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公开(公告)号：US08679356B2
公开(公告)日：2014-03-25
申请号：US13111657
申请日：2011-05-19
IPC分类号： B44C1/22
CPC分类号： G11B5/855
摘要： A method of patterning a substrate, comprises patterning a photoresist layer disposed on the substrate using imprint lithography and etching exposed portions of a hard mask layer disposed between the patterned photoresist layer and the substrate. The method may also comprise implanting ions into a magnetic layer in the substrate while the etched hard mask layer is disposed thereon.
摘要翻译： 图案化衬底的方法包括使用压印光刻图案化设置在衬底上的光致抗蚀剂层，并蚀刻设置在图案化的光致抗蚀剂层和衬底之间的硬掩模层的暴露部分。 该方法还可以包括将离子注入到衬底中的磁性层中，同时将蚀刻的硬掩模层设置在其上。
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公开(公告)号：US20120292285A1
公开(公告)日：2012-11-22
申请号：US13111657
申请日：2011-05-19
CPC分类号： G11B5/855
摘要： A method of patterning a substrate, comprises patterning a photoresist layer disposed on the substrate using imprint lithography and etching exposed portions of a hard mask layer disposed between the patterned photoresist layer and the substrate. The method may also comprise implanting ions into a magnetic layer in the substrate while the etched hard mask layer is disposed thereon.
摘要翻译： 图案化衬底的方法包括使用压印光刻图案化设置在衬底上的光致抗蚀剂层，并蚀刻设置在图案化的光致抗蚀剂层和衬底之间的硬掩模层的暴露部分。 该方法还可以包括将离子注入到衬底中的磁性层中，同时将蚀刻的硬掩模层设置在其上。
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公开(公告)号：US09093104B2
公开(公告)日：2015-07-28
申请号：US13342762
申请日：2012-01-03
CPC分类号： G11B5/855
摘要： A novel technique for manufacturing bit patterned media is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for manufacturing bit pattern media. The technique, which may be realized as a method comprising: forming a non-catalysis region on a first portion of a catalysis layer; forming a non-magnetic separator on the non-catalysis region; and forming a magnetic active region on a second portion of the catalysis layer adjacent to the first portion of the catalysis layer.
摘要翻译： 公开了一种用于制造位图案化介质的新型技术。 在一个特定的示例性实施例中，该技术可以被实现为用于制造钻头图案介质的方法。 该技术可以被实现为一种方法，包括：在催化层的第一部分上形成非催化区; 在非催化区上形成非磁性分离器; 以及在催化层的与催化层的第一部分相邻的第二部分上形成磁性活性区域。
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公开(公告)号：US20120280442A1
公开(公告)日：2012-11-08
申请号：US13101280
申请日：2011-05-05
申请人： Richard J. Hertel , Julian G. Blake , Edward D. MacIntosh , Alexander C. Kontos , Frank Sinclair , Christopher A. Rowland , Mayur Jagtap , Sankar Ganesh Kolappan
发明人： Richard J. Hertel , Julian G. Blake , Edward D. MacIntosh , Alexander C. Kontos , Frank Sinclair , Christopher A. Rowland , Mayur Jagtap , Sankar Ganesh Kolappan
CPC分类号： H01L21/68771 , G11B23/0021 , G11B23/0317 , G11B23/0327
摘要： A media carrier, adapted to hold a plurality of pieces of magnetic media, is disclosed. This media carrier can be placed on the workpiece support, or platen, allowing the magnetic media to be processed. In some embodiments, the media carrier is designed such that only one side of the magnetic media is exposed, requiring a robot or other equipment to invert each piece of media in the carrier to process the second side. In other embodiments, the media carrier is designed such that both sides of the magnetic media are exposed. In this scenario, the media carrier is inverted on the platen to allow processing of the second side.
摘要翻译： 公开了适于容纳多个磁性介质的介质载体。 该介质载体可以放置在工件支撑件或压板上，允许磁性介质被处理。 在一些实施例中，介质载体被设计成使得只有磁性介质的一侧被暴露，需要机器人或其他设备来反转载体中的每个介质以处理第二侧。 在其他实施例中，介质载体被设计成使得磁性介质的两侧都被暴露。 在这种情况下，媒体载体在压板上反转，以允许处理第二面。
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公开(公告)号：US20120175342A1
公开(公告)日：2012-07-12
申请号：US13342762
申请日：2012-01-03
CPC分类号： G11B5/855
摘要： A novel, technique: for manufacturing bit patterned media is disclosed. In one particular exemplary embodiment, the technique may be realized as a method for manufacturing hit pattern media. The technique, which may be realized as a method comprising: forming a non-catalysis region on a first portion of a catalysis layer; forming a non-magnetic separator on the non-catalysis region; and forming a magnetic active region on it second portion of the catalysis layer adjacent to the first portion of the catalysis layer.
摘要翻译： 公开了一种新颖的技术：用于制造位图案的介质。 在一个特定的示例性实施例中，该技术可以被实现为用于制造命中图案媒体的方法。 该技术可以被实现为一种方法，包括：在催化层的第一部分上形成非催化区; 在非催化区上形成非磁性分离器; 以及在催化层的与催化层的第一部分相邻的第二部分上形成磁性活性区域。
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公开(公告)号：US20110124186A1
公开(公告)日：2011-05-26
申请号：US12947078
申请日：2010-11-16
申请人： Anthony Renau , Ludovic Godet , Timothy J. Miller , Joseph C. Olson , Vikram Singh , James Buonodono , Frank Sinclair , Deepak A. Ramappa , Russell Low , Atul Gupta , Kevin M. Daniels
发明人： Anthony Renau , Ludovic Godet , Timothy J. Miller , Joseph C. Olson , Vikram Singh , James Buonodono , Frank Sinclair , Deepak A. Ramappa , Russell Low , Atul Gupta , Kevin M. Daniels
IPC分类号： H01L21/265 , G21K5/10
CPC分类号： B01J19/081 , H01J37/3171 , H01J37/32357 , H01J37/32422 , H01J37/32623 , H01J2237/0453 , H01J2237/1205 , H01L21/2236 , H01L31/022425 , H01L31/068 , H01L31/08 , H01L31/1804 , Y02E10/547 , Y02P70/521
摘要： A plasma processing apparatus comprises a plasma source configured to produce a plasma in a plasma chamber, such that the plasma contains ions for implantation into a workpiece. The apparatus also includes a focusing plate arrangement having an aperture arrangement configured to modify a shape of a plasma sheath of the plasma proximate the focusing plate such that ions exiting an aperture of the aperture arrangement define focused ions. The apparatus further includes a processing chamber containing a workpiece spaced from the focusing plate such that a stationary implant region of the focused ions at the workpiece is substantially narrower that the aperture. The apparatus is configured to create a plurality of patterned areas in the workpiece by scanning the workpiece during ion implantation.
摘要翻译： 等离子体处理装置包括等离子体源，其被配置为在等离子体室中产生等离子体，使得等离子体包含用于注入工件的离子。 该装置还包括聚焦板装置，该聚焦板装置具有孔结构，其被配置为修改离开聚焦板附近的等离子体鞘的等离子体鞘的形状，使得离开孔结构的孔的离子限定聚焦离子。 该设备还包括处理室，其包含与聚焦板间隔开的工件，使得在工件处的聚焦离子的固定注入区域基本上比孔更窄。 该装置被配置为通过在离子注入期间扫描工件来在工件中产生多个图案化区域。
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公开(公告)号：US09112064B2
公开(公告)日：2015-08-18
申请号：US12948248
申请日：2010-11-17
申请人： Peter L. Kellerman , Frank Sinclair
发明人： Peter L. Kellerman , Frank Sinclair
摘要： This sheet production apparatus comprises a vessel defining a channel configured to hold a melt. The melt is configured to flow from a first point to a second point of the channel. A cooling plate is disposed proximate the melt and is configured to form a sheet on the melt. A spillway is disposed at the second point of the channel. This spillway is configured to separate the sheet from the melt.
摘要翻译： 该片材生产设备包括限定被配置为保持熔体的通道的容器。 熔体构造成从通道的第一点流到第二点。 冷却板靠近熔体设置并且被配置成在熔体上形成片材。 溢流道设置在通道的第二点。 该溢流道构造成将片材与熔体分离。
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公开(公告)号：US08659229B2
公开(公告)日：2014-02-25
申请号：US13108052
申请日：2011-05-16
申请人： Peter Kurunczi , Frank Sinclair , Costel Biloiu , Ludovic Godet , Ernest Allen
发明人： Peter Kurunczi , Frank Sinclair , Costel Biloiu , Ludovic Godet , Ernest Allen
IPC分类号： H05H1/24
CPC分类号： H01J37/08 , H01J37/3171 , H01J37/3211 , H01J37/32119 , H01J37/32669
摘要： A plasma processing apparatus and method are disclosed which create a uniform plasma within an enclosure. In one embodiment, a conductive or ferrite material is used to influence a section of the antenna, where a section is made up of portions of multiple coiled segments. In another embodiment, a ferrite material is used to influence a portion of the antenna. In another embodiment, plasma uniformity is improved by modifying the internal shape and volume of the enclosure.
摘要翻译： 公开了一种等离子体处理装置和方法，其在外壳内产生均匀的等离子体。 在一个实施例中，导电或铁氧体材料用于影响天线的一部分，其中一部分由多个线圈段的部分组成。 在另一个实施例中，铁氧体材料用于影响天线的一部分。 在另一个实施例中，通过改变外壳的内部形状和体积来提高等离子体的均匀性。
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9.发明授权Small form factor plasma source for high density wide ribbon ion beam generation 有权用于高密度宽带离子束产生的小尺寸等离子体源公开(公告)号：US08590485B2
公开(公告)日：2013-11-26
申请号：US12767125
申请日：2010-04-26
申请人： Costel Biloiu , Jay Scheuer , Joseph Olson , Frank Sinclair , Daniel Distaso
发明人： Costel Biloiu , Jay Scheuer , Joseph Olson , Frank Sinclair , Daniel Distaso
IPC分类号： C23C16/00 , C23F1/00 , H01L21/306 , H05B31/26
CPC分类号： H01J37/08 , H01J27/16 , H01J37/3171 , H01J2237/061 , H01J2237/065 , H01J2237/0815 , H05H1/30
摘要： An ion source, capable of generating high-density wide ribbon ion beam, utilizing inductively coupled plasma production is disclosed. As opposed to conventional ICP sources, the present disclosure describes an ICP source which is not cylindrical. Rather, the source is defined such that its width, which is the dimension along which the beam is extracted, is greater than its height. The depth of the source may be defined to maximize energy transfer from the antenna to the plasma. In a further embodiment, a multicusp magnetic field surrounding the ICP source is used to further increase the current density and improve the uniformity of the extracted ion beam. Ion beam uniformity can also be controlled by means of several independent controls, including gas flow rate, and input RF power.
摘要翻译： 公开了一种能够利用电感耦合等离子体生产产生高密度宽带状离子束的离子源。 与常规ICP源相反，本公开描述了不是圆柱形的ICP源。 相反，源被限定为使得其宽度（其是提取梁的尺寸）大于其高度。 可以定义源的深度以最大化从天线到等离子体的能量传递。 在另一个实施例中，围绕ICP源的多谐振磁场用于进一步增加电流密度并提高所提取的离子束的均匀性。 离子束均匀性也可以通过几个独立的控制来控制，包括气体流速和输入射频功率。
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公开(公告)号：US08545624B2
公开(公告)日：2013-10-01
申请号：US12487058
申请日：2009-06-18
IPC分类号： C30B13/28
CPC分类号： B22D39/02 , C30B11/001 , C30B11/003 , C30B29/02 , C30B29/06 , C30B29/08 , C30B29/403 , C30B29/60
摘要： An apparatus to pump a melt is disclosed. The pump has a chamber that defines a cavity configured to hold the melt. A gas source is in fluid communication with the chamber. A first valve is between the chamber and a first pipe and a second valve is between the chamber and a second pipe. The valves may be check valves in one embodiment.
摘要翻译： 公开了一种用于泵送熔体的装置。 泵具有限定被配置为保持熔体的腔的腔室。 气体源与腔室流体连通。 第一阀在腔室和第一管之间，第二阀在腔室和第二管之间。 在一个实施例中，阀可以是止回阀。
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