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    Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same
    3.
    发明申请
    Fluorine-Containing Sulfonic Acid Salts, Photo-Acid Generator And Resist Composition And Pattern Formation Method Utilizing Same 有权
    含氟磺酸盐，光酸发生剂和抗蚀剂组合物和图案形成方法

    公开(公告)号：US20130209938A1

    公开(公告)日：2013-08-15

    申请号：US13879989

    申请日：2011-10-14

    申请人： Ryozo Takihana ,  Satoru Narizuka

    发明人： Ryozo Takihana ,  Satoru Narizuka

    IPC分类号： G03F7/027

    CPC分类号： G03F7/027 ,  C07C303/32 ,  C07C309/06 ,  C07C309/10 ,  C07C309/12 ,  C07C309/16 ,  C07C309/19 ,  C07C381/12 ,  C07C2601/14 ,  C07C2603/74 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0382 ,  G03F7/0392 ,  G03F7/2041 ,  Y10S430/111 ,  Y10S430/122 ,  Y10S430/123

    摘要： A resist composition according to the present invention includes at least a base resin, a photoacid generator and a solvent, wherein the photoacid generator comprises a fluorine-containing sulfonic acid salt of the following general formula (4). In the formula, X independently represents a hydrogen atom or a fluorine atom; n represents an integer of 1 to 6; R1 represents a hydrogen atom, or an alkyl, alkenyl, oxoalkyl, aryl or aralkyl group; any of hydrogen atoms on carbons in R1 may be substituted with a substituent; R2 represents RAO or RBRCN; and A represents a divalent group. This fluorine-containing sulfonic acid salt can serve as a photoacid generator having high solubility in a resist solvent and thus can suitably be used for a resist composition such that the resist composition shows high resolution, wide DOF, small LER and high sensitivity to form a good pattern shape in lithographic processes.

    摘要翻译： 根据本发明的抗蚀剂组合物至少包括基础树脂，光致酸产生剂和溶剂，其中光酸产生剂包含以下通式（4）的含氟磺酸盐。 在该式中，X独立地表示氢原子或氟原子; n表示1〜6的整数， R1表示氢原子，或烷基，烯基，氧代烷基，芳基或芳烷基; R1中碳上的任何氢原子可以被取代基取代; R2代表RAO或RBRCN; A表示二价基团。 该含氟磺酸盐可以用作在抗蚀剂溶剂中具有高溶解度的光致酸产生剂，因此可以适当地用于抗蚀剂组合物，使得抗蚀剂组合物显示出高分辨率，宽DOF，小LER和高灵敏度以形成 光刻工艺中的良好图案形状。

    CLEAVABLE SURFACTANTS
    8.
    发明申请
    CLEAVABLE SURFACTANTS 有权
    可清洁的表面活性剂

    公开(公告)号：US20090095628A1

    公开(公告)日：2009-04-16

    申请号：US12249584

    申请日：2008-10-10

    申请人： Sergei Saveliev ,  Daniel Simpson ,  Keith V. Wood

    发明人： Sergei Saveliev ,  Daniel Simpson ,  Keith V. Wood

    IPC分类号： C07K1/26 ,  C07C309/64 ,  C07D307/02 ,  C07D317/10 ,  C07K1/14 ,  C12N9/96 ,  C12Q1/37 ,  C07K1/16

    CPC分类号： C11D1/20 ,  C07C309/10 ,  C07C309/14 ,  C07C309/15 ,  C07C309/16 ,  C07C323/12 ,  C07C329/06 ,  C07D307/40 ,  C07D307/56 ,  C07D317/22 ,  C07D333/16 ,  C11D1/143

    摘要： The invention provides surfactant compounds of formulas I-IX, which can be used in methods for aiding the solubilization, digestion, preparation, analysis, and/or characterization of biological material, for example, proteins or cell membranes. The compounds can also aid in the recovery of peptides generated during protein digestion, particularly for in-gel digestion protocol. Additionally, the compounds can improve enzymatic protein deglycosylation without interfering with downstream sample preparation steps and mass spectrometric analysis. The compounds can be specifically useful as digestion aids that can be decomposed by an acid, by heat, or a combination thereof. Decomposition of the surfactants allows for facile separation from isolated samples, and/or allows for analysis of the sample without interfering with the sensitivity of various analytical techniques.

    摘要翻译： 本发明提供式I-IX的表面活性剂化合物，其可用于帮助生物材料例如蛋白质或细胞膜的增溶，消化，制备，分析和/或表征的方法。 这些化合物还可以帮助回收在蛋白质消化过程中产生的肽，特别是对于凝胶内消化方案。 另外，这些化合物可以改善酶蛋白去糖基化而不干扰下游样品制备步骤和质谱分析。 这些化合物可以特别用作能够被酸，加热或其组合分解的消化助剂。 表面活性剂的分解允许从分离的样品中容易地分离，和/或允许分析样品而不干扰各种分析技术的灵敏度。