Synthetic silica glass optical material having high resistance to laser induced damage
    4.
    发明申请
    Synthetic silica glass optical material having high resistance to laser induced damage 有权
    合成石英玻璃光学材料具有较高的抗激光损伤能力

    公开(公告)号:US20050187092A1

    公开(公告)日:2005-08-25

    申请号:US11064341

    申请日:2005-02-22

    摘要: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength less than about 250 nm and particularly, exhibiting a low laser induced wavefront distortion; specifically a laser induced wavefront distortion, measured at 633 nm, of between about −1.0 and 1.0 nm/cm when subjected to 10 billion pulses of a laser operating at approximately 193 nm and at a fluence of approximately 70 μJ/cm2. The synthetic silica glass optical material of the present invention comprises OH concentration levels of less than about 600 ppm, preferably less than 200 ppm, and H2 concentration levels less than about 5.0×1017 molecules/cm3,and preferably less than about 2.0×1017 molecules/cm3.

    摘要翻译: 公开了一种合成石英玻璃光学材料,其特征在于波长小于约250nm,特别是具有低激光诱导波前失真的紫外线波长范围内具有高抗紫外线辐射的光学损伤, 特别是在经受100nm脉冲激光在约193nm下操作的激光诱导波前失真(在633nm处),介于约-1.0和1.0nm / cm之间,并且流量约为70μJ/ cm 2 。 本发明的合成石英玻璃光学材料包含小于约600ppm,优选小于200ppm的OH浓度水平和小于约5.0×10 17 H 2 O 2浓度水平, SUP>分子/ cm 3,优选小于约2.0×10 17分子/ cm 3。

    Deuteroxyle-doped silica glass, optical member and lithographic system comprising same and method of making same
    5.
    发明申请
    Deuteroxyle-doped silica glass, optical member and lithographic system comprising same and method of making same 审中-公开
    氘氧基掺杂石英玻璃,光学元件和包含其的光刻系统及其制造方法

    公开(公告)号:US20070105703A1

    公开(公告)日:2007-05-10

    申请号:US11348956

    申请日:2006-02-06

    IPC分类号: C03B8/00 C03B19/06

    摘要: What is disclosed includes OD-doped synthetic silica glass capable of being used in optical elements for use in lithography below about 300 nm. OD-doped synthetic silica glass was found to have significantly lower polarization-induced birefringence value than non-OD-doped silica glass with comparable concentration of OH. Also disclosed are processes for making OD-dopes synthetic silica glasses, optical member comprising such glasses, and lithographic systems comprising such optical member. The glass is particularly suitable for immersion lithographic systems due to the exceptionally low polarization-induced birefringence values at about 193 nm.

    摘要翻译: 公开的内容包括能够用于低于约300nm的光刻中的光学元件的OD掺杂合成石英玻璃。 发现OD掺杂的合成二氧化硅玻璃具有比具有相当浓度的OH的非OD掺杂的石英玻璃具有显着更低的偏振诱导双折射值。 还公开了制备OD-掺杂合成二氧化硅玻璃,包括这种玻璃的光学部件以及包括这种光学部件的光刻系统的方法。 由于在约193nm处极度低的偏振诱发双折射值,该玻璃特别适用于浸没式光刻系统。