公开(公告)号：US20200223655A1

公开(公告)日：2020-07-16

申请号：US16706164

申请日：2019-12-06

申请人： Hiroki KOMADA ,  Shoubu KATO ,  Shogo IWAI ,  Shinichi ITO ,  Keiichi ATSUMI ,  Akihito SAKANO

发明人： Hiroki KOMADA ,  Shoubu KATO ,  Shogo IWAI ,  Shinichi ITO ,  Keiichi ATSUMI ,  Akihito SAKANO

IPC分类号： B65H45/16 ,  B65H45/18 ,  B65H37/06

摘要： In a sheet folding apparatus for folding a sheet, a sheet is pushed at a predetermined position thereof by a push member while the sheet is being conveyed by a conveyance roller. The predetermined position of the sheet is guided to the nip section of a folding roller pair. Then, the sheet is nipped at the predetermined position thereof and folded by the folding roller pair.

公开(公告)号：US20110266705A1

公开(公告)日：2011-11-03

申请号：US13069186

申请日：2011-03-22

申请人： Shinichi ITO ,  Takuya KONO

发明人： Shinichi ITO ,  Takuya KONO

IPC分类号： B29C33/38 ,  B05C3/02 ,  B28B7/38

CPC分类号： G03F7/0002 ,  B29C33/62 ,  B29C33/64 ,  B82Y10/00 ,  B82Y40/00

摘要： A template repair method according to one embodiment is a method for repairing a template including a template base material and a first mold release layer formed on a pattern surface of the template base material, and a restorative material is supplied to the pattern surface of the template base material in the template repair method. The restorative material has affinity to the base material and non-affinity to the mold release layer.

摘要翻译： 根据一个实施例的模板修复方法是一种用于修复模板的方法，所述模板包括模板基材和形成在模板基材的图案表面上的第一脱模层，并且将修复材料供应到模板的图案表面 基材在模板修复方法中。 修复材料对基材具有亲和力并且对脱模层具有非亲和性。

公开(公告)号：US20090017401A1

公开(公告)日：2009-01-15

申请号：US12170483

申请日：2008-07-10

申请人： Shinichi ITO

发明人： Shinichi ITO

IPC分类号： G03F7/20

CPC分类号： H01L21/31144 ,  H01L21/0273

摘要： A resist film provided on one major surface of a process target substrate is patterned to form a resist pattern. A solubilization process is carried out on the resist film remaining in a space portion of the resist pattern to make the resist film easily soluble in a liquid for removing the remaining resist film. Then, the liquid is supplied to the remaining resist film.

摘要翻译： 设置在工艺靶基板的一个主表面上的抗蚀剂膜被图案化以形成抗蚀剂图案。 对保留在抗蚀剂图案的空间部分中的抗蚀剂膜进行溶解处理，使得抗蚀剂膜容易溶于用于除去剩余的抗蚀剂膜的液体中。 然后，将液体供给到剩余的抗蚀剂膜。

公开(公告)号：US20130014360A1

公开(公告)日：2013-01-17

申请号：US13428530

申请日：2012-03-23

申请人： Ryoichi INANAMI ,  Shinichi ITO ,  Hiroshi KOIZUMI ,  Akihiro KOJIMA

发明人： Ryoichi INANAMI ,  Shinichi ITO ,  Hiroshi KOIZUMI ,  Akihiro KOJIMA

IPC分类号： H01L21/683

CPC分类号： H01L21/6875 ,  H01L21/6715 ,  H01L21/67288 ,  H01L21/6833 ,  H01L21/6838 ,  Y10T29/41

摘要： According to one embodiment, a stage apparatus includes a height control unit includes height control elements each which is drove in an upward/downward direction independently, a measuring unit which divides an upper surface of the substrate into areas, and measures a height of each of the areas. The control unit is configured to set the height of each of the areas independently by controlling a height of each of the height control elements based on a data value, determine using the measuring unit whether the height of each of the areas in the upper surface of the substrate is in a allowable range, and set the height of the area out of the allowable range again by the height control elements.

摘要翻译： 根据一个实施例，舞台装置包括高度控制单元，包括各自独立地向上/向下驱动的高度控制元件，测量单元，其将衬底的上表面划分为区域，并且测量每个的高度 地区。 控制单元被配置为通过基于数据值来控制每个高度控制元件的高度来独立地设置每个区域的高度，使用测量单元确定上表面中的每个区域的高度 基板处于允许范围内，并且通过高度控制元件再次将该区域的高度设定在允许范围之外。

公开(公告)号：US20150330375A1

公开(公告)日：2015-11-19

申请号：US14654946

申请日：2012-12-27

申请人： Yasuhide MIZUNO ,  Shinichi ITO ,  Hideki KUBONOYA

发明人： Yasuhide MIZUNO ,  Shinichi ITO ,  Hideki KUBONOYA

IPC分类号： F04B17/04 ,  F04B49/06

CPC分类号： F04B17/04 ,  F04B49/06 ,  F04B49/10 ,  F04B2203/0201 ,  F04B2203/0204 ,  F04B2205/11 ,  F16H59/72 ,  F16H61/0025

摘要： A control device of a vehicle drive device including an electromagnetic valve oil pump sucking and discharging hydraulic oil through ON/OFF operations of an electromagnetic valve, a drive frequency controller for controlling a drive frequency at which the electromagnetic valve is to be turned on/off, a temperature sensor for detecting an oil temperature of the hydraulic oil, and a hydraulic circuit supplied with the hydraulic oil discharged from the electromagnetic valve oil pump, the control device of a vehicle drive device further including a surge absorption circuit absorbing a counter electromotive force generated in the electromagnetic valve oil pump, the drive frequency of operation of the electromagnetic valve oil pump being set lower when the oil temperature is low than when the oil temperature is high.

摘要翻译： 一种车辆驱动装置的控制装置，其特征在于，包括：电磁阀油泵，其通过电磁阀的接通/断开操作吸入和排出液压油;驱动频率控制器，用于控制电磁阀打开/关闭的驱动频率 用于检测液压油的油温的温度传感器以及供给从电磁阀油泵排出的液压油的液压回路，还具备吸收反电动势的浪涌吸收回路的车辆驱动装置的控制装置， 在电磁阀油泵中产生，当油温低于油温高时，电磁阀油泵的运行频率设定得较低。

公开(公告)号：US20120247735A1

公开(公告)日：2012-10-04

申请号：US13455717

申请日：2012-04-25

申请人： Shinichi ITO ,  Kenya Kawabata ,  Shinichi Furumoto

发明人： Shinichi ITO ,  Kenya Kawabata ,  Shinichi Furumoto

IPC分类号： F28D15/02 ,  F28F7/00

CPC分类号： F28D15/0275 ,  H01L23/4006 ,  H01L23/427 ,  H01L23/467 ,  H01L2924/0002 ,  H01L2924/00

摘要： The heat sink has a first heat transfer plate member that has one surface thermally connected to a heat generating component and is thermally connected to a first heat dissipating fin section having thin plate fins; a second heat transfer plate member that has one surface thermally connected to a second heat dissipating fin section having thin plate fins; a heat pipe section that is provided between an opposite surface of the first heat transfer plate member and an opposite surface of the second heat transfer plate member to be thermally connected thereto; and a heat transfer block that is thermally connected to a side surface and an upper surface of the heat pipe section and arranged to sandwich the heat pipe section between the heat transfer block and the second heat transfer plate member.

摘要翻译： 散热器具有第一传热板构件，其具有与发热部件热连接的一个表面，并且热连接到具有薄板翅片的第一散热翅片部分; 第二传热板构件，其一个表面热连接到具有薄板翅片的第二散热翅片部分; 设置在所述第一传热板构件的相反面与所述第二传热板构件的与其热连接的相对面之间的热管部; 以及传热块，其与热管部的侧面和上表面热连接并且布置成将热管部夹在传热块和第二传热板部件之间。

公开(公告)号：US20110039214A1

公开(公告)日：2011-02-17

申请号：US12857710

申请日：2010-08-17

申请人： Shinichi ITO ,  Kentaro Matsunaga ,  Daisuke Kawamura ,  Yasunobu Onishi

发明人： Shinichi ITO ,  Kentaro Matsunaga ,  Daisuke Kawamura ,  Yasunobu Onishi

IPC分类号： G03F7/20 ,  H01L21/308

CPC分类号： G03F7/2041 ,  G03F7/11 ,  Y10S430/162

摘要： A pattern forming method includes forming a photo resist film on a film to be processed, forming a protective film for protecting the photo resist film from an immersion liquid on the photo resist film by coating method, performing immersion exposure selectively to a region of part of the photo resist film via the immersion liquid, the immersion liquid being supplied onto the photo resist film, removing a residual substance including an affinitive part for the immersion liquid from the protective film after the forming the protective film and before the performing immersion exposure selectively to the region of part of the photo resist film, removing the protective film, and forming a pattern comprising the photo resist film by selectively removing an exposed region or a non-exposed region of the photo resist film.

摘要翻译： 图案形成方法包括在被处理膜上形成光致抗蚀剂膜，通过涂布法在光致抗蚀剂膜上形成用于保护光致抗蚀剂膜的浸渍液的保护膜，选择性地进行部分浸渍曝光 通过浸渍液将该光致抗蚀剂膜，浸渍液体供给到光致抗蚀剂膜上，在形成保护膜之后，在进行浸渍曝光前，选择性地除去包含浸渍液的残留物质的残留物质， 通过选择性地去除光致抗蚀剂膜的曝光区域或未曝光区域，去除保护膜，以及形成包括光致抗蚀剂膜的图案。

公开(公告)号：US20100104988A1

公开(公告)日：2010-04-29

申请号：US12651062

申请日：2009-12-31

申请人： Kei HAYASAKI ,  Shinichi ITO ,  Tatsuhiko EMA ,  Riichiro TAKAHASHI

发明人： Kei HAYASAKI ,  Shinichi ITO ,  Tatsuhiko EMA ,  Riichiro TAKAHASHI

IPC分类号： G03F7/40

CPC分类号： G03F7/3021 ,  H01L21/31133 ,  Y10S134/902

摘要： There is disclosed a developing method of developing a photo-sensitive resist film in which a desired pattern is exposed, including subjecting the exposed photosensitive resist film to a first developing treatment; supplying a cleaning solution having an oxidizing property or alkalinity with respect to the surface of the resist film to the photosensitive resist film subject to the first developing treatment to perform a first cleaning treatment; subjecting the photosensitive resist film subjected to the first cleaning treatment to a second developing treatment; and subjecting the photosensitive resist film subjected to the second developing treatment to a second cleaning treatment.

摘要翻译： 公开了一种显影方法，该方法包括使曝光的光敏抗蚀剂膜进行第一显影处理，其中曝光所需图案的光敏抗蚀剂膜显影; 将相对于抗蚀剂膜的表面具有氧化性或碱性的清洗溶液提供给经受第一显影处理的感光性抗蚀剂膜，以进行第一清洗处理; 对经受第一清洗处理的感光性抗蚀剂膜进行第二显影处理; 对进行了第二显影处理的感光性抗蚀剂膜进行第二次清洗处理。

公开(公告)号：US20100022098A1

公开(公告)日：2010-01-28

申请号：US12503599

申请日：2009-07-15

申请人： Kentaro MATSUNAGA ,  Shinichi ITO

发明人： Kentaro MATSUNAGA ,  Shinichi ITO

IPC分类号： H01L21/31

CPC分类号： H01L21/306 ,  H01L21/0273 ,  H01L21/0338 ,  H01L21/3105 ,  H01L21/316 ,  H01L21/3185

摘要： A method for manufacturing a semiconductor device includes: performing modifying a surface of a semiconductor wafer including a silanol group on the surface with an alkylsilyl group; and fluorinating an alkyl group of the alkylsilyl group with which the surface was modified.

摘要翻译： 半导体器件的制造方法包括：用烷基甲硅烷基改性表面上含有硅烷醇基的半导体晶片的表面; 并氟化表面被修饰的烷基甲硅烷基的烷基。

公开(公告)号：US20090302000A1

公开(公告)日：2009-12-10

申请号：US12478177

申请日：2009-06-04

申请人： Shinichi ITO

发明人： Shinichi ITO

IPC分类号： B44C1/22

CPC分类号： H01L21/31138 ,  H01L21/0273 ,  H01L21/0337 ,  H01L21/0338 ,  H01L21/31144 ,  H01L22/12 ,  H01L22/20 ,  H01L2924/0002 ,  H01L2924/00

摘要： A pattern forming method according to an embodiment of the present invention includes forming, on a substrate, a base pattern having a space part, adjusting a width of the space part to make a bottom width of the space part closer to an upper width of the space part, and forming a modified base pattern having a space part whose bottom width is smaller than the bottom width of the space part of the base pattern, by a process of forming a deposition film on the substrate and the base pattern, and a process of removing the deposition film from a bottom of the space part of the base pattern.

摘要翻译： 根据本发明的实施例的图案形成方法包括在基板上形成具有空间部分的基底图案，调整所述空间部分的宽度以使得所述空间部分的底部宽度接近所述空间部分的上部宽度 并且通过在基板和基底图案上形成沉积膜而形成具有底部宽度小于基底图案的空间部分的底部宽度的空间部分的修改的基底图案，以及工艺 从基底图案的空间部分的底部去除沉积膜。