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1.发明授权Mask manufacturing method and apparatus and device manufacturing method using a mask manufactured by the method or apparatus 失效掩模制造方法和使用由该方法或装置制造的掩模的装置和装置制造方法
公开(公告)号：US5593800A
公开(公告)日：1997-01-14
申请号：US367856
申请日：1995-01-03
CPC分类号： G03F7/70475 , G03F1/22 , G03F7/70358
摘要： A mask manufacturing method includes holding through a first stage a master reticle having a pattern, holding through a second stage a mask substrate, projecting an exposure beam to the pattern of the master reticle held by the first stage, and projecting the pattern onto the mask substrate held by the second stage at a predetermined reduction magnification, and scanning the first and second stages in a timed relation and at a predetermined speed ratio, whereby the pattern of the master reticle is transferred to the mask substrate.
摘要翻译： 掩模制造方法包括：通过第一阶段保持具有图案的主掩模版，通过第二阶段保持掩模基板，将曝光光束投射到由第一平台保持的主光栅的图案上，并将图案投影到掩模上 基板以预定的缩小倍率保持第二阶段，并以定时关系和预定的速度比扫描第一和第二阶段，从而将主标线的图案转印到掩模基板。
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公开(公告)号：US5161176A
公开(公告)日：1992-11-03
申请号：US802705
申请日：1991-12-06
申请人： Ryuichi Ebinuma , Kunitaka Ozawa , Takao Kariya , Shunichi Uzawa , Noriyuki Nose
发明人： Ryuichi Ebinuma , Kunitaka Ozawa , Takao Kariya , Shunichi Uzawa , Noriyuki Nose
IPC分类号： G03F9/00 , G03F7/20 , H01L21/027 , H01L21/30
CPC分类号： G03F7/70066
摘要： An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.
摘要翻译： 曝光装置包括用于通过掩模曝光晶片的光源; 遮光装置可移动并且有效地阻挡来自光源的光以限制曝光区域; 用于检测掩模和晶片之间的位置偏差的位置偏差检测系统; 以及驱动控制系统，用于基于来自位置偏差检测系统的检测信号移动遮光装置以执行其位置控制。
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3.发明授权
公开(公告)号：US5861952A
公开(公告)日：1999-01-19
申请号：US984509
申请日：1992-12-02
CPC分类号： G01N21/94
摘要： A light source portion having an acousto-optic element produces a laser beam of two light components having a frequency difference .DELTA.w and having registered polarization directions. The laser beam is subsequently divided by a half mirror. One of the divided laser beams is detected by a photoelectric detector as reference light, and a corresponding signal is applied to a synchronism detector. The other laser beam is projected by a scanning optical system to the surface of, e.g., an original to be examined to scan the same. At the position on the surface irradiated by the scanning light spot, the laser beam is modulated at a beat frequency .DELTA.w on the basis of optical heterodyne interference. A synchronism detector detects a signal corresponding to the scattered light from a particle or defect on the surface being examined, in synchronism with the frequency of the reference light, whereby the particle or defect can be detected with a good signal-to-noise ratio.
摘要翻译： 具有声光元件的光源部分产生具有频差DELTA w并具有记录的偏振方向的两个光分量的激光束。 激光束随后被半反射镜分开。 其中一个激光束被光电检测器作为参考光检测，相应的信号被施加到同步检测器。 另一个激光束由扫描光学系统投影到例如要检查的原件的表面以扫描它。 在由扫描光点照射的表面上的位置处，基于光学外差干扰以激光束以拍频DELTA w进行调制。 同步检测器与参考光的频率同步地检测与被检查的表面上的颗粒或缺陷相对应的散射光的信号，从而可以以良好的信噪比检测颗粒或缺陷。
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4.发明授权Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern 失效用于在具有图案的基板上检查颗粒（如果有的话）的检查方法和装置
公开(公告)号：US5486919A
公开(公告)日：1996-01-23
申请号：US76951
申请日：1993-06-15
申请人： Toshihiko Tsuji , Seiji Takeuchi , Kyoichi Miyazaki , Minoru Yoshii , Noriyuki Nose , Tetsuzo Mori
发明人： Toshihiko Tsuji , Seiji Takeuchi , Kyoichi Miyazaki , Minoru Yoshii , Noriyuki Nose , Tetsuzo Mori
CPC分类号： G03F7/70616 , G01N21/88 , G01N21/94 , G03F7/7065 , G03F7/70916 , G01J2009/0261 , G01J9/04 , G01N2021/4792 , G01N21/8806
摘要： Disclosed is an inspection method and apparatus: wherein (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, different from the first state of polarization, and a second wavelength, different from the first wavelength are produced; at least the first light is projected to a position of inspection; and heterodyne interference light produced on the basis of the second light and light scattered at the inspection position and having its state of polarization changed, by the scattering, from the first state of polarization, is detected.
摘要翻译： 公开了一种检查方法和装置：其中（i）具有第一偏振状态和第一波长的第一光，以及（ii）具有与第一偏振态不同的第二极化状态的第二光，以及第二波长 ，与第一波长不同; 至少第一个光被投射到检查的位置; 并且检测基于第二光产生的外差干涉光和在检查位置上散射并且具有从第一极化状态通过散射改变其偏振状态的光。
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5.发明授权Apparatus and method for detecting the relative positional deviation between two diffraction gratings 失效用于检测两个衍射光栅之间的相对位置偏差的装置和方法
公开(公告)号：US5465148A
公开(公告)日：1995-11-07
申请号：US139143
申请日：1993-10-21
申请人： Takahiro Matsumoto , Noriyuki Nose , Kenji Saito , Koichi Sentoku
发明人： Takahiro Matsumoto , Noriyuki Nose , Kenji Saito , Koichi Sentoku
CPC分类号： G03F7/70633 , G03F9/70
摘要： A first Savart plate and an object to be measured are arranged on the light path of a Zeeman light source. The object to be measured is constructed of a diffraction grating on a mask and a diffraction grating on a wafer. A second Savart plate, a deflection plate and a photoelectric detector are sequentially arranged in the light path for the diffracted beams from the measured object. The output of the photoelectric detector is connected to a phase-difference unit to detect the phase difference between two beat signals. Herein, the light is split into two beams by the Savart plate. After a diffraction is caused by the diffraction gratings, thereafter, the beams are re-synthesized by the Savart plates. The two beams travel on the same light path, thereby improving a measurement accuracy.
摘要翻译： 第一萨瓦特板和待测对象被布置在塞曼光源的光路上。 要测量的对象由掩模上的衍射光栅和晶片上的衍射光栅构成。 第二萨瓦特板，偏转板和光电检测器依次布置在来自测量对象的衍射光束的光路中。 光电检测器的输出连接到相位差单元，以检测两个差拍信号之间的相位差。 这里，萨瓦特板将光分成两束。 衍射由衍射光栅引起之后，光束由Savart板重新合成。 两个光束在相同的光路上行进，从而提高测量精度。
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6.发明授权Optical heterodyne interference measuring apparatus and method, and exposing apparatus and device manufacturing method using the same, in which a phase difference between beat signals is detected 失效光学外差干涉测量装置和方法以及使用该光学外差干涉测量装置和方法的曝光装置和装置制造方法，其中检测到拍子信号之间的相位差
公开(公告)号：US5432603A
公开(公告)日：1995-07-11
申请号：US153038
申请日：1993-11-17
申请人： Koichi Sentoku , Noriyuki Nose , Minoru Yoshii , Kenji Saito , Toshihiko Tsuji , Takahiro Matsumoto
发明人： Koichi Sentoku , Noriyuki Nose , Minoru Yoshii , Kenji Saito , Toshihiko Tsuji , Takahiro Matsumoto
CPC分类号： G03F9/70
摘要： An optical element comprised of a plurality of polarizing beam splitters is provided on the optical path of a two-frequency linearly polarized laser beam source, and the optical element divides a light beam from the two-frequency linearly polarized laser beam source into two light beams, whereafter these two light beams are incident on diffraction gratings provided on a mask and a wafer, respectively. A pair of mirrors are provided vertically above the mask, and a pair of lenses, a pair of polarizing plates and a pair of photoelectric detectors are arranged in succession in the directions of reflection of the pair of mirrors. The outputs of the two photoelectric detectors become beat signals, and the phase difference between these beat signals is measured, whereby the alignment of the mask and wafer is effected. Since the optical element is comprised of a plurality of polarizing beam splitters, leak-in light included in each light beam is reduced.
摘要翻译： 在双频线性偏振激光束源的光路上设置由多个偏振分束器构成的光学元件，光学元件将来自双频线性偏振激光束源的光束分成两束光束 之后，这两个光束分别入射到设置在掩模和晶片上的衍射光栅上。 一对镜子垂直地设置在掩模上方，并且一对透镜，一对偏振片和一对光电检测器沿着该对反射镜的反射方向相继布置。 两个光电检测器的输出变为差拍信号，并且测量这些拍频信号之间的相位差，从而实现掩模和晶片的对准。 由于光学元件由多个偏振分束器组成，因此减少了包括在每个光束中的泄漏光。
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7.发明授权Distance measuring system utilizing an object with at least one inclined surface 失效距离测量系统使用至少一个内置表面的对象
公开(公告)号：US5122660A
公开(公告)日：1992-06-16
申请号：US671657
申请日：1991-03-19
申请人： Minoru Yoshii , Noriyuki Nose , Yukichi Niwa , Ryo Kuroda
发明人： Minoru Yoshii , Noriyuki Nose , Yukichi Niwa , Ryo Kuroda
摘要： A device for measuring a relatively moving distance of two relatively moving objects is disclosed. The device includes a plurality of inclined surfaces formed on one of the objects and arrayed with a predetermined pitch along the relatively moving direction, with each of the inclined surfaces being inclined with respect to the relatively moving direction. A measuring portion is provided on the other object for measuring the distance to at least one of the inclined surfaces in a direction having an angle with respect to the relatively moving direction, and a detecting portion detects the relatively moving distance of the two objects on the basis of the measurement by the measuring portion.
摘要翻译： 公开了一种用于测量两个相对移动的物体的相对移动距离的装置。 该装置包括形成在一个物体上的多个倾斜表面，并且沿相对移动的方向以预定间距排列，每个倾斜表面相对于相对移动的方向倾斜。 测量部分设置在另一物体上，用于测量在相对于相对运动方向具有角度的方向上至少一个倾斜表面的距离，并且检测部分检测两个物体在相对移动方向上的相对移动的距离 由测量部分测量的基础。
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公开(公告)号：US5116369A
公开(公告)日：1992-05-26
申请号：US582117
申请日：1990-09-14
申请人： Nobuo Kushibiki , Noriyuki Nose , Yukichi Niwa , Norio Kaneko
发明人： Nobuo Kushibiki , Noriyuki Nose , Yukichi Niwa , Norio Kaneko
摘要： A composition for an intraocular lens comprising, an organopolysiloxane (A) having a viscosity of 10,000 cp or below and comprising at least one unsaturated aliphatic group, an organopolysiloxane (B) comprising at least three hydrogenated silyl units and a platinum compound; wherein the platinum compound based on its platinum content constitutes 10-200 ppm by weight of the composition. The composition provides a homogeneous intraocular lens even when it is injected into a crystalline capsule through a slender tube such as an injection needle.
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9.发明授权An alignment system for align first and second objects using alignment marks 失效对准系统，用于使用对准标记对准第一和第二对象
公开(公告)号：US5028797A
公开(公告)日：1991-07-02
申请号：US413739
申请日：1989-09-28
申请人： Naoto Abe , Shigeyuki Suda , Koji Uda , Hirohisa Ohta , Noriyuki Nose
发明人： Naoto Abe , Shigeyuki Suda , Koji Uda , Hirohisa Ohta , Noriyuki Nose
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/30
CPC分类号： G03F9/7096 , G03F9/7049
摘要： An alignment system for aligning a mask and a wafer into a predetermined positional relationship uses alignment marks provided on the mask and the water. In this system, light from a light source is directed to the alignment marks of the mask and the wafer and, then, the light from these alignment marks is detected by an accumulation type photoelectric converting device, for alignment of the mask and the wafer. The accumulation time of the photoelectric converting device is controlled to be sufficiently longer than or to be equal to a multiple, by an integral number, of the period of relative and natural vibration of the mask and the wafer. This makes it possible to reduce the effect of the relative vibration of the mask and the wafer upon the alignment result and, therefore, makes it possible to enhance the alignment precision.
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公开(公告)号：US4539482A
公开(公告)日：1985-09-03
申请号：US309380
申请日：1981-10-07
申请人： Noriyuki Nose
发明人： Noriyuki Nose
CPC分类号： H04N1/0306 , H04N1/03 , H04N1/19505 , H04N1/1951 , H04N1/19536 , H04N1/19547 , H04N1/19573 , H04N5/2254
摘要： An apparatus for dividing an original surface having image information into a plurality of areas and reading the image information with the use of a photosensor through a plurality of imaging systems provided correspondingly to said plurality of areas. The imaging systems for imaging the image information of the original surface on the photosensor include zone plates.
摘要翻译： 一种用于将具有图像信息的原始表面划分成多个区域并且通过与所述多个区域相对应地设置的多个成像系统通过使用光电传感器来读取图像信息的装置。 用于对光电传感器上原始表面的图像信息进行成像的成像系统包括区域板。
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