公开(公告)号：US20100053581A1

公开(公告)日：2010-03-04

申请号：US12543578

申请日：2009-08-19

申请人： Gerardus Hubertus Petrus Maria SWINKELS ,  Vadim Yevgenyevich BANINE ,  Erik Roelof LOOPSTRA ,  Johannes Hubertus Josephina MOORS

发明人： Gerardus Hubertus Petrus Maria SWINKELS ,  Vadim Yevgenyevich BANINE ,  Erik Roelof LOOPSTRA ,  Johannes Hubertus Josephina MOORS

IPC分类号： G03B27/42 ,  B01J19/12

CPC分类号： G03F7/70916 ,  G03F7/70033 ,  G03F7/70858 ,  G03F7/70983 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a droplet generator constructed and arranged to generate fuel droplets, a heater constructed and arranged to heat the fuel droplets following generation of the fuel droplets by the droplet generator, and reduce the mass of fuel present in the fuel droplets and/or reduce the density of the fuel droplets, and a radiation emitter constructed and arranged to direct radiation onto the fuel droplets that have been heated by the heater to generate the extreme ultraviolet radiation.

摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括构造和布置成产生燃料液滴的液滴发生器，被构造和布置成在液滴发生器产生燃料液滴之后加热燃料液滴的加热器，并且减少存在于燃料液滴中的燃料质量和/或 降低燃料液滴的密度，以及被构造和布置成将辐射引导到已被加热器加热以产生极紫外辐射的燃料液滴上的辐射发射器。

公开(公告)号：US20110121177A1

公开(公告)日：2011-05-26

申请号：US13021226

申请日：2011-02-04

申请人： Vadim Yevgenyevich BANINE ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

发明人： Vadim Yevgenyevich BANINE ,  Levinus Pieter Bakker ,  Ralph Kurt ,  Johannes Hubertus Josephina Moors ,  Lucas Henricus Johannes Stevens ,  Peter Cornelis Zalm

IPC分类号： G01N23/08

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US20120241610A1

公开(公告)日：2012-09-27

申请号：US13478446

申请日：2012-05-23

申请人： Vadim Yevgenyevich BANINE ,  Levinus Pieter BAKKER ,  Ralph KURT ,  Johannes Hubertus Josephina MOORS ,  Lucas Henricus Johannes STEVENS ,  Peter Cornelis ZALM

发明人： Vadim Yevgenyevich BANINE ,  Levinus Pieter BAKKER ,  Ralph KURT ,  Johannes Hubertus Josephina MOORS ,  Lucas Henricus Johannes STEVENS ,  Peter Cornelis ZALM

IPC分类号： G01N23/08

CPC分类号： G01N25/142 ,  G01N25/68 ,  Y10T436/25875

摘要： A system for detecting at least one contamination species in an interior space of a lithographic apparatus, including: at least one monitoring surface configured to be in contact with the interior space, a thermal controller configured to control the temperature of the monitoring surface to at least one detection temperature, and at least one detector configured to detect condensation of the at least one contamination species onto the monitoring surface.

摘要翻译： 一种用于检测光刻设备的内部空间中的至少一种污染物质的系统，包括：被配置为与所述内部空间接触的至少一个监测表面;被配置为将所述监测表面的温度控制在至少 一个检测温度，以及至少一个检测器，被配置为检测所述至少一种污染物质到所述监测表面上的冷凝。

公开(公告)号：US20090173360A1

公开(公告)日：2009-07-09

申请号：US12405831

申请日：2009-03-17

申请人： Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Vadim Yevgenyevich BANINE ,  Johannes Peterus Henricus DE KUSTER ,  Johannes Hubertus Josephina MOORS ,  Lucas Henricus Johannes STEVENS ,  Bastiaan Theodoor WOLSCHRIJN ,  Yurii Victorovitch SIDELNIKOV ,  Marc Hubertus Lorenz VAN DER VELDEN ,  Wouter Anthon SOER ,  Thomas STEIN ,  Kurt Gielissen

发明人： Maarten Marinus Johannes Wilhelmus VAN HERPEN ,  Vadim Yevgenyevich BANINE ,  Johannes Peterus Henricus DE KUSTER ,  Johannes Hubertus Josephina MOORS ,  Lucas Henricus Johannes STEVENS ,  Bastiaan Theodoor WOLSCHRIJN ,  Yurii Victorovitch SIDELNIKOV ,  Marc Hubertus Lorenz VAN DER VELDEN ,  Wouter Anthon SOER ,  Thomas STEIN ,  Kurt Gielissen

IPC分类号： G21K5/00 ,  B08B7/00 ,  H05H1/00

CPC分类号： G03F7/70925 ,  G03F7/7085 ,  G03F7/70908 ,  G03F7/70916

摘要： A lithographic apparatus configured to project a patterned beam of radiation onto a target portion of a substrate is disclosed. The apparatus includes a first radiation dose detector and a second radiation dose detector, each detector comprising a secondary electron emission surface configured to receive a radiation flux and to emit secondary electrons due to the receipt of the radiation flux, the first radiation dose detector located upstream with respect to the second radiation dose detector viewed with respect to a direction of radiation transmission, and a meter, connected to each detector, to detect a current or voltage resulting from the secondary electron emission from the respective electron emission surface.

摘要翻译： 公开了一种被配置为将图案化的辐射束投影到基板的目标部分上的光刻设备。 该装置包括第一辐射剂量检测器和第二辐射剂量检测器，每个检测器包括被配置为接收辐射通量并由于接收到辐射通量而发射二次电子的二次电子发射表面，位于上游的第一辐射剂量检测器 相对于相对于辐射传播方向观察的第二辐射剂量检测器，以及连接到每个检测器的仪表，以检测由相应的电子发射表面产生的二次电子发射产生的电流或电压。

公开(公告)号：US20110222040A1

公开(公告)日：2011-09-15

申请号：US13046303

申请日：2011-03-11

申请人： Jens Arno STEINHOFF ,  Vadim Yevgenyevich BANINE ,  Richard Joseph BRULS ,  Erik Roelof LOOPSTRA ,  Hendrik Antony Johannes NEERHOF ,  Adrianus Johannes Maria VAN DIJK ,  Andrei Mikhailovich YAKUNIN ,  Luigi SCACCABAROZZI

发明人： Jens Arno STEINHOFF ,  Vadim Yevgenyevich BANINE ,  Richard Joseph BRULS ,  Erik Roelof LOOPSTRA ,  Hendrik Antony Johannes NEERHOF ,  Adrianus Johannes Maria VAN DIJK ,  Andrei Mikhailovich YAKUNIN ,  Luigi SCACCABAROZZI

IPC分类号： G03B27/54 ,  G21K5/00 ,  G01J3/10

CPC分类号： G03F7/70916 ,  H05G2/003

摘要： A contaminant trap is used in an EUV radiation source apparatus. An EUV radiation beam is generated and focused through a low pressure gaseous atmosphere into a virtual source point. The EUV radiation creates a plasma in the low pressure hydrogen atmosphere through which it passes. A contaminant trap including electrodes is located in or around radiation beam as it approaches the virtual source point. A DC biasing source is connected to the electrodes to create an electric field oriented to deflect out of the beam path contaminant particles that have been negatively charged by the plasma. Additional RF electrodes and/or an ionizer enhance the plasma to increase the charging of the particles. The deflecting electrodes can be operated with RF bias for a short time, to ensure dissipation of the enhanced plasma.

摘要翻译： 在EUV辐射源装置中使用污染物阱。 产生EUV辐射束并通过低压气体气氛聚焦成虚拟源点。 EUV辐射在其通过的低压氢气氛中产生等离子体。 当辐射束接近虚拟源点时，包括电极的污染物陷阱位于辐射束内或周围。 DC偏置源连接到电极以产生电场，该电场被定向以偏离由等离子体带负电的光束路径污染物颗粒。 附加的RF电极和/或电离器增强等离子体以增加颗粒的充电。 偏转电极可以用RF偏压短时间操作，以确保增强等离子体的耗散。

公开(公告)号：US20100038562A1

公开(公告)日：2010-02-18

申请号：US12540559

申请日：2009-08-13

申请人： Hendrikus Gijsbertus SCHIMMEL ,  Vadim Yevgenyevich BANINE ,  Erik Roelof LOOPSTRA ,  Karel Joop BOSSCHAART

发明人： Hendrikus Gijsbertus SCHIMMEL ,  Vadim Yevgenyevich BANINE ,  Erik Roelof LOOPSTRA ,  Karel Joop BOSSCHAART

IPC分类号： G21K5/04 ,  H05G2/00

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70891 ,  G03F7/70916 ,  G21K1/06 ,  H05G2/005 ,  H05G2/008

摘要： A radiation source is configured to generate extreme ultraviolet radiation. The radiation source includes a laser constructed and arranged to generate a beam of radiation directed to a plasma generation site where a plasma is generated when the beam of radiation interacts with a fuel, an optical component having a surface that is arranged and positioned to be hit by a droplet of fuel, and a temperature conditioner constructed and arranged to elevate the temperature of the surface.

摘要翻译： 辐射源被配置成产生极紫外辐射。 辐射源包括一个激光器，其被构造和布置成产生一个辐射束，该辐射束被引导到等离子体产生位置，在等离子体产生时，当辐射束与燃料相互作用时，光学部件具有布置并定位成被击中的表面 通过一滴燃料，以及温度调节器，其构造和布置成升高表面的温度。

公开(公告)号：US20120013872A1

公开(公告)日：2012-01-19

申请号：US13241837

申请日：2011-09-23

申请人： Joannes Theodoor DE SMIT ,  Vadim Yevgenyevich BANINE ,  Theodorus Hubertus Josephus BISSCHOPS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Theodorus Marinus MODDERMAN

发明人： Joannes Theodoor DE SMIT ,  Vadim Yevgenyevich BANINE ,  Theodorus Hubertus Josephus BISSCHOPS ,  Marcel Mathijs Theodore Marie DIERICHS ,  Theodorus Marinus MODDERMAN

IPC分类号： G03B27/52

CPC分类号： G03F7/70341 ,  G03F7/708 ,  G03F7/70858

摘要： A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns.

摘要翻译： 光刻设备和设备制造方法利用被限制在投影系统和基板之间的储存器中的液体。 检测和/或去除从溶解的大气中的液体中形成的液体或从暴露于液体的装置元件排出的气泡，使得它们不会干扰曝光并导致在基板上的印刷缺陷。 可以通过测量液体中超声波衰减的频率依赖性来进行检测，并且可以通过使液体脱气和加压，使用低表面张力的液体将液体与大气隔离，从而提供连续的液体流动 成像场和/或相移超声波驻波节点图案。

公开(公告)号：US20100290015A1

公开(公告)日：2010-11-18

申请号：US12821033

申请日：2010-06-22

申请人： Vadim Yevgenyevich BANINE ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

发明人： Vadim Yevgenyevich BANINE ,  Vladimir Vitalevitch Ivanov ,  Josephus Jacobus Smits ,  Harm-Jan Voorma ,  Lambertus Adrianus Van Den Wildenberg ,  Vladimir Mihailovitch Krivtsun ,  Alexander Matthijs Struycken ,  Carolus Ida Maria Antonius Spee ,  Klaas Timmer ,  Johannes Bernardus Ridder

IPC分类号： G03F7/20 ,  G02B27/00 ,  G03B27/54 ,  B08B5/00

CPC分类号： G03B7/20 ,  B08B7/00 ,  G01J1/0271 ,  G03F7/70175 ,  G03F7/70916 ,  G03F7/70925 ,  G03F7/70975

摘要： A collector assembly with a radiation collector, a cover plate and a support member connecting the radiation collector to the cover plate are provided. The cover plate is designed to cover an opening in a collector chamber. The collector chamber opening may be large enough to pass the radiation collector and the support member. The removed radiation collector can be cleaned with different cleaning procedures, which may be performed in a cleaning device. Such cleaning device may for example consist of the following: a circumferential hull designed to provide an enclosure volume for circumferentially enclosing at least the radiation collector; an inlet configured to provide at least one of a cleaning gas and a cleaning liquid to the enclosure volume to clean at least said radiation collector; and an outlet configured to remove said at least one of said cleaning gas and said cleaning liquid from the enclosure volume.

摘要翻译： 提供了一种具有辐射收集器，盖板和将辐射收集器连接到盖板的支撑构件的收集器组件。 盖板被设计成覆盖收集器室中的开口。 收集器室开口可以足够大以使辐射收集器和支撑构件通过。 去除的辐射收集器可以用不同的清洁程序进行清洁，这可以在清洁装置中进行。 这种清洁装置可以例如包括以下部件：设计成提供用于周向地包围至少辐射收集器的外壳体积的圆周船体; 入口，其构造成将清洁气体和清洁液体中的至少一个提供到所述外壳体积以清洁至少所述辐射收集器; 以及配置成从所述外壳体积中去除所述清洁气体和所述清洁液体中的所述至少一个的出口。

公开(公告)号：US20110076352A1

公开(公告)日：2011-03-31

申请号：US12891422

申请日：2010-09-27

申请人： Arie Jeffrey DEN BOEF ,  Vadim Yevgenyevich BANINE ,  Andre Bernardus JEUNINK ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN

发明人： Arie Jeffrey DEN BOEF ,  Vadim Yevgenyevich BANINE ,  Andre Bernardus JEUNINK ,  Sander Frederik WUISTER ,  Yvonne Wendela KRUIJT-STEGEMAN

IPC分类号： B29C59/02 ,  G01B11/14

CPC分类号： B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7003 ,  G03F9/7049 ,  G03F9/7076

摘要： A method of determining an offset between an imprint template and a substrate using an alignment grating on the imprint template and an alignment grating on the substrate is disclosed. The method includes bringing the imprint template alignment grating and the substrate alignment grating sufficiently close together such that they form a composite grating, directing an alignment radiation beam at the composite grating while modulating the relative position of the imprint template and the substrate, detecting the intensity of alignment radiation which is reflected from the composite grating, and determining the offset by analyzing modulation of the detected intensity.

摘要翻译： 公开了一种使用压印模板上的对准光栅和衬底上的对准光栅来确定压印模板和衬底之间的偏移的方法。 该方法包括使压印模板对准光栅和衬底对准光栅足够靠近在一起，使得它们形成复合光栅，在调制压印模板和衬底的相对位置的同时调整复合光栅处的对准辐射束，检测强度 从复合光栅反射的对准辐射，并通过分析检测强度的调制来确定偏移。

公开(公告)号：US20100253928A1

公开(公告)日：2010-10-07

申请号：US12818621

申请日：2010-06-18

申请人： Vadim Yevgenyevich BANINE ,  Vladimir Vitalevich Ivanov

发明人： Vadim Yevgenyevich BANINE ,  Vladimir Vitalevich Ivanov

IPC分类号： G03B27/54 ,  G21K5/04

CPC分类号： H05G2/003 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  H05G2/008

摘要： A radiation source includes a chamber, a supply constructed and arranged to supply a substance to the chamber at a location that allows the substance to pass through an interaction point within the chamber, a laser constructed and arranged to provide a laser beam to the interaction point so that a radiation emitting plasma is produced when the laser beam interacts with he substance at the interaction point, and a conduit constructed and arranged to deliver unheated buffer gas into the chamber at a location adjacent to the interaction point at a rate that removes heated buffer gas from a region around the interaction point before a subsequent interaction between the laser beam and the substance at the interaction point.

摘要翻译： 辐射源包括腔室，构造和布置成在物体通过腔室内的相互作用点的位置处将物质供应到腔室的供应源，构造和布置成将激光束提供到相互作用点的激光器 使得当激光束与相互作用点处的物质相互作用时，产生辐射发射等离子体，以及构造和布置成将未加热的缓冲气体以相对于相互作用点的位置的速率递送到腔室中的导管，其速率除去加热的缓冲液 在相互作用点之前的激光束和物质之间的后续相互作用之前的相互作用点周围的区域中的气体。