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公开(公告)号：US07538877B2
公开(公告)日：2009-05-26
申请号：US11555417
申请日：2006-11-01
IPC分类号： G01J3/30
CPC分类号： G01J3/51 , G01J3/0235 , G01J3/32
摘要： The present invention relates to instruments used to analyze materials with light-absorbing properties and their methods of use. More specifically, the invention relates to the use of adjustable optical filters whereby light-absorption can be measured in more detail and with greater variables than what is currently known in the art.
摘要翻译： 本发明涉及用于分析具有光吸收特性的材料及其使用方法的仪器。 更具体地说，本发明涉及可调式光学滤光器的使用，其中光吸收可以比现有技术中已知的更详细和更大的变量来测量。
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公开(公告)号：US06744045B2
公开(公告)日：2004-06-01
申请号：US09971119
申请日：2001-10-04
IPC分类号： B01D5944
CPC分类号： H01J49/0022 , H01J49/0431
摘要： A portable mass spectrometer for underwater use includes a watertight case having an inlet and means for transforming an analyte gas molecule from a solution phase into a gas phase positioned within the case. Means for directing a fluid to the transforming means from the inlet and means for analyzing the gas-phase analyte molecule to determine an identity thereof are also positioned within the case.
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公开(公告)号：US06727498B2
公开(公告)日：2004-04-27
申请号：US09971116
申请日：2001-10-04
IPC分类号： B01D5944
CPC分类号： H01J49/0022 , H01J49/0431
摘要： A portable mass spectrometer for underwater use includes a watertight case having an inlet and means for transforming an analyte gas molecule from a solution phase into a gas phase positioned within the case. Means for directing a fluid to the transforming means from the inlet and means for analyzing the gas-phase analyte molecule to determine an identity thereof are also positioned within the case.
摘要翻译： 用于水下使用的便携式质谱仪包括具有入口的防水壳体和用于将分析物气体分子从溶液相转化到位于壳体内的气相的装置。 用于将流体从入口引导到变换装置和用于分析气相分析物分子以确定其身份的装置的装置也位于壳体内。
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公开(公告)号：US20160329202A1
公开(公告)日：2016-11-10
申请号：US15147204
申请日：2016-05-05
申请人： David P. Fries , William Abbott , Bo Yang
发明人： David P. Fries , William Abbott , Bo Yang
CPC分类号： H01J49/10 , G01N27/622 , H01J49/0431 , H01J49/16
摘要： The present disclosure describes embodiments directed to a bubble based ion source system comprising an ion source configured to generate a plurality of ions, a heat source positioned above the container, an ion channel comprising an aperture and a plurality of electrodes, and/or any other components. The ion source further comprises a container at least partially comprising a solvent or solution, a bubble generator coupled to the container configured to generate a plurality of bubbles within the solvent, and/or any other component. The heat source can be configured to evaporate at least a portion of the solvent from each of the bubbles leaving a plurality of ions.
摘要翻译： 本公开描述了涉及基于气泡的离子源系统的实施例，其包括被配置为产生多个离子的离子源，位于容器上方的热源，包括孔和多个电极的离子通道，和/或任何其它 组件。 离子源还包括至少部分地包含溶剂或溶液的容器，耦合到容器的气泡发生器，其被配置成在溶剂内产生多个气泡，和/或任何其它组分。 热源可以被配置为从离开多个离子的每个气泡蒸发至少一部分溶剂。
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5.发明授权公开(公告)号：US07622239B2
公开(公告)日：2009-11-24
申请号：US11539987
申请日：2006-10-10
申请人： Xiaoling Ding , David P. Fries
发明人： Xiaoling Ding , David P. Fries
IPC分类号： G03F7/00
CPC分类号： G03F7/0043 , G03F7/405
摘要： A method for making a patterned SiO2 films over TiO2 (Si02/Ti02) under ambient atmospheric conditions, including room temperature, through photo and chemical reactions. The method is simple, convenient and can be performed in a short period of time, typically less than two hours. The patterned TiO2 film is fabricated through photo-irradiation of a photosensitive organic-titanium film using a mask. Silica particles are generated from silicate solution by adjusting pH values to 10 to 8 with hydrochloric acid. The pre-deposited TiO2 film has a strong attraction for the SiO2 particles, leading to the instant formation of SiO2 film over the TiO2 film. The silica films are also amino-silylated with 3-aminopropyltriethoxysilane toward applications such as patternable, location-specific silica-based separation and purification.
摘要翻译： 通过光化学反应在环境大气条件下（包括室温）在TiO 2（SiO 2 / TiO 2）上制备图案化的SiO 2膜的方法。 该方法简单，方便，可在短时间内进行，通常少于两小时。 通过使用掩模通过光敏有机钛膜的光照射来制造图案化的TiO 2膜。 通过用盐酸将pH值调节至10至8，由硅酸盐溶液产生二氧化硅颗粒。 预沉积的TiO 2膜对SiO 2颗粒具有很强的吸引力，导致TiO 2膜上立即形成SiO 2膜。 二氧化硅膜也用3-氨基丙基三乙氧基硅烷进行氨基甲硅烷基化，以应用于可图案化的位置特异性二氧化硅基分离和纯化。
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公开(公告)号：US07468238B2
公开(公告)日：2008-12-23
申请号：US11297695
申请日：2005-12-08
申请人： David P. Fries
发明人： David P. Fries
IPC分类号： G03F7/20
CPC分类号： G03F7/2002 , G03F7/2043 , G03F7/70291
摘要： The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects using photoreactive chemicals. In an embodiment, the patterned light generator uses a micromirror array to direct pattern light on a target object. In an alternate embodiment, the patterned light generator uses a plasma display device to generate and direct patterned light onto a target object. Specifically, the invention provides a maskless photolithography system and method for creating molecular imprinted array devices, integrated microsensors and fluidic networks on a substrate, integrated circuits of conducting polymers, and patterns on substrates using photochemical vapor deposition. For creating molecular imprinted array devices, the invention provides a system and method for applying a photoreactive reagent comprising photopolymer receptors and extractable target compounds, exposing the substrate to patterned light to activate the photopolymer to form molecular imprints of the target compounds corresponding to the pattern of incident light. For creating integrated circuits of conducting polymers, the invention provides a system and method for applying a photoreactive conducting polymer reagent to a substrate, exposing the substrate to patterned light to activate the photoreactive conducting polymer reagent to form integrated circuits corresponding to the circuit pattern of incident light. In an embodiment the substrate is a photoreactive conductive polymer. For creating integrated microsensors and fluidic networks on a substrate, the invention provides a system and method for applying a photoreactive sensor creating compound and a photoreactive fluid channel creating compound to a substrate, exposing the substrate to patterned light to activate the photoreactive compounds to form microsensor arrays and fluidic networks corresponding to the pattern of incident light. For creating patterns on substrates using photochemical vapor deposition, the invention provides a system and method for exposing a substrate to photoreactive gases and patterned light to deposit chemicals on the substrate corresponding to the pattern of incident light.
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公开(公告)号：US06633233B1
公开(公告)日：2003-10-14
申请号：US09715339
申请日：2000-11-17
申请人： David P. Fries
发明人： David P. Fries
IPC分类号： G08B2100
CPC分类号： G01D5/145 , G01D5/2451 , G01P13/00 , G01P15/105 , G11B5/40
摘要： Each embodiment (10, 110 and 210) includes a magnetic element (12, 112 and 212) producing a magnetic field. In the first embodiment (10) of FIG. 1, the magnetic element (12) comprises a magnetic bit strip disposed extending in a circular arc on a fixed or stationary plate (14). In the second embodiment (110) of FIG. 2, the magnetic element (112) comprises a magnetic bit strip supported on a movable bar or rod (114). In the third embodiment (210) of FIG. 3, the magnetic element (212) comprises a magnetic bit strip disposed in a rectilinear path on a stationary plate (214). An electrical resistor (16, 116 and 216) is included for changing in electrical resistance in response to changes in the magnetic field produced by the magnetic element (12, 112 and 212). The resistor (16, 116 and 216) comprises a giant magnetoresistive sensor. A voltage sensor (18, 118 and 218) is included for sensing the voltage across the electrical resistor (16, 116 and 216), the sensors (18, 118 and 218) being connected to the resistors (16, 116 and 216) by electrical lead wires.
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公开(公告)号：US07674581B1
公开(公告)日：2010-03-09
申请号：US11161103
申请日：2005-07-22
申请人： David P. Fries , John H. Paul , Andrew Farmer , Matthew Smith
发明人： David P. Fries , John H. Paul , Andrew Farmer , Matthew Smith
CPC分类号： G01N1/02 , G01N35/00 , G01N35/00009 , G01N35/00069 , G01N2035/00881
摘要： An autonomous genosensor apparatus and methods for use are provided for the field detection and analysis of ambient chemical, biochemical, biologic, biogenetic, and radiologic materials under field conditions in fluid or gaseous environments, such as marine or aquatic environments or industrial processes. Autonomous genosensors provide integral, self contained units which automatically extract environmental samples, prepare those samples for analytical studies, analyze those samples using studies such as DNA or biomarker analysis, and store or transmit the data produced to a remote computer or computer network. Autonomous genosensors may be used as freestanding units, or may be networked and controlled through a remote computer network.
摘要翻译： 提供了一种自主的传感器装置和使用方法，用于在流体或气体环境（如海洋或水生环境或工业过程）的现场条件下对环境化学，生化，生物，生物和放射性材料的现场检测和分析。 自主基因传感器提供一体化的自包含单元，可自动提取环境样品，准备样品进行分析研究，使用DNA或生物标志物分析等研究分析样品，并将产生的数据存储或传输到远程计算机或计算机网络。 自主基因传感器可以用作独立单元，或者可以通过远程计算机网络联网和控制。
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公开(公告)号：US07572573B2
公开(公告)日：2009-08-11
申请号：US11343594
申请日：2006-01-30
申请人： David P. Fries
发明人： David P. Fries
IPC分类号： C25D5/02
CPC分类号： G03F7/0041 , G03F7/2002 , G03F7/2043 , G03F7/2051 , G03F7/70291 , G03F7/70341 , Y10T428/31678
摘要： The present invention relates to maskless photolithography using a patterned light generator for creating 2-D and 3-D patterns on objects using etching and deposition techniques. In an embodiment, the patterned light generator uses a micromirror array to direct pattern light on a target object. In an alternate embodiment, the patterned light generator uses a plasma display device to generate and direct patterned light onto a target object. Specifically, the invention provides a maskless photolithography system and method for photo stimulated etching of objects in a liquid solution, patterning glass, and photoselective metal deposition. For photo stimulated etching of objects in a liquid solution, the invention provides a system and method for immersing a substrate in an etchant solution, exposing the immersed substrate to patterned light, and etching the substrate according to the pattern of incident light. For patterning photoreactive glass, the invention provides a system and method for exposing photosensitive or photochromic glass, and washing the target glass with rinse and acid etchant solutions. For photoselective metal deposition, the invention provides a system and method for coating and rinsing a substrate prior to exposure exposing the substrate to a patterned light generator to activate areas corresponding to the incident light pattern, and plating the substrate in the area activated by the light after exposure. By providing a maskless pattern generator, the invention advantageously eliminates the problems associated with using masks for photo stimulated etching, patterning glass, and photoselective metal deposition.
摘要翻译： 本发明涉及使用图案化光发生器的无掩模光刻，用于使用蚀刻和沉积技术在物体上产生2-D和3-D图案。 在一个实施例中，图案化发光器使用微镜阵列来将图案光引导到目标对象上。 在替代实施例中，图案化发光器使用等离子体显示装置来产生并将图案光引导到目标物体上。 具体地说，本发明提供了一种无液晶光刻系统和方法，用于对液体溶液中的物体进行光刺激蚀刻，图案化玻璃和光电金属沉积。 对于液体溶液中的物体的光刺激蚀刻，本发明提供了一种用于将衬底浸入蚀刻剂溶液中的系统和方法，将浸没的衬底暴露于图案化的光，并根据入射光的图案蚀刻衬底。 为了图案化光反应玻璃，本发明提供一种用于曝光光敏或光致变色玻璃的系统和方法，并用冲洗和酸蚀刻剂溶液洗涤目标玻璃。 对于光电金属沉积，本发明提供了一种用于在曝光之前涂覆和冲洗衬底的系统和方法，将衬底暴露于图案化光发生器以激活对应于入射光图案的区域，以及将衬底镀在由光激活的区域中 曝光后 通过提供无掩模图案发生器，本发明有利地消除了与使用用于光刺激蚀刻，图案化玻璃和光电金属沉积的掩模相关的问题。
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10.发明授权Method for etching microchannel networks within liquid crystal polymer substrates 有权在液晶聚合物基板内蚀刻微通道网络的方法公开(公告)号：US07425276B2
公开(公告)日：2008-09-16
申请号：US11160613
申请日：2005-06-30
CPC分类号： B81B1/00 , B01L3/5027 , B81B2203/0323 , B81C1/00071 , G02B6/136 , H05K3/002 , H05K3/107 , H05K2201/0141 , H05K2201/09036 , H05K2203/0554
摘要： The present invention provides for a method for the fabrication of microchannels, and more particularly to the fabrication of microchannels for use in Microelectromechanical (MEMS) devices and MEMS related devices. In accordance with an embodiment of the present invention, microchannels are formed by a microfabrication method utilizing electronic imaging techniques in combination with chemical etching and subsequent metallization. The method of the present invention is effective in producing networks of channels in liquid crystal polymer (LCP) polymeric substrates which are highly defined in terms of their patterns, and thus are able to encompass a wide variety of end uses.
摘要翻译： 本发明提供了用于制造微通道的方法，更具体地说，涉及用于微机电（MEMS）器件和MEMS相关器件的微通道的制造。 根据本发明的实施例，通过利用电子成像技术与化学蚀刻和随后的金属化组合的微细加工方法形成微通道。 本发明的方法在生产液晶聚合物（LCP）聚合物基质中的通道网络方面是有效的，其在其图案方面被高度限定，因此能够涵盖各种各样的最终用途。
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