公开(公告)号：US08931433B2

公开(公告)日：2015-01-13

申请号：US12742604

申请日：2008-11-12

申请人： Yuichi Setsuhara ,  Akinori Ebe ,  Eiji Ino ,  Shinichiro Ishihara ,  Hajime Ashida ,  Akira Watanabe

发明人： Yuichi Setsuhara ,  Akinori Ebe ,  Eiji Ino ,  Shinichiro Ishihara ,  Hajime Ashida ,  Akira Watanabe

IPC分类号： C23C16/505 ,  C23C16/503 ,  C03C17/22 ,  C23C16/24 ,  C23C16/509 ,  H01J37/32

CPC分类号： C23C16/503 ,  C03C17/22 ,  C03C2217/28 ,  C03C2218/153 ,  C23C16/24 ,  C23C16/509 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32715

摘要： The present invention aims at providing a plasma processing apparatus for performing a plasma processing on a planar substrate body to be processed, the apparatus being capable of generating the plasma with good uniformity and efficiently using the plasma, and having a high productivity. That is, the plasma processing apparatus according to the present invention includes: a vacuum chamber; one or plural antenna supporters (plasma generator supporters) projecting into the internal space of the vacuum chamber; radio-frequency antennas (plasma generators) attached to each antenna supporter; and a pair of substrate body holders provided across the antenna supporter in the vacuum chamber, for holding a planar substrate body to be processed.

摘要翻译： 本发明的目的在于提供一种等离子体处理装置，用于对待处理的平面基板主体进行等离子体处理，该装置能够产生均匀性均匀且有效地使用等离子体的等离子体，并且具有高生产率。 也就是说，根据本发明的等离子体处理装置包括：真空室; 一个或多个天线支撑器（等离子体发生器支撑器）突出到真空室的内部空间中; 连接到每个天线支架的射频天线（等离子体发生器）; 以及设置在真空室中的天线支撑体两侧的一对基板主体保持件，用于保持待处理的平面基板主体。

公开(公告)号：US20110220026A1

公开(公告)日：2011-09-15

申请号：US13129924

申请日：2009-11-19

申请人： Eiji Ino ,  Akira Watanabe ,  Shunichi Ishihara ,  Hajime Ashida ,  Hiroshi Shoji ,  Keiichi Yoshimura

发明人： Eiji Ino ,  Akira Watanabe ,  Shunichi Ishihara ,  Hajime Ashida ,  Hiroshi Shoji ,  Keiichi Yoshimura

IPC分类号： C23C16/505 ,  C23C16/455 ,  C23C16/458

CPC分类号： H01J37/32568 ,  C23C16/45578 ,  C23C16/509 ,  H01J37/3244

摘要： A plasma processing device according to the present invention includes a plasma processing chamber consisting of a vacuum container, a pair of substrate holders standing opposite each other in the plasma processing chamber, a plurality of first reaction gas tubes provided between the two substrate holders, and a plurality of second reaction gas tubes provided between the plurality of first reaction gas tubes and each of the two substrate holders. The first reaction gas tubes, which are made of an electrically conductive material, are electrically connected to a first radio-frequency power source or second radio-frequency power source. The first reaction gas tubes double as a radio-frequency antenna, while the second reaction gas tubes double as an electrode.

摘要翻译： 根据本发明的等离子体处理装置包括等离子体处理室，其由真空容器，在等离子体处理室中彼此相对定位的一对基板保持器组成，多个第一反应气体管设置在两个基板保持器之间，以及 设置在所述多个第一反应气体管与所述两个基板保持件中的每一个之间的多个第二反应气体管。 由导电材料制成的第一反应气体管与第一射频电源或第二射频电源电连接。 第一反应气管作为射频天线加倍，而第二反应气管作为电极加倍。

公开(公告)号：US20100263797A1

公开(公告)日：2010-10-21

申请号：US12742604

申请日：2008-11-12

申请人： Yuichi Setsuhara ,  Akinori Ebe ,  Eiji Ino ,  Shinichiro Ishihara ,  Hajime Ashida ,  Akira Watanabe

发明人： Yuichi Setsuhara ,  Akinori Ebe ,  Eiji Ino ,  Shinichiro Ishihara ,  Hajime Ashida ,  Akira Watanabe

IPC分类号： H01L31/18 ,  C23C16/00 ,  C23C16/505 ,  C23F1/08

CPC分类号： C23C16/503 ,  C03C17/22 ,  C03C2217/28 ,  C03C2218/153 ,  C23C16/24 ,  C23C16/509 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32715

摘要： The present invention aims at providing a plasma processing apparatus for performing a plasma processing on a planar substrate body to be processed, the apparatus being capable of generating the plasma with good uniformity and efficiently using the plasma, and having a high productivity. That is, the plasma processing apparatus according to the present invention includes: a vacuum chamber; one or plural antenna supporters (plasma generator supporters) projecting into the internal space of the vacuum chamber; radio-frequency antennas (plasma generators) attached to each antenna supporter; and a pair of substrate body holders provided across the antenna supporter in the vacuum chamber, for holding a planar substrate body to be processed.

摘要翻译： 本发明的目的在于提供一种等离子体处理装置，用于对待处理的平面基板主体进行等离子体处理，该装置能够产生均匀性均匀且有效地使用等离子体的等离子体，并且具有高生产率。 也就是说，根据本发明的等离子体处理装置包括：真空室; 一个或多个天线支撑器（等离子体发生器支撑器）突出到真空室的内部空间中; 连接到每个天线支架的射频天线（等离子体发生器）; 以及设置在真空室中的天线支撑体两侧的一对基板主体保持件，用于保持待处理的平面基板主体。

公开(公告)号：US20100243163A1

公开(公告)日：2010-09-30

申请号：US12682641

申请日：2008-09-29

申请人： Eiji Ino ,  Akira Watanabe ,  Hajime Ashida

发明人： Eiji Ino ,  Akira Watanabe ,  Hajime Ashida

IPC分类号： H01L21/306

CPC分类号： C23C16/54 ,  B65G49/061 ,  B65G49/063 ,  B65G49/068 ,  B65G2249/02 ,  H01L21/67173 ,  H01L21/67196 ,  H01L21/67706 ,  H01L21/67712 ,  H01L21/67718 ,  H01L21/67724 ,  H01L21/67751 ,  H01L21/67757 ,  H01L21/6776

摘要： Disclosed is a substrate processing apparatus for carrying a substrate W in a standing position and performing a predetermined process to the substrate W, including: a plurality of substrate processing chambers; and a common carrying delivery chamber for carrying a substrate to each of the substrate processing chambers, where: at least one of the substrate processing chambers is provided above or below the common carrying delivery chamber; and a substrate passage opening through which the substrate W can pass is provided at the boundaries between the processing chambers and the carrying chamber.

摘要翻译： 公开了一种基板处理装置，用于将基板W承载在竖立位置并对基板W执行预定的处理，包括：多个基板处理室; 以及用于将基板输送到每个基板处理室的公共搬运室，其中：至少一个基板处理室设置在公共搬运输送室的上方或下方; 并且在处理室和搬送室之间的边界处设置有衬底W可以通过的衬底通道开口。

公开(公告)号：US20100272550A1

公开(公告)日：2010-10-28

申请号：US12681018

申请日：2008-09-29

申请人： Shinichiro Ishihara ,  Hajime Ashida ,  Akira Watanabe

发明人： Shinichiro Ishihara ,  Hajime Ashida ,  Akira Watanabe

IPC分类号： B65G47/24 ,  B66C1/10 ,  B65G49/06

CPC分类号： H01L21/67236 ,  B65G49/063 ,  B65G49/064 ,  B65G49/067 ,  B65G2249/02 ,  H01L21/67706 ,  H01L21/67712 ,  H01L21/67718 ,  H01L21/67748 ,  H01L21/67751

摘要： The present invention provides a substrate holding mechanism capable of assuredly holding a substrate and delivering/receiving it: a substrate holding mechanism including a substrate holding unit for holding a rectangular substrate, comprising: a plurality of substrate holding rollers provided at positions corresponding to two opposite sides of the substrate on the substrate holding unit and pivotally supported by the substrate holding unit; and a roller driver for rotating the substrate holding rollers, wherein: the substrate holding roller comprises a cylinder part and a holding flange provided along a portion of a circumference of each end of the cylinder part; and each of the substrate holding rollers is rotated by the roller driver so that a state of holding edges of the substrate by the holding flange and a state of releasing the edges can be switched in accordance with a rotation angle of the substrate holding rollers.

摘要翻译： 本发明提供一种能够可靠地保持基板并输送/接收基板的基板保持机构：具有保持矩形基板的基板保持单元的基板保持机构，包括：多个基板保持辊，设置在对应于两个相对的位置的位置 基板保持单元上的基板的侧面，并被基板保持单元枢转地支撑; 以及用于旋转所述基板保持辊的滚子驱动器，其中：所述基板保持辊包括沿着所述圆筒部分的每个端部的圆周的一部分设置的圆筒部分和保持凸缘; 并且每个基板保持辊由辊驱动器旋转，使得可以根据基板保持辊的旋转角度来切换由保持凸缘保持基板的保持边缘和释放边缘的状态的状态。