公开(公告)号：US07021121B2

公开(公告)日：2006-04-04

申请号：US10854429

申请日：2004-05-27

申请人： Earl W. Ebert ,  Daniel N. Galburt ,  Joseph H. Lyons

发明人： Earl W. Ebert ,  Daniel N. Galburt ,  Joseph H. Lyons

IPC分类号： G01B13/08

CPC分类号： G01B13/12

摘要： A gas gauge proximity sensor modulates a gas stream that is used to feed reference and measurement air gauges, respectively, in a reference portion proximate a reference surface and a measurement portion proximate a measurement surface. The gas stream can be modulated at a frequency at which there is minimal acoustical interference energy (e.g., minimal noise) in demodulated output signal. The sensor output can be filtered so that a measurement signal includes only the modulated frequency and side bands of that frequency to include the desired response band of the device as a whole. The filtered signal can be demodulated using a demodulator operating at a same frequency as the modulator to produce the demodulated output signal. In this embodiment, substantially only ambient acoustical energy in the band pass region may interfere with the device operation. Alternatively, the modulation can be introduced through the reference portion. A reference nozzle sets up a pressure field with the reference surface. A carrier frequency can be generated by mechanical motion of the reference surface. For example, this motion can be introduced by a mechanism like a piezoelectric device or a voice coil coupled to the reference surface. The modulated gas flow combines with the other gas flows to produce a modulated combined gas flow.

摘要翻译： 气体计量接近传感器调节用于分别在靠近参考表面的参考部分和靠近测量表面的测量部分供给参考和测量气量计的气流。 气体流可以在解调输出信号中具有最小声学干扰能量（例如最小噪声）的频率下进行调制。 可以对传感器输出进行滤波，使得测量信号仅包括该频率的调制频率和边带，以包括整个设备的期望响应频带。 可以使用与调制器工作在相同频率的解调器来解调经滤波的信号，以产生解调的输出信号。 在该实施例中，带通区域中基本上只有环境声能可能会干扰器件操作。 或者，可以通过参考部分引入调制。 参考喷嘴与参考表面建立一个压力场。 可以通过参考表面的机械运动来产生载波频率。 例如，该运动可以通过耦合到参考表面的压电装置或音圈等机构引入。 经调制的气流与其他气流结合以产生调制的组合气流。

公开(公告)号：US07134321B2

公开(公告)日：2006-11-14

申请号：US10894028

申请日：2004-07-20

申请人： Daniel N. Galburt ,  Earl W. Ebert ,  Joseph H. Lyons

发明人： Daniel N. Galburt ,  Earl W. Ebert ,  Joseph H. Lyons

IPC分类号： G01B13/08

CPC分类号： G01B13/04

摘要： A system and method that use a fluid gauge proximity sensor. A source of modulated unidirectional or alternating fluid flow travels along at least one path having a nozzle and a flow or pressure sensor. The fluid exists at a gap between the nozzle and a target. The sensor outputs an amplitude modulated signal that varies according to a size of the gap. The amplitude modulated signal is processed either digitally or in analog devices, which can include being filtered (e.g., band pass, band limited, high pass, etc. filter) to include the modulated frequency and sufficient bandwidth on either side of that frequency and/or being demodulated using a demodulator operating at the acoustical driver modulation frequency. Using this system and method can result in only ambient acoustical energy in a desired frequency range of the device actually having the opportunity to interfere with the device operation. This can lower the devices overall sensitivity to external acoustical noise and sensor offset.

摘要翻译： 使用流量计接近传感器的系统和方法。 调制的单向或交替流体流的源沿着具有喷嘴和流量或压力传感器的至少一个路径行进。 流体存在于喷嘴和靶之间的间隙处。 传感器输出根据间隙大小而变化的幅度调制信号。 幅度调制信号以数字方式或在模拟设备中进行处理，其可以包括被滤波（例如，带通，频带限制，高通等等滤波器）以包括在该频率的任一侧上的调制频率和足够的带宽， 或者使用以声驱动器调制频率工作的解调器进行解调。 使用该系统和方法可以仅使设备的期望频率范围内的环境声能实际上具有干扰设备操作的机会。 这可以降低设备对外部声学噪声和传感器偏移的总体灵敏度。

公开(公告)号：USRE42650E1

公开(公告)日：2011-08-30

申请号：US11831558

申请日：2007-07-31

申请人： Daniel N. Galburt ,  Earl W. Ebert ,  Joseph H. Lyons

发明人： Daniel N. Galburt ,  Earl W. Ebert ,  Joseph H. Lyons

IPC分类号： G01B13/08

CPC分类号： G01B13/04

摘要： A system and method that use a fluid gauge proximity sensor. A source of modulated unidirectional or alternating fluid flow travels along at least one path having a nozzle and a flow or pressure sensor. The fluid exists at a gap between the nozzle and a target. The sensor outputs an amplitude modulated signal that varies according to a size of the gap. The amplitude modulated signal is processed either digitally or in analog devices, which can include being filtered (e.g., band pass, band limited, high pass, etc. filter) to include the modulated frequency and sufficient bandwidth on either side of that frequency and/or being demodulated using a demodulator operating at the acoustical driver modulation frequency. Using this system and method can result in only ambient acoustical energy in a desired frequency range of the device actually having the opportunity to interfere with the device operation. This can lower the devices overall sensitivity to external acoustical noise and sensor offset.

摘要翻译： 使用流量计接近传感器的系统和方法。 调制的单向或交替流体流的源沿着具有喷嘴和流量或压力传感器的至少一个路径行进。 流体存在于喷嘴和靶之间的间隙处。 传感器输出根据间隙大小而变化的幅度调制信号。 幅度调制信号以数字方式或在模拟设备中进行处理，其可以包括被滤波（例如，带通，频带限制，高通等等滤波器）以包括在该频率的任一侧上的调制频率和足够的带宽， 或者使用以声驱动器调制频率工作的解调器进行解调。 使用该系统和方法可以仅使设备的期望频率范围内的环境声能实际上具有干扰设备操作的机会。 这可以降低设备对外部声学噪声和传感器偏移的总体灵敏度。

公开(公告)号：US07472580B2

公开(公告)日：2009-01-06

申请号：US11647575

申请日：2006-12-29

申请人： Joseph H. Lyons ,  Peter C. Kochersperger ,  James Walsh ,  Rajan Mali

发明人： Joseph H. Lyons ,  Peter C. Kochersperger ,  James Walsh ,  Rajan Mali

IPC分类号： G01B13/08 ,  G01L7/00

CPC分类号： G01B13/12

摘要： A vacuum-driven gas gauge proximity sensor for sensing a difference between a reference surface standoff and a measurement surface standoff is disclosed. Unlike existing proximity sensors, the vacuum-driven gas gauge proximity sensor uses a vacuum to reverse the traditional flow of gas through a proximity sensor, such that gas flows inward across measurement and reference standoffs through measurement and reference nozzles. The conditioned ambient gas that is vacuumed into the reference and measurement nozzles flows through reference and measurement channels that are coupled at a junction into a single channel. The single channel is coupled to the vacuum that is used to evacuate the conditioned ambient gas through the proximity sensor. A bridge channel couples the reference and measurement channels. A mass flow sensor along the bridge channel monitors flow rates to detect measurement standoffs that can be used to initiate a control action. A pump-driven liquid flow proximity sensor is also disclosed.

摘要翻译： 公开了一种用于感测参考表面间隔和测量表面间隔之间的差异的真空驱动气体计量传感器。 与现有的接近传感器不同，真空驱动的气体计量接近传感器使用真空来反转传统的气体流过接近传感器，使得气体通过测量和参考喷嘴在测量和参考间隙内向内流动。 被抽吸到参考和测量喷嘴中的条件环境气体流过参考和测量通道，该通道在结点处耦合到单个通道中。 单通道与用于通过接近传感器抽空调节的环境气体的真空相连。 桥接通道耦合参考和测量通道。 沿桥通道的质量流量传感器监测流速以检测可用于启动控制动作的测量间隔。 还公开了一种泵驱动的液流接近传感器。

公开(公告)号：US08390782B2

公开(公告)日：2013-03-05

申请号：US12539190

申请日：2009-08-11

申请人： Joseph H. Lyons

发明人： Joseph H. Lyons

IPC分类号： G01L7/00 ,  G03B27/32 ,  G03B27/42 ,  G03B27/52

CPC分类号： G03B27/52 ,  G03F7/70608 ,  G03F7/70775 ,  G03F7/70783 ,  G03F7/70808 ,  G03F7/7085

摘要： A fluid proximity sensor having one or more measurement nozzles and a reference nozzle coupled to a common chamber. Diaphragms coupled to the measurement nozzles can be sensed by optical, capacitive or inductive means so as to detect changes in pressure. In addition, the number of pressure detectors can be minimized through the use of control valves to selectively couple the nozzles to the detectors, while maintaining the required high level of topographic sensitivity. Further, the measurement nozzle dimensions can be adjusted to optimize proximity measurements in response to accuracy, speed and similar requirements.

摘要翻译： 具有一个或多个测量喷嘴和连接到公共室的参考喷嘴的流体接近传感器。 耦合到测量喷嘴的隔膜可以通过光学，电容或电感装置来感测，以便检测压力的变化。 此外，通过使用控制阀来选择性地将喷嘴耦合到检测器，同时保持所需的高水平的地形灵敏度，可以最小化压力检测器的数量。 此外，可以调整测量喷嘴尺寸以根据精度，速度和类似要求优化接近度测量。

公开(公告)号：US06979833B2

公开(公告)日：2005-12-27

申请号：US10890213

申请日：2004-07-14

申请人： Joseph H. Lyons

发明人： Joseph H. Lyons

IPC分类号： G03F9/00 ,  H01L21/00 ,  H01L21/68 ,  G01J1/20 ,  G01N21/86

CPC分类号： H01L21/681 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7034

摘要： A system for monitoring wafer surface topography during a lithographic process is described that includes means for capturing wafer position and surface data at a first time when a wafer is at a first location, means for generating correction data for a second wafer location prior to the wafer reaching the second wafer location, and means for storing the correction data in a spatial delay line. The means for capturing wafer position and surface data includes means for capturing backplane position data with a plurality of stalk gauges. The means for generating correction data includes means for converting the wafer position and surface data from a time-domain into a space domain. The system also includes means for moving the wafer based on the correction data when the wafer is at the second wafer location at a second time.

摘要翻译： 描述了在光刻处理期间用于监测晶片表面形貌的系统，其包括在晶片处于第一位置时在第一时间捕获晶片位置和表面数据的装置，用于在晶片之前产生第二晶片位置的校正数据的装置 到达第二晶片位置，以及用于将校正数据存储在空间延迟线中的装置。 用于捕获晶片位置和表面数据的装置包括用于利用多个茎尺来捕获背板位置数据的装置。 用于产生校正数据的装置包括用于将晶片位置和表面数据从时域转换成空间域的装置。 该系统还包括当晶片在第二时间处于第二晶片位置时基于校正数据移动晶片的装置。

公开(公告)号：US07940374B2

公开(公告)日：2011-05-10

申请号：US12164931

申请日：2008-06-30

申请人： Joseph H. Lyons

发明人： Joseph H. Lyons

IPC分类号： G03B27/52

CPC分类号： G03B27/52 ,  G03F9/7003 ,  G03F9/7011 ,  G03F9/7019 ,  G03F9/7026

摘要： Disclosed are systems, methods, and computer program products for parallel process focus compensation. Such methods may include three steps. First, a first sensor senses a top surface of a wafer to provide first-sensor data which defines a first topographic map of the first surface of the wafer. The first sensor may be, for example, an air gauge. Second, a second sensor senses the top surface of the wafer in parallel with the first sensor to provide second-sensor data which defines a second topographic map of the first surface of the wafer. The second sensor may be, for example, an optical sensor or a capacitance sensor. Third, a calibration module calibrates focus-positioning parameters of an exposure system based on the first- and second-sensor data. The calibration module may be embodied in hardware, software, firmware, or a combination thereof.

摘要翻译： 公开了用于并行过程焦点补偿的系统，方法和计算机程序产品。 这样的方法可以包括三个步骤。 首先，第一传感器感测晶片的顶表面以提供限定晶片的第一表面的第一地形图的第一传感器数据。 第一传感器可以是例如气压表。 第二，第二传感器与第一传感器平行地感测晶片的顶表面，以提供限定晶片的第一表面的第二地形图的第二传感器数据。 第二传感器可以是例如光学传感器或电容传感器。 第三，校准模块基于第一和第二传感器数据来校准曝光系统的焦点定位参数。 校准模块可以以硬件，软件，固件或其组合来体现。

公开(公告)号：US07049618B2

公开(公告)日：2006-05-23

申请号：US11256938

申请日：2005-10-25

申请人： Joseph H. Lyons

发明人： Joseph H. Lyons

IPC分类号： G01J1/20

CPC分类号： H01L21/681 ,  G03F9/7003 ,  G03F9/7026 ,  G03F9/7034

摘要： A virtual gauging method for use in a lithographic process includes gauging a region at a surface of a wafer when the region is located away from an axis of illumination producing wafer surface data, while other portions of the wafer are being illuminated. The method also includes acquiring time-domain measurements representing the wafer surface data and converting the time-domain measurements into space-domain measurements. This conversion can be done using a finite-impulse-response (FIR) filter. The FIR filter can be triggered with a spatial interrupt, and a width of the FIR filter is modified in response to a velocity of travel of the wafer. The method further includes converting space-domain measurements into wafer correction data.

公开(公告)号：US06885429B2

公开(公告)日：2005-04-26

申请号：US10301627

申请日：2002-11-22

申请人： Joseph H. Lyons ,  Joseph G. Whelan

发明人： Joseph H. Lyons ,  Joseph G. Whelan

IPC分类号： G01B11/00 ,  G03F7/20 ,  G03F7/207 ,  G03F7/22 ,  G03F9/00 ,  H01L21/027 ,  G03B27/42 ,  G03B27/32 ,  G03B27/52

CPC分类号： G03F7/70516 ,  G01B11/00 ,  G03F7/70641

摘要： A system and method are used to calibrate a focus portion of an exposure section of a lithography tool. A wafer is exposed so that a resulted or formed patterned image is tilted with respect to the wafer. The tilting can be imposed based on controlling a wafer stage to tilt the wafer or a reticle stage to tilt the reticle. The wafer is developed. Characteristics of the tilted patterned image are measured with a portion of the lithography tool to determine focus parameters of an exposure system. The portion can be an alignment system. The measuring step can measure band width and/or band location of the tilted patterned image. Sometimes, more than one patterned image is formed on the wafer, then the measuring step can measure distance between bands and shifting of the bands with respect to a central axis of the wafer. The focus parameters can be focus tilt errors and/or focus offset. The focus parameters are used to perform calibration. Calibration is done by either automatically or manually entering compensation values for the measured focus parameters into the lithography tool.

摘要翻译： 系统和方法用于校准光刻工具的曝光部分的焦点部分。 使晶片曝光，使得所得到或形成的图案化图像相对于晶片倾斜。 可以基于控制晶片台来倾斜晶片或标线片台以使掩模版倾斜来施加倾斜。 开发晶圆。 用光刻工具的一部分测量倾斜图案图像的特性，以确定曝光系统的焦点参数。 该部分可以是对准系统。 测量步骤可以测量倾斜的图案化图像的带宽和/或带位置。 有时，在晶片上形成多于一个的图案化图像，则测量步骤可以测量带之间的距离和带相对于晶片的中心轴移动。 焦点参数可以是焦点倾斜误差和/或聚焦偏移。 焦点参数用于执行校准。 通过自动或手动输入光刻工具中测量的聚焦参数的补偿值进行校准。

公开(公告)号：US08144306B2

公开(公告)日：2012-03-27

申请号：US12547835

申请日：2009-08-26

申请人： Joseph H. Lyons

发明人： Joseph H. Lyons

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03B27/42 ,  G03F9/7057

摘要： A gas gauge proximity sensor supplying gas in a reverse flow direction from the injection chamber to the measurement chamber. Supplying gas in a reverse flow direction enables the transient behavior in the sensor to more rapidly stabilize, with a resulting increase in bandwidth. Optionally, a scavenger chamber can be used to remove the excess gas by locating a scavenger aperture of the scavenger chamber in close proximity to the exit aperture of the injection chamber. A bridge proximity sensor can be used with a reference chamber to receive gas flow from a location close to the exit aperture of the injection chamber in order to reduce common mode errors.

摘要翻译： 气体计量接近传感器，从反射流方向将气体从注射室供给到测量室。 以反向流动方向供应气体使得传感器中的瞬态行为能够更快地稳定，从而带宽的增加。 可选地，清除室可用于通过将清除室的清除器孔定位成紧邻注射室的出口孔来除去过量的气体。 桥接口传感器可以与参考室一起使用以从靠近注射室的出口孔的位置接收气流，以减少共模误差。