公开(公告)号：US07972469B2

公开(公告)日：2011-07-05

申请号：US11738505

申请日：2007-04-22

申请人： Hiroji Hanawa ,  Andrew Nguyen ,  Keiji Horioka ,  Kallol Bera ,  Kenneth S. Collins ,  Lawrence Wong ,  Martin Jeff Salinas ,  Roger A. Lindley ,  Hong S. Yang

发明人： Hiroji Hanawa ,  Andrew Nguyen ,  Keiji Horioka ,  Kallol Bera ,  Kenneth S. Collins ,  Lawrence Wong ,  Martin Jeff Salinas ,  Roger A. Lindley ,  Hong S. Yang

IPC分类号： H01L21/00

CPC分类号： H01J37/3266 ,  H01J37/32623

摘要： Embodiments of the present invention relate to plasma processing apparatus and methods of use thereof. In some embodiments, a plasma control magnet assembly includes a plurality of magnets arranged in a predetermined pattern that generate a magnetic field having a strength greater than 10 Gauss in a region proximate the assembly and less than 10 Gauss in a region remote from the assembly.

摘要翻译： 本发明的实施例涉及等离子体处理装置及其使用方法。 在一些实施例中，等离子体控制磁体组件包括以预定图案布置的多个磁体，其在靠近组件的区域中产生强度大于10高斯的磁场，并且在远离组件的区域中小于10高斯。

公开(公告)号：US08617351B2

公开(公告)日：2013-12-31

申请号：US11046656

申请日：2005-01-28

申请人： Daniel J. Hoffman ,  Roger A. Lindley ,  Michael C. Kutney ,  Martin J. Salinas ,  Hamid F. Tavassoli ,  Keiji Horioka ,  Douglas A. Buchberger, Jr.

发明人： Daniel J. Hoffman ,  Roger A. Lindley ,  Michael C. Kutney ,  Martin J. Salinas ,  Hamid F. Tavassoli ,  Keiji Horioka ,  Douglas A. Buchberger, Jr.

IPC分类号： C23F1/00 ,  H01L21/306 ,  C03C15/00

CPC分类号： H01J37/32091 ,  H01J37/3244 ,  H01J37/32623 ,  H01J37/3266

摘要： A plasma reactor for processing a workpiece, includes a vacuum chamber defined by a sidewall and ceiling, and a workpiece support pedestal having a workpiece support surface in the chamber and facing the ceiling and including a cathode electrode. An RF power generator is coupled to the cathode electrode. Plasma distribution is controlled by an external annular inner electromagnet in a first plane overlying the workpiece support surface, an external annular outer electromagnet in a second plane overlying the workpiece support surface and having a greater diameter than the inner electromagnet, and an external annular bottom electromagnet in a third plane underlying the workpiece support surface. D.C. current supplies are connected to respective ones of the inner, outer and bottom electromagnets.

摘要翻译： 一种用于加工工件的等离子体反应器，包括由侧壁和天花板限定的真空室，以及在所述室中具有工件支撑表面并且面向天花板并且包括阴极电极的工件支撑基座。 RF发生器耦合到阴极电极。 等离子体分布由覆盖工件支撑表面的第一平面中的外部环形内部电磁体控制，覆盖工件支撑表面并且具有比内部电磁体更大的直径的第二平面中的外部环形外部电磁体以及外部环形底部电磁体 在工件支撑表面下方的第三平面内。 内部，外部和底部电磁铁中的相应电源连接到电流源。

公开(公告)号：US06326307B1

公开(公告)日：2001-12-04

申请号：US09440792

申请日：1999-11-15

申请人： Roger A. Lindley ,  Henry Fong ,  Yunsang Kim ,  Takehito Komatsu ,  Ajey M. Joshi ,  Bryan Y. Pu ,  Hongqing Shan

发明人： Roger A. Lindley ,  Henry Fong ,  Yunsang Kim ,  Takehito Komatsu ,  Ajey M. Joshi ,  Bryan Y. Pu ,  Hongqing Shan

IPC分类号： H01L21302

CPC分类号： H01L21/76802 ,  H01L21/31116

摘要： A photoresist plasma pretreatment performed prior to a plasma oxide etch. The plasma pretreatment is performed with an argon plasma or a carbon tetrafluoride and trifluoromethane plasma with lower power than in the main etch or is performed with a plasma of difluoromethane or trifluoromethane and carbon monoxide but no argon diluent gas. Thereby, striations on the oxide wall are reduced.

摘要翻译： 在等离子体氧化物蚀刻之前执行的光刻胶等离子体预处理。 等离子体预处理用氩等离子体或四氟化碳和三氟甲烷等离子体进行，功率低于主蚀刻，或者用二氟甲烷或三氟甲烷和一氧化碳的等离子体进行，而不是氩气稀释气体。 因此，氧化物壁上的条纹减小。

公开(公告)号：US08092605B2

公开(公告)日：2012-01-10

申请号：US11564206

申请日：2006-11-28

申请人： Steven C. Shannon ,  Masao Drexel ,  James A. Stinnett ,  Ying Rui ,  Ying Xiao ,  Roger A. Lindley ,  Imad Yousif

发明人： Steven C. Shannon ,  Masao Drexel ,  James A. Stinnett ,  Ying Rui ,  Ying Xiao ,  Roger A. Lindley ,  Imad Yousif

IPC分类号： C23C16/00 ,  H01L21/306 ,  C23F1/00

CPC分类号： H01J37/3266 ,  H01J37/32082 ,  H01J37/32623

摘要： A method and apparatus for confining a plasma are provided herein. In one embodiment, an apparatus for confining a plasma includes a substrate support and a magnetic field forming device for forming a magnetic field proximate a boundary between a first region disposed at least above the substrate support, where a plasma is to be formed, and a second region, where the plasma is to be selectively restricted. The magnetic field has b-field components perpendicular to a direction of desired plasma confinement that selectively restrict movement of charged species of the plasma from the first region to the second region dependent upon the process conditions used to form the plasma.

摘要翻译： 本文提供了一种限制等离子体的方法和装置。 在一个实施例中，用于限制等离子体的装置包括基板支撑件和磁场形成装置，用于在至少设置在衬底支架上的第一区域之间形成靠近边界的磁场，其中将形成等离子体，以及 第二区域，其中等离子体将被选择性地限制。 磁场具有垂直于期望等离子体限制的方向的b场分量，其根据用于形成等离子体的工艺条件，选择性地限制等离子体的带电物质从第一区域到第二区域的移动。

公开(公告)号：US08048328B2

公开(公告)日：2011-11-01

申请号：US11612102

申请日：2006-12-18

申请人： Roger A. Lindley ,  Scott A. Hogenson ,  Daniel J. Hoffman

发明人： Roger A. Lindley ,  Scott A. Hogenson ,  Daniel J. Hoffman

IPC分类号： B44C1/22 ,  C03C15/00 ,  C03C25/68 ,  C23F1/00 ,  H01L21/306

CPC分类号： H01J37/3266 ,  H01J37/32623 ,  H01J37/32688

摘要： Methods for rotating a magnetic field in a process chamber is provided herein. In one embodiment, a method for rotating a magnetic field in a process chamber includes forming a magnetic field having a primary shape; changing the primary shape to at least two sequential transitional shapes; and changing the transitional shape to a rotated primary shape. Optionally, the magnetic field may be maintained at an approximately constant magnitude throughout each step. Optionally, a maximum of one current applied to one or more magnetic field producing coils is equal to zero or has its polarity reversed between any two adjacent steps.

公开(公告)号：US20080121345A1

公开(公告)日：2008-05-29

申请号：US11564206

申请日：2006-11-28

申请人： Steven C. Shannon ,  Masao Drexel ,  James A. Stinnett ,  Ying Rui ,  Ying Xiao ,  Roger A. Lindley ,  Imad Yousif

发明人： Steven C. Shannon ,  Masao Drexel ,  James A. Stinnett ,  Ying Rui ,  Ying Xiao ,  Roger A. Lindley ,  Imad Yousif

IPC分类号： H01L21/306

CPC分类号： H01J37/3266 ,  H01J37/32082 ,  H01J37/32623

摘要： A method and apparatus for confining a plasma are provided herein. In one embodiment, an apparatus for confining a plasma includes a substrate support and a magnetic field forming device for forming a magnetic field proximate a boundary between a first region disposed at least above the substrate support, where a plasma is to be formed, and a second region, where the plasma is to be selectively restricted. The magnetic field has b-field components perpendicular to a direction of desired plasma confinement that selectively restrict movement of charged species of the plasma from the first region to the second region dependent upon the process conditions used to form the plasma.

摘要翻译： 本文提供了一种限制等离子体的方法和装置。 在一个实施例中，用于限制等离子体的装置包括基板支撑件和磁场形成装置，用于在至少设置在衬底支架上的第一区域之间形成靠近边界的磁场，其中将形成等离子体，以及 第二区域，其中等离子体将被选择性地限制。 磁场具有垂直于期望等离子体限制的方向的b场分量，其根据用于形成等离子体的工艺条件，选择性地限制等离子体的带电物质从第一区域到第二区域的移动。

公开(公告)号：US5989349A

公开(公告)日：1999-11-23

申请号：US881601

申请日：1997-06-24

申请人： Kuang-Han Ke ,  Roger A. Lindley ,  Hongching Shan ,  Richard R. Mett

发明人： Kuang-Han Ke ,  Roger A. Lindley ,  Hongching Shan ,  Richard R. Mett

IPC分类号： H01L21/66 ,  H01J37/32 ,  H01L21/00 ,  H01L21/687 ,  C23C16/00

CPC分类号： H01L21/67109 ,  H01J37/32935 ,  H01L21/67253 ,  H01L21/68785 ,  H01J2237/244

摘要： A diagnostic pedestal assembly for measuring ion current and DC bias voltage within a high-power plasma reaction chamber of a semiconductor wafer processing system. The diagnostic pedestal assembly contains an aperture located in a surface of the pedestal and a probe element that is supported within the aperture.

摘要翻译： 一种用于测量半导体晶片处理系统的大功率等离子体反应室内的离子电流和DC偏置电压的诊断基座组件。 诊断基座组件包括位于基座的表面中的孔和支撑在孔内的探针元件。

公开(公告)号：US07883633B2

公开(公告)日：2011-02-08

申请号：US11612129

申请日：2006-12-18

申请人： Roger A. Lindley ,  Scott A. Hogenson ,  Daniel J. Hoffman

发明人： Roger A. Lindley ,  Scott A. Hogenson ,  Daniel J. Hoffman

IPC分类号： C23F1/00

CPC分类号： H01J37/3266 ,  H01J37/32623 ,  H01J37/32688

摘要： Methods for rotating a magnetic field in a process chamber is provided herein. In one embodiment, a method for rotating a magnetic field in a process chamber includes forming a magnetic field having a primary shape; changing the primary shape to at least two sequential transitional shapes; and changing the transitional shape to a rotated primary shape. Optionally, the magnetic field may be maintained at an approximately constant magnitude throughout each step. Optionally, a maximum of one current applied to one or more magnetic field producing coils is equal to zero or has its polarity reversed between any two adjacent steps.

摘要翻译： 本文提供了用于在处理室中旋转磁场的方法。 在一个实施例中，用于旋转处理室中的磁场的方法包括形成具有初级形状的磁场; 将主要形状改变为至少两个顺序的过渡形状; 并将过渡形状改变为旋转的主要形状。 任选地，在每个步骤中，磁场可以保持在大致恒定的量级。 可选地，施加到一个或多个磁场产生线圈的最大一个电流等于零或在任何两个相邻步骤之间具有其极性反转。