-
公开(公告)号：US20180275082A1
公开(公告)日：2018-09-27
申请号：US15990226
申请日：2018-05-25
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Kevin Dooley , Richard Coull , Graeme Scott , Lorraine Byrne
IPC: G01N27/07
CPC classification number: G01N27/07 , B82Y30/00 , C25D3/12 , C25D5/022 , G01N27/048 , G01N27/126 , G01N27/127
Abstract: A structure for a chemical sensing device includes a plurality of recesses and a plurality of electrically conductive elements located in, and protruding from, the plurality of recesses.
-
公开(公告)号：US09964508B2
公开(公告)日：2018-05-08
申请号：US15456567
申请日：2017-03-12
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Graeme Scott , Richard Coull , Vittorio Scardaci
CPC classification number: G01N27/127 , B05D3/0254 , G01N25/02 , G01N27/121
Abstract: A water vapor sensor comprises a substrate and a film of carbon nanotubes impregnated with surfactant on the substrate. The substrate is of material which is inert relative to the film. Two or more electrical conductors are in contact with in spaced apart zones of the film, whereby the impedance of the film may be measured. The sensor is housed in housing which protects the sensor but also allows exposure of the film to water vapor.
-
3.发明申请公开(公告)号：US20140320152A1
公开(公告)日：2014-10-30
申请号：US13874315
申请日：2013-04-30
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： James Elmer Abbott, JR. , Vittorio Scardaci , Graeme Scott
IPC: G01N27/12
CPC classification number: G01N27/127 , B82Y30/00 , G01N33/0044
Abstract: A dosimeter includes a platinum-ruthenium (PtRu) nanoparticle-decorated, -coated, or -deposited carbon nanostructure element. The PtRu nanoparticle-decorated carbon nanostructure element is foulably sensitive to a gas.
Abstract translation: 剂量计包括铂 - 钌（PtRu）纳米颗粒装饰的，涂覆的或沉积的碳纳米结构元素。 PtRu纳米颗粒装饰的碳纳米结构元件对气体是非常敏感的。
-
公开(公告)号：US20140182372A1
公开(公告)日：2014-07-03
申请号：US14240362
申请日：2011-09-19
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Graeme Scott , Richard Coull , Vittorio Scardaci
CPC classification number: G01N27/127 , B05D3/0254 , G01N25/02 , G01N27/121
Abstract: A water vapour sensor comprises a substrate and a film of carbon nanotubes impregnated with surfactant on the substrate. The substrate is of material which is inert relative to the film. Two or more electrical conductors are in contact with in spaced apart zones of the film, whereby the impedance of the film may be measured. The sensor is housed in housing which protects the sensor but also allows exposure of the film to water vapour.
Abstract translation: 水蒸汽传感器包括基材和在基材上浸渍有表面活性剂的碳纳米管膜。 基材是相对于膜是惰性的材料。 两个或更多个电导体与膜的间隔开的区域接触，从而可以测量膜的阻抗。 传感器容纳在保护传感器的壳体中，但也允许膜暴露于水蒸汽。
-
公开(公告)号：US10078065B2
公开(公告)日：2018-09-18
申请号：US15218952
申请日：2016-07-25
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Kevin Dooley , Richard Coull , Graeme Scott , Lorraine Byrne
CPC classification number: G01N27/07 , B82Y30/00 , C25D3/12 , C25D5/022 , G01N27/048 , G01N27/126 , G01N27/127
Abstract: A structure for a chemical sensing device includes a plurality of recesses and a plurality of electrically conductive elements located in, and protruding from, the plurality of recesses.
-
Patent Agency Ranking
公开(公告)号：US09410911B2
公开(公告)日：2016-08-09
申请号：US13868435
申请日：2013-04-23
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Kevin Dooley , Richard Coull , Graeme Scott , Lorraine Byrne
CPC classification number: G01N27/07 , B82Y30/00 , C25D3/12 , C25D5/022 , G01N27/048 , G01N27/126 , G01N27/127
Abstract: A structure for a chemical sensing device, the structure comprising at least one electrically conductive element located in, and protruding from, at least one recess. A method of manufacturing the structure includes: (a) providing a template comprising at least one recess having a recess depth; (b) providing an electrically conductive material in the at least one recess; and (c) removing part of the template to decrease the recess depth of the at least one recess, thereby forming said protruding at least one electrically conductive element.
Abstract translation: 一种用于化学感测装置的结构，所述结构包括位于至少一个凹部中并从其突出的至少一个导电元件。 一种制造该结构的方法包括：（a）提供包含至少一个具有凹陷深度的凹部的模板; （b）在所述至少一个凹部中提供导电材料; 和（c）去除所述模板的一部分以减小所述至少一个凹部的凹陷深度，由此形成所述突出的至少一个导电元件。
-
7.发明授权公开(公告)号：US09304095B2
公开(公告)日：2016-04-05
申请号：US13874315
申请日：2013-04-30
Applicant: Hewlett-Packard Development Company, L.P.
Inventor： James Elmer Abbott, Jr. , Vittorio Scardaci , Graeme Scott
CPC classification number: G01N27/127 , B82Y30/00 , G01N33/0044
Abstract: A dosimeter includes a platinum-ruthenium (PtRu) nanoparticle-decorated, -coated, or -deposited carbon nanostructure element. The PtRu nanoparticle-decorated carbon nanostructure element is foulably sensitive to a gas.
Abstract translation: 剂量计包括铂 - 钌（PtRu）纳米颗粒装饰的，涂覆的或沉积的碳纳米结构元素。 PtRu纳米颗粒装饰的碳纳米结构元件对气体是非常敏感的。
-
公开(公告)号：US20170191176A1
公开(公告)日：2017-07-06
申请号：US15459272
申请日：2017-03-15
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Graeme Scott , Kevin Dooley , Lorraine Byrne , Pat J. Reilly
IPC: C25D1/04 , C23C18/16 , G03F7/00 , H05K3/20 , G03F7/038 , H05K1/09 , H05K3/00 , C25D1/00 , G03F7/20
CPC classification number: C25D1/04 , B82B3/0033 , B82Y40/00 , C23C18/1633 , C25D1/006 , G03F7/0002 , G03F7/038 , G03F7/2004 , G03F7/2006 , G03F7/2037 , G03F7/2039 , H05K1/09 , H05K3/0023 , H05K3/007 , H05K3/20 , H05K2203/0548 , H05K2203/1142 , Y10S977/762 , Y10S977/882 , Y10S977/932
Abstract: Controlling dimensions of nanowires includes lithographically forming a trench in a layer of a polymer resin with a width less than one micrometer where the polymer resin has a thickness less than one micrometer and is deposited over an electrically conductive substrate, depositing a nanowire material within the trench to form a nanowire, and obtaining the nanowire from the trench with a removal mechanism.
-
公开(公告)号：US09631291B2
公开(公告)日：2017-04-25
申请号：US13752868
申请日：2013-01-29
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Graeme Scott , Kevin Dooley , Lorraine Byrne , Pat J. Reilly
CPC classification number: C25D1/04 , B82B3/0033 , B82Y40/00 , C23C18/1633 , C25D1/006 , G03F7/0002 , G03F7/038 , G03F7/2004 , G03F7/2006 , G03F7/2037 , G03F7/2039 , H05K1/09 , H05K3/0023 , H05K3/007 , H05K3/20 , H05K2203/0548 , H05K2203/1142 , Y10S977/762 , Y10S977/882 , Y10S977/932
Abstract: Controlling dimensions of nanowires includes lithographically forming a trench in a layer of a polymer resin with a width less than one micrometer where the polymer resin has a thickness less than one micrometer and is deposited over an electrically conductive substrate, depositing a nanowire material within the trench to form a nanowire, and obtaining the nanowire from the trench with a removal mechanism.
-
公开(公告)号：US09776409B2
公开(公告)日：2017-10-03
申请号：US15305026
申请日：2014-04-24
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Kevin Dooley , John Larkin , Liam Cheevers , Kenneth Hickey , Graeme Scott
CPC classification number: B41J2/1433 , B41J2/1603 , B41J2/162 , B41J2/1631
Abstract: A method for forming a fluidic ejection device is described. The method includes depositing a first layer on a silicon wafer, the first layer including a first photoresist, and exposing, at a first energy level, a portion of the first photoresist. The method also includes depositing a second layer on the first layer, the second layer including a second photoresist that is more sensitive to light than the first photoresist, and exposing, at a second energy level, a portion of the second photoresist. The second energy level is less than the first energy level. The method also includes developing unexposed portions of the first photoresist and the second photoresist to form an enclosed firing chamber and a nozzle.
-
-
-
-
-
-
-
-
-
Search Results
15
records
(took 0.017 seconds)
