Adjusting a trace data rate based upon a tool state
    1.
    发明授权
    Adjusting a trace data rate based upon a tool state 失效
    根据工具状态调整跟踪数据速率

    公开(公告)号:US06834211B1

    公开(公告)日:2004-12-21

    申请号:US10284639

    申请日:2002-10-31

    IPC分类号: G06F1900

    摘要: A method and an apparatus for adjusting a rate of data flow based upon a tool state. A processing step is performed on a workpiece using a processing tool. A dynamic data rate adjustment process is performed to determine a data rate for acquiring data relating to the process performed upon the workpiece. The dynamic data rate adjustment process includes adjusting the data rate based upon an operation parameter relating to the processing tool.

    摘要翻译: 一种用于基于工具状态来调整数据流速率的方法和装置。 使用加工工具对工件进行加工步骤。 执行动态数据速率调整处理以确定用于获取与在工件上执行的处理相关的数据的数据速率。 动态数据速率调整处理包括基于与处理工具相关的操作参数来调整数据速率。

    Wafer fabrication system providing measurement data screening
    2.
    发明授权
    Wafer fabrication system providing measurement data screening 有权
    晶圆制造系统提供测量数据筛选

    公开(公告)号:US06446022B1

    公开(公告)日:2002-09-03

    申请号:US09252402

    申请日:1999-02-18

    IPC分类号: G01N3700

    摘要: A wafer fabrication system is presented including a measurement system which screens measurement data prior to dissemination. The measurement system may include an equipment interface computer coupled between a measurement tool and a work-in-process (WIP) server. The measurement tool may perform one of possibly several measurement procedures (i.e., “recipes”) upon one or more semiconductor wafers processed as a lot, thereby producing measurement data. The WIP server may select the measurement recipe and store the measurement data. The equipment interface computer may receive the measurement data produced by the measurement tool and compare the measurement data to a predetermined range of acceptable values in order to determine if the measurement data is within the range of acceptable values. The equipment interface computer may display the measurement data upon a display device such that any portion of the measurement data not within the range of acceptable values is visually flagged (e.g., displayed in flashing type, in bold type, in a color which differs from surrounding text, with a background color which differs from surrounding text, etc.). The equipment interface computer may allow an operator to modify the measurement data, then generate a signal indicating acceptance of the measurement data. Upon receiving the signal indicating acceptance, the equipment interface computer may provide the measurement data to the WIP server. The equipment interface computer may also respond to the acceptance signal by providing the measurement data to an entity server and/or a statistical process control (SPC) server.

    摘要翻译: 提出了一种晶片制造系统,其包括在传播之前屏蔽测量数据的测量系统。 测量系统可以包括耦合在测量工具和在制品(WIP)服务器之间的设备接口计算机。 测量工具可以在一批或多个经批处理的半导体晶片上执行可能的几个测量过程(即“配方”)之一,由此产生测量数据。 WIP服务器可以选择测量配方并存储测量数据。 设备接口计算机可以接收由测量工具产生的测量数据,并将测量数据与可接受值的预定范围进行比较,以便确定测量数据是否在可接受值的范围内。 设备接口计算机可以在显示设备上显示测量数据,使得不在可接受值范围内的测量数据的任何部分被视觉标记(例如,以闪烁类型,粗体显示,颜色不同于周围的颜色 文字,背景颜色不同于周围文字等)。 设备接口计算机可以允许操作者修改测量数据,然后产生指示接收测量数据的信号。 在接收到指示接受的信号时,设备接口计算机可以向WIP服务器提供测量数据。 设备接口计算机还可以通过向实体服务器和/或统计过程控制(SPC)服务器提供测量数据来响应接受信号。

    Identifying a cause of a fault based on a process controller output
    3.
    发明授权
    Identifying a cause of a fault based on a process controller output 失效
    根据过程控制器输出识别出故障的原因

    公开(公告)号:US06778873B1

    公开(公告)日:2004-08-17

    申请号:US10210640

    申请日:2002-07-31

    IPC分类号: G06F1900

    摘要: A method and apparatus is provided for identifying a cause of a fault based on controller output. The method comprises processing at least one workpiece under a direction of the controller and detecting a fault associated with the processing of the at least one workpiece. The method further includes determining a plurality of possible causes of the detected fault, identifying a more likely possible cause out of the plurality of possible causes, providing fault information associated with the identified more likely possible cause to the controller. The method further includes providing fault information associated with the identified more likely possible cause to the controller. The method further comprises adjusting the processing of one or more workpieces to be processed next based on the fault information provided to the controller. The method further includes generating prediction data associated with processing of the next workpieces, and comparing the prediction data to processing data associated with the processing of the next workpieces to identify a possible cause of the fault.

    摘要翻译: 提供了一种基于控制器输出来识别故障原因的方法和装置。 该方法包括在控制器的方向上处理至少一个工件,并检测与至少一个工件的处理相关的故障。 该方法还包括确定检测到的故障的多个可能的原因,从多个可能的原因中识别更可能的可能原因,将与所识别的更可能的可能原因相关联的故障信息提供给控制器。 该方法还包括向控制器提供与所识别的更可能的可能原因相关联的故障信息。 该方法还包括基于提供给控制器的故障信息来调整接下来要处理的一个或多个待处理工件的处理。 该方法还包括生成与下一个工件的处理相关联的预测数据,以及将预测数据与与下一个工件的处理相关联的处理数据进行比较,以识别故障的可能原因。

    Conflict resolution among multiple controllers
    4.
    发明授权
    Conflict resolution among multiple controllers 失效
    多个控制器之间的冲突解决

    公开(公告)号:US07031793B1

    公开(公告)日:2006-04-18

    申请号:US10286305

    申请日:2002-11-01

    CPC分类号: G05B19/042

    摘要: A method and an apparatus are provided for conflict resolution among a plurality of controllers. The method includes receiving a first control instruction from a first process controller to process a workpiece, receiving a second control instruction from a second process controller to process the workpiece and adjusting at least one of the first control instruction and the second control instruction to process the workpiece to achieve a desired process goal.

    摘要翻译: 为多个控制器之间的冲突解决提供了一种方法和装置。 该方法包括从第一过程控制器接收第一控制指令以处理工件,从第二过程控制器接收第二控制指令以处理工件并调整第一控制指令和第二控制指令中的至少一个以处理 工件达到所期望的工艺目标。

    Fault notification based on a severity level
    7.
    发明授权
    Fault notification based on a severity level 失效
    基于严重性级别的故障通知

    公开(公告)号:US07200779B1

    公开(公告)日:2007-04-03

    申请号:US10133097

    申请日:2002-04-26

    IPC分类号: G06F11/00

    摘要: A method and apparatus is provided for fault notification based on a severity level. The method comprises detecting a fault associated with a processing tool that is adapted to process one or more workpieces, determining a fault severity level of the detected fault and selecting at least one user to notify of the fault based on the severity level of the fault.

    摘要翻译: 基于严重性级别提供了用于故障通知的方法和装置。 该方法包括检测与处理一个或多个工件的处理工具相关联的故障,确定检测到的故障的故障严重性级别,并且基于故障的严重性级别选择至少一个用户通知故障。

    Scheduling method for automated work-cell transfer system
    9.
    发明授权
    Scheduling method for automated work-cell transfer system 失效
    自动化工作单元传输系统的调度方法

    公开(公告)号:US06928333B1

    公开(公告)日:2005-08-09

    申请号:US09387174

    申请日:1999-08-31

    IPC分类号: G06F19/00 G06Q10/00

    CPC分类号: G06Q10/06 Y02P90/86

    摘要: According to an example embodiment, the present invention is directed to a new and efficient method for bringing at least two items together from independent locations via separate paths in a computer controlled manufacturing environment. Using the computer, the probabilities for pickup and delivery of each of the two items are generated and used to determine an efficient manner in which to bring the items together via the separate paths.

    摘要翻译: 根据示例性实施例,本发明涉及一种用于在计算机控制的制造环境中通过独立路径将独立位置带入至少两个项目的新的和有效的方法。 使用计算机,产生并且使用两个项目中的每一个的拾取和递送的概率来确定通过分开的路径将项目合在一起的有效方式。

    Predicting process excursions based upon tool state variables
    10.
    发明授权
    Predicting process excursions based upon tool state variables 失效
    基于工具状态变量预测过程偏移

    公开(公告)号:US06905895B1

    公开(公告)日:2005-06-14

    申请号:US10185495

    申请日:2002-06-28

    CPC分类号: H01L22/20 H01L2223/54453

    摘要: A method and an apparatus for predicting excursions based upon tool state variables. At least one semiconductor wafer is processed in a processing tool. Tool state data relating to the processing tool is acquired. The tool state data comprises at least one tool state variable. A determination is made whether an excursion of the tool health related to the processing tool has occurred based upon the tool state data. The tool state variable is modified to reduce the excursion of the tool health in response to the determination that the excursion of the tool health has occurred.

    摘要翻译: 一种基于工具状态变量预测偏移的方法和装置。 在处理工具中处理至少一个半导体晶片。 获取与处理工具相关的工具状态数据。 刀具状态数据包括至少一个刀具状态变量。 根据工具状态数据确定是否发生了与处理工具相关的工具健康的偏移。 修改工具状态变量以减少工具健康的偏差,以响应确定工具健康发生偏移的确定。