公开(公告)号：US08003200B2

公开(公告)日：2011-08-23

申请号：US11664583

申请日：2005-09-27

申请人： Tomotake Nashiki ,  Hideo Sugawara ,  Hidehiko Andou ,  Hidetoshi Yoshitake

发明人： Tomotake Nashiki ,  Hideo Sugawara ,  Hidehiko Andou ,  Hidetoshi Yoshitake

IPC分类号： B32B7/02

CPC分类号： G02B1/116 ,  G02B1/105 ,  G02B1/14 ,  G02B1/18 ,  G02B27/0006 ,  G06F3/045 ,  Y10S428/917 ,  Y10T428/24942 ,  Y10T428/265 ,  Y10T428/31504

摘要： A transparent electrically-conductive film of the present invention comprises a transparent film substrate, a hard coat layer formed on one side of the transparent film substrate, a SiOx layer with a thickness of 10 nm to 300 nm that is formed on the hard coat layer by a dry process, and a transparent electrically-conductive thin layer with a thickness of 20 nm to 35 nm that is formed on another side of the transparent film substrate. The transparent electrically-conductive film has good resistance to moisture and heat and high durability against pen-based input and can be prevented from cracking during a punching process and also prevented from waving or curling even in a high-temperature, high-humidity environment.

摘要翻译： 本发明的透明导电膜包括透明膜基材，形成在透明膜基材一侧的硬涂层，形成在硬涂层上的厚度为10nm至300nm的SiOx层 通过干法形成的厚度为20nm〜35nm的透明导电性薄膜，形成在透明膜基板的另一侧。 透明导电膜具有良好的抗水分和耐热性，并且对于基于笔的输入具有高的耐久性，并且可以防止在冲压加工过程中的裂纹，并且即使在高温，高湿度的环境下也可防止波动或卷曲。

公开(公告)号：US20100136276A1

公开(公告)日：2010-06-03

申请号：US12525864

申请日：2008-02-28

申请人： Hidehiko Andou ,  Hideo Sugawara ,  Tomotake Nashiki

发明人： Hidehiko Andou ,  Hideo Sugawara ,  Tomotake Nashiki

IPC分类号： B32B33/00 ,  B32B37/00

CPC分类号： G06F3/0414 ,  B32B7/06 ,  B32B7/12 ,  B32B25/08 ,  B32B25/12 ,  B32B25/14 ,  B32B27/08 ,  B32B27/20 ,  B32B27/281 ,  B32B27/283 ,  B32B27/285 ,  B32B27/286 ,  B32B27/30 ,  B32B27/32 ,  B32B27/322 ,  B32B27/34 ,  B32B27/36 ,  B32B27/365 ,  B32B27/38 ,  B32B27/40 ,  B32B2255/10 ,  B32B2255/205 ,  B32B2262/101 ,  B32B2264/101 ,  B32B2264/105 ,  B32B2307/202 ,  B32B2307/306 ,  B32B2307/4026 ,  B32B2307/412 ,  B32B2307/54 ,  B32B2307/702 ,  B32B2307/712 ,  B32B2307/728 ,  B32B2307/748 ,  B32B2457/00 ,  Y10T428/14 ,  Y10T428/1476

摘要： An object of the invention is to provide a transparent conductive film having good processability and to provide a method for production thereof. The pressure-sensitive adhesive layer-carrying transparent conductive film of the invention comprises: an amorphous transparent conductive laminate comprising a transparent plastic film substrate and an amorphous transparent conductive thin film provided on one side of the transparent plastic film substrate; a pressure-sensitive adhesive layer; and a release film that is provided on another side of the transparent plastic film substrate with the pressure-sensitive adhesive layer interposed therebetween and comprises at least a film substrate, wherein the release film is thicker than the amorphous transparent conductive laminate, and a value obtained by subtracting the thermal shrinkage percentage of the release film in the MD direction from the thermal shrinkage percentage of the amorphous transparent conductive laminate in the MD direction is from −0.3% to 0.45%.

摘要翻译： 本发明的目的是提供一种具有良好加工性能的透明导电膜并提供其生产方法。 本发明的带有粘合剂层的透明导电膜包括：非晶透明导电层压板，包括透明塑料膜基片和设置在透明塑料薄膜基片一侧的非晶透明导电薄膜; 压敏粘合剂层; 以及剥离膜，其设置在所述透明塑料膜基材的另一侧，并且所述粘合剂层介于其间，并且至少包括膜基材，其中所述剥离膜比所述非晶形透明导电性层压体厚，得到的值 通过从MD方向从非晶透明导电性层叠体的热收缩率减去MD方向的热收缩率为-0.3％〜0.45％。

公开(公告)号：US20080096013A1

公开(公告)日：2008-04-24

申请号：US11664583

申请日：2005-09-27

申请人： Tomotake Nashiki ,  Hideo Sugawara ,  Hidehiko Andou ,  Hidetoshi Yoshitake

发明人： Tomotake Nashiki ,  Hideo Sugawara ,  Hidehiko Andou ,  Hidetoshi Yoshitake

IPC分类号： B32B27/08

CPC分类号： G02B1/116 ,  G02B1/105 ,  G02B1/14 ,  G02B1/18 ,  G02B27/0006 ,  G06F3/045 ,  Y10S428/917 ,  Y10T428/24942 ,  Y10T428/265 ,  Y10T428/31504

摘要： A transparent electrically-conductive film of the present invention comprises a transparent film substrate, a hard coat layer formed on one side of the transparent film substrate, a SiOx layer with a thickness of 10 nm to 300 nm that is formed on the hard coat layer by a dry process, and a transparent electrically-conductive thin layer with a thickness of 20 nm to 35 nm that is formed on another side of the transparent film substrate. The transparent electrically-conductive film has good resistance to moisture and heat and high durability against pen-based input and can be prevented from cracking during a punching process and also prevented from waving or curling even in a high-temperature, high-humidity environment.

摘要翻译： 本发明的透明导电膜包括透明膜基材，形成在透明膜基材一侧的硬涂层，厚度为10nm至300nm的SiO 2层 通过干法在硬涂层上形成的厚度为20nm〜35nm的透明导电薄膜，形成在透明膜基板的另一侧。 透明导电膜具有良好的抗水分和耐热性，并且对于基于笔的输入具有高的耐久性，并且可以防止在冲压加工过程中的裂纹，并且即使在高温，高湿度的环境下也可防止波动或卷曲。

公开(公告)号：US09910545B2

公开(公告)日：2018-03-06

申请号：US12503395

申请日：2009-07-15

申请人： Kazuhiro Nakajima ,  Tomotake Nashiki ,  Hideo Sugawara

发明人： Kazuhiro Nakajima ,  Tomotake Nashiki ,  Hideo Sugawara

IPC分类号： G06F3/044 ,  G02B5/22 ,  B32B3/00

CPC分类号： G06F3/044

摘要： The transparent conductive film of the present invention is a transparent conductive film, comprising: a transparent film substrate; a patterned transparent conductive layer formed on one side of the transparent film substrate; and a colored layer provided on at least one of an opposite side of the transparent conductive layer from the transparent film substrate and an opposite side of the transparent film substrate from the transparent conductive layer, wherein the colored layer has an average absorptance of from 35% to 90% for light in the wavelength range of from 380 nm to 780 nm.

公开(公告)号：US09523147B2

公开(公告)日：2016-12-20

申请号：US13458640

申请日：2012-04-27

申请人： Tomotake Nashiki ,  Yoshimasa Sakata ,  Hideo Sugawara ,  Kenkichi Yagura ,  Akira Hamada ,  Yoshihisa Ito ,  Kuniaki Ishibashi

发明人： Tomotake Nashiki ,  Yoshimasa Sakata ,  Hideo Sugawara ,  Kenkichi Yagura ,  Akira Hamada ,  Yoshihisa Ito ,  Kuniaki Ishibashi

IPC分类号： C23C14/56 ,  C23C14/08 ,  C23C14/14 ,  C23C14/34 ,  H01L21/67

CPC分类号： C23C14/562 ,  C23C14/086 ,  C23C14/14 ,  C23C14/34 ,  C23C14/568 ,  H01L21/67132 ,  H01L21/67173 ,  Y10T428/31678

摘要： A method of continuously subjecting an elongated substrate to vacuum film formation is disclosed. The method comprises the steps of: feeding a first substrate from a first roll chamber in a first direction from the first roll chamber toward a second roll chamber; degassing the first substrate; forming a film of a second material on the first substrate, in a second film formation chamber; and rolling up the first substrate in the second roll chamber, thereby producing the first substrate, and comprises similar steps to produce a second substrate. In advance of producing the first substrate with the second material film, the first cathode electrode of the first film formation chamber is removed from the first film formation chamber, and, in advance of producing the second substrate with the first material film, the second cathode electrode of the second film formation chamber is removed from the second film formation chamber.

摘要翻译： 公开了一种连续使细长衬底经受真空成膜的方法。 该方法包括以下步骤：将来自第一辊室的第一衬底沿第一方向从第一辊室向第二辊室供给; 对第一衬底进行脱气; 在第二成膜室中在第一基板上形成第二材料的膜; 并卷起第二辊室中的第一基板，从而制造第一基板，并且包括类似的步骤以产生第二基板。 在利用第二材料膜制造第一基板之前，第一成膜室的第一阴极电极从第一成膜室除去，并且在用第一材料膜制造第二基板之前，第二阴极 从第二成膜室除去第二成膜室的电极。

公开(公告)号：US09513747B2

公开(公告)日：2016-12-06

申请号：US13271625

申请日：2011-10-12

申请人： Kazuhiro Nakajima ,  Tomotake Nashiki ,  Hideo Sugawara

发明人： Kazuhiro Nakajima ,  Tomotake Nashiki ,  Hideo Sugawara

IPC分类号： B32B3/10 ,  B32B3/14 ,  B32B7/02 ,  G06F3/044 ,  G06F3/045

CPC分类号： G06F3/044 ,  G06F3/045 ,  G06F2203/04103 ,  Y10T428/24802 ,  Y10T428/24868 ,  Y10T428/2495

摘要： The present invention provides a transparent conductive film in which the difference in visibility between the pattern portion and the pattern opening portion is kept small even when a transparent conductive layer is patterned. The transparent conductive film has a first dielectric layer, a second dielectric layer, and a transparent conductive layer in this order on a transparent film substrate, a thickness d21 of the first dielectric layer is larger than a thickness d22 of the second dielectric layer, the thickness d21 of the first dielectric layer is 8 to 40 nm and the thickness d22 of the second dielectric layer is 5 to 25 nm, and a difference between the thickness d21 of the first dielectric layer and the thickness d22 of the second dielectric layer, d21-d22, is 3 to 30 nm.

摘要翻译： 本发明提供了一种透明导电膜，其中即使在透明导电层被图案化时，图案部分和图案开口部分之间的可见性差也保持较小。 透明导电膜在透明膜基板上依次具有第一电介质层，第二电介质层和透明导电层，第一电介质层的厚度d21大于第二电介质层的厚度d22， 第一电介质层的厚度d21为8〜40nm，第二电介质层的厚度d22为5〜25nm，第一电介质层的厚度d21与第二电介质层的厚度d22之差d21 -d22，为3〜30nm。

公开(公告)号：US09297066B2

公开(公告)日：2016-03-29

申请号：US13559041

申请日：2012-07-26

申请人： Tomotake Nashiki ,  Yoshimasa Sakata ,  Hideo Sugawara ,  Kenkichi Yagura ,  Akira Hamada ,  Yoshihisa Ito ,  Kuniaki Ishibashi

发明人： Tomotake Nashiki ,  Yoshimasa Sakata ,  Hideo Sugawara ,  Kenkichi Yagura ,  Akira Hamada ,  Yoshihisa Ito ,  Kuniaki Ishibashi

IPC分类号： C23C14/56 ,  C23C14/02

CPC分类号： C23C16/44 ,  C23C14/021 ,  C23C14/562 ,  C23C16/06 ,  C23C16/56 ,  Y10T428/31678

摘要： The film formation method comprises the steps of: unrolling and feeding an elongated substrate wound in a roll form from a first roll chamber in a direction from the first roll chamber toward a second roll chamber, using a first surface as a surface for film formation; degassing the fed substrate; forming a first material film on the first surface of the degassed substrate in a first film formation chamber; forming a second material film on the first material film in a second film formation chamber; taking up the substrate in a roll form in the second roll chamber, the substrate having the material films formed thereon; unrolling and feeding the taken up substrate from the first roll chamber in the direction, using a second surface opposite the first surface of the substrate as a surface for film formation; and repeating all the above treatments.

摘要翻译： 成膜方法包括以下步骤：使用第一表面作为成膜表面，从第一辊室向第一辊室向第二辊室展开卷绕并卷绕成辊状的细长基材; 对进料基材进行脱气; 在第一成膜室中在脱气基板的第一表面上形成第一材料膜; 在第二成膜室中在第一材料膜上形成第二材料膜; 在第二辊室中以辊状卷取基板，其中形成有材料膜的基板; 使用与基板的第一表面相对的第二表面作为成膜的表面，使卷取的基板从第一辊室沿着该方向展开和进给; 并重复所有上述处理。

公开(公告)号：US09249503B2

公开(公告)日：2016-02-02

申请号：US13559094

申请日：2012-07-26

申请人： Tomotake Nashiki ,  Yoshimasa Sakata ,  Hideo Sugawara ,  Kenkichi Yagura ,  Akira Hamada ,  Yoshihisa Ito ,  Kuniaki Ishibashi

发明人： Tomotake Nashiki ,  Yoshimasa Sakata ,  Hideo Sugawara ,  Kenkichi Yagura ,  Akira Hamada ,  Yoshihisa Ito ,  Kuniaki Ishibashi

IPC分类号： C23C14/56

CPC分类号： C23C14/562 ,  Y10T428/31678

摘要： The film formation method comprises the steps of: unrolling and feeding an elongated substrate wound in a roll form from a first roll chamber in a first direction from the first roll chamber toward a second roll chamber, using a first surface as a surface for film formation; degassing the substrate fed in the first direction; forming a second material film on the first surface of the substrate in a second film formation chamber; taking up the substrate in a roll form in the second roll chamber, the substrate having the second material film formed thereon; unrolling and feeding the substrate from the second roll chamber in a second direction from the second roll chamber toward the first roll chamber; forming a first material film on the second material film in a first film formation chamber; taking up the substrate in a roll form in the first roll chamber.

摘要翻译： 成膜方法包括以下步骤：使用第一表面作为成膜表面，从第一辊室向第二辊室，以第一方向从第一辊室开始卷绕并卷绕成卷状的细长衬底 ; 对沿第一方向进给的基板进行脱气; 在第二成膜室中在所述基板的第一表面上形成第二材料膜; 在第二辊室中以辊状卷取基板，其上形成有第二材料膜的基板; 从第二辊室朝向第一辊室从第二辊室向第二方向展开和供给衬底; 在第一成膜室中在第二材料膜上形成第一材料膜; 在第一辊室中以辊状卷取基材。

公开(公告)号：US09243320B2

公开(公告)日：2016-01-26

申请号：US13559155

申请日：2012-07-26

申请人： Tomotake Nashiki ,  Yoshimasa Sakata ,  Hideo Sugawara ,  Kenkichi Yagura ,  Akira Hamada ,  Yoshihisa Ito ,  Kuniaki Ishibashi

发明人： Tomotake Nashiki ,  Yoshimasa Sakata ,  Hideo Sugawara ,  Kenkichi Yagura ,  Akira Hamada ,  Yoshihisa Ito ,  Kuniaki Ishibashi

IPC分类号： C23C14/56

CPC分类号： C23C14/562 ,  Y10T428/31678

摘要： The film formation method comprises the steps of: unrolling and feeding an elongated substrate wound in a roll form from a first roll chamber in a first direction from the first roll chamber toward a second roll chamber; degassing the fed substrate; forming a first material film on a first surface in a first film formation chamber; guiding the substrate having the first material film formed thereon to a second film formation chamber in a second direction from the second roll chamber toward the first roll chamber; forming, in the second film formation chamber, a second material film on a second surface opposite the first surface of the substrate when it is being guided in the second direction; taking up, in a third roll chamber provided between the first roll chamber and the second roll chamber, the substrate in a roll state.

摘要翻译： 成膜方法包括以下步骤：从第一方向从第一辊室向第二辊室展开卷绕并卷绕成卷状的细长基材从第一辊室; 对进料基材进行脱气; 在第一成膜室中的第一表面上形成第一材料膜; 将其上形成有第一材料膜的基板从第二辊室朝向第一辊室沿第二方向引导到第二成膜室; 在所述第二成膜室中，当在所述第二方向上被引导时，在与所述基板的所述第一表面相对的第二表面上形成第二材料膜; 在设置在第一辊室和第二辊室之间的第三辊室中卷绕处于辊状态的基板。

公开(公告)号：US09223165B2

公开(公告)日：2015-12-29

申请号：US13881958

申请日：2011-10-27

申请人： Tomotake Nashiki ,  Daisuke Kajihara ,  Hideo Sugawara ,  Tsuyoshi Chiba ,  Hiroaki Kishioka ,  Mayumi Kishioka ,  Tomohide Banba ,  Masahiro Ooura

发明人： Tomotake Nashiki ,  Daisuke Kajihara ,  Hideo Sugawara ,  Tsuyoshi Chiba ,  Hiroaki Kishioka ,  Tomohide Banba ,  Masahiro Ooura

IPC分类号： G02F1/1335 ,  G02F1/1333 ,  G02F1/13 ,  G06F3/041 ,  G06F3/045 ,  G06F3/044

CPC分类号： G02F1/13338 ,  G06F3/041 ,  G06F3/044 ,  G06F2203/04103 ,  Y10T156/1062

摘要： Provided is an optical unit for a display panel device with a capacitive touch input function. In the optical unit, a touch panel laminate comprises: an optically transparent first substrate layer laminated to one surface of a transparent adhesive layer; a first transparent electrically conductive layer laminated, through a first undercoat layer, to a surface of the first substrate layer on a side opposite to the adhesive layer; an optically transparent second substrate layer laminated to the other surface of the adhesive layer; and a second transparent electrically conductive layer laminated, through a second undercoat layer, to a surface of the second substrate layer on a side opposite side to the adhesive layer.

摘要翻译： 提供了一种具有电容式触摸输入功能的显示面板装置的光学单元。 在光学单元中，触摸面板层叠体包括：层压到透明粘合剂层的一个表面上的光学透明的第一基底层; 第一透明导电层，其通过第一底涂层层叠在与所述粘合剂层相对的一侧上的所述第一基材层的表面上; 层压到粘合剂层的另一个表面上的光学透明的第二基底层; 以及第二透明导电层，其通过第二底涂层层叠在与所述粘合剂层相反侧的所述第二基材层的表面上。