公开(公告)号：US20080236423A1

公开(公告)日：2008-10-02

申请号：US11693390

申请日：2007-03-29

申请人： Harald Baumann ,  Udo Dwars ,  Joerg Heinemann ,  Michael Mursal ,  Marco Scala

发明人： Harald Baumann ,  Udo Dwars ,  Joerg Heinemann ,  Michael Mursal ,  Marco Scala

IPC分类号： B41F35/04

CPC分类号： B41F35/04 ,  B41P2235/20

摘要： An apparatus and related method for preparing a lithographic web during manufacturing by incorporating a cleaning device cleaning device capable of being in contact with one or more web rollers. The cleaning device including a cleaning applicator to apply the cleaning solution such that the cleaning solution connected to the cleaning applicator, and a controller to move the applicator from an operational mode to a self-cleaning mode.

摘要翻译： 一种用于在制造期间通过结合能够与一个或多个卷筒纸辊接触的清洁装置清洁装置来制备平版印刷卷材的装置和相关方法。 清洁装置包括清洁施加器以施加清洁溶液，使得连接到清洁施加器的清洁溶液和控制器将施加器从操作模式移动到自清洁模式。

公开(公告)号：US20090211477A1

公开(公告)日：2009-08-27

申请号：US12401739

申请日：2009-03-11

申请人： Harald Baumann ,  Udo Dwars ,  Jorg Heinemann ,  Michael Mursal ,  Marco Scala

发明人： Harald Baumann ,  Udo Dwars ,  Jorg Heinemann ,  Michael Mursal ,  Marco Scala

IPC分类号： B41N3/00 ,  B08B7/00

CPC分类号： B41F35/04 ,  B41P2235/20

摘要： An apparatus and related method for preparing a lithographic web during manufacturing by incorporating a cleaning device cleaning device capable of being in contact with one or more web rollers. The cleaning device including a cleaning applicator to apply the cleaning solution such that the cleaning solution connected to the cleaning applicator, and a controller to move the applicator from an operational mode to a self-cleaning mode.

摘要翻译： 一种用于在制造期间通过结合能够与一个或多个卷筒纸辊接触的清洁装置清洁装置来制备平版印刷卷材的装置和相关方法。 清洁装置包括清洁施加器以施加清洁溶液，使得连接到清洁施加器的清洁溶液和控制器将施加器从操作模式移动到自清洁模式。

公开(公告)号：US20100107914A1

公开(公告)日：2010-05-06

申请号：US12687201

申请日：2010-01-14

申请人： Harald Baumann ,  Udo Dwars ,  Jorg Heinemann ,  Michael Mursal ,  Marco Scala ,  Martin Schubert

发明人： Harald Baumann ,  Udo Dwars ,  Jorg Heinemann ,  Michael Mursal ,  Marco Scala ,  Martin Schubert

IPC分类号： B41L41/00

CPC分类号： B41F35/04 ,  B41P2235/20

摘要： A method for preparing a lithographic web during manufacturing by incorporating a cleaning device cleaning device capable of being in contact with one or more web rollers. The cleaning device including a cleaning applicator to apply the cleaning solution such that the cleaning solution connected to the cleaning applicator, and a controller to move the applicator from an operational mode to a self-cleaning mode.

摘要翻译： 一种在制造期间通过结合能够与一个或多个卷材辊接触的清洁装置清洁装置来制备平版印刷网的方法。 清洁装置包括清洁施加器以施加清洁溶液，使得连接到清洁施加器的清洁溶液和控制器将施加器从操作模式移动到自清洁模式。

公开(公告)号：US07615323B2

公开(公告)日：2009-11-10

申请号：US11718809

申请日：2005-11-11

申请人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

发明人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

IPC分类号： G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  G03F7/11 ,  G03F7/38 ,  G03F7/40 ,  B41C1/10

CPC分类号： G03F7/029 ,  G03F7/031 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/123 ,  Y10S430/127 ,  Y10S522/904 ,  Y10S522/913

摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.

摘要翻译： 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由基聚合的烯键式不饱和基团，（ii）至少一种敏化剂和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p1是芳族或杂芳族单元或两者的组合，使得共轭的n体系存在于 结构（I）中的两个基团Z，每个Z独立地表示杂原子，每个R 1和R 2独立地选自卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各自 R 3，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或1-4的整数，n的值> 1，AS是脂肪族间隔基。

公开(公告)号：US20060024609A1

公开(公告)日：2006-02-02

申请号：US10537471

申请日：2003-12-17

申请人： Udo Dwars ,  Harald Baumann ,  Michael Mursal ,  Axel Draber

发明人： Udo Dwars ,  Harald Baumann ,  Michael Mursal ,  Axel Draber

IPC分类号： G03C1/76

CPC分类号： G03F7/0048 ,  G03F7/0166 ,  G03F7/16

摘要： A process for the production of lithographic printing plate precursors with a coating comprising a diazo resin is described, wherein a solvent mixture comprising (i) 2 to 9.9 wt.-% 1-methoxy-2-propanol, (ii) 20 to 50 wt.-% of at least one ketone with a boiling point below 130° C., (iii) 20 to 60 wt.-% of at least one alkanol with a boiling point below 120° C., and (iv) 10 to 30 wt.-% ethyl lactate, and a slot coater are used to produce the printing plate precursors.

摘要翻译： 描述了一种制备具有包含重氮树脂的涂层的平版印刷版前体的方法，其中包含（i）2-9.9重量％1-甲氧基-2-丙醇，（ii）20至50重量％ 至少一种沸点低于130℃的酮，（iii）20至60重量％的至少一种沸点低于120℃的链烷醇，和（iv）10至30 重量％乳酸乙酯和狭缝涂布机用于制备印刷版前体。

公开(公告)号：US20070269745A1

公开(公告)日：2007-11-22

申请号：US11718809

申请日：2005-11-11

申请人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

发明人： Bernd Strehmel ,  Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Axel Draber ,  Michael Mursal

IPC分类号： G03C1/00

CPC分类号： G03F7/029 ,  G03F7/031 ,  Y10S430/116 ,  Y10S430/117 ,  Y10S430/121 ,  Y10S430/123 ,  Y10S430/127 ,  Y10S522/904 ,  Y10S522/913

摘要： Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a freeradical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer

摘要翻译： 该平版印刷版原版包括（a）具有亲水表面的平版印刷基材和（b）亲水表面上的辐射敏感涂层，其包含（i）一种或多种类型的单体和/或低聚物和/或聚合物， 至少一种可自由聚合的烯属不饱和基团，（ii）至少一种敏化剂，和至少一种能够与敏化剂（ii）一起形成自由基的共引发剂; 其特征在于，所述至少一种敏化剂是包含以下结构单元（式（I））的低聚或聚合化合物，其中p 1是芳族或杂芳族单元或两者的组合，使得 在结构（I）中的两个基团Z之间存在共轭n系，每个Z独立地表示杂原子，每个R 1和R 2独立地选自 卤素原子，烷基，芳基，烷基芳基或芳烷基，基团-NR 3 R 4和基团-OR 5，各R R 4，R 4和R 5独立地选自烷基，芳基，烷基芳基和芳烷基，a和b独立地表示0或 1〜4的整数，n的值为1，AS为脂肪族间隔物

公开(公告)号：US09329485B2

公开(公告)日：2016-05-03

申请号：US14484333

申请日：2014-09-12

申请人： Christopher D. Simpson ,  Harald Baumann ,  Michael Flugel ,  Saija Werner ,  Oliver Piestert ,  Udo Dwars

发明人： Christopher D. Simpson ,  Harald Baumann ,  Michael Flugel ,  Saija Werner ,  Oliver Piestert ,  Udo Dwars

IPC分类号： G03F7/32 ,  G03F7/38 ,  B41C1/10

CPC分类号： G03F7/38 ,  B41C1/1008 ,  G03F7/32

摘要： Lithographic printing plates are provided by imagewise exposing negative-working lithographic printing plate precursors having a negative-working radiation-sensitive imageable layer, followed by contacting with a processing solution that has a pH of at least 7 and up to and including 11. This processing solution also includes component (1) that is a nitrogen-containing base having an atmospheric pressure melting point of at least 40° C.; component (2) that is a non-ionic surfactant that independently has an atmospheric pressure melting point, glass transition temperature, or pour point of at least 40° C.; component (3) that is a hydroxy-containing solution promoter; and component (4) that is a hydrophilic surface protective compound. The method is carried out in a manner such that the exposed and processed precursor is not further treated with any liquid (such as gumming or rinsing solution) between processing and mounting onto a printing press.

摘要翻译： 平版印刷版通过成像曝光具有负性辐射敏感可成像层的负性平版印刷版原版提供，然后与pH至少为7且高达11并且包括11的处理溶液接触。这种处理 溶液还包括作为大气压熔点至少为40℃的含氮碱的组分（1）。 组分（2），其是独立地具有至少40℃的大气压熔点，玻璃化转变温度或倾点的非离子表面活性剂。 作为含羟基溶液促进剂的组分（3）; 和作为亲水性表面保护性化合物的成分（4）。 该方法以这样的方式进行，使得在处理和安装到印刷机上之前，曝光和加工的前体不被任何液体（例如上胶或漂洗溶液）进一步处理。

公开(公告)号：US08318405B2

公开(公告)日：2012-11-27

申请号：US12403458

申请日：2009-03-13

申请人： Christopher D. Simpson ,  Harald Baumann ,  Udo Dwars ,  Bernd Strehmel

发明人： Christopher D. Simpson ,  Harald Baumann ,  Udo Dwars ,  Bernd Strehmel

IPC分类号： B32B3/10 ,  G03F7/09 ,  G03F7/11

CPC分类号： G03F7/092 ,  G03F7/11 ,  Y10T428/24802

摘要： Negative-working imageable element can be used to provide lithographic printing plates. The imageable element has a suitable radiation-sensitive imageable layer and a water-soluble overcoat disposed on the imageable layer. This overcoat comprises at least one poly(vinyl alcohol) having a saponification degree of at least 90%, an alkoxylation product of an alkanol, and either a 2-sulfonato succinic acid dialkylester or an alkoxylation product of a 1,4-butanediol.

摘要翻译： 负性可成像元件可用于提供平版印刷版。 可成像元件具有合适的辐射敏感可成像层和设置在可成像层上的水溶性外涂层。 该外涂层包含至少一种皂化度至少为90％的聚（乙烯醇），链烷醇的烷氧基化产物，2-磺酸丁二酸二烷基酯或1,4-丁二醇的烷氧基化产物。

公开(公告)号：US07442486B2

公开(公告)日：2008-10-28

申请号：US10544758

申请日：2004-02-20

申请人： Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Michael Flugel

发明人： Harald Baumann ,  Udo Dwars ,  Detlef Pietsch ,  Michael Flugel

IPC分类号： G03C1/76 ,  G03C1/492 ,  G03C1/494 ,  G03C5/00 ,  G03C1/00

CPC分类号： G03F7/029 ,  G03F7/031

摘要： Radiation-sensitive element comprising: (a) one or more types of monomers each comprising at least one ethylenically unsaturated group accessible to a free-radical polymerization, (b) at least one sensitizer, (c) at least one coinitiator capable of forming free radicals together with the sensitizer (b) and selected from the following classes of compounds: metallocenes; 1,3,5-triazine derivatives with one to three CX3 groups, wherein X represents chlorine or bromine; peroxides; hexaarylbiimidazoles; oxime ethers; oxime esters; N-aryl glycines and derivatives thereof; thiol compounds; N-aryl, S-aryl and O-aryl polycarboxylic acids with at least 2 carboxyl groups of which at least one is bonded to the N, S or O atom of the aryl unit; alkyltriarylborates; benzoin ethers; benzoin esters; trihalogenomethylarylsulfones; amines; N,N-dialkylaminobenzoic acid esters; aromatic sulfonyl halides; trihalogenomethylsulfones; imides; diazosulfonates; 9,10-dihydroanthracene derivatives; a-hydroxy and a-amino acetophenones; and (d) optionally one or more components selected from alkali-soluble binders, colorants, exposure indicators, plasticizers, chain transfer agents, leuco dyes, surfactants, inorganic fillers and thermopolymerization inhibitors characterized in that the at least one sensitizer is an oxazole derivative of the formula (I), wherein each R1, R2 and R3 is independently selected from a halogen atom, an optionally substituted alkyl group, an optionally substituted aryl group, which may also be fused, an optionally substituted aralkyl group, a group —NR4R5 and a group —OR6, wherein R4 and R5 are independently selected from a hydrogen atom, an alkyl, aryl or ralkyl group, R6 is an alkyl, aryl or aralkyl group or a hydrogen atom and k, m and n are independently 0 or an integer from 1 to 5.

公开(公告)号：US5698360A

公开(公告)日：1997-12-16

申请号：US677703

申请日：1996-07-10

申请人： Hans-Joachim Timpe ,  Udo Dwars ,  Harald Baumann ,  Celin Savariar-Hauck

发明人： Hans-Joachim Timpe ,  Udo Dwars ,  Harald Baumann ,  Celin Savariar-Hauck

IPC分类号： C08F8/34 ,  G03F7/021 ,  G03F7/033

CPC分类号： G03F7/0212 ,  C08F8/34 ,  G03F7/0215 ,  G03F7/033

摘要： The present invention relates to binders and photosensitive compositions comprising said binders. The binder comprises units A, B, C and D, wherein A is present in an amount of 0.5 to 15 wt. % and is of the formula ##STR1## B is present in an amount of 10 to 35 wt. % and is of the formula ##STR2## C is present in an amount of 10 to 50 wt. % and is of the formula ##STR3## wherein R.sup.1 is methyl, ethyl, propyl or isopropyl, and D is present in an amount of 25 to 70 wt. % and is of the formula ##STR4## wherein n is an integer of from 1 to 3 and R.sup.2, R.sup.3 are hydrogen or methyl and R.sup.4 is alkyl, aralkyl or aryl.

摘要翻译： 本发明涉及包含所述粘合剂的粘合剂和光敏组合物。 粘合剂包含单元A，B，C和D，其中A的存在量为0.5-15wt。 （A）B以10〜35重量％的量存在。 ％，并且具有式50重量％ ％，并且具有式（C）的式（C）其中R 1是甲基，乙基，丙基或异丙​​基，D以25至70重量％的量存在。 ％，并且具有式（D）的式（I）其中n是1至3的整数，R 2，R 3是氢或甲基，R 4是烷基，芳烷基或芳基。