公开(公告)号：US20030207475A1

公开(公告)日：2003-11-06

申请号：US10445826

申请日：2003-05-28

申请人： EBARA CORPORATION ,  NIKON CORPORATION

发明人： Mamoru Nakasuji ,  Tohru Satake ,  Kenji Watanabe ,  Takeshi Murakami ,  Nobuharu Noji ,  Hirosi Sobukawa ,  Tsutomu Karimata ,  Shoji Yoshikawa ,  Toshifumi Kimba ,  Shin Oowada ,  Mutsumi Saito ,  Muneki Hamashima ,  Toru Takagi ,  Naoto Kihara ,  Hiroshi Nishimura

IPC分类号： H01L021/66

CPC分类号： H01J37/185 ,  G01N23/225 ,  G01N23/2251 ,  H01J37/06 ,  H01J37/073 ,  H01J37/20 ,  H01J37/222 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/082 ,  H01J2237/202 ,  H01J2237/20228 ,  H01J2237/204 ,  H01J2237/22 ,  H01J2237/24564 ,  H01J2237/2806 ,  H01J2237/2816 ,  H01J2237/2817

摘要： The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system.

公开(公告)号：US20040227077A1

公开(公告)日：2004-11-18

申请号：US10779323

申请日：2004-02-13

申请人： Nikon Corporation

发明人： Toru Takagi ,  Naoto Kihara

IPC分类号： H01J037/28

CPC分类号： G01N23/2251 ,  H01J37/026 ,  H01J37/265 ,  H01J2237/0044 ,  H01J2237/0048 ,  H01J2237/2817

摘要： Electron microscopes (e.g., scanning electron microscopes, mapping SEMs) are disclosed in which the amount of charging of the specimen is controlled to between a minimum amount needed to view an image and a maximum amount beyond which a viewable image cannot be obtained, and such that the image has low distortion and the specimen is not damaged. Multiple irradiation-electron beams, or multiple segments of a single irradiation-electron beam, are directed to a specimen surface. The irradiation beams (or segments) are decelerated by a retarding voltage applied by a cathode lens and are incident on the specimen surface. The respective current and incident energy of each irradiation beam (or segment thereof) are controlled independently to a predetermined relationship so as to impart predetermined amounts of charging to different insulator regions of the specimen.

摘要翻译： 公开了电子显微镜（例如，扫描电子显微镜，映射SEM），其中将样品的充电量控制在观看图像所需的最小量与不能获得可视图像的最大量之间， 图像的变形小，样品没有损坏。 单个照射电子束的多个照射电子束或多个片段被引导到样品表面。 照射光束（或片段）由阴极透镜施加的延迟电压减速，并入射在样本表面上。 每个照射束（或其片段）的相应的电流和入射能量被独立​​地控制到预定的关系，以便对样本的不同绝缘体区域赋予预定量的电荷。

公开(公告)号：US20040251428A1

公开(公告)日：2004-12-16

申请号：US10816467

申请日：2004-03-31

申请人： Nikon Corporation.

发明人： Hiroshi Nishimura ,  Naoto Kihara ,  Kinya Kato ,  Toru Takagi ,  Akihiro Goto ,  Junji Ikeda ,  Kazuya Okamoto

IPC分类号： G21K007/00

CPC分类号： H01J37/26 ,  G01N23/225 ,  H01J37/1471 ,  H01J37/226 ,  H01J37/265 ,  H01J2237/0492 ,  H01J2237/057 ,  H01J2237/1501 ,  H01J2237/2482 ,  H01J2237/2538 ,  H01J2237/262 ,  H01J2237/2806 ,  H01J2237/2817 ,  H01J2237/282 ,  H01J2237/2823 ,  H01J2237/2826 ,  H01J2237/30438

摘要： Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation-optical system, and enters a Wien filter (nullEnullBnull). Upon passing through the EnullB, the irradiation beam passes through an objective-optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective-optical system and the EnullB in a different direction to a detector via an imaging-optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the EnullB. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB-optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the EnullB is in the same position as the image formed on the detector when electrical voltage and current are applied to the EnullB. Also provided are nullevaluation chartsnull for use in such alignments that do not require adjustment of the optical axis of the irradiation-optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.

摘要翻译： 公开了可以快速且准确地执行这种系统的带电粒子束（CPB）映射投影光学系统和调整方法。 在典型的系统中，照射光束从光源发出，通过照射光学系统，并进入维恩滤光片（“ExB”）。 当通过ExB时，照射光束通过物镜光学系统并且入射到物体表面上。 这种冲击产生观察光束，该观察光束经由成像光学系统通过物镜 - 光学系统和ExB以不同的方向返回到检测器。 调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。 调节光束可以相对于物镜光学系统偏轴。 对于这种调整和对准，可以使用为CPB光学系统和离轴光学系统优化的基准标记（例如位于物体表面的平面中）。 理想地，当电压和电流未施加到ExB时，在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。 还提供了用于这种对准的“评估图”，其不需要调整照射光学系统的光轴，并且发射的调节光束的动能分布从该对准是稳定的。