Photosensitive composition, color filter, pattern forming method, solid-state imaging device, and image display device

    公开(公告)号:US11009739B2

    公开(公告)日:2021-05-18

    申请号:US16137856

    申请日:2018-09-21

    Abstract: Provided are a photosensitive composition capable of forming a cured film having excellent adhesiveness and pattern forming properties, a color filter, a pattern forming method, a solid-state imaging device, and an image display device. The photosensitive composition includes a photopolymerization initiator I, a polymerizable monomer M having two or more groups having an ethylenically unsaturated double bond, and a halogenated zinc phthalocyanine, in which the polymerizable monomer M contains a polymerizable monomer M1 having three groups having an ethylenically unsaturated double bond, the photopolymerization initiator I contains a photopolymerization initiator I1 having a molar light absorption coefficient at a wavelength of 365 nm of 12,000 L·mol−1·cm−1 or more, and the ratio of the mass of the photopolymerization initiator I to the mass of the polymerizable monomer M is 0.15 or less in terms of the mass of the photopolymerization initiator I/the mass of the polymerizable monomer M.

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