Technique for manufacturing bit patterned media
    1.
    发明授权
    Technique for manufacturing bit patterned media 有权
    技术制造位图案媒体

    公开(公告)号:US09093104B2

    公开(公告)日:2015-07-28

    申请号:US13342762

    申请日:2012-01-03

    IPC分类号: B44C1/22 G11B5/855

    CPC分类号: G11B5/855

    摘要: A novel technique for manufacturing bit patterned media is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for manufacturing bit pattern media. The technique, which may be realized as a method comprising: forming a non-catalysis region on a first portion of a catalysis layer; forming a non-magnetic separator on the non-catalysis region; and forming a magnetic active region on a second portion of the catalysis layer adjacent to the first portion of the catalysis layer.

    摘要翻译: 公开了一种用于制造位图案化介质的新型技术。 在一个特定的示例性实施例中,该技术可以被实现为用于制造钻头图案介质的方法。 该技术可以被实现为一种方法,包括:在催化层的第一部分上形成非催化区; 在非催化区上形成非磁性分离器; 以及在催化层的与催化层的第一部分相邻的第二部分上形成磁性活性区域。

    TECHNIQUE FOR MANUFACTURING BIT PATTERNED MEDIA
    2.
    发明申请
    TECHNIQUE FOR MANUFACTURING BIT PATTERNED MEDIA 有权
    制造位图形图的技术

    公开(公告)号:US20120175342A1

    公开(公告)日:2012-07-12

    申请号:US13342762

    申请日:2012-01-03

    IPC分类号: C23F1/00 B05D5/12

    CPC分类号: G11B5/855

    摘要: A novel, technique: for manufacturing bit patterned media is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for manufacturing hit pattern media. The technique, which may be realized as a method comprising: forming a non-catalysis region on a first portion of a catalysis layer; forming a non-magnetic separator on the non-catalysis region; and forming a magnetic active region on it second portion of the catalysis layer adjacent to the first portion of the catalysis layer.

    摘要翻译: 公开了一种新颖的技术:用于制造位图案的介质。 在一个特定的示例性实施例中,该技术可以被实现为用于制造命中图案媒体的方法。 该技术可以被实现为一种方法,包括:在催化层的第一部分上形成非催化区; 在非催化区上形成非磁性分离器; 以及在催化层的与催化层的第一部分相邻的第二部分上形成磁性活性区域。

    Mask system and method of patterning magnetic media
    4.
    发明授权
    Mask system and method of patterning magnetic media 失效
    磁性介质的掩模系统和方法

    公开(公告)号:US08679356B2

    公开(公告)日:2014-03-25

    申请号:US13111657

    申请日:2011-05-19

    IPC分类号: B44C1/22

    CPC分类号: G11B5/855

    摘要: A method of patterning a substrate, comprises patterning a photoresist layer disposed on the substrate using imprint lithography and etching exposed portions of a hard mask layer disposed between the patterned photoresist layer and the substrate. The method may also comprise implanting ions into a magnetic layer in the substrate while the etched hard mask layer is disposed thereon.

    摘要翻译: 图案化衬底的方法包括使用压印光刻图案化设置在衬底上的光致抗蚀剂层,并蚀刻设置在图案化的光致抗蚀剂层和衬底之间的硬掩模层的暴露部分。 该方法还可以包括将离子注入到衬底中的磁性层中,同时将蚀刻的硬掩模层设置在其上。

    MASK SYSTEM AND METHOD OF PATTERNING MAGNETIC MEDIA
    5.
    发明申请
    MASK SYSTEM AND METHOD OF PATTERNING MAGNETIC MEDIA 失效
    掩蔽系统和磁场介质的方法

    公开(公告)号:US20120292285A1

    公开(公告)日:2012-11-22

    申请号:US13111657

    申请日:2011-05-19

    IPC分类号: G11B5/84 C23C14/48 C23C14/04

    CPC分类号: G11B5/855

    摘要: A method of patterning a substrate, comprises patterning a photoresist layer disposed on the substrate using imprint lithography and etching exposed portions of a hard mask layer disposed between the patterned photoresist layer and the substrate. The method may also comprise implanting ions into a magnetic layer in the substrate while the etched hard mask layer is disposed thereon.

    摘要翻译: 图案化衬底的方法包括使用压印光刻图案化设置在衬底上的光致抗蚀剂层,并蚀刻设置在图案化的光致抗蚀剂层和衬底之间的硬掩模层的暴露部分。 该方法还可以包括将离子注入到衬底中的磁性层中,同时将蚀刻的硬掩模层设置在其上。

    MASK APPLIED TO A WORKPIECE
    8.
    发明申请
    MASK APPLIED TO A WORKPIECE 失效
    MASK应用于工作

    公开(公告)号:US20100184243A1

    公开(公告)日:2010-07-22

    申请号:US12689605

    申请日:2010-01-19

    摘要: A method of fabricating a workpiece is disclosed. A material defining apertures is applied to a workpiece. A species is introduced to the workpiece through the apertures and the material is removed. For example, the material may be evaporated, may form a volatile product with a gas, or may dissolve when exposed to a solvent. The species may be introduced using, for example, ion implantation or gaseous diffusion.

    摘要翻译: 公开了一种制造工件的方法。 将定义孔的材料施加到工件上。 通过孔将物质引入工件,并且去除材料。 例如,该材料可能被蒸发,可能与气体形成挥发性产物,或者当暴露于溶剂时可能会溶解。 可以使用例如离子注入或气体扩散来引入物种。

    Technique for manufacturing bit patterned media
    9.
    发明授权
    Technique for manufacturing bit patterned media 失效
    技术制造位图案媒体

    公开(公告)号:US08709533B2

    公开(公告)日:2014-04-29

    申请号:US13228426

    申请日:2011-09-08

    IPC分类号: G11B5/708

    CPC分类号: G11B5/855

    摘要: A technique for manufacturing hit pattern media is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for manufacturing bit pattern media. The method may comprise forming an intermediate layer comprising a modified region and a first region adjacent to one another, where the modified region and the first region may have at least one different property; depositing magnetic species on the first region of the intermediate layer to form an active region; and depositing non-ferromagnetic species on the modified region of the intermediate layer to form a separator.

    摘要翻译: 公开了一种制造命中图形介质的技术。 在一个特定的示例性实施例中,该技术可以被实现为用于制造钻头图案介质的方法。 该方法可以包括形成包括相邻的修饰区域和第一区域的中间层,其中改质区域和第一区域可具有至少一个不同的性质; 在所述中间层的第一区域上沉积磁性物质以形成活性区域; 并将非铁磁物质沉积在中间层的改性区上以形成隔膜。