Optical sensor device and method for manufacturing an optical sensor device

    公开(公告)号:US12087780B2

    公开(公告)日:2024-09-10

    申请号:US17288316

    申请日:2019-09-27

    发明人: Franz Lechner

    IPC分类号: H01L27/144 H01L31/0216

    CPC分类号: H01L27/1443 H01L31/02164

    摘要: An optical sensor device comprises a semiconductor body with a light-sensitive area, metal layers which are arranged above the light-sensitive area and comprise an upper metal layer and a lower metal layer, wherein the upper metal layer is located at a greater distance from the light-sensitive area than the lower metal layer. The optical sensor device further comprises an aperture opening in the metal layers above the light-sensitive area and a via structure, which is arranged outside the aperture opening and interconnects the metal layers and/or the semiconductor body. The via structure is arranged in such a fashion that any straight line that is parallel to the light-sensitive area and traverses the aperture opening between the light-sensitive area and the upper metal layer is limited in both of its opposite directions by the via structure.

    DISPLAY PANEL AND MOBILE TERMINAL
    4.
    发明公开

    公开(公告)号:US20240186338A1

    公开(公告)日:2024-06-06

    申请号:US17759371

    申请日:2022-07-07

    发明人: Zhitao Lu

    IPC分类号: H01L27/144

    CPC分类号: H01L27/1443

    摘要: A display panel and a mobile terminal are provided. A photosensitive module of the display panel includes a photosensitive transistor and a light-concentrating structure. A first active layer of the photosensitive transistor includes a first channel portion. A first source-drain electrode layer is disposed on the first active portion which is disposed on two sides of the first channel portion. The light-concentrating structure includes at least one protrusion protruded along a direction that the photosensitive transistor away from a substrate of the display panel. In a direction of a top view of the display panel, the light-concentrating structure covers at least the first channel portion of the first active layer.

    Method for manufacturing back surface incident type semiconductor photo detection element

    公开(公告)号:US11764236B2

    公开(公告)日:2023-09-19

    申请号:US17877214

    申请日:2022-07-29

    IPC分类号: H01L27/146 H01L27/144

    CPC分类号: H01L27/1446 H01L27/1443

    摘要: A semiconductor substrate including a first main surface and a second main surface opposing each other is provided. The semiconductor substrate includes a first semiconductor region of a first conductivity type. The semiconductor substrate includes a plurality of planned regions where a plurality of second semiconductor regions of a second conductivity type forming pn junctions with the first semiconductor region are going to be formed, in a side of the second main surface. A textured region is formed on surfaces included in the plurality of planned regions, in the second main surface. The plurality of second semiconductor regions are formed in the plurality of planned regions after forming the textured region. The first main surface is a light incident surface of the semiconductor substrate.