependent on the mutual phase relationship of the aforementioned partial beam clusters. A splitter grating splits the linearly polarized signal beam cluster into partial beam clusters that are analyzed by analyzers, detected by photoelectric transducers and phase-shifted electrically from one another.

    摘要翻译： 一种偏振光学装置，其中产生线偏振信号光束簇。 信号束簇由干扰的部分束簇产生并且是线偏振的。 线性偏振信号束簇的振荡方位依赖于上述部分光束簇的相位关系。 分离器光栅将线性偏振信号束束分裂成由分析仪分析的部分束簇，由光电传感器检测并相互电移位。

    Method and apparatus for generating exposure masks
    7.
    发明授权
    Method and apparatus for generating exposure masks 失效
    用于产生曝光掩模的方法和装置

    公开(公告)号：US4505580A

    公开(公告)日：1985-03-19

    申请号：US435705

    申请日：1982-10-21

    申请人： Dieter Michel

    发明人： Dieter Michel

    IPC分类号： G03B27/32 ,  G03B27/34 ,  G03B27/47 ,  G03F1/00 ,  G03F1/02 ,  G03F9/00 ,  G03F9/02 ,  G03B27/42 ,  G03B27/52

    CPC分类号： G03B27/326

    摘要： A method and apparatus for generating exposure masks is disclosed which markedly reduces the number of required process steps. A plurality of recording originals are successively reproduced in reduced form on a photosensitive recording substrate. These reduced size images are adjusted and placed in registry with respect to one another by means of a computer. In order to achieve this desired result, the computer calculates from the prescribed desired coordinate values and the measured actual coordinate values of index marks included on the recording original, an angle .DELTA..phi. through which the recording original must be rotated to achieve the desired orientation. The computer then acts to determine the corrected actual coordinate values of the diagonal intersection point and from these the coordinate values at which the recording substrate is to be positioned to achieve the desired in registry reproduction of the reduced size image of the recording original. This process is repeated for a number of recording originals, reduced size images of which are successively reproduced on the recording substrate, which is in each case appropriately positioned by means of the computer. The recording substrate is then developed, and the desired exposure mask is produced by photolithographic techniques.

    摘要翻译： 公开了用于产生曝光掩模的方法和装置，其显着地减少了所需的处理步骤的数量。 多个记录原稿以缩小的形式连续地再现在感光记录基板上。 这些减小尺寸的图像被调整并且通过计算机相对于彼此放置在注册表中。 为了达到这个期望的结果，计算机根据规定的期望坐标值和记录原稿上包含的索引标记的测量实际坐标值来计算角度DELTA phi，记录原稿必须通过该角度DELTA phi来旋转以获得期望的取向。 然后，计算机用于确定对角线交叉点的校正实际坐标值，并从这些坐标值确定记录基板的位置，以实现记录原稿的缩小尺寸图像的所需注册表再现。 对于多个记录原稿重复该过程，其缩小尺寸的图像被连续地再现在记录基板上，每个记录基板通过计算机适当地定位。 然后显影记录基底，并通过光刻技术产生所需的曝光掩模。

    Angle measuring arrangement
    8.
    发明授权
    Angle measuring arrangement 失效
    角度测量装置

    公开(公告)号：US5001340A

    公开(公告)日：1991-03-19

    申请号：US426056

    申请日：1989-10-24

    申请人： Ernst Schwefel ,  Dieter Michel ,  Olivier Pariaux

    发明人： Ernst Schwefel ,  Dieter Michel ,  Olivier Pariaux

    IPC分类号： G01B11/26 ,  G01D5/38

    CPC分类号： G01D5/38

    摘要： An interferometric type photoelectric measuring device is disclosed. The photoelectric angle measuring device includes a graduation carrier having a circular graduation and a scanning arrangement for the diametral scanning of the circular graduation. The scanning arrangement is constructed as an integrated optical circuit.

    摘要翻译： 公开了一种干涉式光电测量装置。 光电角度测量装置包括具有圆形刻度的刻度载体和用于圆形刻度的直径扫描的扫描装置。 扫描装置构成为集成光电路。

    Photoelectric measuring system
    9.
    发明授权
    Photoelectric measuring system 失效
    光电测量系统

    公开(公告)号：US4677293A

    公开(公告)日：1987-06-30

    申请号：US728182

    申请日：1985-04-29

    申请人： Dieter Michel

    发明人： Dieter Michel

    IPC分类号： G01B11/00 ,  G01D5/36 ,  G01D5/38 ,  H01J3/14

    CPC分类号： G01D5/38 ,  G01D5/366

    摘要： A photoelectric measuring system includes a graduation field in the form of a phase grid. An outer field is provided for the graduation field, and this outer field is likewise formed as a phase grid. The phase grids of the graduation field and the outer field have different grid constants, so that the diffraction images generated by them impinge in different places on an array of photodetectors which are circuited together antiparallel to one another. In this way a push-pull signal is generated which can be reliably evaluated and is well suited for use as a reference signal.

    摘要翻译： 光电测量系统包括相位格式形式的刻度场。 为刻度场提供外场，该外场同样形成为相位格。 刻度场和外场的相位栅格具有不同的栅格常数，使得它们产生的衍射图像在不同的地方入射到一起反射并联的光电检测器阵列。 以这种方式产生可以可靠地评估的推挽信号，并且非常适合用作参考信号。