Optical detector for measuring relative displacement of an object on which a grated scale is formed
    2.
    发明授权
    Optical detector for measuring relative displacement of an object on which a grated scale is formed 有权
    光学检测器,用于测量形成刻度的物体的相对位移

    公开(公告)号:US06486467B1

    公开(公告)日:2002-11-26

    申请号:US09468186

    申请日:1999-12-21

    IPC分类号: H01J314

    CPC分类号: H01L31/167 G01D5/34715

    摘要: Electronic components of an optoelectronic sensor for a measuring system are arranged on the side of a semiconductor substrate that is facing away from a scale. The semiconductor substrate between electronic components and the scale is removed at those locations where the components emit or detect an electromagnetic beam. In this way, it is possible to arrange all of the electrical connections of the components and further electronic assemblies of the measuring system on a first side of the semiconductor substrate, and all optical components of the measuring system on a second side of the semiconductor substrate.

    摘要翻译: 用于测量系统的光电传感器的电子部件布置在半导体衬底的背离刻度的一侧。 电子部件与标尺之间的半导体衬底在组件发射或检测电磁波的那些位置被去除。 以这种方式,可以在半导体衬底的第一侧上布置测量系统的部件和其他电子组件的所有电连接,并且在半导体衬底的第二侧上布置测量系统的所有光学部件 。

    Integrated optoelectronic thin-film sensor and method of producing same
    3.
    发明授权
    Integrated optoelectronic thin-film sensor and method of producing same 失效
    集成光电薄膜传感器及其制作方法

    公开(公告)号:US06621104B1

    公开(公告)日:2003-09-16

    申请号:US09959357

    申请日:2002-02-15

    IPC分类号: H01L2715

    摘要: A measuring system that includes a scale and a transparent substrate located opposite the scale. The transparent includes a graduation structure and a semiconductor layer arranged on a first side of the transparent substrate facing away from the scale, wherein a photodetector, a light source and an electronic circuit are integrated into the semiconductor layer.

    摘要翻译: 测量系统,包括刻度尺和与刻度尺相对的透明基板。 透明体包括分级结构和布置在透明基板背离标尺的第一侧上的半导体层,其中光电检测器,光源和电子电路集成到半导体层中。

    Rotary position measuring system
    4.
    发明授权
    Rotary position measuring system 有权
    旋转位置测量系统

    公开(公告)号:US06885457B1

    公开(公告)日:2005-04-26

    申请号:US09365118

    申请日:1999-07-30

    IPC分类号: G01D5/347 G01D5/38 G01B9/02

    摘要: A rotary position measuring system having a housing connected with a scanning unit having a light source that emits beams of light and a detector element. A reflection scanning graduation structure arranged directly on the housing opposite the scanning unit. A graduated disk is connected with a rotatable shaft and has a radial transmission measuring graduation structure, wherein the graduated disk is arranged so it is rotatable around an axis of symmetry in the housing so that the measuring graduation structure is located between the scanning unit and the scanning graduation structure. The beams of light emitted by the light source first reach the measuring graduation structure where they are split into a first set of diffracted partial beams of different orders and the diffracted partial beams impinge on the scanning graduation structure. A second set of diffracted partial beams of different orders results and a back-reflection of the second set of diffracted partial beams in the direction toward the measuring graduation structure results, where the second set of diffracted partial beams interfere with one another and the detection of interfering partial beams takes place by the detector element.

    摘要翻译: 一种旋转位置测量系统,其具有与具有发射光束的光源的扫描单元连接的壳体和检测器元件。 反射扫描刻度结构,直接布置在与扫描单元相对的壳体上。 刻度盘与旋转轴连接并具有径向传动测量刻度结构,其中刻度盘被布置为可围绕壳体中的对称轴线旋转,使得测量刻度结构位于扫描单元和扫描单元之间 扫描毕业结构。 由光源发射的光束首先到达测量刻度结构,在那里将它们分成第一组不同阶的衍射部分光束,并且衍射的部分光束照射在扫描刻度结构上。 导致不同阶数的第二组衍射部分光束导致朝向测量刻度结构的方向上的第二组衍射部分光束的反射,其中第二组衍射部分光束彼此干涉,并且检测 干扰的部分光束由检测器元件发生。

    Polarizing interferometric displacement measuring arrangement
    5.
    发明授权
    Polarizing interferometric displacement measuring arrangement 失效
    偏振干涉位移测量装置

    公开(公告)号:US5333048A

    公开(公告)日:1994-07-26

    申请号:US50733

    申请日:1993-04-20

    CPC分类号: G01D5/344 G01D5/38

    摘要: A polarizing optical arrangement wherein a linearly polarized signal beam cluster is generated. The signal beam cluster is created from interfering partial beam clusters and is linearly polarized. The azimuth of oscillation of the linearly polarized signal beam cluster is dependent on the mutual phase relationship of the aforementioned partial beam clusters. A splitter grating splits the linearly polarized signal beam cluster into partial beam clusters that are analyzed by analyzers, detected by photoelectric transducers and phase-shifted electrically from one another.

    摘要翻译: 一种偏振光学装置,其中产生线偏振信号光束簇。 信号束簇由干扰的部分束簇产生并且是线偏振的。 线性偏振信号束簇的振荡方位依赖于上述部分光束簇的相位关系。 分离器光栅将线性偏振信号束束分裂成由分析仪分析的部分束簇,由光电传感器检测并相互电移位。

    Method and apparatus for generating exposure masks
    6.
    发明授权
    Method and apparatus for generating exposure masks 失效
    用于产生曝光掩模的方法和装置

    公开(公告)号:US4505580A

    公开(公告)日:1985-03-19

    申请号:US435705

    申请日:1982-10-21

    申请人: Dieter Michel

    发明人: Dieter Michel

    CPC分类号: G03B27/326

    摘要: A method and apparatus for generating exposure masks is disclosed which markedly reduces the number of required process steps. A plurality of recording originals are successively reproduced in reduced form on a photosensitive recording substrate. These reduced size images are adjusted and placed in registry with respect to one another by means of a computer. In order to achieve this desired result, the computer calculates from the prescribed desired coordinate values and the measured actual coordinate values of index marks included on the recording original, an angle .DELTA..phi. through which the recording original must be rotated to achieve the desired orientation. The computer then acts to determine the corrected actual coordinate values of the diagonal intersection point and from these the coordinate values at which the recording substrate is to be positioned to achieve the desired in registry reproduction of the reduced size image of the recording original. This process is repeated for a number of recording originals, reduced size images of which are successively reproduced on the recording substrate, which is in each case appropriately positioned by means of the computer. The recording substrate is then developed, and the desired exposure mask is produced by photolithographic techniques.

    摘要翻译: 公开了用于产生曝光掩模的方法和装置,其显着地减少了所需的处理步骤的数量。 多个记录原稿以缩小的形式连续地再现在感光记录基板上。 这些减小尺寸的图像被调整并且通过计算机相对于彼此放置在注册表中。 为了达到这个期望的结果,计算机根据规定的期望坐标值和记录原稿上包含的索引标记的测量实际坐标值来计算角度DELTA phi,记录原稿必须通过该角度DELTA phi来旋转以获得期望的取向。 然后,计算机用于确定对角线交叉点的校正实际坐标值,并从这些坐标值确定记录基板的位置,以实现记录原稿的缩小尺寸图像的所需注册表再现。 对于多个记录原稿重复该过程,其缩小尺寸的图像被连续地再现在记录基板上,每个记录基板通过计算机适当地定位。 然后显影记录基底,并通过光刻技术产生所需的曝光掩模。

    Waveguide type displacement interferometer having two reference paths
    7.
    发明授权
    Waveguide type displacement interferometer having two reference paths 失效
    具有两个参考路径的波导型位移干涉仪

    公开(公告)号:US5396328A

    公开(公告)日:1995-03-07

    申请号:US768217

    申请日:1992-09-21

    摘要: The interferometer comprises a light source, at least one beam splitting means, a beam combiner means, measuring and reference arms as well as wave guides for guiding the light to the beam splitting means and for guiding the light back to photodetectors. Beam splitting means and beam combiner means are formed by integrated optics elements on a substrate. The wave guides on the substrate form a measuring arm (7.sub.1) and two reference arms (6.sub.1, 8.sub.1) which have different optical path lengths for setting a phase difference. An evaluation electronics for determining correct as to signs, the change in optical path length in the measuring arm (7.sub.1) is connected to the photodetectors.

    摘要翻译: PCT No.PCT / EP91 / 00246 Sec。 371日期:1992年9月21日 102(e)日期1992年9月21日PCT 1991年2月8日PCT PCT。 WO91 / 12487 PCT出版物 日期1991年8月22日。干涉仪包括光源,至少一个分束装置,光束组合器装置,测量和参考臂以及波导,用于将光引导到分束装置并将光引导回 到光电探测器。 光束分束装置和光束组合器装置由衬底上的集成光学元件形成。 基板上的波导形成测量臂(71)和具有不同光程长度的两个参考臂(61,81),用于设定相位差。 用于确定符号正确的评估电子装置,测量臂(71)中的光路长度的变化被连接到光电检测器。

    Angle measuring arrangement
    8.
    发明授权
    Angle measuring arrangement 失效
    角度测量装置

    公开(公告)号:US5001340A

    公开(公告)日:1991-03-19

    申请号:US426056

    申请日:1989-10-24

    IPC分类号: G01B11/26 G01D5/38

    CPC分类号: G01D5/38

    摘要: An interferometric type photoelectric measuring device is disclosed. The photoelectric angle measuring device includes a graduation carrier having a circular graduation and a scanning arrangement for the diametral scanning of the circular graduation. The scanning arrangement is constructed as an integrated optical circuit.

    摘要翻译: 公开了一种干涉式光电测量装置。 光电角度测量装置包括具有圆形刻度的刻度载体和用于圆形刻度的直径扫描的扫描装置。 扫描装置构成为集成光电路。

    Photoelectric measuring system
    9.
    发明授权
    Photoelectric measuring system 失效
    光电测量系统

    公开(公告)号:US4677293A

    公开(公告)日:1987-06-30

    申请号:US728182

    申请日:1985-04-29

    申请人: Dieter Michel

    发明人: Dieter Michel

    CPC分类号: G01D5/38 G01D5/366

    摘要: A photoelectric measuring system includes a graduation field in the form of a phase grid. An outer field is provided for the graduation field, and this outer field is likewise formed as a phase grid. The phase grids of the graduation field and the outer field have different grid constants, so that the diffraction images generated by them impinge in different places on an array of photodetectors which are circuited together antiparallel to one another. In this way a push-pull signal is generated which can be reliably evaluated and is well suited for use as a reference signal.

    摘要翻译: 光电测量系统包括相位格式形式的刻度场。 为刻度场提供外场,该外场同样形成为相位格。 刻度场和外场的相位栅格具有不同的栅格常数,使得它们产生的衍射图像在不同的地方入射到一起反射并联的光电检测器阵列。 以这种方式产生可以可靠地评估的推挽信号,并且非常适合用作参考信号。

    Absolute interferometer measuring process and apparatus having a
measuring interferometer, control interferometer and tunable laser
    10.
    发明授权
    Absolute interferometer measuring process and apparatus having a measuring interferometer, control interferometer and tunable laser 失效
    具有测量干涉仪,控制干涉仪和可调激光器的绝对干涉仪测量过程和设备

    公开(公告)号:US5631736A

    公开(公告)日:1997-05-20

    申请号:US614334

    申请日:1996-03-12

    IPC分类号: G01B9/02 G01B11/02

    摘要: An absolute measuring interferometer having a measuring interferometer, a tunable laser emitting a laser beam and a control interferometer for adjusting the air wavelength of the laser beam. The control interferometer adjusts the air wavelength of the laser beam to a specific wavelength value at the ends of each measuring cycle. The wavelength of the tunable laser is continually tuned within the specific wavelength interval where the phase change of the interference signal is continually detected during the wavelength modulation process. An absolute measurement is determined by a simple mathematical relationship between the measured wavelength and phase changes.

    摘要翻译: 具有测量干涉仪,发射激光束的可调激光器和用于调节激光束的空气波长的控制干涉仪的绝对测量干涉仪。 控制干涉仪在每个测量周期的末端将激光束的空气波长调整到特定的波长值。 可调谐激光器的波长在波长调制过程中连续检测到干扰信号的相位变化的特定波长间隔内连续调谐。 绝对测量由测量的波长和相位变化之间的简单数学关系确定。