-
公开(公告)号：US08925186B2
公开(公告)日：2015-01-06
申请号：US13520674
申请日：2011-01-06
申请人： Erwin John Van Zwet , Léon Van Dooren , Adrianus Johannes Petrus Maria Vermeer , Kees Moddemeijer
发明人： Erwin John Van Zwet , Léon Van Dooren , Adrianus Johannes Petrus Maria Vermeer , Kees Moddemeijer
IPC分类号： B23P19/00 , B25J9/16 , G05B19/401 , H01L21/68
CPC分类号： B25J9/1697 , G05B19/401 , G05B2219/40609 , G05B2219/45029 , H01L21/681 , Y10T29/53087 , Y10T29/53091 , Y10T29/53174 , Y10T29/53178
摘要： According to an aspect of the invention, there is provided a chip die 2 manipulator apparatus arranged for picking and placing of a chip die 2 in a chip manufacturing process, wherein an imaging system 11 comprising an arc form convex spherical mirror 13 arranged at a second off-axis position B and centered relative to the center position 5; a folding mirror 4 arranged in a light path between the convex spherical mirror 13 and the center position 5 for folding the light path to a third off-axis position C; and an arc form concave spherical mirror 15 arranged at the third off-axis position C having a curvature to image from at least one of the center position 5 and the component 2 on the image detection system 9. The imaging system 11 corrects for the angled image detection of the center position 5.
摘要翻译： 根据本发明的一个方面，提供了一种在芯片制造过程中设置用于拾取和放置芯片芯片2的芯片芯片2的机械手装置，其中，成像系统11包括设置在第二个处的弧形凸球面镜13 离轴位置B并相对于中心位置5居中; 折叠镜4，布置在凸球面镜13和中心位置5之间的光路中，用于将光路折叠到第三离轴位置C; 以及布置在第三离轴位置C处的弧形凹球面镜15，其具有从图像检测系统9上的中心位置5和部件2中的至少一个成像的曲率。成像系统11校正成角度 图像检测中心位置5。
-
公开(公告)号：US20130004269A1
公开(公告)日：2013-01-03
申请号：US13520674
申请日：2011-01-06
申请人： Erwin John Van Zwet , Léon Van Dooren , Adrianus Johannes Petrus Maria Vermeer , Kees Moddemeijer
发明人： Erwin John Van Zwet , Léon Van Dooren , Adrianus Johannes Petrus Maria Vermeer , Kees Moddemeijer
CPC分类号： B25J9/1697 , G05B19/401 , G05B2219/40609 , G05B2219/45029 , H01L21/681 , Y10T29/53087 , Y10T29/53091 , Y10T29/53174 , Y10T29/53178
摘要： According to an aspect of the invention, there is provided a chip die 2 manipulator apparatus arranged for picking and placing of a chip die 2 in a chip manufacturing process, wherein an imaging system 11 comprising an arc form convex spherical mirror 13 arranged at a second off-axis position B and centered relative to the centre position 5; a folding mirror 4 arranged in a light path between the convex spherical mirror 13 and the centre position 5 for folding the light path to a third off-axis position C; and an arc form concave spherical mirror 15 arranged at the third off-axis position C having a curvature to image from at least one of the centre position 5 and the component 2 on the image detection system 9. The imaging system 11 corrects for the angled image detection of the centre position 5.
摘要翻译： 根据本发明的一个方面，提供了一种在芯片制造过程中设置用于拾取和放置芯片芯片2的芯片芯片2的机械手装置，其中，成像系统11包括设置在第二个处的弧形凸球面镜13 离轴位置B并相对于中心位置5居中; 折叠镜4，布置在凸球面镜13和中心位置5之间的光路中，用于将光路折叠到第三离轴位置C; 以及布置在第三离轴位置C处的弧形凹球面镜15，其具有从图像检测系统9上的中心位置5和部件2中的至少一个成像的曲率。成像系统11校正成角度 图像检测中心位置5。
-
公开(公告)号：US20130043212A1
公开(公告)日：2013-02-21
申请号：US13579429
申请日：2011-02-17
申请人： Ariël De Graaf , Erwin John Van Zwet , Paulus Willibrordus George Poodt , Adrianus Johannes Petrus Maria Vermeer
发明人： Ariël De Graaf , Erwin John Van Zwet , Paulus Willibrordus George Poodt , Adrianus Johannes Petrus Maria Vermeer
CPC分类号： C23C16/45551 , C23C16/04 , C23C16/545
摘要： A method of manufacturing a substrate with a patterned layer of deposited material, the patterned layer being deposited from a processing head, the method comprising applying bearing gas from the processing head to keep the processing head hovering over the substrate on a gas bearing; moving the substrate and the hovering processing head relative to each other; applying a primer material for selective deposition of a deposition material to the substrate, the primer material being applied from a first area of a surface of the processing head that faces the substrate, and spatially patterning the primer on the substrate after or during application; applying the deposition material to the substrate from a second area of the surface of the processing head that faces the substrate, the second area lying downstream of the first area in a direction of the movement of the substrate relative to the processing head.
摘要翻译： 一种制造具有沉积材料的图案化层的衬底的方法，所述图案化层从处理头沉积，所述方法包括从处理头施加轴承气体以将处理头保持在气体轴承上的衬底上; 相对于彼此移动基板和悬停处理头; 施加用于选择性沉积沉积材料的底漆材料到基材上，底漆材料从加工头表面的面向基材的第一区域施加，并在涂布之后或施涂期间在基材上进行空间图案化; 将所述沉积材料从所述处理头的面向所述衬底的表面的第二区域施加到所述衬底，所述第二区域在所述衬底相对于所述处理头的运动方向上位于所述第一区域的下游。
-
公开(公告)号：US09416449B2
公开(公告)日：2016-08-16
申请号：US13579429
申请日：2011-02-17
申请人： Ariël De Graaf , Erwin John Van Zwet , Paulus Willibrordus George Poodt , Adrianus Johannes Petrus Maria Vermeer
发明人： Ariël De Graaf , Erwin John Van Zwet , Paulus Willibrordus George Poodt , Adrianus Johannes Petrus Maria Vermeer
IPC分类号： C23C16/54 , C23C16/455 , C23C16/04
CPC分类号： C23C16/45551 , C23C16/04 , C23C16/545
摘要： A method of manufacturing a substrate with a patterned layer of deposited material, the patterned layer being deposited from a processing head, the method comprising applying bearing gas from the processing head to keep the processing head hovering over the substrate on a gas bearing; moving the substrate and the hovering processing head relative to each other; applying a primer material for selective deposition of a deposition material to the substrate, the primer material being applied from a first area of a surface of the processing head that faces the substrate, and spatially patterning the primer on the substrate after or during application; applying the deposition material to the substrate from a second area of the surface of the processing head that faces the substrate, the second area lying downstream of the first area in a direction of the movement of the substrate relative to the processing head.
摘要翻译： 一种制造具有沉积材料的图案化层的衬底的方法，所述图案化层从处理头沉积，所述方法包括从处理头施加轴承气体以将处理头保持在气体轴承上的衬底上; 相对于彼此移动基板和悬停处理头; 施加用于选择性沉积沉积材料的底漆材料到基材上，底漆材料从加工头表面的面向基材的第一区域施加，并在涂布之后或施涂期间在基材上进行空间图案化; 将所述沉积材料从所述处理头的面向所述衬底的表面的第二区域施加到所述衬底，所述第二区域在所述衬底相对于所述处理头的运动方向上位于所述第一区域的下游。
-
公开(公告)号：US09235140B2
公开(公告)日：2016-01-12
申请号：US13579539
申请日：2011-02-18
CPC分类号： G03F7/704 , G03F7/70275 , G03F7/70391
摘要： A lithographic apparatus having an optical column capable of projecting a beam on a target portion on a substrate held by the substrate support. The optical column may have a self-emissive contrast device to emit the beam. The optical column may include a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion.
摘要翻译： 一种光刻设备，其具有能够将基板支撑体保持的基板上的目标部分上的光束投射的光学列。 光学柱可以具有发射光束的自发射对比度装置。 光学柱可以包括将光束投影到目标部分上的投影系统。 目标部分具有基板的扫描方向的高度和主要垂直于扫描方向的切线宽度，其中基板沿扫描方向除以高度的扫描速度基本上对应于光学柱的转速或 其一部分除以目标部分的切线宽度。
-
公开(公告)号：US20120314194A1
公开(公告)日：2012-12-13
申请号：US13580361
申请日：2011-02-18
IPC分类号： G03B27/54
CPC分类号： G03F7/7085 , G03F7/70275 , G03F7/70366 , G03F7/70391 , G03F7/704 , G03F7/70516 , G03F7/70558
摘要： A lithographic apparatus having an optical column capable of creating a pattern on a target portion of the substrate. The optical column may be provided with a self-emissive contrast device configured to emit a beam and a projection system configured to project the beam onto the target portion. The apparatus may be provided with an actuator to move the optical column or a part thereof with respect to the substrate. An optical sensor device is provided which is movable in respect of the optical columns and has a range of movement which enables the optical sensor device to move through a projection area of each of the optical columns to measure a beam of each of the optical columns.
摘要翻译： 具有能够在基板的目标部分上形成图案的光学列的光刻设备。 光学柱可以设置有被配置为发射光束的自发射对比度装置和被配置为将光束投射到目标部分上的投影系统。 该装置可以设置有致动器，以相对于基板移动光学柱或其一部分。 提供了一种光学传感器装置，其可相对于光学柱移动，并且具有使光学传感器装置能够移动通过每个光学列的投影区域的运动范围，以测量每个光学柱的光束。
-
公开(公告)号：US20120307223A1
公开(公告)日：2012-12-06
申请号：US13579539
申请日：2011-02-18
IPC分类号： G03B27/54
CPC分类号： G03F7/704 , G03F7/70275 , G03F7/70391
摘要： A lithographic apparatus having an optical column capable of projecting a beam on a target portion on a substrate held by the substrate support. The optical column may have a self-emissive contrast device to emit the beam. The optical column may include a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion.
摘要翻译： 一种光刻设备，其具有能够将基板支撑体保持的基板上的目标部分上的光束投射的光学列。 光学柱可以具有发射光束的自发射对比度装置。 光学柱可以包括将光束投影到目标部分上的投影系统。 目标部分具有基板的扫描方向的高度和主要垂直于扫描方向的切线宽度，其中基板沿扫描方向除以高度的扫描速度基本上对应于光学柱的转速或 其一部分除以目标部分的切线宽度。
-
公开(公告)号：US09316926B2
公开(公告)日：2016-04-19
申请号：US13885960
申请日：2011-11-15
IPC分类号： G03F7/20
CPC分类号： G03F7/70641 , G03F7/70216 , G03F7/70258 , G03F7/70266 , G03F7/70275 , G03F7/70375 , G03F7/70383 , G03F7/70391 , G03F7/704
摘要： A system to control the focus of a mask-less lithographic apparatus, the apparatus including a projection system to project an image of a programmable patterning device onto a substrate. A first actuator system is configured to move at least one of the lenses of the projection system in a direction perpendicular to the optical axis of the projection system. A radiation beam expander is configured to project an image of the programmable patterning device onto the at least one lens. A second actuator system is configured to move the radiation beam expander in a direction parallel to the optical axis of the projection system in order to control the focus of the image projected onto the substrate.
摘要翻译： 一种用于控制无掩模光刻设备的焦点的系统，该设备包括将可编程图案形成装置的图像投影到基板上的投影系统。 第一致动器系统被配置为沿着垂直于投影系统的光轴的方向移动投影系统的透镜中的至少一个。 辐射束扩展器被配置为将可编程图案形成装置的图像投影到至少一个透镜上。 第二致动器系统被配置成沿着平行于投影系统的光轴的方向移动辐射束扩展器，以便控制投影到基板上的图像的焦点。
-
公开(公告)号：US08717535B2
公开(公告)日：2014-05-06
申请号：US12341081
申请日：2008-12-22
申请人： Huibert Visser , Martinus Hendricus Hendricus Hoeks , Borgert Kruizinga , Bob Streefkerk , Patricius Aloysius Jacobus Tinnemans , Erwin John Van Zwet , Roeland Nicolaas Maria Vanneer , Marcus Gerhardus Hendrikus Meijerink , Nicolaas Cornelis Johannes Van Der Valk , Har Van Himbergen
发明人： Huibert Visser , Martinus Hendricus Hendricus Hoeks , Borgert Kruizinga , Bob Streefkerk , Patricius Aloysius Jacobus Tinnemans , Erwin John Van Zwet , Roeland Nicolaas Maria Vanneer , Marcus Gerhardus Hendrikus Meijerink , Nicolaas Cornelis Johannes Van Der Valk , Har Van Himbergen
IPC分类号： G03B27/42
CPC分类号： G03F7/70291 , G03F7/70516
摘要： Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.
摘要翻译： 设备和方法用于校准光刻设备内的独立可控元件阵列。 校准单元可以在其中调制的辐射束通过投影系统的第一状态之间切换，以将经调制的辐射束投射到衬底上，以及第二状态，其中调制的辐射束的一部分通过校准 单元。 校准单元产生校准数据，或者替代地，基于调制的辐射束的检查更新校准数据。 阵列控制器使用校准数据向独立可控元件阵列的元件提供控制信号，其随后响应于控制信号被配置。
-
10.发明申请公开(公告)号：US20130242277A1
公开(公告)日：2013-09-19
申请号：US13885066
申请日：2011-12-02
IPC分类号： G03F7/20
CPC分类号： G03F7/70508 , G03F7/70291 , G03F7/70433 , G03F7/7055 , G03F7/70558
摘要： A system for controlling a patterning device in a lithographic apparatus using a patterning device having individually controllable elements that may only be set to two states. The method includes converting a representation of a pattern to be formed on the substrate into a plurality of area intensity signals, each corresponding to a radiation intensity level required to be set in a respective area of the patterning device in order to provide the desired pattern on the substrate and a separate step of converting each of the area intensity signals into control signals for a plurality of individually controllable elements that each correspond to the area of the patterning device.
摘要翻译： 一种用于使用具有单独可控元件的图案形成装置来控制光刻设备中的图案形成装置的系统，该单独可控元件仅可设置为两种状态。 该方法包括将要形成在衬底上的图案的表示转换为多个区域强度信号，每个区域强度信号对应于需要设置在图案形成装置的相应区域中的辐射强度水平，以便提供期望的图案 基板和单独的步骤，将每个区域强度信号转换成多个独立可控元件的控制信号，每个对应于图案形成装置的区域。
-
-
-
-
-
-
-
-
-
搜索结果
19 条记录 (耗时 0.035 秒)
