摘要:
An optoelectronic component that includes a substrate having a first optoelectronic component, a second optoelectronic component arranged next to the first optoelectronic component and a contact point. A support of the substrate includes a second contact point, wherein the second contact point is located opposite to the first contact point and is in electrical connection with the first contact point. An underfiller in a space between the substrate and the support, the underfiller forms a border area between the substrate and the support toward a space free of underfiller, wherein the border area restricts the space free of underfiller of at least one of the first and second optoelectronic components.
摘要:
Electronic components of an optoelectronic sensor for a measuring system are arranged on the side of a semiconductor substrate that is facing away from a scale. The semiconductor substrate between electronic components and the scale is removed at those locations where the components emit or detect an electromagnetic beam. In this way, it is possible to arrange all of the electrical connections of the components and further electronic assemblies of the measuring system on a first side of the semiconductor substrate, and all optical components of the measuring system on a second side of the semiconductor substrate.
摘要:
A measuring system that includes a scale and a transparent substrate located opposite the scale. The transparent includes a graduation structure and a semiconductor layer arranged on a first side of the transparent substrate facing away from the scale, wherein a photodetector, a light source and an electronic circuit are integrated into the semiconductor layer.
摘要:
A rotary position measuring system having a housing connected with a scanning unit having a light source that emits beams of light and a detector element. A reflection scanning graduation structure arranged directly on the housing opposite the scanning unit. A graduated disk is connected with a rotatable shaft and has a radial transmission measuring graduation structure, wherein the graduated disk is arranged so it is rotatable around an axis of symmetry in the housing so that the measuring graduation structure is located between the scanning unit and the scanning graduation structure. The beams of light emitted by the light source first reach the measuring graduation structure where they are split into a first set of diffracted partial beams of different orders and the diffracted partial beams impinge on the scanning graduation structure. A second set of diffracted partial beams of different orders results and a back-reflection of the second set of diffracted partial beams in the direction toward the measuring graduation structure results, where the second set of diffracted partial beams interfere with one another and the detection of interfering partial beams takes place by the detector element.
摘要:
A polarizing optical arrangement wherein a linearly polarized signal beam cluster is generated. The signal beam cluster is created from interfering partial beam clusters and is linearly polarized. The azimuth of oscillation of the linearly polarized signal beam cluster is dependent on the mutual phase relationship of the aforementioned partial beam clusters. A splitter grating splits the linearly polarized signal beam cluster into partial beam clusters that are analyzed by analyzers, detected by photoelectric transducers and phase-shifted electrically from one another.
摘要:
A method and apparatus for generating exposure masks is disclosed which markedly reduces the number of required process steps. A plurality of recording originals are successively reproduced in reduced form on a photosensitive recording substrate. These reduced size images are adjusted and placed in registry with respect to one another by means of a computer. In order to achieve this desired result, the computer calculates from the prescribed desired coordinate values and the measured actual coordinate values of index marks included on the recording original, an angle .DELTA..phi. through which the recording original must be rotated to achieve the desired orientation. The computer then acts to determine the corrected actual coordinate values of the diagonal intersection point and from these the coordinate values at which the recording substrate is to be positioned to achieve the desired in registry reproduction of the reduced size image of the recording original. This process is repeated for a number of recording originals, reduced size images of which are successively reproduced on the recording substrate, which is in each case appropriately positioned by means of the computer. The recording substrate is then developed, and the desired exposure mask is produced by photolithographic techniques.
摘要:
The interferometer comprises a light source, at least one beam splitting means, a beam combiner means, measuring and reference arms as well as wave guides for guiding the light to the beam splitting means and for guiding the light back to photodetectors. Beam splitting means and beam combiner means are formed by integrated optics elements on a substrate. The wave guides on the substrate form a measuring arm (7.sub.1) and two reference arms (6.sub.1, 8.sub.1) which have different optical path lengths for setting a phase difference. An evaluation electronics for determining correct as to signs, the change in optical path length in the measuring arm (7.sub.1) is connected to the photodetectors.
摘要:
An interferometric type photoelectric measuring device is disclosed. The photoelectric angle measuring device includes a graduation carrier having a circular graduation and a scanning arrangement for the diametral scanning of the circular graduation. The scanning arrangement is constructed as an integrated optical circuit.
摘要:
A photoelectric measuring system includes a graduation field in the form of a phase grid. An outer field is provided for the graduation field, and this outer field is likewise formed as a phase grid. The phase grids of the graduation field and the outer field have different grid constants, so that the diffraction images generated by them impinge in different places on an array of photodetectors which are circuited together antiparallel to one another. In this way a push-pull signal is generated which can be reliably evaluated and is well suited for use as a reference signal.
摘要:
An absolute measuring interferometer having a measuring interferometer, a tunable laser emitting a laser beam and a control interferometer for adjusting the air wavelength of the laser beam. The control interferometer adjusts the air wavelength of the laser beam to a specific wavelength value at the ends of each measuring cycle. The wavelength of the tunable laser is continually tuned within the specific wavelength interval where the phase change of the interference signal is continually detected during the wavelength modulation process. An absolute measurement is determined by a simple mathematical relationship between the measured wavelength and phase changes.