DUAL SOURCE AUTO-CORRECTION IN DISTRIBUTED TEMPERATURE SYSTEMS
    7.
    发明申请
    DUAL SOURCE AUTO-CORRECTION IN DISTRIBUTED TEMPERATURE SYSTEMS 有权
    分布式温度系统中的双源自动校正

    公开(公告)号:US20100128756A1

    公开(公告)日:2010-05-27

    申请号:US12451865

    申请日:2008-07-07

    申请人: Chung Lee Kwang Suh

    发明人: Chung Lee Kwang Suh

    IPC分类号: G01K11/32

    摘要: An automatic and continuous method is presented to improve the accuracy of fiber optic distributed temperature measurements derived from Raman back scatterings utilizing two light sources with different wavelengths, by choosing the wavelengths of the two sources so the primary source's return anti-Stokes component overlaps with the incident wavelength of the secondary light source thereby canceling out the non-identical attenuations generated by the wavelength differences between Stokes and anti-Stokes bands.

    摘要翻译: 提出了一种自动和连续的方法,通过选择两个光源的波长来提高从使用两个不同波长的光源的拉曼后向散射得到的光纤分布温度测量的精度,使得主光源的反斯托克斯分量与 从而消除由斯托克斯和反斯托克斯波段之间的波长差产生的不相同的衰减。

    Hybrid dielectric film
    8.
    发明申请
    Hybrid dielectric film 有权
    混合电介质膜

    公开(公告)号:US20060051972A1

    公开(公告)日:2006-03-09

    申请号:US10936156

    申请日:2004-09-07

    IPC分类号: H01L21/469 C23C16/00

    摘要: A method of forming a hybrid inorganic/organic dielectric layer on a substrate for use in an integrated circuit is provided, wherein the method includes forming a first dielectric layer on the substrate via chemical vapor deposition, and forming a second dielectric layer on the first dielectric layer via chemical vapor deposition, wherein one of the first dielectric layer and the second dielectric layer is formed from an organic dielectric material, and wherein the other of the first dielectric layer and the second dielectric layer is formed from an inorganic dielectric material.

    摘要翻译: 提供了一种在用于集成电路的衬底上形成杂化无机/有机电介质层的方法,其中所述方法包括通过化学气相沉积在衬底上形成第一电介质层,并在第一电介质上形成第二电介质层 层,其中所述第一介电层和所述第二介电层中的一个由有机介电材料形成,并且其中所述第一介电层和所述第二介电层中的另一个由无机介电材料形成。

    Embossing stylus
    9.
    发明申请
    Embossing stylus 审中-公开

    公开(公告)号:US20050279231A1

    公开(公告)日:2005-12-22

    申请号:US10913286

    申请日:2004-08-05

    申请人: Chung Lee

    发明人: Chung Lee

    IPC分类号: B31F1/07 B44B5/00

    CPC分类号: B44B5/0085 B31F1/07

    摘要: The present invention is for an embossing stylus for embossing a design. The stylus has a central body portion, a removable embossing tip, having at least one embossing point and a spring biasing mechanism. The spring biasing mechanism is disposed on one end of the central body portion, and is configured to contact the removable embossing tip, biasing the embossing point in an outward direction away from the central body portion, such that the embossing point can be used to emboss the desired design.