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    Polysiloxane, process for production thereof and radiation-sensitive resin composition
    1.
    发明授权
    Polysiloxane, process for production thereof and radiation-sensitive resin composition 有权
    聚硅氧烷，其制造方法和辐射敏感性树脂组合物

    公开(公告)号：US07108955B2

    公开(公告)日：2006-09-19

    申请号：US10476453

    申请日：2002-04-30

    申请人： Haruo Iwasawa ,  Akihiro Hayashi ,  Tsutomu Shimokawa ,  Masafumi Yamamoto

    发明人： Haruo Iwasawa ,  Akihiro Hayashi ,  Tsutomu Shimokawa ,  Masafumi Yamamoto

    IPC分类号： G03C1/73

    CPC分类号： G03F7/0397 ,  C08G77/08 ,  C08G77/24 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0757

    摘要： A novel polysiloxane having high transparency to radiations with a wavelength of 193 nm or less, particularly 157 nm or less, and exhibiting superior dry etching resistance and a radiation-sensitive resin composition comprising the polysiloxane exhibiting superior sensitivity, resolution, and the like are provided. The polysiloxane is a resin having the structural unit (I) and/or structural unit (II) of the following formula (1), and having an acid-dissociable group, wherein R1 represents a monovalent aromatic group substituted with a fluorine atom or a fluoroalkyl group or a monovalent aliphatic group substituted with a fluorine atom or a fluoroalkyl group and R2 represents the above a monovalent aromatic group, the above monovalent aliphatic group, a hydrogen atom, a monovalent hydrocarbon group, haloalkyl group, or amino group. The radiation-sensitive resin composition (A) comprises the polysiloxane (A) and the photoacid generator (B)

    摘要翻译： 提供了具有193nm以下，特别是157nm以下的波长的高透明度，表现出优异的耐干蚀刻性的新颖的聚硅氧烷和包含显示出优异的灵敏度，分辨率等的聚硅氧烷的辐射敏感性树脂组合物 。 聚硅氧烷是具有下式（1）的结构单元（I）和/或结构单元（II），具有酸解离基团的树脂，其中R 1表示单价芳族 被氟原子或氟代烷基取代的基团或被氟原子或氟代烷基取代的一价脂肪族基团，R 2表示上述一价芳族基团，上述一价脂肪族基团，氢 原子，一价烃基，卤代烷基或氨基。 辐射敏感性树脂组合物（A）含有聚硅氧烷（A）和光致酸产生剂（B）

    Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition
    2.
    发明授权
    Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition 有权
    聚硅氧烷，其制造方法，含硅脂环化合物和辐射敏感性树脂组合物

    公开(公告)号：US06531260B2

    公开(公告)日：2003-03-11

    申请号：US09824224

    申请日：2001-04-03

    申请人： Haruo Iwasawa ,  Tsutomu Shimokawa ,  Akihiro Hayashi ,  Satoru Nishiyama

    发明人： Haruo Iwasawa ,  Tsutomu Shimokawa ,  Akihiro Hayashi ,  Satoru Nishiyama

    IPC分类号： G03C172

    CPC分类号： C08L83/08 ,  C07F7/0838 ,  C08G77/14 ,  C08G77/24 ,  C08L83/06 ,  G03F7/0045 ,  G03F7/0757

    摘要： A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A1 and A2 are an acid-dissociable monovalent organic group, R1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.

    摘要翻译： 一种具有以下结构单元（I）和/或（II）和结构单元（III）的新型聚硅氧烷，其中A1和A2是酸解离的一价有机基团，R 1是氢，一价（卤代）烃，卤素， 或氨基，R 2为单价（卤代）烃基或卤素。 还提供了制备这种聚硅氧烷的方法，提供该聚硅氧烷的含硅脂环族化合物和包含该聚硅氧烷的辐射敏感性树脂组合物。 聚硅氧烷可用作抗蚀剂材料的树脂组分，有效地感测短波长的辐射，对辐射具有高透明度和优异的干蚀刻性能，并且抗蚀剂材料如高灵敏度，分辨率，显影性所需的基本抗蚀剂性能优异 等等

    Pattern forming method and bilayer film
    3.
    发明授权
    Pattern forming method and bilayer film 有权
    图案形成方法和双层膜

    公开(公告)号：US07244549B2

    公开(公告)日：2007-07-17

    申请号：US10226321

    申请日：2002-08-23

    申请人： Haruo Iwasawa ,  Akihiro Hayashi ,  Tsutomu Shimokawa ,  Kazuo Kawaguchi ,  Masato Tanaka

    发明人： Haruo Iwasawa ,  Akihiro Hayashi ,  Tsutomu Shimokawa ,  Kazuo Kawaguchi ,  Masato Tanaka

    IPC分类号： G03C1/825 ,  G03F7/039 ,  G03F7/20

    CPC分类号： G03F7/091 ,  G03F7/0045 ,  G03F7/0757 ,  Y10S430/106

    摘要： A pattern forming method comprising forming a coating of a radiation-sensitive resin composition, which contains an acid-dissociable group-containing polysiloxane, alkali-insoluble or scarcely alkali-soluble but becoming alkali-soluble when the acid-dissociable group dissociates, on a film containing a polymer with a carbon content of 80 wt % or more and a polystyrene-reduced weight average molecular weight of 500–100,000, an applying radiation to the coating is provided. The method can form minute patterns with a high aspect ratio by suitably selecting a specific etching gas in the dry etching process, without being affected by standing waves.

    摘要翻译： 一种图案形成方法，包括形成辐射敏感性树脂组合物的涂层，其包含含酸解离基团的聚硅氧烷，碱解不溶性或几乎不碱溶性，当酸解离基解离时变成碱溶性 含有碳含量为80重量％以上且聚苯乙烯换算的重均分子量为500〜10000的聚合物的薄膜，提供了对涂层的涂布辐射。 该方法可以通过在干蚀刻工艺中适当地选择特定的蚀刻气体而不受驻波的影响而形成具有高纵横比的微小图案。

    Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition
    4.
    发明授权
    Polysiloxane, method of manufacturing same, silicon-containing alicyclic compound, and radiation-sensitive resin composition 有权
    聚硅氧烷，其制造方法，含硅脂环化合物和辐射敏感性树脂组合物

    公开(公告)号：US06846895B2

    公开(公告)日：2005-01-25

    申请号：US10364351

    申请日：2003-02-12

    申请人： Haruo Iwasawa ,  Tsutomu Shimokawa ,  Akihiro Hayashi ,  Satoru Nishiyama

    发明人： Haruo Iwasawa ,  Tsutomu Shimokawa ,  Akihiro Hayashi ,  Satoru Nishiyama

    IPC分类号： C08G77/42 ,  C07F7/08 ,  C08G77/14 ,  C08G77/24 ,  C08L83/06 ,  C08L83/08 ,  G03F7/004 ,  G03F7/075 ,  C08G77/12

    CPC分类号： C08L83/08 ,  C07F7/0838 ,  C08G77/14 ,  C08G77/24 ,  C08L83/06 ,  G03F7/0045 ,  G03F7/0757

    摘要： A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A1 and A2 are an acid-dissociable monovalent organic group, R1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.

    摘要翻译： 具有以下结构单元（I）和/或（II）和结构单元（III）的新型聚硅氧烷，其中A 1和A 2是酸解离的一价有机基团，R 1是氢 ，一价（卤代）烃，卤素或氨基，R 2是一价（卤代）烃基或卤素。 还提供了制备这种聚硅氧烷的方法，提供该聚硅氧烷的含硅脂环族化合物和包含该聚硅氧烷的辐射敏感性树脂组合物。 聚硅氧烷可用作抗蚀剂材料的树脂组分，有效地感测短波长的辐射，对辐射具有高透明度和优异的干蚀刻性能，并且抗蚀剂材料如高灵敏度，分辨率，显影性所需的基本抗蚀剂性能优异 等等

    Radiation-sensitive resin composition
    5.
    发明授权
    Radiation-sensitive resin composition 有权
    辐射敏感树脂组合物

    公开(公告)号：US07288359B2

    公开(公告)日：2007-10-30

    申请号：US10309017

    申请日：2002-12-04

    申请人： Haruo Iwasawa ,  Akihiro Hayashi ,  Tsutomu Shimokawa

    发明人： Haruo Iwasawa ,  Akihiro Hayashi ,  Tsutomu Shimokawa

    IPC分类号： G03C1/73 ,  G03F7/039

    CPC分类号： G03F7/0045 ,  C07C309/17 ,  C07C309/19 ,  C07C309/23 ,  C07C381/12 ,  C07C2602/42 ,  C07C2603/86 ,  C07D333/46 ,  C07D333/78 ,  C07D335/02 ,  C07D347/00 ,  G03F7/0392 ,  G03F7/0757 ,  Y10S430/106 ,  Y10S430/122 ,  Y10S430/126

    摘要： A radiation-sensitive resin composition comprising (A) an acid-dissociable group-containing polysiloxane and (B) a photoacid generator containing trifluoromethane sulfonic acid or a compound which generates an acid of the following formula (I), wherein Rf individually represents a fluorine atom or a trifluoromethyl group, and Ra represents a hydrogen atom, a fluorine atom, a linear or branched alkyl group having 1-20 carbon atoms, or a linear or branched fluoroalkyl group having 1-20 carbon atoms, a substituted or unsubstituted monovalent cyclic hydrocarbon group having 3-20 carbon atoms, or a substituted or unsubstituted monovalent cyclic fluoro-hydrocarbon group having 3-20 carbon atoms. The radiation-sensitive resin composition of the present invention exhibits superior resolution, while maintaining high transparency to radiations and high dry etching resistance. The resin composition thus can greatly contribute to the lithography process that will become more and more minute in the future.

    摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）含酸解离基的聚硅氧烷和（B）含有三氟甲磺酸的光酸产生剂或产生下式（I）的酸的化合物，其中Rf分别表示氟 原子或三氟甲基，Ra表示氢原子，氟原子，具有1-20个碳原子的直链或支链烷基或具有1-20个碳原子的直链或支链氟代烷基，取代或未取代的一价环状 具有3-20个碳原子的烃基，或具有3-20个碳原子的取代或未取代的一价环状氟代烃基。 本发明的辐射敏感性树脂组合物表现出优异的分辨率，同时保持高的透光透明度和高耐干蚀刻性。 因此，树脂组合物可以极大地有助于将来将变得越来越多的光刻工艺。

    Printing control apparatus, image forming apparatus and printing system
    9.
    发明授权
    Printing control apparatus, image forming apparatus and printing system 有权
    打印控制装置，图像形成装置和打印系统

    公开(公告)号：US08792109B2

    公开(公告)日：2014-07-29

    申请号：US13432779

    申请日：2012-03-28

    申请人： Takeshi Tamada ,  Akinori Kimata ,  Kenji Yamamoto ,  Akihiro Hayashi ,  Yoshihito Sasamoto ,  Kenji Tamaki

    发明人： Takeshi Tamada ,  Akinori Kimata ,  Kenji Yamamoto ,  Akihiro Hayashi ,  Yoshihito Sasamoto ,  Kenji Tamaki

    IPC分类号： G06F3/12 ,  G06K15/00 ,  H04N1/00 ,  G06F1/26

    CPC分类号： G06F3/1221 ,  G06F1/3284 ,  G06F3/1229 ,  G06F3/1285 ,  Y02D10/159 ,  Y02D10/1592

    摘要： A printing control apparatus connected via a network with one or more of image forming apparatuses includes: a power source detection section which detects an image forming apparatus turned on; and a setting section which sets a mode shift time for shifting from a normal power mode to a power saving power mode a power consumption of which is less than a power consumption of the normal power mode of each of the image forming apparatuses; and a notice section which notices the set mode shift time to the image forming apparatus corresponding to the mode shift time, wherein the setting section changes the mode shift time when a plurality of image forming apparatuses which has been turned on is connected with the network, by comparing with a case when the network is connected with only one image forming apparatus turned on.

    摘要翻译： 经由网络与图像形成装置中的一个或多个连接的打印控制装置包括：电源检测部，其检测打开的图像形成装置; 以及设定部，其将用于从正常功率模式切换到省电功率模式的模式移位时间，功率消耗小于每个图像形成装置的正常功率模式的功耗; 以及通知部，其注意与所述模式移位时间对应的所述图像形成装置的设定模式移动时间，其中，当已经打开的多个图像形成装置与所述网络连接时，所述设定部改变模式移位时间， 通过与网络仅连​​接一个打开的图像形成装置的情况进行比较。