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公开(公告)号：US06777164B2
公开(公告)日：2004-08-17
申请号：US09828075
申请日：2001-04-06
IPC分类号： G03C177
CPC分类号： B41N3/00 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/20 , B41C2210/22 , B41C2210/262 , B41N1/083 , B41N3/036 , Y10S430/106 , Y10S430/11 , Y10S430/127 , Y10S430/145
摘要： The invention provides a lithographic printing for precursor having an imagable coating on an aluminum support, wherein the imagable coating comprises a polymeric substance comprising colorant groups, and wherein the aluminum support on which the coating is provided is anodized but not subsequently modified by means of a post-anodic treatment compound, and the coating does not comprise a colorant dye. The polymeric substance may also comprise pendent infra-red or developer dissolution inhibiting groups, and these groups may also be the colorant groups themselves.
摘要翻译： 本发明提供了一种用于前体的平版印刷，其具有在铝支架上的可成像涂层，其中可成像涂层包含包含着色剂基团的聚合物质，并且其中提供涂层的铝载体被阳极氧化，但后来不通过 后阳极处理化合物，并且涂层不包含着色剂染料。 聚合物还可以包含悬滴红外或显色剂溶解抑制基团，这些基团本身也可以是着色剂基团。
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公开(公告)号：US06537735B1
公开(公告)日：2003-03-25
申请号：US09477893
申请日：2000-01-05
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , Stuart Bayes , Mark John Spowage
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , Stuart Bayes , Mark John Spowage
IPC分类号： G03F730
CPC分类号： G03F7/2022 , B41C1/1008 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/262 , B41M5/368 , B41M5/465 , G03F7/022 , G03F7/023 , G03F7/0233 , H05K3/0082
摘要： The invention is directed to a method for producing a predetermined resist pattern on a substrate. The method includes the patternwise application of infrared radiation to a precursor which contains the substrate, having a coating thereon, wherein the coating contains a positive working composition; and the development of the pattern using a developer. The composition contains a polymeric substance having functional groups Q thereon, such that the functionalized polymeric substance has the property that it is developer insoluble prior to delivery of infrared radiation and developer soluble thereafter.
摘要翻译： 本发明涉及一种在基板上制造预定抗蚀剂图案的方法。 该方法包括将红外辐射图案化地应用于含有基材的前体，其上具有涂层，其中涂层含有正性工作组合物; 并使用开发人员开发模式。 该组合物含有其上具有官能团Q的聚合物质，使得官能化聚合物质具有在红外辐射传递之前是显影剂不溶性的特性，此后可显影剂可溶。
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公开(公告)号：US06596469B2
公开(公告)日：2003-07-22
申请号：US09503095
申请日：2000-02-11
申请人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare
发明人： Christopher David McCullough , Kevin Barry Ray , Alan Stanley Victor Monk , John David Riches , Anthony Paul Kitson , Gareth Rhodri Parsons , David Stephen Riley , Peter Andrew Reath Bennett , Richard David Hoare
IPC分类号： G03C176
CPC分类号： G03F7/2022 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , G03F7/022 , G03F7/023 , G03F7/0233 , H05K3/0082
摘要： A method of making a mask or an electronic part, for example a printed circuit, comprises the steps of delivering heat in a desired pattern to a precursor of the mask or electronic part, the precursor comprising a surface coated with a coating, the coating comprising a heat-sensitive composition itself comprising an aqueous developer soluble polymeric substance and a compound which reduces the aqueous developer solubility of the polymeric substance, wherein the aqueous developer solubility of the composition is not increased by incident UV radiation but is increased by the delivery of heat; then developing the precursor to remove the heat-sensitive composition in regions to which the heat was delivered. In the case of a printed circuit precursor the surface may be then etched in conventional manner to yield the required printed circuit.
摘要翻译： 制造掩模或电子部件（例如印刷电路）的方法包括以期望的图案将热量输送到掩模或电子部件的前体的步骤，前体包括涂覆有涂层的表面，该涂层包含 包含显影剂可溶性水溶性聚合物的热敏组合物和降低聚合物质的显影剂水溶性的化合物，其中组合物的水性显影剂溶解度不会因入射的紫外线辐射而增加，而是通过传递热而增加 ; 然后展开该前体以在传送热量的区域中除去热敏组合物。 在印刷电路前体的情况下，可以以常规方式蚀刻表面以产生所需的印刷电路。
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公开(公告)号：US06524767B1
公开(公告)日：2003-02-25
申请号：US09696870
申请日：2000-10-26
IPC分类号： G03F7004
CPC分类号： B41C1/1016 , B41C2210/04 , B41C2210/08 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , H05K3/105 , Y10S430/145
摘要： An imagable article comprises a thermally imagable coating on a substrate, the coating comprising a radiation absorbing compound and a metal compound which is thermally decomposable, to form a metal. The imagable article is imagewise exposed to electromagnetic radiation, which is converted to heat by the radiation absorbing compound. The imaged article is then subjected to a developer, and in regions that have been exposed the thermally decomposable metal compound is decomposed to elemental metal, and regions that have not been exposed dissolve in the developer leaving behind the regions of elemental metal.
摘要翻译： 可成像制品包括在基底上的可热成像的涂层，所述涂层包含辐射吸收化合物和可热分解的金属化合物以形成金属。 可成像的物品成像暴露于电磁辐射，辐射吸收化合物转化成热。 然后将成像的制品经受显影剂，并且在已经暴露于可热分解的金属化合物的区域中分解成元素金属，并且未暴露的区域溶解在离开元素金属区域的显影剂中。
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公开(公告)号：US5976735A
公开(公告)日：1999-11-02
申请号：US615293
申请日：1996-03-21
申请人： Alan Stanley Victor Monk , Peter Andrew Reath Bennett , Christopher David McCullogh , Geoffrey Horne
发明人： Alan Stanley Victor Monk , Peter Andrew Reath Bennett , Christopher David McCullogh , Geoffrey Horne
IPC分类号： G03F7/004 , C09D4/00 , C09D4/06 , C09D101/10 , C09D155/00 , C09D171/00 , G03F7/00 , G03F7/028 , G03F7/029 , G03F7/031 , G03F7/032 , G03F7/033
CPC分类号： G03F7/031 , G03F7/029 , Y10S430/107 , Y10S430/112 , Y10S430/116 , Y10S430/12 , Y10S430/124 , Y10S430/127 , Y10S430/146 , Y10S430/148
摘要： There is described a lithographic plate which comprises a base coated with a photopolymerisable composition which comprises a polymeric binder, at least one free-radically polymerisable ethylenically unsaturated compound and as the photoinitiator combination a metallocene compound, N-phenyl glycine or a substituted N-phenyl glycine or an N-phenyl glycine derivative together with a third component which is a substance which helps in the reaction initiation but also increases the sensitivity of the photopolymerisable composition to a desired region of the spectrum.
摘要翻译： PCT No.PCT / GB94 / 02056 Sec。 371日期1996年3月21日 102（e）1996年3月21日PCT PCT 1994年9月22日PCT公布。 出版物WO95 / 09383 日期1995年4月6日描述了一种平版印刷版，其包括涂覆有可光聚合组合物的基底，其包含聚合物粘合剂，至少一种可自由基聚合的烯键式不饱和化合物，并且作为光引发剂组合，茂金属化合物，N-苯基甘氨酸或 取代的N-苯基甘氨酸或N-苯基甘氨酸衍生物以及作为有助于反应引发的物质的第三组分，但也增加可光聚合组合物对光谱的所需区域的敏感性。
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公开(公告)号：US06280899B1
公开(公告)日：2001-08-28
申请号：US09483990
申请日：2000-01-18
IPC分类号： G03C176
CPC分类号： B41M5/368 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： Thermally imageable lithographic printing plate precursors and heat-sensitive compositions for use in these printing plate precursors are disclosed. The compositions contain an aqueous developer soluble polymer, such as a phenolic resin; a compound that reduces the aqueous developer solubility of the polymer; and optionally, and infrared absorber. Examples of compounds that reduce the aqueous developer solubility of the polymer are those that contain at least one quarternized nitrogen atom, such as quinolinium compounds, benzothiazolium compounds, pyridinium compounds, and imidazoline compounds. On thermal imaging, the irradiated areas become more soluble in the aqueous developer and can be removed to form a positive image.
摘要翻译： 公开了用于这些印版前体的可热成像的平版印刷版前体和热敏组合物。 组合物含有显影剂水溶性聚合物，例如酚醛树脂; 降低聚合物的水性显影剂溶解度的化合物; 和任选地，和红外线吸收剂。 降低聚合物的水性显影剂溶解度的化合物的实例是含有至少一个季铵化氮原子的化合物，例如喹啉鎓化合物，苯并噻唑鎓化合物，吡啶鎓化合物和咪唑啉化合物。 在热成像中，被照射的区域变得更易溶于含水显影剂，并且可以除去以形成正像。
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公开(公告)号：US06485890B2
公开(公告)日：2002-11-26
申请号：US09860943
申请日：2001-05-18
IPC分类号： G03F7039
CPC分类号： B41M5/368 , B41C1/1008 , B41C1/1016 , B41C2210/02 , B41C2210/06 , B41C2210/14 , B41C2210/22 , B41C2210/24 , B41C2210/262 , Y10S430/145 , Y10S430/146 , Y10S430/165
摘要： Thermally imageable lithographic printing plate precursors and heat-sensitive compositions for use in these printing plate precursors are disclosed. The compositions contain an aqueous developer soluble polymer, such as a phenolic resin; a compound that reduces the aqueous developer solubility of the polymer; and optionally, and infrared absorber. Examples of compounds that reduce the aqueous developer solubility of the polymer are those that contain at least one quarternized nitrogen atom, such as quinolinium compounds, benzothiazolium compounds, pyridinium compounds, and imidazoline compounds. On thermal imaging, the irradiated areas become more soluble in the aqueous developer and can be removed to form a positive image.
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