Flash memory cells having leakage-inhibition layers
    3.
    发明授权
    Flash memory cells having leakage-inhibition layers 有权
    具有泄漏抑制层的闪存单元

    公开(公告)号:US08735963B2

    公开(公告)日:2014-05-27

    申请号:US12168545

    申请日:2008-07-07

    IPC分类号: H01L29/792

    摘要: A semiconductor device includes a semiconductor substrate; a tunneling layer over the semiconductor substrate, wherein the tunneling layer has a first conduction band; a storage layer over the tunneling layer, wherein the storage layer has a second conduction band; a blocking layer over the storage layer, wherein the blocking layer has a third conduction band; a gate electrode over the blocking layer; and at least one of a first leakage-inhibition layer and a second leakage-inhibition layer. The first leakage-inhibition layer is between the tunneling layer and the storage layer, and has a fourth conduction band lower than the first conduction band. The second leakage-inhibition layer is between the blocking layer and the gate electrode, and has a fifth conduction band lower than the third conduction band.

    摘要翻译: 半导体器件包括半导体衬底; 在所述半导体衬底上的隧道层,其中所述隧道层具有第一导带; 在所述隧道层上的存储层,其中所述存储层具有第二导带; 在所述存储层上的阻挡层,其中所述阻挡层具有第三导带; 阻挡层上的栅电极; 以及第一泄漏抑制层和第二泄漏抑制层中的至少一个。 第一泄漏抑制层在隧道层和存储层之间,并且具有比第一导带低的第四导带。 第二泄漏抑制层位于阻挡层和栅电极之间,并且具有比第三导带低的第五导带。

    CAPACITOR DEVICE AND METHOD FOR FORMING THE SAME
    5.
    发明申请
    CAPACITOR DEVICE AND METHOD FOR FORMING THE SAME 审中-公开
    电容器装置及其形成方法

    公开(公告)号:US20120113561A1

    公开(公告)日:2012-05-10

    申请号:US12939222

    申请日:2010-11-04

    申请人: Albert Chin

    发明人: Albert Chin

    IPC分类号: H01G4/06 B23K26/00

    CPC分类号: H01G4/085 H01G4/33

    摘要: The present invention related to a method for forming a capacitor device, comprising steps of: providing a substrate, forming a first metal layer on the substrate, forming a dielectric on the first metal layer, applying a laser-annealing to the dielectric, and forming a second metal layer on the dielectric.

    摘要翻译: 本发明涉及一种形成电容器器件的方法,包括以下步骤:提供衬底,在衬底上形成第一金属层,在第一金属层上形成电介质,对电介质进行激光退火,以及形成 电介质上的第二金属层。

    Ultra-Low Energy RRAM with Good Endurance and Retention
    10.
    发明申请
    Ultra-Low Energy RRAM with Good Endurance and Retention 审中-公开
    超低能量RRAM具有良好的耐久性和保留性

    公开(公告)号:US20110193043A1

    公开(公告)日:2011-08-11

    申请号:US12700726

    申请日:2010-02-05

    申请人: Albert Chin

    发明人: Albert Chin

    IPC分类号: H01L45/00

    摘要: This invention proposes an ultra-low energy (ULE) RRAM with electrode—1/covalent-bond-dielectric/metal-oxide/electrode—2/substrate structure, where the sequence of covalent-bond-dielectric layer and metal-oxide layer is exchangeable. Stacked dielectric layers of covalent-bond-dielectric and metal-oxide are used to improve the switching power and energy, retention and cycling endurance of resistance random access memory.

    摘要翻译: 本发明提出了具有电极1 /共价键 - 电介质/金属氧化物/电极2 /衬底结构的超低能量(ULE)RRAM,其中共价键介电层和金属氧化物层的顺序为 可交换 使用共价 - 电介质和金属氧化物的堆叠电介质层来提高电阻随机存取存储器的开关功率和能量,保持和循环耐久性。