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    Mask holding device, exposure apparatus and device manufacturing method
    3.
    发明授权
    Mask holding device, exposure apparatus and device manufacturing method 失效
    面罩保持装置，曝光装置及装置的制造方法

    公开(公告)号：US06381005B1

    公开(公告)日：2002-04-30

    申请号：US09066836

    申请日：1998-04-28

    申请人： Kazuyuki Kasumi ,  Takeshi Miyachi

    发明人： Kazuyuki Kasumi ,  Takeshi Miyachi

    IPC分类号： G03B2762

    CPC分类号： G03F7/707 ,  G03F7/70783

    摘要： An exposure device for transferring a pattern on a mask onto a wafer. The exposure device includes a frame for supporting the mask, a mask holding device including a correction mechanism for correcting the pattern on the mask by applying force to the mask frame, and a device for changing at least one of the attitude and position of the correction mechanism, in accordance with the attitude of the mask. The positional relationship between the correction mechanism and the mask does not vary even if the attitude of the mask is changed to adjust the exposure gap between the wafer and the mask. Accordingly, the amount of change in magnification to be corrected can be kept constant and precise magnification correction can be achieved.

    摘要翻译： 一种用于将掩模上的图案转印到晶片上的曝光装置。 曝光装置包括用于支撑掩模的框架，掩模保持装置，其包括用于通过向掩模框架施加力来校正掩模上的图案的校正机构，以及用于改变校正的姿态和位置中的至少一个的装置 机制，按照面具的态度。 即使改变掩模的姿态来调节晶片和掩模之间的曝光间隙，校正机构和掩模之间的位置关系也不变化。 因此，可以将要校正的倍率变化量保持恒定，并且可以实现精确的倍率校正。

    Processing apparatus and device manufacturing method
    7.
    发明授权
    Processing apparatus and device manufacturing method 有权
    加工装置及装置的制造方法

    公开(公告)号：US07785091B2

    公开(公告)日：2010-08-31

    申请号：US11755973

    申请日：2007-05-31

    申请人： Kazuyuki Kasumi ,  Eigo Kawakami

    发明人： Kazuyuki Kasumi ,  Eigo Kawakami

    IPC分类号： B28B17/00 ,  B29C59/00

    CPC分类号： B29C59/022 ,  B29C33/3842 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    摘要： A processing apparatus configured to transfer a pattern of a mold onto a target member by pressing the mold against a resin applied to the target member includes a driver configured to move the mold and the target member relative to each other, and a controller configured to control the driver so that a changing rate of a load generated between the mold and the resin in a first state is smaller than that in a second state, and the first state being a state in which the mold that adheres to the resin starts moving in a direction separating from the resin, and the second state being a state in which the mold that moves in the direction separating from the resin is about to separate from the resin.

    摘要翻译： 一种处理装置，其被配置为通过将模具压靠在施加到所述目标构件上的树脂上而将模具的图案转印到目标构件上，所述处理装置包括驱动器，所述驱动器被配置为相对于彼此移动所述模具和所述目标构件;以及控制器， 驱动器，使得在第一状态下在模具和树脂之间产生的负载的变化率小于第二状态时的变化率，并且第一状态是粘附到树脂的模具开始移动的状态 方向与树脂分离，第二状态是在与树脂分离的方向上移动的模具将与树脂分离的状态。

    LOAD-LOCK TECHNIQUE
    8.
    发明申请
    LOAD-LOCK TECHNIQUE 有权
    负载技术

    公开(公告)号：US20080003081A1

    公开(公告)日：2008-01-03

    申请号：US11843074

    申请日：2007-08-22

    申请人： Kazuyuki Kasumi

    发明人： Kazuyuki Kasumi

    IPC分类号： B65G49/07

    CPC分类号： H01L21/67748 ,  Y10T137/87917

    摘要： A method of exhausting a gas in a chamber of a load-lock system having a first valve defining an opening for supplying a gas and a second valve defining an opening for conveyance of an article. The method includes a gas supplying step for supplying a gas heated by a heater into the chamber through the first valve, while the first valve and the second valve are kept open, a conveying step for conveying the article into the chamber while the second valve is kept open, and an exhausting step to be carried out after the gas supplying step and the conveying step are executed and the first and second valves are closed, to exhaust the gas inside the chamber while the first valve and the second valve are kept closed.

    摘要翻译： 一种排气装置的方法，所述方法包括：具有限定用于供应气体的开口的第一阀和限定用于输送物品的开口的第二阀的装载系统的腔室。 该方法包括：气体供给步骤，用于在第一阀和第二阀保持打开的同时通过第一阀将由加热器加热的气体供给到室中;一个输送步骤，用于将物品输送到室中，而第二阀为 保持打开状态，在执行气体供给步骤和输送步骤之后执行排气步骤，并且关闭第一和第二阀，以在第一阀和第二阀保持关闭的同时排出室内的气体。

    Exposure apparatus, device manufacturing method, stage apparatus, and alignment method
    9.
    发明授权
    Exposure apparatus, device manufacturing method, stage apparatus, and alignment method 失效
    曝光装置，装置制造方法，舞台装置和对准方法

    公开(公告)号：US07248335B2

    公开(公告)日：2007-07-24

    申请号：US11377282

    申请日：2006-03-17

    申请人： Kazuyuki Kasumi

    发明人： Kazuyuki Kasumi

    IPC分类号： G03B27/42

    CPC分类号： G03F9/7015 ,  G03F7/7035 ,  G03F7/70716 ,  G03F9/7038 ,  G03F9/7084 ,  G03F9/7088

    摘要： An exposure apparatus for exposing a substrate to a pattern due to an original includes a substrate stage which holds and moves the substrate, and a first measurement unit which is arranged on the substrate stage, and measures a position of a mark formed on the original by projecting and receiving light.

    摘要翻译： 用于将原材料暴露于图案的曝光装置包括保持和移动基板的基板台和布置在基板台上的第一测量单元，并且通过以下步骤测量原稿上形成的标记的位置： 投射和接收光。

    PROCESSING METHOD
    10.
    发明申请
    PROCESSING METHOD 有权
    处理方法

    公开(公告)号：US20070132157A1

    公开(公告)日：2007-06-14

    申请号：US11608009

    申请日：2006-12-07

    申请人： Toshinobu Tokita ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi

    发明人： Toshinobu Tokita ,  Hirohisa Ota ,  Eigo Kawakami ,  Kazuyuki Kasumi

    IPC分类号： B29C35/08 ,  C03C25/68 ,  G03C5/04

    CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

    摘要： A processing method for forming a first pattern on a substrate to which a resist is applied includes the steps of pressing an original having a second pattern that has a relief reverse to that of the first pattern, against the resist on the substrate, and irradiating light onto the resist via the original, wherein a size of a concave of the second pattern is greater than a size of a convex of the first pattern corresponding to the concave of the second pattern, and a size of a convex of the second pattern is smaller than a size of a concave of the first pattern corresponding to the convex of the second pattern.

    摘要翻译： 在施加抗蚀剂的基板上形成第一图案的处理方法包括将具有与第一图案相反的第二图案的原稿压在基板上的抗蚀剂上的步骤，以及照射光 通过原稿到抗蚀剂上，其中第二图案的凹部的尺寸大于对应于第二图案的凹部的第一图案的凸起的尺寸，并且第二图案的凸起的尺寸较小 比第一图案的凹部的尺寸对应于第二图案的凸起。