Linear electron source, evaporator using linear electron source, and applications of electron sources
    1.
    发明授权
    Linear electron source, evaporator using linear electron source, and applications of electron sources 有权
    线性电子源,蒸发器使用线性电子源,以及电子源的应用

    公开(公告)号:US08294115B2

    公开(公告)日:2012-10-23

    申请号:US12272477

    申请日:2008-11-17

    摘要: A linear plasma electron source is provided. The linear plasma electron source includes a housing acting as a first electrode, the housing having side walls a slit opening in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode being arranged within the housing and having a first side facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply for providing a gas into the housing.

    摘要翻译: 提供线性等离子体电子源。 线性等离子体电子源包括用作第一电极的壳体,壳体具有在壳体中用于侵入电子束的狭缝开口的侧壁,狭缝开口限定源的长度方向,第二电极布置在 壳体并且具有面向狭缝开口的第一侧,第一侧与狭缝开口间隔开第一距离,其中电子源在长度方向上的长度为第一距离的至少5倍,并且至少一个气体 用于向壳体提供气体。

    LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICATIONS OF ELECTRON SOURCES
    2.
    发明申请
    LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICATIONS OF ELECTRON SOURCES 有权
    线性电子源,使用线性电子源的蒸发器,以及电子源的应用

    公开(公告)号:US20090159811A1

    公开(公告)日:2009-06-25

    申请号:US12272477

    申请日:2008-11-17

    IPC分类号: H01J3/14 G21G4/00

    摘要: A linear plasma electron source is provided. The linear plasma electron source includes a housing acting as a first electrode, the housing having side walls a slit opening in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode being arranged within the housing and having a first side facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply for providing a gas into the housing.

    摘要翻译: 提供线性等离子体电子源。 线性等离子体电子源包括用作第一电极的壳体,壳体具有在壳体中用于侵入电子束的狭缝开口的侧壁,狭缝开口限定源的长度方向,第二电极布置在 壳体并且具有面向狭缝开口的第一侧,第一侧与狭缝开口间隔开第一距离,其中电子源在长度方向上的长度为第一距离的至少5倍,并且至少一个气体 用于向壳体提供气体。

    Linear electron source, evaporator using linear electron source, and applications of electron sources
    3.
    发明授权
    Linear electron source, evaporator using linear electron source, and applications of electron sources 有权
    线性电子源,蒸发器使用线性电子源,以及电子源的应用

    公开(公告)号:US07928411B2

    公开(公告)日:2011-04-19

    申请号:US12276872

    申请日:2008-11-24

    IPC分类号: H01J49/08 H01J37/305

    摘要: A method of charging a web or foil is described. The method includes guiding a web or foil having a thickness of 10 μm or larger with at least on roller; providing a linear electron source having a housing acting as an anode, the housing having side walls; a slit opening in the housing for trespassing of a linear electron beam, the slit opening defining a length direction of the source; a cathode being arranged within the housing and having a first side facing the slit opening; at least one gas supply for providing a gas into the housing; and a power supply for providing a high voltage between the anode and the cathode; and emitting the linear electron beam, wherein the high voltage is adjusted for providing an electron energy to implant electrons of the electron beam within the web or foil.

    摘要翻译: 描述了对网或箔进行充电的方法。 该方法包括至少在辊上引导具有10μm或更大厚度的纤维网或箔; 提供具有用作阳极的壳体的线性电子源,所述壳体具有侧壁; 所述壳体中的狭缝开口用于侵入线性电子束,所述狭缝开口限定所述源的长度方向; 阴极布置在壳体内并且具有面向狭缝开口的第一侧面; 用于将气体提供到壳体中的至少一个气体供应装置; 以及用于在阳极和阴极之间提供高电压的电源; 并发射线性电子束,其中调节高电压以提供电子能量以在电子束或箔内注入电子束的电子。

    System and method for generating ions and radicals
    4.
    发明授权
    System and method for generating ions and radicals 失效
    用于产生离子和自由基的系统和方法

    公开(公告)号:US07550927B2

    公开(公告)日:2009-06-23

    申请号:US11558309

    申请日:2006-11-09

    IPC分类号: H05B13/32

    摘要: A system and method for producing electrons and ions are disclosed. One embodiment includes an outer electrode with a discharge chamber; an inner electrode positioned inside the discharge chamber, the inner electrode positioning forming a upper portion of the discharge chamber and a lower portion of the discharge chamber; and a gas inlet positioned in the lower portion of the discharge chamber; wherein a plasma formed within the lower portion of the discharge chamber provides priming particles usable to form a plasma in the upper portion of the discharge chamber.

    摘要翻译: 公开了一种用于产生电子和离子的系统和方法。 一个实施例包括具有放电室的外部电极; 位于所述放电室内部的内电极,所述内电极定位形成所述放电室的上部和所述放电室的下部; 以及位于所述排出室的下部的气体入口; 其中形成在所述放电室的下部内的等离子体提供可用于在所述放电室的上部形成等离子体的引发粒子。

    SYSTEM AND METHOD FOR GENERATING IONS AND RADICALS
    5.
    发明申请
    SYSTEM AND METHOD FOR GENERATING IONS AND RADICALS 失效
    用于产生离子和辐射的系统和方法

    公开(公告)号:US20080111490A1

    公开(公告)日:2008-05-15

    申请号:US11558309

    申请日:2006-11-09

    IPC分类号: H01J3/00

    摘要: A system and method for producing electrons and ions are disclosed. One embodiment includes an outer electrode with a discharge chamber; an inner electrode positioned inside the discharge chamber, the inner electrode positioning forming a upper portion of the discharge chamber and a lower portion of the discharge chamber; and a gas inlet positioned in the lower portion of the discharge chamber; wherein a plasma formed within the lower portion of the discharge chamber provides priming particles usable to form a plasma in the upper portion of the discharge chamber.

    摘要翻译: 公开了一种用于产生电子和离子的系统和方法。 一个实施例包括具有放电室的外部电极; 位于所述放电室内部的内电极,所述内电极定位形成所述放电室的上部和所述放电室的下部; 以及位于所述排出室的下部的气体入口; 其中形成在所述放电室的下部内的等离子体提供可用于在所述放电室的上部形成等离子体的引发粒子。

    LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICATIONS OF ELECTRON SOURCES
    6.
    发明申请
    LINEAR ELECTRON SOURCE, EVAPORATOR USING LINEAR ELECTRON SOURCE, AND APPLICATIONS OF ELECTRON SOURCES 审中-公开
    线性电子源,使用线性电子源的蒸发器,以及电子源的应用

    公开(公告)号:US20090161719A1

    公开(公告)日:2009-06-25

    申请号:US12341791

    申请日:2008-12-22

    IPC分类号: H01J37/305 B23K10/00 B08B6/00

    摘要: An evaporation apparatus for evaporating a material to be deposited is described. The evaporation apparatus includes at least one evaporation crucible having a body with an area for receiving the material to be deposited at one side; a linear electron source being positioned adjacent to the evaporation crucible for impingement of an electron beam on another side. The linear electron source includes a housing acting as a first electrode, the housing having side walls; slit opening in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source; a second electrode being arranged within the housing and having a first side facing the slit opening; and at least one gas supply for providing a gas into the housing, wherein the first electrode is the anode and the second electrode is the cathode.

    摘要翻译: 描述用于蒸发待沉积材料的蒸发装置。 所述蒸发装置包括至少一个蒸发坩埚,所述蒸发坩埚具有主体,所述主体具有用于接收待在一侧沉积的材料的区域; 位于蒸发坩埚附近的线性电子源,用于在另一侧上撞击电子束。 线性电子源包括用作第一电极的壳体,壳体具有侧壁; 用于侵入电子束的壳体中的狭缝开口,狭缝开口限定了源的长度方向; 第二电极布置在壳体内并且具有面向狭缝开口的第一侧面; 以及用于将气体提供到壳体中的至少一个气体供应源,其中第一电极是阳极,第二电极是阴极。

    METHOD AND SYSTEM FOR MANUFACTURING A TRANSPARENT BODY FOR USE IN A TOUCH PANEL
    7.
    发明申请
    METHOD AND SYSTEM FOR MANUFACTURING A TRANSPARENT BODY FOR USE IN A TOUCH PANEL 有权
    用于制造面板的透明体的方法和系统

    公开(公告)号:US20140216924A1

    公开(公告)日:2014-08-07

    申请号:US14343125

    申请日:2011-09-07

    申请人: Hans-Georg Lotz

    发明人: Hans-Georg Lotz

    IPC分类号: H01J37/34 C23C14/34

    摘要: A process for manufacturing a transparent body for use in a touch panel is provided. The process includes: The process includes depositing a first transparent layer stack over a substrate with a first silicon-containing dielectric film, a second silicon-containing dielectric film, and a third silicon-containing dielectric film. The first and the third silicon-containing dielectric films have a low refractive index and the second silicon-containing dielectric film has a high refractive index. The process further includes depositing a transparent conductive film in a manner such that the first transparent layer stack and the transparent conductive film are disposed over the substrate in this order. At least one of the first silicon-containing dielectric film, the second silicon-containing dielectric film, the silicon-containing third dielectric film, or the transparent conductive film is deposited by sputtering from a target. Further thereto, a deposition apparatus (300) for manufacturing a transparent body for use in a touch panel and a transparent body for use in a touch panel are provided.

    摘要翻译: 提供一种用于制造用于触摸面板的透明体的方法。 该方法包括:该方法包括在第一含硅电介质膜,第二含硅电介质膜和第三含硅电介质膜上沉积衬底上的第一透明层堆叠。 第一和第三含硅介电膜具有低折射率,第二含硅电介质膜具有高折射率。 该方法还包括以使得第一透明层堆叠和透明导电膜以该顺序设置在衬底上的方式沉积透明导电膜。 第一含硅电介质膜,第二含硅电介质膜,含硅第三电介质膜或透明导电膜中的至少一个通过溅射从靶材沉积。 此外,提供了一种用于制造用于触摸面板的透明体和用于触摸面板的透明体的沉积设备(300)。

    Method of producing optical elements having interference layers
    9.
    发明授权
    Method of producing optical elements having interference layers 失效
    制造具有干涉层的光学元件的方法

    公开(公告)号:US4602847A

    公开(公告)日:1986-07-29

    申请号:US616961

    申请日:1984-06-04

    IPC分类号: G02B5/28

    CPC分类号: G02B5/285

    摘要: The invention concerns a method of producing optical elements, in particular filters, with interference layers comprising alternately slightly refractive and highly refractive dielectric layers deposited on a substrate S. The first layer 1 applied to the substrate is Al.sub.2 O.sub.3, constituting a slightly refractive layer, after which further layers 2 to n of ZnS and Al.sub.2 O.sub.3 are applied in an alternating sequence. The last layer n consists of Al.sub.2 O.sub.3. Such layers can be applied, at low temperatures, on flat substrates and, in particular, on sharply curved substrates. Production costs are reduced, and these layers possess the optical properties of known interference layers however resistance to external influences is greatly increased. In the case of mineral substrates, the coatings also offer considerable resistance to boiling.

    摘要翻译: 本发明涉及一种制造光学元件,特别是滤光片的方法,其中干涉层包括沉积在衬底S上的交替的略微折射和高折射的电介质层。施加到衬底上的第一层1是Al 2 O 3,构成稍微折射的层, 其中以交替的顺序施加进一步的ZnS和Al 2 O 3的层。 最后一层n由Al2O3组成。 这样的层可以在低温下在平坦的基底上,特别是在急剧弯曲的基底上施加。 生产成本降低,这些层具有已知干涉层的光学特性,但是对外部影响的抵抗力大大增加。 在矿物基材的情况下,涂层也具有相当大的耐沸腾性。

    VACUUM COATING INSTALLATION AND METHOD OF PRODUCING A COATING LAYER ON A SUBSTRATE
    10.
    发明申请
    VACUUM COATING INSTALLATION AND METHOD OF PRODUCING A COATING LAYER ON A SUBSTRATE 审中-公开
    真空涂料安装和在基材上生产涂层的方法

    公开(公告)号:US20090191327A1

    公开(公告)日:2009-07-30

    申请号:US12276533

    申请日:2008-11-24

    IPC分类号: C23C14/54

    摘要: A strip coating system includes a first pulley carrying a flexible metal or Al substrate wound up on the first pulley. A second, take-up, pulley is provided for taking up the coated substrate. The coating process is a continuous coating process, during which the first pulley and the second pulley are rotated to move the substrate continuously past a coating tool for depositing coating particles on a surface of the substrate. After having passed the coating section with a speed v, the substrate carrying a coating layer on the surface thereof passes an infrared spectroscopic measurement device for measuring the layer thickness of the coating layer. Feedback controls are provided to control one or more process parameters of the coating tool responsive to the measurement of the thickness of the coating layer detected by the measurement tool. Thus, an in situ online measurement of the thickness of the coating layer may be implemented.

    摘要翻译: 条带涂覆系统包括承载卷绕在第一滑轮上的柔性金属或Al基底的第一带轮。 提供第二个卷取轮,用于卷绕涂覆的基材。 涂覆过程是连续的涂覆过程,在该过程中,第一滑轮和第二滑轮被旋转以使基板连续地移动通过涂覆工具,以将涂层颗粒沉积在基板的表面上。 以速度v通过涂布部后,在其表面上带有涂层的基板通过用于测量涂层的层厚度的红外光谱测量装置。 响应于由测量工具检测到的涂层厚度的测量,提供反馈控制以控制涂层工具的一个或多个工艺参数。 因此,可以实现涂层厚度的在线在线测量。