公开(公告)号：US09926627B2

公开(公告)日：2018-03-27

申请号：US14364687

申请日：2011-12-21

Applicant: Uwe Hermanns ,  Neil Morrison ,  Tobias Stolley ,  Volker Hacker

Inventor： Uwe Hermanns ,  Neil Morrison ,  Tobias Stolley ,  Volker Hacker

IPC: C23C16/503 ,  C23C14/54 ,  C23C14/56 ,  C23C16/44 ,  C23C16/52 ,  C23C16/54

CPC classification number: C23C16/503 ,  C23C14/54 ,  C23C14/562 ,  C23C14/564 ,  C23C16/4401 ,  C23C16/52 ,  C23C16/545

Abstract: According to the present disclosure, a substrate processing apparatus for processing a flexible substrate including a vacuum chamber configured for being evacuated and being configured for having a process gas provided therein, a processing module adapted to process the flexible substrate, wherein the processing module is provided within the vacuum chamber, and a discharging assembly configured to generate a flow of charged particles to discharge the flexible substrate is provided. The discharging assembly is configured to generate an electric field for ionizing a processing gas.

公开(公告)号：US07928411B2

公开(公告)日：2011-04-19

申请号：US12276872

申请日：2008-11-24

Applicant: Guenter Klemm ,  Volker Hacker ,  Hans-Georg Lotz

Inventor： Guenter Klemm ,  Volker Hacker ,  Hans-Georg Lotz

IPC: H01J49/08 ,  H01J37/305

CPC classification number: H01J37/077 ,  C23C14/22 ,  C23C14/243 ,  C23C14/30 ,  H01J37/3053

Abstract: A method of charging a web or foil is described. The method includes guiding a web or foil having a thickness of 10 μm or larger with at least on roller; providing a linear electron source having a housing acting as an anode, the housing having side walls; a slit opening in the housing for trespassing of a linear electron beam, the slit opening defining a length direction of the source; a cathode being arranged within the housing and having a first side facing the slit opening; at least one gas supply for providing a gas into the housing; and a power supply for providing a high voltage between the anode and the cathode; and emitting the linear electron beam, wherein the high voltage is adjusted for providing an electron energy to implant electrons of the electron beam within the web or foil.

Abstract translation: 描述了对网或箔进行充电的方法。 该方法包括至少在辊上引导具有10μm或更大厚度的纤维网或箔; 提供具有用作阳极的壳体的线性电子源，所述壳体具有侧壁; 所述壳体中的狭缝开口用于侵入线性电子束，所述狭缝开口限定所述源的长度方向; 阴极布置在壳体内并且具有面向狭缝开口的第一侧面; 用于将气体提供到壳体中的至少一个气体供应装置; 以及用于在阳极和阴极之间提供高电压的电源; 并发射线性电子束，其中调节高电压以提供电子能量以在电子束或箔内注入电子束的电子。

公开(公告)号：US07550927B2

公开(公告)日：2009-06-23

申请号：US11558309

申请日：2006-11-09

Applicant: Michael W. Stowell ,  Guenter Klemm ,  Hans-Georg Lotz ,  Volker Hacker

Inventor： Michael W. Stowell ,  Guenter Klemm ,  Hans-Georg Lotz ,  Volker Hacker

IPC: H05B13/32

CPC classification number: H01J37/3266 ,  H01J27/16 ,  H01J37/32009 ,  H01J37/3233 ,  H01J37/32366

Abstract: A system and method for producing electrons and ions are disclosed. One embodiment includes an outer electrode with a discharge chamber; an inner electrode positioned inside the discharge chamber, the inner electrode positioning forming a upper portion of the discharge chamber and a lower portion of the discharge chamber; and a gas inlet positioned in the lower portion of the discharge chamber; wherein a plasma formed within the lower portion of the discharge chamber provides priming particles usable to form a plasma in the upper portion of the discharge chamber.

Abstract translation: 公开了一种用于产生电子和离子的系统和方法。 一个实施例包括具有放电室的外部电极; 位于所述放电室内部的内电极，所述内电极定位形成所述放电室的上部和所述放电室的下部; 以及位于所述排出室的下部的气体入口; 其中形成在所述放电室的下部内的等离子体提供可用于在所述放电室的上部形成等离子体的引发粒子。

公开(公告)号：US20080111490A1

公开(公告)日：2008-05-15

申请号：US11558309

申请日：2006-11-09

Applicant: Michael W. Stowell ,  Guenter Klemm ,  Hans-Georg Lotz ,  Volker Hacker

Inventor： Michael W. Stowell ,  Guenter Klemm ,  Hans-Georg Lotz ,  Volker Hacker

IPC: H01J3/00

CPC classification number: H01J37/3266 ,  H01J27/16 ,  H01J37/32009 ,  H01J37/3233 ,  H01J37/32366

Abstract: A system and method for producing electrons and ions are disclosed. One embodiment includes an outer electrode with a discharge chamber; an inner electrode positioned inside the discharge chamber, the inner electrode positioning forming a upper portion of the discharge chamber and a lower portion of the discharge chamber; and a gas inlet positioned in the lower portion of the discharge chamber; wherein a plasma formed within the lower portion of the discharge chamber provides priming particles usable to form a plasma in the upper portion of the discharge chamber.

Abstract translation: 公开了一种用于产生电子和离子的系统和方法。 一个实施例包括具有放电室的外部电极; 位于所述放电室内部的内电极，所述内电极定位形成所述放电室的上部和所述放电室的下部; 以及位于所述排出室的下部的气体入口; 其中形成在所述放电室的下部内的等离子体提供可用于在所述放电室的上部形成等离子体的引发粒子。

公开(公告)号：US20090161719A1

公开(公告)日：2009-06-25

申请号：US12341791

申请日：2008-12-22

Applicant: Guenter Klemm ,  Volker Hacker ,  Hans-Georg Lotz

Inventor： Guenter Klemm ,  Volker Hacker ,  Hans-Georg Lotz

IPC: H01J37/305 ,  B23K10/00 ,  B08B6/00

CPC classification number: H01J37/077 ,  C23C14/243 ,  C23C14/30 ,  G21K5/00 ,  H01J37/3053

Abstract: An evaporation apparatus for evaporating a material to be deposited is described. The evaporation apparatus includes at least one evaporation crucible having a body with an area for receiving the material to be deposited at one side; a linear electron source being positioned adjacent to the evaporation crucible for impingement of an electron beam on another side. The linear electron source includes a housing acting as a first electrode, the housing having side walls; slit opening in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source; a second electrode being arranged within the housing and having a first side facing the slit opening; and at least one gas supply for providing a gas into the housing, wherein the first electrode is the anode and the second electrode is the cathode.

Abstract translation: 描述用于蒸发待沉积材料的蒸发装置。 所述蒸发装置包括至少一个蒸发坩埚，所述蒸发坩埚具有主体，所述主体具有用于接收待在一侧沉积的材料的区域; 位于蒸发坩埚附近的线性电子源，用于在另一侧上撞击电子束。 线性电子源包括用作第一电极的壳体，壳体具有侧壁; 用于侵入电子束的壳体中的狭缝开口，狭缝开口限定了源的长度方向; 第二电极布置在壳体内并且具有面向狭缝开口的第一侧面; 以及用于将气体提供到壳体中的至少一个气体供应源，其中第一电极是阳极，第二电极是阴极。

公开(公告)号：US20150079271A1

公开(公告)日：2015-03-19

申请号：US14364687

申请日：2011-12-21

Applicant: Uwe Hermanns ,  Neil Morrison ,  Tobias Stolley ,  Volker Hacker

Inventor： Uwe Hermanns ,  Neil Morrison ,  Tobias Stolley ,  Volker Hacker

IPC: C23C16/503 ,  C23C16/54 ,  C23C16/52

CPC classification number: C23C16/503 ,  C23C14/54 ,  C23C14/562 ,  C23C14/564 ,  C23C16/4401 ,  C23C16/52 ,  C23C16/545

Abstract: According to the present disclosure, a substrate processing apparatus for processing a flexible substrate including a vacuum chamber configured for being evacuated and being configured for having a process gas provided therein, a processing module adapted to process the flexible substrate, wherein the processing module is provided within the vacuum chamber, and a discharging assembly configured to generate a flow of charged particles to discharge the flexible substrate is provided. The discharging assembly is configured to generate an electric field for ionizing a processing gas.

Abstract translation: 根据本公开，一种用于处理包括真空室的柔性基板的基板处理装置，所述真空室被构造成被抽真空并且被配置为具有设置在其中的处理气体;处理模块，其适于处理柔性基板，其中提供处理模块 并且设置有用于产生带电粒子流以排出柔性基板的排出组件。 放电组件被配置为产生用于电离处理气体的电场。

公开(公告)号：US20110247557A1

公开(公告)日：2011-10-13

申请号：US12759246

申请日：2010-04-13

Applicant: Karl-Heinrich WENK ,  Volker HACKER

Inventor： Karl-Heinrich WENK ,  Volker HACKER

IPC: C23C16/00 ,  F16J15/16 ,  B23P11/00

CPC classification number: C23C14/568 ,  B29C37/0089 ,  F16K7/10 ,  H01J2237/166 ,  Y10T29/49826

Abstract: The present disclosure relates to a device for sealing a chamber inlet or a chamber outlet for a flexible substrate, comprising a body having a sealing surface, a substrate opening formed in the body configured to be traversed by the flexible substrate, an elastic tube at least partially facing the sealing surface, wherein the elastic tube has a connecting portion for connecting to a gas supply and being adapted for inflating and deflating during operation. Further, the present disclosure relates to a substrate processing apparatus for processing a flexible substrate, the substrate processing apparatus comprising a first chamber and a second chamber separated from the first chamber, and a device for sealing a chamber inlet or a chamber outlet for a flexible substrate, the device comprising a body having a sealing surface, a substrate opening formed in the body configured to be traversed by the flexible substrate, an elastic tube at least partially facing the sealing surface, wherein the elastic tube has a connecting portion for connecting to a gas supply and being adapted for inflating and deflating during operation, wherein the device selectively opens or closes a fluid connection between the first and the second chamber. Additionally, the present disclosure relates to a method for assembling a device for sealing a chamber inlet or a chamber outlet for a flexible substrate, comprising providing a body having a sealing surface, wherein a substrate opening is formed in the body configured to be traversed by the flexible substrate; inserting an elastic tube into the body, such that the elastic tube is facing at least partially the sealing surface, the elastic tube having a connecting portion and being adapted for inflating and deflating during operation; and connecting the connecting portion of the elastic tube to a gas supply.

公开(公告)号：US20090159811A1

公开(公告)日：2009-06-25

申请号：US12272477

申请日：2008-11-17

Applicant: Guenter Klemm ,  Volker Hacker ,  Hans-Georg Lotz

Inventor： Guenter Klemm ,  Volker Hacker ,  Hans-Georg Lotz

IPC: H01J3/14 ,  G21G4/00

CPC classification number: H01J37/077 ,  H01J3/025 ,  H01J37/3053

Abstract: A linear plasma electron source is provided. The linear plasma electron source includes a housing acting as a first electrode, the housing having side walls a slit opening in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode being arranged within the housing and having a first side facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply for providing a gas into the housing.

Abstract translation: 提供线性等离子体电子源。 线性等离子体电子源包括用作第一电极的壳体，壳体具有在壳体中用于侵入电子束的狭缝开口的侧壁，狭缝开口限定源的长度方向，第二电极布置在 壳体并且具有面向狭缝开口的第一侧，第一侧与狭缝开口间隔开第一距离，其中电子源在长度方向上的长度为第一距离的至少5倍，并且至少一个气体 用于向壳体提供气体。

公开(公告)号：US08294115B2

公开(公告)日：2012-10-23

申请号：US12272477

申请日：2008-11-17

Applicant: Guenter Klemm ,  Volker Hacker ,  Hans-Georg Lotz

Inventor： Guenter Klemm ,  Volker Hacker ,  Hans-Georg Lotz

IPC: G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42

CPC classification number: H01J37/077 ,  H01J3/025 ,  H01J37/3053

Abstract: A linear plasma electron source is provided. The linear plasma electron source includes a housing acting as a first electrode, the housing having side walls a slit opening in the housing for trespassing of a electron beam, the slit opening defining a length direction of the source, a second electrode being arranged within the housing and having a first side facing the slit opening, the first side being spaced from the slit opening by a first distance, wherein the length of the electron source in the length direction is at least 5 times the first distance, and at least one gas supply for providing a gas into the housing.

Abstract translation: 提供线性等离子体电子源。 线性等离子体电子源包括用作第一电极的壳体，壳体具有在壳体中用于侵入电子束的狭缝开口的侧壁，狭缝开口限定源的长度方向，第二电极布置在 壳体并且具有面向狭缝开口的第一侧，第一侧与狭缝开口间隔开第一距离，其中电子源在长度方向上的长度为第一距离的至少5倍，并且至少一个气体 用于向壳体提供气体。

公开(公告)号：US20090159818A1

公开(公告)日：2009-06-25

申请号：US12276872

申请日：2008-11-24

Applicant: Guenter KLEMM ,  Volker HACKER ,  Hans-Georg LOTZ

Inventor： Guenter KLEMM ,  Volker HACKER ,  Hans-Georg LOTZ

IPC: A61N5/00 ,  G21G4/00

CPC classification number: H01J37/077 ,  C23C14/22 ,  C23C14/243 ,  C23C14/30 ,  H01J37/3053

Abstract: A method of charging a web or foil is described. The method includes guiding a web or foil having a thickness of 10 μm or larger with at least on roller; providing a linear electron source having a housing acting as an anode, the housing having side walls; a slit opening in the housing for trespassing of a linear electron beam, the slit opening defining a length direction of the source; a cathode being arranged within the housing and having a first side facing the slit opening; at least one gas supply for providing a gas into the housing; and a power supply for providing a high voltage between the anode and the cathode; and emitting the linear electron beam, wherein the high voltage is adjusted for providing an electron energy to implant electrons of the electron beam within the web or foil.

Abstract translation: 描述了对网或箔进行充电的方法。 该方法包括至少在辊上引导具有10μm或更大厚度的纤维网或箔; 提供具有用作阳极的壳体的线性电子源，所述壳体具有侧壁; 所述壳体中的狭缝开口用于侵入线性电子束，所述狭缝开口限定所述源的长度方向; 阴极布置在壳体内并且具有面向狭缝开口的第一侧面; 用于将气体提供到壳体中的至少一个气体供应装置; 以及用于在阳极和阴极之间提供高电压的电源; 并发射线性电子束，其中调节高电压以提供电子能量以在电子束或箔内注入电子束的电子。