Abstract:
A system and method for multi detector detection of electrons, the method includes the steps of directing a primary electron beam, through a column, to interact with an inspected object, directing, by introducing a substantial electrostatic field, electrons reflected or scattered from the inspected objects towards multiple interior detectors, whereas at least some of the directed electrons are reflected or scattered at small angle in relation to the inspected object; and receiving detection signals from at least one interior detector.
Abstract:
A charged particle detector assembly comprises a particle detector, which has at least one particle sensitive region for detecting at least a portion of the spatial distribution of charged particles and for generating a two-dimensional optical signal which correlates to the detected spatial distribution. Further, an image conduit has an input coupled to the particle sensitive region of the particle detector for transmitting the two-dimensional optical signal to at least one optical detector. Further, a selecting means is adapted for selecting at least a portion of the two-dimensional optical signal.
Abstract:
A charged particle detector assembly comprises a particle detector, which has at least one particle sensitive region for detecting at least a portion of the spatial distribution of charged particles and for generating a two-dimensional optical signal which correlates to the detected spatial distribution. Further, an image conduit has an input coupled to the particle sensitive region of the particle detector for transmitting the two-dimensional optical signal to at least one optical detector. Further, a selecting means is adapted for selecting at least a portion of the two-dimensional optical signal.
Abstract:
A system and method for multi detector detection of electrons, the method includes the steps of directing a primary electron beam, through a column, to interact with an inspected object, directing, by introducing a substantial electrostatic field, electrons reflected or scattered from the inspected objects towards multiple interior detectors, whereas at least some of the directed electrons are reflected or scattered at small angle in relation to the inspected object; and receiving detection signals from at least one interior detector.
Abstract:
A system for providing a compensated Auger spectrum, the system includes: a processor, adapted to generate a compensated Auger spectrum in response to a non-compensated Auger spectrum and in response to an electric potential related parameter, and an interface to an electron detector that is adapted to detect electrons emitted from the first area, wherein the interface is connected to the processor, and wherein the electric potential related parameter reflects a state of a first area of an object that was illuminated by a charged particle beam during the generation of the non-compensated Auger spectrum.
Abstract:
An apparatus and method for fast changing a focal length of a charged particle beam the method comprising the step of changing a control signal in response to a relationship between the control signal voltage value and the focal length of the charged particle beam.
Abstract:
A method for evaluating a cleanliness of a tool, the method includes: receiving a wafer; cleaning the wafer; placing the wafer into the tool for a predefined period; removing the wafer from the tool, performing a contact angle measurement and determining the cleanliness of the wafer.
Abstract:
Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions. Concept as expressed herein.
Abstract:
A method for improving the resolution of a scanning electron microscope, the method including: defining an energy band in response to an expected penetration depth of secondary electrons in an object; illuminating the object with a primary electron beam; and generating images from electrons that arrive at a spectrometer having an energy within the energy band. A scanning electron microscope that includes: a stage for supporting an object; a controller, adapted to receive or define an energy band an energy band in response to an expected penetration depth of secondary electrons in an object; illumination optics adapted to illuminate the object with a primary electron beam; a spectrometer; controlled by the controller so as to selectively reject electrons in response to the defined energy band; and a processor that is adapted to generate images from detection signals provided by the spectrometer.
Abstract:
Systems and methods for process monitoring based upon X-ray emission induced by a beam of charged particles such as electrons or ions. Concept as expressed herein.