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1.发明申请Method And Apparatus For Detecting The Endpoint Of A Chemical-Mechanical Polishing Operation 审中-公开用于检测化学机械抛光操作端点的方法和装置公开(公告)号：US20070105247A1
公开(公告)日：2007-05-10
申请号：US11608054
申请日：2006-12-07
申请人： Frank Mauersberger , Peter Beckage , Paul Besser , Frederick Hause , Errol Ryan , William Brennan , John Jacoponi
发明人： Frank Mauersberger , Peter Beckage , Paul Besser , Frederick Hause , Errol Ryan , William Brennan , John Jacoponi
CPC分类号： H01L21/76883 , B24B37/013 , H01L21/7684 , H01L22/26 , H01L23/544 , H01L2223/54453 , H01L2924/0002 , H01L2924/00
摘要： A structure in a semiconductor device useful in determining an endpoint in a chemical-mechanical polishing process is provided. The structure comprises a dielectric layer, an anti-reflective coating, and a metal layer. The dielectric layer has an opening extending therein. The anti-reflective coating extends over at least a portion of the first dielectric layer. The metal layer extends over at least a portion of the anti-reflective coating and within the opening. Thus, during the CMP process, the metal layer is removed, exposing the anti-reflective coating but leaving the metal layer in the opening to form a metal interconnect.
摘要翻译： 提供了可用于确定化学机械抛光工艺中的端点的半导体器件中的结构。 该结构包括电介质层，抗反射涂层和金属层。 电介质层具有在其中延伸的开口。 抗反射涂层在第一介电层的至少一部分上延伸。 金属层在抗反射涂层的至少一部分上并在开口内延伸。 因此，在CMP工艺期间，去除金属层，露出抗反射涂层，但将金属层留在开口中以形成金属互连。
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2.发明申请ELECTRONIC DEVICES WITH ULTRAVIOLET BLOCKING LAYERS AND PROCESSES OF FORMING THE SAME 有权具有超紫外线阻挡层的电子器件及其形成方法公开(公告)号：US20090159321A1
公开(公告)日：2009-06-25
申请号：US11962714
申请日：2007-12-21
CPC分类号： H01L21/76802 , H01L21/76807 , H01L21/76829 , H01L21/76834
摘要： An electronic device can include a conductive feature and an ultraviolet (“UV”) blocking layer overlying the conductive feature. The electronic device can also include an insulating layer overlying the UV blocking layer. The electronic device can further include a conductive structure extending into an opening within the insulating layer, wherein the conductive structure is electrically connected to the conductive feature. In one aspect, the UV blocking layer lies within 90 nm of the conductive structure. The insulating layer can be at least 4 times thicker than the UV blocking layer. In another aspect, a method can be used in forming the electronic device. In still a further aspect, a system can include the electronic device, a processor, and a display, wherein the processor is electrically coupled to the electronic device and the display.
摘要翻译： 电子设备可以包括导电特征和覆盖导电特征的紫外线（“UV”）阻挡层。 电子器件还可以包括覆盖在UV阻挡层上的绝缘层。 电子设备还可以包括延伸到绝缘层内的开口中的导电结构，其中导电结构电连接到导电特征。 在一个方面，UV阻挡层位于导电结构的90nm内。 绝缘层可以是至少比UV阻挡层厚4倍。 另一方面，一种方法可用于形成电子设备。 在另一方面，系统可以包括电子设备，处理器和显示器，其中处理器电耦合到电子设备和显示器。
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公开(公告)号：US20050003962A1
公开(公告)日：2005-01-06
申请号：US10899461
申请日：2004-07-26
申请人： William Brennan , Gary Rhoades , Paul Lawrence
发明人： William Brennan , Gary Rhoades , Paul Lawrence
CPC分类号： B32B27/36 , B32B27/08 , B32B27/20 , B32B27/308 , B32B2307/41 , B32B2425/00 , Y10T428/24802 , Y10T428/24942 , Y10T428/2495 , Y10T428/31855
摘要： A multilayer card has (i) an opaque polyester film substrate (1) containing 0.2 to 30% by weight, relative to the total weight of the substrate, of at least one copolyesterether, (ii) an ink-receptive layer (2) on at least one surface of the substrate, and (iii) a cover layer (4) on the surface of the ink-receptive layer and/or surface of the substrate. The presence of the copolyesterether in the substrate reduces the tendency of the card to delaminate in use. Suitable for use, inter alia, in identification, magnetic, credit, pre-paid and smart cards.
摘要翻译： 多层卡具有（i）不透明的聚酯薄膜基材（1），其相对于基材的总重量含有0.2至30重量％的至少一种共聚内酯，（ii）在...上的油墨接受层（2） 衬底的至少一个表面，和（iii）在所述油墨接受层和/或所述衬底的表面上的覆盖层（4）。 底物中共聚酯的存在降低了卡在使用中分层的倾向。 适用于识别，磁性，信用，预付费和智能卡等。
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公开(公告)号：US20070151086A1
公开(公告)日：2007-07-05
申请号：US11323518
申请日：2005-12-29
申请人： Joseph Hayes , Carl Schartner , William Brennan
发明人： Joseph Hayes , Carl Schartner , William Brennan
IPC分类号： B23Q17/00
CPC分类号： G01M13/005 , Y10T29/49771 , Y10T29/49776
摘要： The present invention is for a method of testing a seal on a collapsible tube dispensing orifice during the manufacturing process. Air pressure is applied on one side of the seal, and the pressure is monitored on the other side of the seal, for any increase in pressure which would indicate a leak in the seal.
摘要翻译： 本发明是用于在制造过程中测试可折叠管分配孔口上的密封件的方法。 在密封件的一侧上施加空气压力，并且在密封件的另一侧上监视压力，以防止任何增加的压力，这将表示密封件中的泄漏。
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公开(公告)号：US20050050671A1
公开(公告)日：2005-03-10
申请号：US10710791
申请日：2004-08-03
申请人： William Brennan , Kenneth Lee , Kenneth Lenkiewicz
发明人： William Brennan , Kenneth Lee , Kenneth Lenkiewicz
CPC分类号： A47L11/34 , A47L11/4008 , A47L11/4013 , A47L11/4044 , A47L11/4075 , A47L11/4083 , A47L11/4088
摘要： An upright deep cleaner includes a base housing pivotally connected to an upright handle, wherein the base housing supports a recovery tank. A working air path that flows through the recovery tank is exhausted through a vent that is directed away from the surface to be cleaned. Air drawn into a motor and impeller assembly to cool the motor is also ducted away from the surface to be cleaned.
摘要翻译： 立式深度清洁器包括枢转地连接到直立手柄的基座壳体，其中基座壳体支撑回收罐。 流过回收罐的工作空气通道通过远离待清洁表面的排气口排出。 吸入马达和叶轮组件以冷却马达的空气也被导管远离待清洁的表面。
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公开(公告)号：US08643083B2
公开(公告)日：2014-02-04
申请号：US13465600
申请日：2012-05-07
IPC分类号： H01L29/792 , H01L23/48 , H01L23/52 , H01L29/40
CPC分类号： H01L21/76802 , H01L21/76807 , H01L21/76829 , H01L21/76834
摘要： Devices and systems for insulating integrated circuits from ultraviolet (“UV”) light are described. The device includes a conductive feature, a first and second UV blocking layer, a first and second insulating laver, and a conductive structure. The first insulating layer overlays the first UV blocking layer. A via opening extends through the first insulating layer and the first UV blocking layer. The second UV blocking layer overlays the first insulating laver. The second insulating layer overlays the second UV blocking layer. An interconnect trench is defined in the second insulating layer and second UV blocking layer. The conductive structure is electrically connected to the conductive feature and extends into the via opening and along the interconnect trench.
摘要翻译： 描述了用于从紫外（“UV”）光隔离集成电路的装置和系统。 该器件包括导电特征，第一和第二UV阻挡层，第一和第二绝缘紫菜和导电结构。 第一绝缘层覆盖第一UV阻挡层。 通孔开口延伸穿过第一绝缘层和第一UV阻挡层。 第二UV阻挡层覆盖第一绝缘紫菜。 第二绝缘层覆盖第二UV阻挡层。 在第二绝缘层和第二UV阻挡层中限定互连沟槽。 导电结构电连接到导电特征并延伸到通孔开口并沿着互连沟槽。
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7.发明申请ELECTRONIC DEVICES WITH ULTRAVIOLET BLOCKING LAYERS AND PROCESSES OF FORMING THE SAME 有权具有超紫外线阻挡层的电子器件及其形成方法公开(公告)号：US20120218700A1
公开(公告)日：2012-08-30
申请号：US13465600
申请日：2012-05-07
CPC分类号： H01L21/76802 , H01L21/76807 , H01L21/76829 , H01L21/76834
摘要： An electronic device can include a conductive feature and an ultraviolet (“UV”) blocking layer overlying the conductive feature. The electronic device can also include an insulating layer overlying the UV blocking layer. The electronic device can further include a conductive structure extending into an opening within the insulating layer, wherein the conductive structure is electrically connected to the conductive feature. In one aspect, the UV blocking layer lies within 90 nm of the conductive structure. The insulating layer can be at least 4 times thicker than the UV blocking layer. In another aspect, a method can be used in forming the electronic device. In still a further aspect, a system can include the electronic device, a processor, and a display, wherein the processor is electrically coupled to the electronic device and the display.
摘要翻译： 电子设备可以包括导电特征和覆盖导电特征的紫外线（“UV”）阻挡层。 电子器件还可以包括覆盖在UV阻挡层上的绝缘层。 电子设备还可以包括延伸到绝缘层内的开口中的导电结构，其中导电结构电连接到导电特征。 在一个方面，UV阻挡层位于导电结构的90nm内。 绝缘层可以是至少比UV阻挡层厚4倍。 另一方面，一种方法可用于形成电子设备。 在另一方面，系统可以包括电子设备，处理器和显示器，其中处理器电耦合到电子设备和显示器。
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公开(公告)号：US20070202733A1
公开(公告)日：2007-08-30
申请号：US11364764
申请日：2006-02-28
申请人： Timothy Rose , Russell Hum , William Brennan
发明人： Timothy Rose , Russell Hum , William Brennan
IPC分类号： H01R13/627
CPC分类号： H01R13/6215 , H01R13/5224
摘要： A cable fastener is disclosed. The cable fastener includes a first portion and a second portion. A set of threads is disposed at a first end of the first portion, and a knurl is disposed at a second end of the first portion. The second portion includes an interface region disposed within a first end and a tool interface disposed upon a second end. The interface region is disposed in intimate connection upon the knurl, and the first and second portion are configured to transmit at least 12 in-lbs across the interface region and knurl without relative motion.
摘要翻译： 公开了一种电缆紧固件。 电缆紧固件包括第一部分和第二部分。 一组螺纹设置在第一部分的第一端，并且滚花设置在第一部分的第二端。 第二部分包括设置在第一端内的界面区域和设置在第二端上的工具界面。 界面区域在滚花上紧密地连接设置，并且第一和第二部分被构造成跨越界面区域传递至少12英寸，而不会相对运动地滚动。
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公开(公告)号：US20050055093A1
公开(公告)日：2005-03-10
申请号：US10931899
申请日：2004-09-01
申请人： William Brennan
发明人： William Brennan
IPC分类号： A61F2/12
CPC分类号： A61F2/12
摘要： A system for breast augmentation includes a plurality of microballoons. An injector can be provided for injecting microballoons into a breast through an incision in the breast. The microballoons can have a first dimension when in the injector and a second, larger dimension when in the breast. An injector and tissue dissector are also disclosed. The microballoons can also include a filling structure to permit the microballoons to be filled after insertion into the breast. A method for performing breast augmentation surgery and microballoons for use in the method are also disclosed.
摘要翻译： 用于隆胸的系统包括多个微球。 可以提供注射器，用于通过乳房中的切口将微球注入乳房。 当在注射器中时，微球可具有第一尺寸，而在乳房中可具有第二尺寸。 还公开了一种注射器和组织解剖器。 微球还可以包括填充结构，以允许在插入乳房之后填充微球。 还公开了一种用于执行隆胸术和用于该方法的微球的方法。
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公开(公告)号：US08171627B2
公开(公告)日：2012-05-08
申请号：US11962714
申请日：2007-12-21
IPC分类号： H05K3/02
CPC分类号： H01L21/76802 , H01L21/76807 , H01L21/76829 , H01L21/76834
摘要： A process of forming an electronic device including forming a first ultraviolet (“UV”) blocking layer over a conductive feature, wherein the first UV blocking layer lies within 90 nm of the conductive structure; forming a first insulating layer over the first UV blocking layer; and patterning the first insulating layer and the first UV blocking layer to form a first opening extending to the conductive feature, wherein during the process, the first UV blocking layer is exposed to UV radiation.
摘要翻译： 一种形成电子器件的方法，包括在导电特征上形成第一紫外线（“UV”）阻挡层，其中第一UV阻挡层位于导电结构的90nm范围内; 在所述第一UV阻挡层上形成第一绝缘层; 以及图案化所述第一绝缘层和所述第一UV阻挡层以形成延伸到所述导电特征的第一开口，其中在所述工艺期间，所述第一UV阻挡层暴露于UV辐射。
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