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1.发明授权Method for selecting sample positions on a substrate, method for providing a representation of a model of properties of a substrate, method of providing a representation of the variation of properties of a substrate across the substrate and device manufacturing method 有权用于选择衬底上的样品位置的方法，用于提供衬底的性质模型的表示的方法，提供衬底跨过衬底的性质变化的表示的方法和器件制造方法公开(公告)号：US08504333B2
公开(公告)日：2013-08-06
申请号：US12816723
申请日：2010-06-16
CPC分类号： G03F9/7003 , G03F7/705 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G06T7/0006 , G06T2207/10061 , G06T2207/30148
摘要： A method for selecting sample positions on a substrate from a set of all available sample positions is provided, in which a representation of a model, which may represent the variation of one or more properties across the substrate, is analyzed in order to identify the sample positions having the greatest effect on the model.
摘要翻译： 提供了一种从一组所有可用样本位置中选择衬底上的样本位置的方法，其中分析可以表示穿过衬底的一个或多个性质的变化的模型的表示，以便识别样品 对模型影响最大的职位。
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2.发明申请Method for Selecting Sample Positions on a Substrate, Method for Providing a Representation of a Model of Properties of a Substrate, Method of Providing a Representation of the Variation of Properties of a Substrate Across the Substrate and Device Manufacturing Method 有权用于选择基板上的样品位置的方法，提供基板特性模型的表示方法，提供基板的基板的特性变化的表示方法和器件制造方法公开(公告)号：US20110010000A1
公开(公告)日：2011-01-13
申请号：US12816723
申请日：2010-06-16
IPC分类号： G06F19/00
CPC分类号： G03F9/7003 , G03F7/705 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/70641 , G06T7/0006 , G06T2207/10061 , G06T2207/30148
摘要： A method for selecting sample positions on a substrate from a set of all available sample positions is provided, in which a representation of a model, which may represent the variation of one or more properties across the substrate, is analyzed in order to identify the sample positions having the greatest effect on the model.
摘要翻译： 提供了一种从一组所有可用样本位置中选择衬底上的样本位置的方法，其中分析可以表示穿过衬底的一个或多个性质的变化的模型的表示，以便识别样品 对模型影响最大的职位。
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公开(公告)号：US08706442B2
公开(公告)日：2014-04-22
申请号：US13000443
申请日：2009-07-03
申请人： Everhardus Cornelis Mos , Henricus Johannes Lambertus Megens , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
发明人： Everhardus Cornelis Mos , Henricus Johannes Lambertus Megens , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
CPC分类号： G03F9/7003 , G03F7/705 , G03F7/70633
摘要： A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.
摘要翻译： 光刻系统包括光刻设备，其包括投影系统，该投影系统将图案化的辐射束投影到基板的目标部分上;以及对准系统，该对准系统在衬底上的多个位置处测量衬底上的图案的特征的位置。 控制器将测量位置与值网格上的点进行比较，并基于栅格上对应的中间点的值来外推基板上的中间位置的值，以便提供基板上的中间位置及其相对位移的指示 到电网。 网格基于至少一个正交基函数，基板上的测量在对应于至少一个正交基函数的根值的位置处执行。
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公开(公告)号：US20110196646A1
公开(公告)日：2011-08-11
申请号：US13000443
申请日：2009-07-03
申请人： Everhardus Mos , Henricus Johannes Lamberttus Megens , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
发明人： Everhardus Mos , Henricus Johannes Lamberttus Megens , Maurits Van Der Schaar , Hubertus Johannes Gertrudus Simons , Scott Anderson Middlebrooks
CPC分类号： G03F9/7003 , G03F7/705 , G03F7/70633
摘要： A lithographic system includes a lithographic apparatus comprising a projection system which projects a patterned radiation beam onto a target portion of a substrate and an alignment system which measures the position of a feature of the pattern on the substrate at a number of locations over the substrate. A controller compares the measured positions with points on a grid of values and extrapolates values for intermediate positions on the substrate based on values of corresponding intermediate points on the grid, so as to provide an indication of the intermediate positions on the substrate and their displacements relative to the grid. The grid is based on at least one orthogonal basis function, the measurement on the substrate being performed at positions corresponding to the root values of the at least one orthogonal basis function.
摘要翻译： 光刻系统包括光刻设备，其包括投影系统，该投影系统将图案化的辐射束投影到基板的目标部分上;以及对准系统，该对准系统在衬底上的多个位置处测量衬底上的图案的特征的位置。 控制器将测量位置与值网格上的点进行比较，并基于栅格上对应的中间点的值来外推基板上的中间位置的值，以便提供基板上的中间位置及其相对位移的指示 到电网。 网格基于至少一个正交基函数，基板上的测量在对应于至少一个正交基函数的根值的位置处执行。
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公开(公告)号：US08612045B2
公开(公告)日：2013-12-17
申请号：US12633252
申请日：2009-12-08
申请人： Everhardus Cornelis Mos , Mircea Dusa , Jozef Maria Finders , Christianus Gerardus Maria De Mol , Scott Anderson Middlebrooks , Dongzi Wangli
发明人： Everhardus Cornelis Mos , Mircea Dusa , Jozef Maria Finders , Christianus Gerardus Maria De Mol , Scott Anderson Middlebrooks , Dongzi Wangli
摘要： Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.
摘要翻译： 记录双重图案化平版印刷工艺中的每个步骤中的变量，并测量双重图案化工艺中的中间特征的特征。 然后对最终特征进行建模，并优化变量的值。
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公开(公告)号：US09632430B2
公开(公告)日：2017-04-25
申请号：US13120495
申请日：2009-09-17
CPC分类号： G03F7/70625 , G03F7/70525
摘要： A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.
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7.发明申请公开(公告)号：US20110299050A1
公开(公告)日：2011-12-08
申请号：US13120495
申请日：2009-09-17
IPC分类号： G03B27/54
CPC分类号： G03F7/70625 , G03F7/70525
摘要： A lithographic system includes a lithographic apparatus and a scatterometer. In an embodiment, the lithographic apparatus includes an illumination optical system arranged to illuminate a pattern and a projection optical system arranged to project an image of the pattern on to a substrate. In an embodiment, the scatterometer includes a measurement system arranged to direct a beam of radiation onto a target pattern on said substrate and to obtain an image of a pupil plane representative of radiation scattered from the target pattern. A computational arrangement represents the pupil plane by moment functions calculated from a pair of orthogonal basis function and correlates the moment function to lithographic feature parameters to build a lithographic system identification. A control arrangement uses the system identification to control subsequent lithographic processes performed by the lithographic apparatus.
摘要翻译： 光刻系统包括光刻设备和散射仪。 在一个实施例中，光刻设备包括布置成照亮图案的照明光学系统和布置成将图案的图像投影到基板上的投影光学系统。 在一个实施例中，散射仪包括测量系统，其布置成将辐射束引导到所述基板上的目标图案上，并且获得代表从目标图案散射的辐射的光瞳平面的图像。 计算装置表示由一对正交基函数计算的瞳面平面，并将力矩函数与光刻特征参数相关联以构建光刻系统识别。 控制装置使用系统识别来控制由光刻设备执行的后续光刻处理。
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公开(公告)号：US20100161099A1
公开(公告)日：2010-06-24
申请号：US12633252
申请日：2009-12-08
申请人： Everhardus Cornelis Mos , Mircea Dusa , Jozef Maria Finders , Christianus Gerardus Maria De Mol , Scott Anderson Middlebrooks , Dongzi Wangli
发明人： Everhardus Cornelis Mos , Mircea Dusa , Jozef Maria Finders , Christianus Gerardus Maria De Mol , Scott Anderson Middlebrooks , Dongzi Wangli
摘要： Variables in each step in a double patterning lithographic process are recorded and characteristics of intermediate features in a double patterning process measured. The final feature is then modeled, and the values of the variables optimized.
摘要翻译： 记录双重图案化平版印刷工艺中的每个步骤中的变量，并测量双重图案化工艺中的中间特征的特征。 然后对最终特征进行建模，并优化变量的值。
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公开(公告)号：US20190035075A1
公开(公告)日：2019-01-31
申请号：US15660568
申请日：2017-07-26
IPC分类号： G06T7/00
CPC分类号： G06T7/0012 , G06T2200/04 , G06T2207/10081 , G06T2207/20081 , G06T2207/20084 , G06T2207/30064
摘要： The invention provides a method and device for creating a model for classifying a data point in imaging data representing measured intensities, the method comprising: training a model using a first labelled set of imaging data points; determining at least one first image part in the first labelled set which the model incorrectly classifies; generating second image parts similar to at least one image part; further training the model using the second image parts. Preferably the imaging data points and the second image parts comprise 3D data points.
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公开(公告)号：US20170018076A1
公开(公告)日：2017-01-19
申请号：US14797803
申请日：2015-07-13
CPC分类号： A61B6/502 , A61B6/032 , A61B6/481 , A61B6/5217 , G06K9/52 , G06K9/6262 , G06K9/6267 , G06K9/629 , G06K2009/4666 , G06K2209/05
摘要： The invention provides a method and apparatus for classifying a region of interest in imaging data, the method comprising: calculating a feature vector for at least one region of interest in the imaging data, said feature vector including features of a first modality; projecting the feature vector for the at least one region of interest in the imaging data using a decision function to generate a classification, wherein the decision function is based on classified feature vectors including features of a first modality and features of a second modality; estimating the confidence of the classification if the feature vector is enhanced with features of the second modality.
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