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    Electron beam apparatus and device manufacturing method using same
    1.
    发明申请
    Electron beam apparatus and device manufacturing method using same 失效
    电子束装置及其制造方法

    公开(公告)号：US20030042417A1

    公开(公告)日：2003-03-06

    申请号：US10234152

    申请日：2002-09-05

    Applicant: EBARA CORPORATION

    Inventor： Mamoru Nakasuji ,  Takao Kato ,  Kenji Watanabe ,  Shoji Yoshikawa ,  Tohru Satake ,  Nobuharu Noji

    IPC: H01J037/28

    CPC classification number: B82Y10/00 ,  G01N23/225 ,  G01R31/307 ,  H01J37/242 ,  H01J37/265 ,  H01J37/28 ,  H01J2237/221 ,  H01J2237/24507 ,  H01J2237/2817

    Abstract: An electron beam apparatus is provided for reliably measuring a potential contrast and the like at a high throughput in a simple structure. The electron beam apparatus for irradiating a sample, such as a wafer, formed with a pattern with an electron beam to evaluate the sample comprises an electron-optical column for accommodating an electron beam source, an objective lens, an ExB separator, and a secondary electron beam detector; a stage for holding the sample, and relatively moving the sample with respect to the electron-optical column; a working chamber for accommodating the stage and capable of controlling the interior thereof in a vacuum atmosphere; a loader for supplying a sample to the stage; a voltage applying mechanism for applying a voltage to the sample, and capable of applying at least two voltages to a lower electrode of the objective lens; and an alignment mechanism for measuring a direction in which dies are arranged on the sample. When the sample is evaluated, a direction in which the stage is moved is corrected to align with the direction in which the dies are arranged.

    Abstract translation: 提供电子束装置，用于以简单的结构以高通量可靠地测量电位对比度等。 用于照射形成有电子束图案的晶片的样品（如晶片）以评估样品的电子束装置包括用于容纳电子束源的电子 - 光学柱，物镜，ExB分离器和次级 电子束检测器 用于保持样品的阶段，并相对于电子 - 光学柱相对移动样品; 用于容纳舞台并能够在真空气氛中控制其内部的工作室; 用于将样品供应到载物台的装载机; 电压施加机构，用于向样品施加电压，并且能够向物镜的下电极施加至少两个电压; 以及用于测量模具布置在样品上的方向的对准机构。 当评估样品时，对载物台移动的方向进行校正，使其与模具的排列方向一致。

    Stage device and angle detecting device
    3.
    发明申请
    Stage device and angle detecting device 有权
    舞台装置和角度检测装置

    公开(公告)号：US20030136309A1

    公开(公告)日：2003-07-24

    申请号：US10347208

    申请日：2003-01-21

    Applicant: EBARA CORPORATION

    Inventor： Hiroyuki Shinozaki ,  Hirosi Sobukawa ,  Shoji Yoshikawa

    IPC: A47B085/00

    CPC classification number: H01L21/682 ,  H01L21/68 ,  H01L21/681

    Abstract: The present invention provides a stage device applicable to a semiconductor manufacturing apparatus. A stage device 10 comprises a Y-axis stage 20 and an X-axis stage 40, said Y-axis stage 20 including a fixed component 21 and a movable component 26 movable along the Y-axis, said X-axis stage 40 including a fixed component 41 and a movable component 43 movable along the X-axis, wherein the fixed component 41 of the X-axis stage 40 is disposed in the movable component 26 side of the Y-axis stage 20, the Y-axis is designed as a scanning axis, while the X-axis is designed as a stepping axis, and a non-contact sealing device is arranged between the fixed component 21 and the movable component 26 of the Y-axis stage 20.

    Abstract translation: 本发明提供一种适用于半导体制造装置的平台装置。 平台装置10包括Y轴平台20和X轴平台40，所述Y轴平台20包括可沿着Y轴移动的固定部件21和可移动部件26，所述X轴平台40包括 固定部件41和可沿X轴移动的可动部件43，其中，X轴平台40的固定部件41设置在Y轴支架20的可动部件26侧，Y轴设计为 扫描轴，而X轴被设计为步进轴，并且非接触式密封装置设置在Y轴平台20的固定部件21和可动部件26之间。

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