公开(公告)号：US5485495A

公开(公告)日：1996-01-16

申请号：US286904

申请日：1994-08-08

申请人： Takeshi Miyachi ,  Nobutoshi Mizusawa ,  Shinichi Hara ,  Hiroshi Maehara

发明人： Takeshi Miyachi ,  Nobutoshi Mizusawa ,  Shinichi Hara ,  Hiroshi Maehara

IPC分类号： G03F1/22 ,  G03F7/20 ,  G21K5/04 ,  H01L21/027 ,  G21K5/00

CPC分类号： G03F1/22 ,  G03F7/70783 ,  G21K5/04

摘要： A method of producing an X-ray mask includes a step of forming a mask pattern on a mask substrate having an amount of warp, and a step of bonding the mask substrate to a mask frame. In both steps, the mask substrate maintains a shape obtained due to the amount of warp. Since the mask substrate is fixed to the mask frame in a warped state, distortion is not produced in the mask pattern. As a result, an X-ray mask, which is suitable for very precise exposure, is provided.

摘要翻译： 制造X射线掩模的方法包括在具有翘曲量的掩模基板上形成掩模图案的步骤，以及将掩模基板接合到掩模框架的步骤。 在两个步骤中，掩模基板保持由于翘曲量而获得的形状。 由于掩模基板以翘曲状态固定在荫罩框架上，所以在掩模图案中不产生畸变。 因此，提供了适合于非常精确的曝光的X射线掩模。

公开(公告)号：US5854819A

公开(公告)日：1998-12-29

申请号：US797467

申请日：1997-02-06

申请人： Shinichi Hara ,  Takeshi Miyachi ,  Nobutoshi Mizusawa ,  Yuji Chiba ,  Kazuyuki Kasumi

发明人： Shinichi Hara ,  Takeshi Miyachi ,  Nobutoshi Mizusawa ,  Yuji Chiba ,  Kazuyuki Kasumi

IPC分类号： G03F7/20 ,  H01L21/30

CPC分类号： G03F7/70708 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/708

摘要： There is disclosed a mask supporting device comprising a chuck mechanism for supporting a mask substrate provided with a rectangular window in which a mask pattern is formed, and a frame for reinforcing the mask substrate, and a mechanism for applying, to said frame of the mask, loads from mutually orthogonal directions. The mechanism for applying loads includes a fixed reference contacting two positions on the external periphery of the mask frame and two pressing mechanism for applying loads to the mask frame from two directions respectively opposed to the two contact positions.

摘要翻译： 公开了一种掩模支撑装置，其包括用于支撑设置有其中形成有掩模图案的矩形窗口的掩模基板的卡盘机构和用于加强掩模基板的框架，以及用于将所述掩模 ，来自相互正交的方向的载荷。 用于施加载荷的机构包括固定的参考，其接触在荫罩框架的外周上的两个位置，以及两个按压机构，用于从两个接触位置相对的两个方向向荫罩框架施加负载。

公开(公告)号：US5825463A

公开(公告)日：1998-10-20

申请号：US791545

申请日：1997-01-31

申请人： Shinichi Hara ,  Nobutoshi Mizusawa ,  Yuji Chiba

发明人： Shinichi Hara ,  Nobutoshi Mizusawa ,  Yuji Chiba

IPC分类号： G03F1/22 ,  G03F7/20 ,  G03B27/62

CPC分类号： G03F1/22 ,  G03F7/707

摘要： A mask and a mask supporting mechanism wherein the outside periphery of a mask frame, having a rectangular shape, which supports the mask, is supported at three supporting points which are substantially the same distance from the center line of a mask membrane, whereby the mask frame is positioned with respect to X, Y and .theta. directions. Two pressing mechanisms press the mask frame at two points substantially opposed to two of the supporting points. The mask is supported at three points on the bottom surface thereof for positioning in the Z direction.

摘要翻译： 一种掩模和掩模支撑机构，其中具有矩形形状的支撑掩模的掩模框架的外周被支撑在与掩模膜的中心线基本相同的距离处的三个支撑点处，由此掩模 框架相对于X，Y和θ方向定位。 两个按压机构在基本上与两个支撑点相对的两点处按压面罩框架。 掩模在其底表面上的三个点处被支撑以在Z方向上定位。

公开(公告)号：US6167111A

公开(公告)日：2000-12-26

申请号：US108373

申请日：1998-07-01

申请人： Yutaka Watanabe ,  Shunichi Uzawa ,  Yasuaki Fukuda ,  Nobutoshi Mizusawa ,  Shinichi Hara

发明人： Yutaka Watanabe ,  Shunichi Uzawa ,  Yasuaki Fukuda ,  Nobutoshi Mizusawa ,  Shinichi Hara

IPC分类号： G03F7/20 ,  G21K1/06 ,  G21K5/00

CPC分类号： G03F7/70058 ,  G21K1/06

摘要： An apparatus for transferring a pattern of a mask onto a substrate with radiation light from a synchrotron radiation light source, includes a first mirror for collectively reflecting radiation light from the synchrotron radiation light source, and a second mirror for reflecting radiation light from the first mirror and for projecting the same to the mask. When a light ray advancing from a light emission point of the light source toward a center of a predetermined region of the mask, to be transferred to the substrate, is taken as a chief ray, when a normal to each of the first and second mirrors at an incidence position of a corresponding chief ray is taken as a Z axis, when a direction perpendicular to a plane defined by the Z axis of each mirror and a corresponding chief ray is taken as an X axis, and when a Y axis is taken along a direction perpendicular to the Z axis and X axis of each mirror, the first mirror has a reflection surface of a shape which is concave with respect to the X axis direction and concave with respect to the Y axis direction, while the second mirror has a reflection surface of a shape which is convex with respect to the Y axis direction.

摘要翻译： 一种用于利用来自同步加速器辐射光源的辐射光将掩模图案转印到基板上的装置，包括用于共同地反射来自同步加速器辐射光源的辐射光的第一反射镜和用于反射来自第一反射镜的辐射光的第二反射镜 并将其投射到面罩。 当将从光源的发光点向掩模的预定区域的中心传播的光线作为主光线时，当第一和第二反射镜中的每一个的法线 当将相应的主光线的入射位置作为Z轴时，当将与每个反射镜的Z轴和相应的主光线所定义的平面垂直的方向作为X轴，并且当采用Y轴时 沿着与每个反射镜的Z轴和X轴垂直的方向，第一反射镜具有相对于X轴方向为凹形且相对于Y轴方向凹陷的形状的反射面，而第二反射镜具有 相对于Y轴方向凸出的形状的反射面。

公开(公告)号：US5157700A

公开(公告)日：1992-10-20

申请号：US401615

申请日：1989-08-31

申请人： Hiroshi Kurosawa ,  Mitsuaki Amemiya ,  Shigeru Terashima ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Kunitaka Ozawa ,  Makiko Mori ,  Ryuichi Ebinuma ,  Shinichi Hara ,  Nobutoshi Mizusawa ,  Eigo Kawakami

发明人： Hiroshi Kurosawa ,  Mitsuaki Amemiya ,  Shigeru Terashima ,  Koji Uda ,  Isamu Shimoda ,  Shunichi Uzawa ,  Kunitaka Ozawa ,  Makiko Mori ,  Ryuichi Ebinuma ,  Shinichi Hara ,  Nobutoshi Mizusawa ,  Eigo Kawakami

IPC分类号： G03F7/20

CPC分类号： G03F7/70691 ,  G03F7/70058 ,  G03F7/70091 ,  G03F7/702

摘要： An exposure apparatus usable with synchrotron radiation source wherein the synchrotron radiation is generated by electron injection into a ring. The exposure apparatus is to transfer a semiconductor element pattern of a mask onto a semiconductor wafer by the synchrotron radiation. The apparatus includes a shutter for controlling the exposure of the wafer. The shutter controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined in response to the electron injection, and thereafter, the illuminance distribution is corrected in a predetermined manner. By this, the illuminance distribution data for controlling the shutter always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer are exposed with high precision.

公开(公告)号：US5883932A

公开(公告)日：1999-03-16

申请号：US464225

申请日：1995-06-05

申请人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

发明人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

IPC分类号： B23Q3/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  H01J37/20

CPC分类号： G03F7/707 ,  H01L21/6838 ,  H01J2237/20 ,  H01J2237/3175 ,  Y10T279/11

摘要： A substrate holding apparatus in which first and second vacuum clamping devices each have a holding surface for holding a portion of a substrate, a first driving device for rotating the first vacuum clamping device relative to the second vacuum clamping device, and a second driving device for reciprocally moving the first vacuum clamping device between a position in which it protrudes by a predetermined amount from the holding surface of the second vacuum clamping device and a position in which it does not protrude from that holding surface. Also disclosed is a substrate holding device in which a vacuum clamping device creates a vacuum clamp force on the holding surface thereof, a cylindrical delivering member surrounds at least a portion of the holding surface and is reciprocally movable between a position in which it protrudes by a predetermined amount from the holding surface and a position in which it does not protrude from the holding surface, and a driving device for moving the delivering member.

摘要翻译： 一种基板保持装置，其中第一和第二真空夹紧装置各自具有用于保持基板的一部分的保持表面，用于使第一真空夹紧装置相对于第二真空夹紧装置旋转的第一驱动装置，以及用于 在第一真空夹紧装置从第二真空夹紧装置的保持表面突出预定量的位置和不从该保持表面突出的位置之间往复移动第一真空夹紧装置。 还公开了一种基板保持装置，其中真空夹持装置在其保持表面上产生真空夹紧力，圆柱形输送构件围绕保持表面的至少一部分，并且可在其突出位置之间往复运动 从保持表面预定量和不从保持表面突出的位置，以及用于移动输送构件的驱动装置。

公开(公告)号：US5999589A

公开(公告)日：1999-12-07

申请号：US140679

申请日：1998-08-26

申请人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

发明人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

IPC分类号： B23Q3/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  H01J37/20

CPC分类号： G03F7/707 ,  H01L21/6838 ,  H01J2237/20 ,  H01J2237/3175 ,  Y10T279/11

摘要： A substrate holding device includes a vacuum supplying device for supplying a vacuum to a holding surface to hold a substrate, a hollow member surrounding at least a portion of the holding surface and movable between a position in which the holding member protrudes from the holding surface and a position in which the hollow member does not protrude from the holding surface, and a moving mechanism for relatively moving between the hollow member and the holding surface.

摘要翻译： 基板保持装置包括用于向保持表面提供真空以保持基板的真空供应装置，围绕保持表面的至少一部分的中空构件，并且可在保持构件从保持表面突出的位置和 中空构件不从保持表面突出的位置，以及用于在中空构件和保持表面之间相对移动的移动机构。

公开(公告)号：US06804323B2

公开(公告)日：2004-10-12

申请号：US10176614

申请日：2002-06-24

申请人： Akira Moriya ,  Takeshi Miyachi ,  Shinichi Hara ,  Toshinobu Tokita

发明人： Akira Moriya ,  Takeshi Miyachi ,  Shinichi Hara ,  Toshinobu Tokita

IPC分类号： G21K500

CPC分类号： G03F1/22 ,  Y02P90/14 ,  Y02P90/18 ,  Y02P90/20

摘要： A method of correcting a magnification of a mask pattern formed on a mask substrate. The method includes applying forces to four pressurizing points of an outer periphery of an approximately ring-shaped frame, which supports the mask substrate and has a rectangular window, on substantially extended lines of two diagonal lines of the rectangular window, and adjusting at least an angle, to the extended lines, of a vector of the forces applied to each of the pressurizing points.

摘要翻译： 一种校正形成在掩模基板上的掩模图案的放大率的方法。 该方法包括在矩形窗口的两个对角线的基本上延伸的线上对大约环形框架的外周边的四个加压点施加力，该四个加压点支撑掩模基板并具有矩形窗口，并且至少调整 与施加到每个加压点的力的向量的延伸线的角度。

公开(公告)号：US5994003A

公开(公告)日：1999-11-30

申请号：US935901

申请日：1997-09-23

申请人： Shinichi Hara ,  Takeshi Miyachi

发明人： Shinichi Hara ,  Takeshi Miyachi

IPC分类号： H01L21/027 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70075 ,  G03F7/20 ,  G03F7/702 ,  G03F7/70358

摘要： A scanning exposure method includes steps of relatively scanning a mask and a wafer relative to exposure light of a slit beam, to transfer a pattern of the mask onto the wafer and applying a relative speed between the mask and the wafer in a scan direction, during the scan exposure in one shot area, wherein the relative speed is changed in accordance with thermal distortion of the mask pattern caused during the scan exposure.

摘要翻译： 扫描曝光方法包括以下步骤：相对于狭缝光束的曝光来相对地扫描掩模和晶片，以将掩模的图案转移到晶片上，并在扫描方向上在掩模和晶片之间施加相对速度， 在一个拍摄区域中的扫描曝光，其中相对速度根据在扫描曝光期间引起的掩模图案的热失真而改变。

公开(公告)号：US6069931A

公开(公告)日：2000-05-30

申请号：US30081

申请日：1998-02-25

申请人： Takeshi Miyachi ,  Shinichi Hara

发明人： Takeshi Miyachi ,  Shinichi Hara

IPC分类号： G03F1/00 ,  G03F7/20 ,  H01L21/30

CPC分类号： G03F7/707 ,  G03F7/70783

摘要： A mask holding system includes a chucking mechanism for holding a mask structure including a frame and a mask substrate having a rectangular window with a mask pattern, and a load mechanism for applying, at a position along an extension of a diagonal of the rectangular window, a load to the frame in a direction along the plane of the mask, whereby the mask pattern can be distorted isotropically with the application of the load along the mask plane.

摘要翻译： 掩模保持系统包括用于保持包括框架的掩模结构的夹持机构和具有带有掩模图案的矩形窗口的掩模基板，以及负载机构，用于在沿着矩形窗口的对角线的延伸部的位置处， 沿着掩模平面的方向对框架的载荷，由此掩模图案可以沿着掩模平面施加负载而各向同性地变形。