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公开(公告)号：US20110165412A1
公开(公告)日：2011-07-07
申请号：US12954376
申请日：2010-11-24
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/265
摘要： Forming an adhesive layer on a nanoimprint lithography template or a double-sided disk. Forming the adhesive layer on the double-sided disk includes immersing the double-sided disk in a liquid adhesive composition and removing the double-sided disk from the adhesive composition. The outer layer of the double-sided disk is a carbon overcoating or an intermediate layer. The adhesive composition is dried to form a first adhesion layer adhered directly to the carbon overcoating or intermediate layer on a first side of the disk and a second adhesion layer adhered directly to the carbon overcoating or intermediate layer on a second side of the disk. Forming the adhesive layer on the nanoimprint lithography template includes applying an adhesive material to the template, allowing the template to remain motionless, and rinsing a portion of the adhesive material from the template with a solvent, and drying the template.
摘要翻译： 在纳米压印光刻模板或双面盘上形成粘合剂层。 在双面盘上形成粘合剂层包括将双面盘浸入液体粘合剂组合物中并从粘合剂组合物中除去双面盘。 双面盘的外层是碳外涂层或中间层。 将粘合剂组合物干燥以形成直接附着在盘的第一侧上的碳外涂层或中间层的第一粘合层，以及直接粘附在盘的第二侧上的碳外涂层或中间层的第二粘附层。 在纳米压印光刻模板上形成粘合剂层包括将粘合剂材料施加到模板上，允许模板保持静止，并用溶剂从模板中漂洗一部分粘合剂材料，并干燥模板。
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公开(公告)号：US08935981B2
公开(公告)日：2015-01-20
申请号：US13245288
申请日：2011-09-26
CPC分类号： B82Y40/00 , B82Y10/00 , G03F7/0002
摘要： Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.
摘要翻译： 这里描述能够保护压印光刻模板的精细图案化特征的两阶段压印技术。 特别地，这种技术可以在制造凹陷的高对比度对准标记期间使用，以防止沉积的金属层与蚀刻到模板中的精细特征接触。
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公开(公告)号：US08967992B2
公开(公告)日：2015-03-03
申请号：US13455966
申请日：2012-04-25
CPC分类号： B29C43/58 , B29C59/00 , B29C2043/585 , B29K2105/24 , B29K2905/02 , B29K2995/0018 , B29K2995/0027 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7042 , G03F9/7084 , Y10T428/24612 , Y10T428/2462
摘要： Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
摘要翻译： 压印光刻模板，具有高吸收性材料的对准标记。 对准标记对液体扩散的影响不敏感，并且可以在模板特征的液体印迹填充期间提供稳定性并增加对准系统的对比度。
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公开(公告)号：US20120269972A1
公开(公告)日：2012-10-25
申请号：US13455966
申请日：2012-04-25
CPC分类号： B29C43/58 , B29C59/00 , B29C2043/585 , B29K2105/24 , B29K2905/02 , B29K2995/0018 , B29K2995/0027 , B82Y10/00 , B82Y40/00 , G03F7/0002 , G03F9/7042 , G03F9/7084 , Y10T428/24612 , Y10T428/2462
摘要： Imprint lithography templates having alignment marks with highly absorptive material. The alignment marks are insensitive to the effects of liquid spreading and can provide stability and increase contrast to alignment system during liquid imprint filling of template features.
摘要翻译： 压印光刻模板，具有高吸收性材料的对准标记。 对准标记对液体扩散的影响不敏感，并且可以在模板特征的液体印迹填充期间提供稳定性并增加对准系统的对比度。
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公开(公告)号：US20120073462A1
公开(公告)日：2012-03-29
申请号：US13245288
申请日：2011-09-26
IPC分类号： B41F1/18
CPC分类号： B82Y40/00 , B82Y10/00 , G03F7/0002
摘要： Two-stage imprinting techniques capable of protecting fine patterned features of an imprint lithography template are herein described. In particular, such techniques may be used during fabrication of recessed high-contrast alignment marks for preventing deposited metal layers from coming into contact with fine features etched into the template.
摘要翻译： 这里描述能够保护压印光刻模板的精细图案化特征的两阶段压印技术。 特别地，这种技术可以在制造凹陷的高对比度对准标记期间使用，以防止沉积的金属层与蚀刻到模板中的精细特征接触。
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公开(公告)号：US20100104852A1
公开(公告)日：2010-04-29
申请号：US12604094
申请日：2009-10-22
申请人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
发明人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F7/0017 , Y10T428/249978 , Y10T428/268
摘要： An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (pporous/pfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
摘要翻译： 压印光刻模板包括限定平均孔径至少约0.4nm的多个孔的多孔材料。 多孔材料包括硅和氧，并且杨氏模量（E）与多孔材料相对于熔融二氧化硅的相对密度（磷/二氧化硅）的比例为至少约10:1。 多孔材料的折射率在约1.4和1.5之间。 多孔材料可以形成压印光刻模板的中间层或盖层。 模板可以包括在多孔层和盖层之间的孔密封层，或者在盖层的顶部上的孔密封层。
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公开(公告)号：US09778562B2
公开(公告)日：2017-10-03
申请号：US12275998
申请日：2008-11-21
申请人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
发明人： Frank Y. Xu , Weijun Liu , Edward Brian Fletcher , Sidlgata V. Sreenivasan , Byung Jin Choi , Niyaz Khusnatdinov , Anshuman Cherala , Kosta S. Selinidis
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , Y10T428/249978
摘要： An imprint lithography template or imprinting stack includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. A porosity of the porous material is at least about 10%. The porous template, the porous imprinting stack, or both may be used in an imprint lithography process to facilitate diffusion of gas trapped between the template and the imprinting stack into the template, the imprinting stack or both, such that polymerizable material between the imprinting stack and the template rapidly forms a substantially continuous layer between the imprinting stack and the template.
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8.发明授权公开(公告)号：US07874831B2
公开(公告)日：2011-01-25
申请号：US12605848
申请日：2009-10-26
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.
摘要翻译： 压印光刻模板，其特别包括具有与其相关联的第一厚度的主体; 具有与其相关联的第二厚度的图案化层，包括具有与其相关联的第三厚度的多个特征。
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9.发明申请公开(公告)号：US20100040718A1
公开(公告)日：2010-02-18
申请号：US12605848
申请日：2009-10-26
IPC分类号： G03F1/06
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： An imprint lithography template including, inter alia, a body having a first thickness associated therewith; a patterning layer, having a second thickness associated therewith, comprising a plurality of features, having a third thickness associated therewith.
摘要翻译： 压印光刻模板，其特别包括具有与其相关联的第一厚度的主体; 具有与其相关联的第二厚度的图案化层，包括具有与其相关联的第三厚度的多个特征。
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公开(公告)号：US20140212534A1
公开(公告)日：2014-07-31
申请号：US13754015
申请日：2013-01-30
申请人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
发明人： Edward B. Fletcher , Frank Y. Xu , Weijun Liu , Fen Wan , Marlon Menezes , Kosta S. Selinidis
CPC分类号： C23C16/401 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An imprint lithography template includes a porous material defining a multiplicity of pores with an average pore size of at least about 0.4 nm. The porous material includes silicon and oxygen, and a ratio of Young's modulus (E) to relative density of the porous material with respect to fused silica (ρporous/ρfused silica) is at least about 10:1. A refractive index of the porous material is between about 1.4 and 1.5. The porous material may form an intermediate layer or a cap layer of an imprint lithography template. The template may include a pore seal layer between a porous layer and a cap layer, or a pore seal layer on top of a cap layer.
摘要翻译： 压印光刻模板包括限定平均孔径至少约0.4nm的多个孔的多孔材料。 多孔材料包括硅和氧，并且杨氏模量（E）与多孔材料相对于熔融二氧化硅（“多孔/熔融二氧化硅”）的相对密度之比至少为约10:1。 多孔材料的折射率在约1.4和1.5之间。 多孔材料可以形成压印光刻模板的中间层或盖层。 模板可以包括在多孔层和盖层之间的孔密封层，或者在盖层的顶部上的孔密封层。
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