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43 条记录 (耗时 0.033 秒)

    Mask and mask supporting mechanism
    3.
    发明授权
    Mask and mask supporting mechanism 失效
    面罩和面罩支撑机构

    公开(公告)号：US5825463A

    公开(公告)日：1998-10-20

    申请号：US791545

    申请日：1997-01-31

    申请人： Shinichi Hara ,  Nobutoshi Mizusawa ,  Yuji Chiba

    发明人： Shinichi Hara ,  Nobutoshi Mizusawa ,  Yuji Chiba

    IPC分类号： G03F1/22 ,  G03F7/20 ,  G03B27/62

    CPC分类号： G03F1/22 ,  G03F7/707

    摘要： A mask and a mask supporting mechanism wherein the outside periphery of a mask frame, having a rectangular shape, which supports the mask, is supported at three supporting points which are substantially the same distance from the center line of a mask membrane, whereby the mask frame is positioned with respect to X, Y and .theta. directions. Two pressing mechanisms press the mask frame at two points substantially opposed to two of the supporting points. The mask is supported at three points on the bottom surface thereof for positioning in the Z direction.

    摘要翻译： 一种掩模和掩模支撑机构，其中具有矩形形状的支撑掩模的掩模框架的外周被支撑在与掩模膜的中心线基本相同的距离处的三个支撑点处，由此掩模 框架相对于X，Y和θ方向定位。 两个按压机构在基本上与两个支撑点相对的两点处按压面罩框架。 掩模在其底表面上的三个点处被支撑以在Z方向上定位。

    X-ray mask, and exposure apparatus and device production using the mask
    4.
    发明授权
    X-ray mask, and exposure apparatus and device production using the mask 失效
    X射线掩模，以及使用掩模的曝光装置和装置制造

    公开(公告)号：US5485495A

    公开(公告)日：1996-01-16

    申请号：US286904

    申请日：1994-08-08

    申请人： Takeshi Miyachi ,  Nobutoshi Mizusawa ,  Shinichi Hara ,  Hiroshi Maehara

    发明人： Takeshi Miyachi ,  Nobutoshi Mizusawa ,  Shinichi Hara ,  Hiroshi Maehara

    IPC分类号： G03F1/22 ,  G03F7/20 ,  G21K5/04 ,  H01L21/027 ,  G21K5/00

    CPC分类号： G03F1/22 ,  G03F7/70783 ,  G21K5/04

    摘要： A method of producing an X-ray mask includes a step of forming a mask pattern on a mask substrate having an amount of warp, and a step of bonding the mask substrate to a mask frame. In both steps, the mask substrate maintains a shape obtained due to the amount of warp. Since the mask substrate is fixed to the mask frame in a warped state, distortion is not produced in the mask pattern. As a result, an X-ray mask, which is suitable for very precise exposure, is provided.

    摘要翻译： 制造X射线掩模的方法包括在具有翘曲量的掩模基板上形成掩模图案的步骤，以及将掩模基板接合到掩模框架的步骤。 在两个步骤中，掩模基板保持由于翘曲量而获得的形状。 由于掩模基板以翘曲状态固定在荫罩框架上，所以在掩模图案中不产生畸变。 因此，提供了适合于非常精确的曝光的X射线掩模。

    Substrate holding device and exposing apparatus using the same
    6.
    发明授权
    Substrate holding device and exposing apparatus using the same 失效
    基板保持装置和使用其的曝光装置

    公开(公告)号：US5883932A

    公开(公告)日：1999-03-16

    申请号：US464225

    申请日：1995-06-05

    申请人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

    发明人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

    IPC分类号： B23Q3/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  H01J37/20

    CPC分类号： G03F7/707 ,  H01L21/6838 ,  H01J2237/20 ,  H01J2237/3175 ,  Y10T279/11

    摘要： A substrate holding apparatus in which first and second vacuum clamping devices each have a holding surface for holding a portion of a substrate, a first driving device for rotating the first vacuum clamping device relative to the second vacuum clamping device, and a second driving device for reciprocally moving the first vacuum clamping device between a position in which it protrudes by a predetermined amount from the holding surface of the second vacuum clamping device and a position in which it does not protrude from that holding surface. Also disclosed is a substrate holding device in which a vacuum clamping device creates a vacuum clamp force on the holding surface thereof, a cylindrical delivering member surrounds at least a portion of the holding surface and is reciprocally movable between a position in which it protrudes by a predetermined amount from the holding surface and a position in which it does not protrude from the holding surface, and a driving device for moving the delivering member.

    摘要翻译： 一种基板保持装置，其中第一和第二真空夹紧装置各自具有用于保持基板的一部分的保持表面，用于使第一真空夹紧装置相对于第二真空夹紧装置旋转的第一驱动装置，以及用于 在第一真空夹紧装置从第二真空夹紧装置的保持表面突出预定量的位置和不从该保持表面突出的位置之间往复移动第一真空夹紧装置。 还公开了一种基板保持装置，其中真空夹持装置在其保持表面上产生真空夹紧力，圆柱形输送构件围绕保持表面的至少一部分，并且可在其突出位置之间往复运动 从保持表面预定量和不从保持表面突出的位置，以及用于移动输送构件的驱动装置。

    Recording apparatus having an ink mist evacuation system
    7.
    发明授权
    Recording apparatus having an ink mist evacuation system 失效
    具有墨雾排出系统的记录装置

    公开(公告)号：US5552812A

    公开(公告)日：1996-09-03

    申请号：US465933

    申请日：1995-06-06

    申请人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Yuji Chiba

    发明人： Ryuichi Ebinuma ,  Nobutoshi Mizusawa ,  Yuji Chiba

    IPC分类号： B41J2/165 ,  B41J2/175 ,  B41J11/14 ,  B41J29/02 ,  B41J29/377 ,  G03G21/16 ,  H04N1/00

    CPC分类号： B41J2/17523 ,  B41J11/14 ,  B41J2/1652 ,  B41J2/16585 ,  B41J2/1714 ,  B41J2/17513 ,  B41J2/1752 ,  B41J29/02 ,  B41J29/377 ,  G03G21/1628 ,  G03G21/1647 ,  G03G21/206 ,  H04N1/00525 ,  H04N1/00543 ,  H04N1/00554 ,  H04N1/00976 ,  G03G2221/1645 ,  G03G2221/1651 ,  G03G2221/1672 ,  G03G2221/1687

    摘要： A recording apparatus is provided with an upper unit having a recording head for discharging ink for effecting recording on a recording medium in response to information, and at least a portion of the electric circuit of the apparatus, a lower unit having a platen for maintaining the recording medium in the recording station by the recording head, the lower unit capable of being spaced apart relative to the upper unit, and a conveying member for conveying the recording medium to the recording station. The upper unit and the lower unit are capable of being spaced apart and opened in the recording station by the recording head. The recording apparatus further having a blower which introduces air and directs an air stream through the apparatus and past a full page width recording head. The air stream directs ink mist generated by the printhead through a recording medium discharge port such that ink mist is removed from the apparatus body by riding the air stream or by adhering to the recording medium. Internal contamination of the recording apparatus is avoided.

    摘要翻译： 记录装置具有上部单元，该上部单元具有用于排出墨水的记录头，用于响应于信息在记录介质上进行记录，并且该装置的电路的至少一部分具有用于保持 通过记录头在记录站中记录介质，下部单元能够相对于上部单元间隔开;以及传送构件，用于将记录介质传送到记录站。 上部单元和下部单元能够通过记录头在记录站中间隔开并打开。 该记录装置还具有引入空气并引导空气流通过设备并经过全页宽度记录头的鼓风机。 空气流通过记录介质排出口引导由打印头产生的墨雾，从而通过乘坐空气流或通过粘附到记录介质将墨雾从设备主体移除。 避免了记录装置的内部污染。