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公开(公告)号：US20180275082A1
公开(公告)日：2018-09-27
申请号：US15990226
申请日：2018-05-25
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Kevin Dooley , Richard Coull , Graeme Scott , Lorraine Byrne
IPC: G01N27/07
CPC classification number: G01N27/07 , B82Y30/00 , C25D3/12 , C25D5/022 , G01N27/048 , G01N27/126 , G01N27/127
Abstract: A structure for a chemical sensing device includes a plurality of recesses and a plurality of electrically conductive elements located in, and protruding from, the plurality of recesses.
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公开(公告)号：US20170084533A1
公开(公告)日：2017-03-23
申请号：US15364240
申请日：2016-11-29
Applicant: Hewlett-Packard Development Company, L.P.
Inventor： Kevin Dooley , Roger McQuaid , Liam Cheevers , David Fitzpatrick , Lorraine Byrne
IPC: H01L23/522 , H01L23/528 , H01L23/532 , H01L21/768
CPC classification number: H01L23/5226 , H01L21/76802 , H01L21/76828 , H01L21/76877 , H01L23/528 , H01L23/5283 , H01L23/5329 , H01L27/1214 , H01L2924/0002 , H01L2924/00
Abstract: A dielectric layer includes a reflow via. The reflow via is formed by reflow of the dielectric layer away from a raised feature. An interconnect is in contact with the raised feature through the reflow via.
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公开(公告)号：US09780028B2
公开(公告)日：2017-10-03
申请号：US15364240
申请日：2016-11-29
Applicant: Hewlett-Packard Development Company, L.P.
Inventor： Kevin Dooley , Roger McQuaid , Liam Cheevers , David Fitzpatrick , Lorraine Byrne
IPC: H01L23/00 , H01L23/522 , H01L23/532 , H01L21/768 , H01L23/528 , H01L27/12
CPC classification number: H01L23/5226 , H01L21/76802 , H01L21/76828 , H01L21/76877 , H01L23/528 , H01L23/5283 , H01L23/5329 , H01L27/1214 , H01L2924/0002 , H01L2924/00
Abstract: A dielectric layer includes a reflow via. The reflow via is formed by reflow of the dielectric layer away from a raised feature. An interconnect is in contact with the raised feature through the reflow via.
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公开(公告)号：US20170146475A1
公开(公告)日：2017-05-25
申请号：US15218952
申请日：2016-07-25
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Kevin Dooley , Richard Coull , Graeme Scott , Lorraine Byrne
IPC: G01N27/07
CPC classification number: G01N27/07 , B82Y30/00 , C25D3/12 , C25D5/022 , G01N27/048 , G01N27/126 , G01N27/127
Abstract: A structure for a chemical sensing device includes a plurality of recesses and a plurality of electrically conductive elements located in, and protruding from, the plurality of recesses.
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公开(公告)号：US20140314624A1
公开(公告)日：2014-10-23
申请号：US13868435
申请日：2013-04-23
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Kevin Dooley , Richard Coull , Graeme Scott , Lorraine Byrne
CPC classification number: G01N27/07 , B82Y30/00 , C25D3/12 , C25D5/022 , G01N27/048 , G01N27/126 , G01N27/127
Abstract: A structure for a chemical sensing device, the structure comprising at least one electrically conductive element located in, and protruding from, at least one recess. A method of manufacturing the structure includes: (a) providing a template comprising at least one recess having a recess depth; (b) providing an electrically conductive material in the at least one recess; and (c) removing part of the template to decrease the recess depth of the at least one recess, thereby forming said protruding at least one electrically conductive element.
Abstract translation: 一种用于化学感测装置的结构，所述结构包括位于至少一个凹部中并从其突出的至少一个导电元件。 一种制造该结构的方法包括：（a）提供包含至少一个具有凹陷深度的凹部的模板; （b）在所述至少一个凹部中提供导电材料; 和（c）去除所述模板的一部分以减小所述至少一个凹部的凹陷深度，由此形成所述突出的至少一个导电元件。
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Patent Agency Ranking
公开(公告)号：US20140209469A1
公开(公告)日：2014-07-31
申请号：US13752868
申请日：2013-01-29
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Graeme Scott , Kevin Dooley , Lorraine Byrne , Pat J. Reilly
CPC classification number: C25D1/04 , B82B3/0033 , B82Y40/00 , C23C18/1633 , C25D1/006 , G03F7/0002 , G03F7/038 , G03F7/2004 , G03F7/2006 , G03F7/2037 , G03F7/2039 , H05K1/09 , H05K3/0023 , H05K3/007 , H05K3/20 , H05K2203/0548 , H05K2203/1142 , Y10S977/762 , Y10S977/882 , Y10S977/932
Abstract: Controlling dimensions of nanowires includes lithographically forming a trench in a layer of a polymer resin with a width less than one micrometer where the polymer resin has a thickness less than one micrometer and is deposited over an electrically conductive substrate, depositing a nanowire material within the trench to form a nanowire, and obtaining the nanowire from the trench with a removal mechanism.
Abstract translation: 纳米线的控制尺寸包括在宽度小于1微米的聚合物树脂层中光刻形成沟槽，其中聚合物树脂具有小于1微米的厚度并沉积在导电衬底上，在沟槽内沉积纳米线材料 形成纳米线，用去除机构从沟槽获得纳米线。
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公开(公告)号：US10078065B2
公开(公告)日：2018-09-18
申请号：US15218952
申请日：2016-07-25
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Kevin Dooley , Richard Coull , Graeme Scott , Lorraine Byrne
CPC classification number: G01N27/07 , B82Y30/00 , C25D3/12 , C25D5/022 , G01N27/048 , G01N27/126 , G01N27/127
Abstract: A structure for a chemical sensing device includes a plurality of recesses and a plurality of electrically conductive elements located in, and protruding from, the plurality of recesses.
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公开(公告)号：US09410911B2
公开(公告)日：2016-08-09
申请号：US13868435
申请日：2013-04-23
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Kevin Dooley , Richard Coull , Graeme Scott , Lorraine Byrne
CPC classification number: G01N27/07 , B82Y30/00 , C25D3/12 , C25D5/022 , G01N27/048 , G01N27/126 , G01N27/127
Abstract: A structure for a chemical sensing device, the structure comprising at least one electrically conductive element located in, and protruding from, at least one recess. A method of manufacturing the structure includes: (a) providing a template comprising at least one recess having a recess depth; (b) providing an electrically conductive material in the at least one recess; and (c) removing part of the template to decrease the recess depth of the at least one recess, thereby forming said protruding at least one electrically conductive element.
Abstract translation: 一种用于化学感测装置的结构，所述结构包括位于至少一个凹部中并从其突出的至少一个导电元件。 一种制造该结构的方法包括：（a）提供包含至少一个具有凹陷深度的凹部的模板; （b）在所述至少一个凹部中提供导电材料; 和（c）去除所述模板的一部分以减小所述至少一个凹部的凹陷深度，由此形成所述突出的至少一个导电元件。
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公开(公告)号：US20170191176A1
公开(公告)日：2017-07-06
申请号：US15459272
申请日：2017-03-15
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Graeme Scott , Kevin Dooley , Lorraine Byrne , Pat J. Reilly
IPC: C25D1/04 , C23C18/16 , G03F7/00 , H05K3/20 , G03F7/038 , H05K1/09 , H05K3/00 , C25D1/00 , G03F7/20
CPC classification number: C25D1/04 , B82B3/0033 , B82Y40/00 , C23C18/1633 , C25D1/006 , G03F7/0002 , G03F7/038 , G03F7/2004 , G03F7/2006 , G03F7/2037 , G03F7/2039 , H05K1/09 , H05K3/0023 , H05K3/007 , H05K3/20 , H05K2203/0548 , H05K2203/1142 , Y10S977/762 , Y10S977/882 , Y10S977/932
Abstract: Controlling dimensions of nanowires includes lithographically forming a trench in a layer of a polymer resin with a width less than one micrometer where the polymer resin has a thickness less than one micrometer and is deposited over an electrically conductive substrate, depositing a nanowire material within the trench to form a nanowire, and obtaining the nanowire from the trench with a removal mechanism.
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公开(公告)号：US09631291B2
公开(公告)日：2017-04-25
申请号：US13752868
申请日：2013-01-29
Applicant: HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.
Inventor： Graeme Scott , Kevin Dooley , Lorraine Byrne , Pat J. Reilly
CPC classification number: C25D1/04 , B82B3/0033 , B82Y40/00 , C23C18/1633 , C25D1/006 , G03F7/0002 , G03F7/038 , G03F7/2004 , G03F7/2006 , G03F7/2037 , G03F7/2039 , H05K1/09 , H05K3/0023 , H05K3/007 , H05K3/20 , H05K2203/0548 , H05K2203/1142 , Y10S977/762 , Y10S977/882 , Y10S977/932
Abstract: Controlling dimensions of nanowires includes lithographically forming a trench in a layer of a polymer resin with a width less than one micrometer where the polymer resin has a thickness less than one micrometer and is deposited over an electrically conductive substrate, depositing a nanowire material within the trench to form a nanowire, and obtaining the nanowire from the trench with a removal mechanism.
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