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14 条记录 (耗时 0.021 秒)

    Magnetic circuit for matrix print head
    3.
    发明授权
    Magnetic circuit for matrix print head 失效
    矩阵打印头磁路

    公开(公告)号：US4695174A

    公开(公告)日：1987-09-22

    申请号：US822874

    申请日：1986-01-27

    申请人： Bernd Gugel ,  Harald Niebel ,  Hubert Ott

    发明人： Bernd Gugel ,  Harald Niebel ,  Hubert Ott

    IPC分类号： B41J2/28 ,  B41J3/12

    CPC分类号： B41J2/28

    摘要： A matrix print head includes a magnetic yoke plate, magnetic pole defining cores annularly arranged on the yoke plate, electromagnetic coils mounted on the cores, a permanent magnet plate arranged in magnetic conductive relationship to the yoke plate; the yoke plate, the cores, coils, and permanent magnet plate establishing an electromagnetic assembly, there being additionally an armature assembly including an armature plate and a plurality of deflectable radially extending armature arms, the armature assembly being arranged in relation to the electromagnetic assembly such that the armature arms cooperate with the electromagnetic cores, there being print elements such as styli connected to the armature arms; the improvement disclosed is comprised of the following features, the armature plate and the armature arms are physically separated from each other but resiliently interconnected to establish a single uncritical parasitic air gap; and the magnetic yoke and armature plates are radially, inwardly recessed vis-a-vis the permanent magnet plate. A radially inwardly and outwardly recessed intermediate plate is interposed between the permanent magnet and the armature ring.

    摘要翻译： 矩阵式打印头包括磁轭板，环形地设置在磁轭板上的磁极限定磁芯，安装在磁芯上的电磁线圈，与磁轭板成磁导电关系的永久磁铁板; 磁轭板，磁芯，线圈和建立电磁组件的永磁体板，还有一个电枢组件，其包括电枢板和多个可偏转径向延伸的电枢臂，电枢组件相对于电磁组件布置 电枢臂与电磁铁芯配合，存在诸如连接到电枢臂的测针的打印元件; 所公开的改进包括以下特征，电枢板和衔铁臂在物理上彼此分离，但是弹性互连以建立单个非关键寄生气隙; 并且磁轭和衔铁板相对于永磁体板径向地向内凹入。 径向向内和向外凹入的中间板介于永磁体和电枢环之间。

    Precession diffraction charged particle beam system
    4.
    发明授权
    Precession diffraction charged particle beam system 有权
    进动衍射带电粒子束系统

    公开(公告)号：US08541739B2

    公开(公告)日：2013-09-24

    申请号：US13190871

    申请日：2011-07-26

    申请人： Gerd Benner ,  Harald Niebel

    发明人： Gerd Benner ,  Harald Niebel

    IPC分类号： G01N23/20 ,  G21K1/10

    CPC分类号： H01J37/295 ,  G01N23/20058

    摘要： A charged particle beam system for performing precession diffraction includes a lens 11 for focusing a beam 5 in an object plane 9, and an objective lens 13 having a diffraction plane 27. A doublet 53 of lenses 35, 63 images the diffraction plane 27 into an intermediate diffraction plane 69 where a multipole 55 is located. A doublet 57 of lenses 65, 93 images the intermediate diffraction plane 69 into an intermediate diffraction plane 71 where a multipole 59 is located. A first deflection system 15 upstream of the object plane 9 can tilt to change an angle of incidence of the beam on the object plane. A second deflection system 37 between lenses 35 and 63 tilts the beam such that the change of the angle of incidence of the charged particle beam on the object plane is compensated.

    摘要翻译： 用于进行进动衍射的带电粒子束系统包括用于将光束5聚焦在物平面9中的透镜11和具有衍射平面27的物镜13.透镜35,63的双折射53将衍射平面27成像为 中间衍射平面69，其中多极55位于其中。 透镜65,93的双重透镜57将中间衍射平面69成像为多极59所在的中间衍射平面71。 在物平面9上游的第一偏转系统15可以倾斜以改变光束在物平面上的入射角。 透镜35和63之间的第二偏转系统37使光束倾斜，使得补偿了物体平面上的带电粒子束的入射角的变化。

    Electron beam device having a specimen holder
    5.
    发明授权
    Electron beam device having a specimen holder 有权
    具有试样架的电子束装置

    公开(公告)号：US07119344B2

    公开(公告)日：2006-10-10

    申请号：US10895629

    申请日：2004-07-21

    申请人： Stephan Hiller ,  Richard König ,  Harald Niebel

    发明人： Stephan Hiller ,  Richard König ,  Harald Niebel

    IPC分类号： H01J37/20

    CPC分类号： H01J37/26 ,  H01J37/20

    摘要： An electron beam device having a specimen holder, in particular for a transmission electron microscope (TEM), which makes it possible to identify the specimen holder in a simple manner is described. Therefore, the electron beam device has at least one specimen holder having at least one holding element for holding a specimen and at least one identification unit. Furthermore, the electron beam device has a reading unit for reading the identification unit without contact, a goniometer, into which the specimen holder may be inserted, and a controller for controlling the movement modes of the goniometer, via which the movement modes of the goniometer are controlled on the basis of the identification data supplied by the identification unit and of corresponding data stored in the controller.

    摘要翻译： 具有特别用于透射电子显微镜（TEM）的试样保持器的电子束装置被描述为使得能够以简单的方式识别试样保持器。 因此，电子束装置具有至少一个具有至少一个用于保持试样的保持元件和至少一个识别单元的样本保持器。 此外，电子束装置具有用于读取识别单元而不接触的读取单元，可以插入样本保持器的测角器，以及用于控制测角器的移动模式的控制器，通过该控制器，测角器的移动模式 基于由识别单元提供的识别数据和存储在控制器中的相应数据进行控制。

    Dot matrix print head with an adjustable print needle guide
    6.
    发明授权
    Dot matrix print head with an adjustable print needle guide 失效
    点阵打印头，带有可调节的打印针导向

    公开(公告)号：US4629344A

    公开(公告)日：1986-12-16

    申请号：US716531

    申请日：1985-03-26

    申请人： Harald Niebel

    发明人： Harald Niebel

    IPC分类号： B41J2/265 ,  B41J2/255 ,  B41J2/275 ,  B41J2/51 ,  B41J3/12

    CPC分类号： B41J25/001 ,  B41J2/255

    摘要： A dot matrix print head which has on the side of the print countersupport (1) a print needle adjustment unit (3) with an electromagnetically drivable guide orifice (7) for the print needles (4) on an adjustment element (6). To provide a precise adjustment for the guide orifice (7) with controllable production tolerances, with flat design of the print head in the area of the guide orifice (7), and with easy installation, to provide a changeover for several guide orifices (7), and to define reliable end positions of the guide orifices (7), the adjustment element (6) consists of a guide support (7) mounted in the area of the print needle drive unit (2) and swiveling by means of a play-free joint (8). An electromagnet (15), fastened next to the guide support (7), is mounted on an armature bridge (13) supported in a play-free swivel bearing (14) running crossways to the guide support (7). The armature bridge (13) rests on the guide support (7) by spaced supporting projections (18), (19).

    摘要翻译： 一种点阵打印头，其在打印支架（1）的侧面上具有用于打印针（4）在调节元件（6）上的电磁驱动的引导孔（7）的打印针调节单元（3）。 为了提供具有可控生产公差的导向孔（7）的精确调节，在引导孔（7）的区域中打印头的平面设计，并且易于安装，以提供多个导向孔（7 ），并且为了限定导向孔（7）的可靠的端部位置，调节元件（6）由安装在打印针驱动单元（2）的区域中的引导支撑件（7）组成并且通过播放 - 无关节（8）。 安装在导向支撑件（7）旁边的一个电磁铁（15）安装在一个电枢桥（13）上，电枢桥（13）支撑在一个与导向支架（7）交叉运行的无游隙旋转轴承（14）中。 电枢桥（13）通过间隔的支撑突起（18），（19）靠在引导支撑件（7）上。

    High-voltage lead-through for particle-beam apparatus
    7.
    发明授权
    High-voltage lead-through for particle-beam apparatus 失效
    用于粒子束装置的高电压引线

    公开(公告)号：US5134339A

    公开(公告)日：1992-07-28

    申请号：US704175

    申请日：1991-05-22

    申请人： Dietrich Hoffmeister ,  Johannes Bihr ,  Harald Niebel

    发明人： Dietrich Hoffmeister ,  Johannes Bihr ,  Harald Niebel

    IPC分类号： H01J37/06 ,  H01J37/248

    CPC分类号： H01J37/248

    摘要： The invention is directed to a high-voltage lead-through arrangement for introducing a high voltage into an enclosure wherein a vacuum is maintained such as for particle-beam apparatus. The arrangement includes: a high-voltage electrode for carrying a high potential; an insulator enclosing the high-voltage electrode and having a surface defining a boundary with the vacuum; and, an outer low-voltage electrode surrounding the insulator for carrying a low potential. The electrodes are spaced from each other by an electrode spacing measured along the surface of the insulator. The high-voltage electrode and the insulator conjointly define a first region wherein the high potential is present to a good approximation; and the first region is bounded by the insulator surface for a first distance of up to approximately 1/10 of the electrode spacing. The low-voltage electrode and the insulator conjointly define a second region wherein the low potential is present to a good approximation and the second region is bounded by the insulator surface for a second distance of up to approximately 1/10 of the electrode spacing. With this arrangement, the high-voltage lead-through can be operated at a higher voltage than the known configurations without the occurrence of micro-discharges.

    摘要翻译： 本发明涉及一种用于将高电压引入外壳中的高压导通装置，其中保持诸如用于粒子束装置的真空。 该装置包括：用于承载高电位的高压电极; 封闭高压电极并具有限定与真空边界的表面的绝缘体; 以及包围用于承载低电位的绝缘体的外部低压电极。 电极通过沿着绝缘体的表面测量的电极间隔彼此间隔开。 高压电极和绝缘体共同限定了第一区域，其中存在高电位以获得良好的近似值; 并且第一区域由绝缘体表面限定高达电极间距的大约1/10的第一距离。 低电压电极和绝缘体共同限定了第二区域，其中存在低电位以达到良好的近似值，而第二区域由绝缘体表面限定高达电极间距的大约1/10的第二距离。 通过这种布置，高电压导通可以以比已知构造更高的电压工作，而不会发生微放电。

    Print head with permanent magnetic bias
    8.
    发明授权
    Print head with permanent magnetic bias 失效
    具有永久磁偏置的打印头

    公开(公告)号：US4552471A

    公开(公告)日：1985-11-12

    申请号：US553826

    申请日：1983-11-21

    申请人： Bernd Gugel ,  Harald Niebel

    发明人： Bernd Gugel ,  Harald Niebel

    IPC分类号： B41J2/28 ,  B41J3/12

    CPC分类号： B41J2/28

    摘要： A print head includes a coil carrier having upwardly bent legs serving as yokes and being arranged around or upon a permanent magnet whose outer face is coplanar with the end faces of the yokes; a cover plate is mounted on and in that plane having apertures adjacent the space between the permanent magnet and the closest yoke. A set of armature plates is resiliently mounted on the other side of the cover plate respectively adjacent the apertures which are filled with nonmagnetizable material, and the magnet plate of each armature has affixed to it thin, side-wall type members converging towards a main apex-point to which the stylus is mounted.

    摘要翻译： 打印头包括线圈架，其具有用作轭的向上弯曲的腿，并且布置在其外表面与轭的端面共面的永磁体周围; 盖板安装在具有邻近永磁体和最近的轭之间的空间的孔中并且在该平面中。 一组电枢板分别弹性地安装在盖板的另一侧，分别邻近填充有不可磁化材料的孔，并且每个电枢的磁板已经固定到薄的侧壁型构件上，朝向主顶点会聚 指针安装在哪里。

    CHARGED PARTICLE BEAM SYSTEM
    10.
    发明申请
    CHARGED PARTICLE BEAM SYSTEM 有权
    充电颗粒光束系统

    公开(公告)号：US20120025094A1

    公开(公告)日：2012-02-02

    申请号：US13190871

    申请日：2011-07-26

    申请人： Gerd Benner ,  Harald Niebel

    发明人： Gerd Benner ,  Harald Niebel

    IPC分类号： G21K1/08

    CPC分类号： H01J37/295 ,  G01N23/20058

    摘要： A charged particle beam system for performing precession diffraction includes a lens 11 for focusing a beam 5 in an object plane 9, and an objective lens 13 having a diffraction plane 27. A doublet 53 of lenses 35, 63 images the diffraction plane 27 into an intermediate diffraction plane 69 where a multipole 55 is located. A doublet 57 of lenses 65, 93 images the intermediate diffraction plane 69 into an intermediate diffraction plane 71 where a multipole 59 is located. A first deflection system 15 upstream of the object plane 9 can tilt to change an angle of incidence of the beam on the object plane. A second deflection system 37 between lenses 35 and 63 tilts the beam such that the change of the angle of incidence of the charged particle beam on the object plane is compensated.

    摘要翻译： 用于进行进动衍射的带电粒子束系统包括用于将光束5聚焦在物平面9中的透镜11和具有衍射平面27的物镜13.透镜35,63的双折射53将衍射平面27成像为 中间衍射平面69，其中多极55位于其中。 透镜65,93的双重透镜57将中间衍射平面69成像为多极59所在的中间衍射平面71。 在物平面9上游的第一偏转系统15可以倾斜以改变光束在物平面上的入射角。 透镜35和63之间的第二偏转系统37使光束倾斜，使得补偿了物体平面上的带电粒子束的入射角的变化。