公开(公告)号：US06084356A

公开(公告)日：2000-07-04

申请号：US84911

申请日：1998-05-28

申请人： Hirofumi Seki ,  Satoshi Ichimura ,  Satoshi Takemori ,  Eiji Setoyama ,  Kouji Ishiguro ,  Yasuhiro Mochizuki ,  Sensuke Okada ,  Hajime Murakami

发明人： Hirofumi Seki ,  Satoshi Ichimura ,  Satoshi Takemori ,  Eiji Setoyama ,  Kouji Ishiguro ,  Yasuhiro Mochizuki ,  Sensuke Okada ,  Hajime Murakami

IPC分类号： H05H1/46 ,  C23C16/50 ,  C23C16/511 ,  C23F4/00 ,  H01J37/32 ,  H01L21/205 ,  H01L21/302 ,  H01L21/3065 ,  H01L21/31

CPC分类号： H01J37/32229 ,  H01J37/32192 ,  H01J37/32266 ,  H01J37/32678

摘要： Dielectric bodies are arranged in waveguide portions for passing microwave radiation and for holding a plasma generating chamber 25 at a vacuum. The dielectric bodies are arranged to intersect at least an electron cyclotron resonance area of the waveguide portions. A tip end portion of the dielectric bodies at a side of the plasma generating chamber are positioned toward at a side of the plasma generating chamber from an intermediate portion in an axial direction length of a first permanent magnet which is arranged by enclosing an outer periphery of the waveguide portions, and a tip end portion of the dielectric bodies at a side of the plasma generating chamber is substantially consistent with an inner face of the plasma generating chamber.

摘要翻译： 电介质体布置在用于通过微波辐射的波导部分中并且用于将等离子体产生室25保持在真空下。 电介质体被布置成与波导部分的至少一个电子回旋共振区域相交。 等离子体发生室一侧的电介质体的前端部从第一永久磁铁的轴向方向长度的中间部朝向等离子体发生室侧， 波导部分和等离子体发生室侧面的电介质体的末端部分与等离子体发生室的内表面基本一致。

公开(公告)号：US06196155B1

公开(公告)日：2001-03-06

申请号：US09290169

申请日：1999-04-13

申请人： Eiji Setoyama ,  Kouji Ishiguro ,  Hajime Murakami ,  Hirofumi Seki

发明人： Eiji Setoyama ,  Kouji Ishiguro ,  Hajime Murakami ,  Hirofumi Seki

IPC分类号： C23C1600

CPC分类号： H01J37/32862 ,  B08B7/00 ,  C23C16/402 ,  C23C16/517 ,  H01J37/32623 ,  H01J37/32688

摘要： A plasma processing apparatus comprises a plasma generating chamber including a side wall and a roof-plate to cover the upper part of the side wall, in which plasma is generated; a plurality of magnets, one group of the magnets being arranged on the roof-plate in concentric circles, with the polarity of each magnets in each circle being alternated, and the other group of the magnets being arranged around the side wall of the plasma generating chamber in rings, with the polarity of each magnet in each ring being alternated, to form a cusped magnetic field to confine the plasma in the plasma generating chamber; and a holding device which is provided in the plasma generating chamber, to hold a substrate to be processed with the plasma; wherein the magnet means arranged on the roof-plate and the magnet means arranged around the side wall are held in such a way that they can be moved up and down.

摘要翻译： 等离子体处理装置包括等离子体产生室，其包括侧壁和顶板，以覆盖其中产生等离子体的侧壁的上部; 多个磁体，一组磁体以同心圆布置在屋顶板上，每个圆中的每个磁体的极性交替，另一组磁体围绕等离子体产生的侧壁布置 每个环中的每个磁体的极性交替，以形成一个限定的等离子体在等离子体产生室中的脉冲磁场; 以及保持装置，其设置在所述等离子体产生室中，以用所述等离子体保持待处理的基板; 其中布置在屋顶板上的磁体装置和围绕侧壁布置的磁铁装置被保持为使得它们能够上下移动。

公开(公告)号：US07394081B2

公开(公告)日：2008-07-01

申请号：US11088208

申请日：2005-03-24

申请人： Takashi Okazaki ,  Kazuki Tsuchida ,  Hirofumi Seki ,  Robert W. Hamm

发明人： Takashi Okazaki ,  Kazuki Tsuchida ,  Hirofumi Seki ,  Robert W. Hamm

IPC分类号： A61N5/00

CPC分类号： G21G1/10 ,  A61K51/1282

摘要： A radioisotope production apparatus includes: a linear accelerator for accelerating an ion beam and irradiating a target with the ion beam, radio frequency power supplies for supplying radio frequency waves through coaxial tubes and the linear accelerator, a target shield member containing the target, a first radiation shield member covering the linear accelerator, and a movable second radiation shield member covering the side of target shield member of the linear accelerator between the first radiation shield member and the target shield member. The first radiation shield member is movably divided in opposite directions, respectively, of the axial direction of the linear accelerator from the base point of the connection point of the coaxial tube connected to the linear accelerator.

摘要翻译： 放射性同位素制造装置包括：用于加速离子束并用离子束照射靶的线性加速器，用于通过同轴管和线性加速器提供射频的射频电源，包含靶的靶屏蔽构件，第一 覆盖直线加速器的辐射屏蔽构件，以及覆盖第一辐射屏蔽构件和目标屏蔽构件之间的线性加速器的目标屏蔽构件的一侧的可移动的第二辐射屏蔽构件。 第一辐射屏蔽构件从连接到线性加速器的同轴管的连接点的基点分别沿线性加速器的轴向的相反方向可移动地分开。

公开(公告)号：US20050242276A1

公开(公告)日：2005-11-03

申请号：US11088208

申请日：2005-03-24

申请人： Takashi Okazaki ,  Kazuki Tsuchida ,  Hirofumi Seki ,  Robert Hamm

发明人： Takashi Okazaki ,  Kazuki Tsuchida ,  Hirofumi Seki ,  Robert Hamm

IPC分类号： G21F3/00 ,  A61K51/00 ,  A61K51/12 ,  G21G1/10 ,  G21H5/02 ,  G21K5/00 ,  G21K5/04 ,  G21K5/08 ,  H01S1/00 ,  H05H3/02 ,  H05H6/00 ,  H05H9/00

CPC分类号： G21G1/10 ,  A61K51/1282

摘要： A radioisotope production apparatus includes: a linear accelerator for accelerating an ion beam and irradiating a target with the ion beam, radio frequency power supplies for supplying radio frequency waves through coaxial tubes and the linear accelerator, a target shield member containing the target, a first radiation shield member covering the linear accelerator, and a movable second radiation shield member covering the side of target shield member of the linear accelerator between the first radiation shield member and the target shield member. The first radiation shield member is movably divided in opposite directions, respectively, of the axial direction of the linear accelerator from the base point of the connection point of the coaxial tube connected to the linear accelerator.

摘要翻译： 放射性同位素制造装置包括：用于加速离子束并用离子束照射靶的线性加速器，用于通过同轴管和线性加速器提供射频的射频电源，包含靶的靶屏蔽构件，第一 覆盖直线加速器的辐射屏蔽构件，以及覆盖第一辐射屏蔽构件和目标屏蔽构件之间的线性加速器的目标屏蔽构件的一侧的可移动的第二辐射屏蔽构件。 第一辐射屏蔽构件从连接到线性加速器的同轴管的连接点的基点分别沿线性加速器的轴向的相反方向可移动地分开。

公开(公告)号：US5939026A

公开(公告)日：1999-08-17

申请号：US999399

申请日：1997-12-29

申请人： Hirofumi Seki ,  Hirofumi Shirakata ,  Yasuro Hori ,  Shigeo Shiono

发明人： Hirofumi Seki ,  Hirofumi Shirakata ,  Yasuro Hori ,  Shigeo Shiono

IPC分类号： B01D53/60 ,  B01D53/32 ,  B01D53/74 ,  B01J19/12 ,  A61L2/02

CPC分类号： B01D53/323 ,  B01D2259/812 ,  Y10S422/90

摘要： An electron beam gas processing apparatus includes a single vacuum vessel maintained at vacuum by means of a vacuum pump and first and second lenses are disposed in the vacuum vessel. An electron beam emitted from an electron source is focused by each of the lenses, and the electron beam is irradiated onto a processing gas in a duct. When the current value of the electron beam is increased as the concentration of NOx in the processing gas increases, the focal distance is decreased by increasing the intensity of magnetic fields or the intensity of electric fields of the lenses in accordance with the current value of a filament, the current value of an arc power supply and the gas pressure in a gas reservoir and the first lens is moved toward a draw-out electrode and the second lens is moved toward the duct, so that a parallel electron beam of constant diameter is formed and the electron beam can be prevented from being increased in focusing diameter.

摘要翻译： 电子束气体处理装置包括通过真空泵保持真空的单个真空容器，并且第一和第二透镜设置在真空容器中。 从电子源发射的电子束由每个透镜聚焦，并且电子束照射在管道中的处理气体上。 当电子束的当前值随着处理气体中的NOx浓度增加而增加时，通过根据当前值a的磁场强度或透镜的电场强度增加来减小焦距 电弧电源的电流值和气体储存器中的气体压力和第一透镜朝向拉出电极移动，并且第二透镜朝向导管移动，使得恒定直径的平行电子束为 并且可以防止电子束在聚焦直径上增加。