Methods of selectively incorporating metals onto substrates
    4.
    发明授权
    Methods of selectively incorporating metals onto substrates 有权
    将金属选择性地结合到基底上的方法

    公开(公告)号:US07429404B2

    公开(公告)日:2008-09-30

    申请号:US11215828

    申请日:2005-08-29

    IPC分类号: C23C16/40

    摘要: A method for forming multi-metallic sites on a substrate is disclosed and described. A substrate including active groups such as hydroxyl can be reacted with a pretarget metal complex. The target metal attached to the active group can then be reacted with a secondary metal complex such that an oxidation-reduction (redox) reaction occurs to form a multi-metallic species. The substrate can be a highly porous material such as aerogels, xerogels, zeolites, and similar materials. Additional metal complexes can be reacted to increase catalyst loading or control co-catalyst content. The resulting compounds can be oxidized to form oxides or reduced to form metals in the ground state which are suitable for practical use.

    摘要翻译: 公开并描述了在基板上形成多金属部位的方法。 包括活性基团如羟基的底物可以与预靶金属络合物反应。 附着在活性基团上的靶金属然后可以与二次金属络合物反应,从而发生氧化还原(氧化还原)反应以形成多金属物质。 基底可以是高度多孔的材料,例如气凝胶,干凝胶,沸石和类似材料。 另外的金属络合物可以反应以增加催化剂负载量或控制助催化剂含量。 所得到的化合物可被氧化形成氧化物或还原形成处于基态的金属,这些金属适用于实际应用。