摘要:
A method and apparatus for providing fault detection in an Advanced Process Control (APC) framework. A first interface receives operational state data of a processing tool related to the manufacture of a processing piece. The state data is sent from the first interface to a fault detection unit. A fault detection unit determines if a fault condition exists with the processing tool based upon the state data. A predetermined action is performed on the processing tool in response to the presence of a fault condition. In accordance with one embodiment, the predetermined action is to shutdown the processing tool so as to prevent further production of faulty wafers.
摘要:
A method and apparatus for providing near real-time fault detection in a manufacturing process is provided. The apparatus includes a processing tool adapted to manufacture a processing piece and an interface, coupled to the processing tool, for receiving operational data from the processing tool related to the manufacture of the processing piece, and product data defining characteristics of the processing piece. In one embodiment, the processing tool is in the form of semiconductor fabrication equipment and the processing piece is a silicon wafer. A fault detection unit is provided to determine if a fault condition exists with the processing tool from the operational data or with the processing piece from the product data. An Advanced Process Control (APC) framework is further provided to receive the operational and product data from the first interface, and to send the data to the fault detection unit.
摘要:
A method is provided for configuring a final data set to use for modeling a manufacturing process, the method including requesting a real-time data set from a real-time database, requesting an historical data set from an historical database, and defining a required format for the final data set. The method also includes combining the real-time data set from the real-time database with the historical data set from the historical database using the required format for the final data set.
摘要:
A method and apparatus for performing manufacturing system analysis upon a manufacturing network. Real-time production data is collected. The real-time production data is stored in a static file database. A real-time data flow is emulated using said real-time production data from said static file database. A reactive function analysis is performed.
摘要:
A method and apparatus for providing fault detection in an Advanced Process Control (APC) framework. A first interface receives operational state data of a processing tool related to the manufacture of a processing piece. The state data is sent from the first interface to a fault detection unit. A fault detection unit determines if a fault condition exists with the processing tool based upon the state data. A predetermined action is performed on the processing tool in response to the presence of a fault condition. In accordance with one embodiment, the predetermined action is to shutdown the processing tool so as to prevent further production of faulty wafers.
摘要:
The present invention provides for a method and an apparatus for fault model analysis in manufacturing tools. A sequence of semiconductor devices is processed through a manufacturing process. Production data resulting from the processing of the semiconductor devices is acquired. A fault model analysis is performed using the acquired production data.
摘要:
A method is provided, the method comprising preheating a rapid thermal processing chamber according to a preheating recipe and processing a first plurality of workpieces in the rapid thermal processing chamber. The method also comprises performing first parameter measurements on first and second workpieces of the first plurality of workpieces, the first parameter measurements indicative of first processing differences between the first and second workpieces, and forming a first output signal corresponding to the first parameter measurements. The method further comprises adjusting the preheating recipe based on the first output signal and using the adjusted preheating recipe to preheat the rapid thermal processing chamber for processing a second plurality of workpieces in the rapid thermal processing chamber to reduce second processing differences between first and second workpieces of the second plurality of workpieces.
摘要:
Methods of optimizing a preheat recipe for rapid thermal processing workpieces are provided. In one aspect, a method of manufacturing is provided that includes preheating a rapid thermal processing chamber according to a preheating recipe and processing a first plurality of workpieces in the rapid thermal processing chamber. Parameter measurements are performed on a first workpiece and a second workpiece of the first plurality of workpieces. The parameter measurements are indicative of processing differences between the first and second workpieces. An output signal is formed corresponding to the parameter measurements and a control signal based on the output signal is used to adjust the preheating recipe for preheating the rapid thermal processing chamber for processing a second plurality of workpieces in the rapid thermal processing chamber to reduce processing differences between first and second workpieces of the second plurality of workpieces.
摘要:
A method for identifying faulty wafers includes processing a set of wafers in a tool; collecting tool state information during the processing of the set of wafers; generating a tool state information baseline; comparing the tool state information for each wafer to the tool state information baseline to identify any wafers with outlying tool state information; and designating a particular wafer in the set as suspect in response to identifying outlying tool state information for the particular wafer. A processing line includes a tool adapted to process a set of wafers, and a process controller. The process controller is adapted to collect tool state information during the processing of the set of wafers, generate a tool state information baseline, compare the tool state information for each wafer to the baseline tool state information to identify any wafers with outlying tool state information, and designate a particular wafer in the set as suspect in response to identifying outlying tool state information for the particular wafer.
摘要:
A metbod for perforning a wafer-less qualification of a processing tool includes creating a wafer-less qualification model for the processing tool. Qualification data is generated from the processing tool iiiring a wafer-less qualification process. The qualification data is compared with the wafer-less qualification model. The processig tool is determined to be operating in a predefined state based on the comparison of the qualification data with the wafer-less qualification model.